PL424096A1 - Zestaw do bezdotykowej kontroli temperatury, sposób generowania frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych - Google Patents

Zestaw do bezdotykowej kontroli temperatury, sposób generowania frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych

Info

Publication number
PL424096A1
PL424096A1 PL424096A PL42409618A PL424096A1 PL 424096 A1 PL424096 A1 PL 424096A1 PL 424096 A PL424096 A PL 424096A PL 42409618 A PL42409618 A PL 42409618A PL 424096 A1 PL424096 A1 PL 424096A1
Authority
PL
Poland
Prior art keywords
generation
application
electromagnetic radiation
touchless
wave fronts
Prior art date
Application number
PL424096A
Other languages
English (en)
Other versions
PL239727B1 (pl
Inventor
Miron TOKARSKI
Małgorzata MAŁODOBRA-MAZUR
Henryk Waldemar ROGUSZCZAK
Mateusz CZOK
Original Assignee
Genomtec Spółka Akcyjna
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Genomtec Spółka Akcyjna filed Critical Genomtec Spółka Akcyjna
Priority to PL424096A priority Critical patent/PL239727B1/pl
Priority to JP2020557112A priority patent/JP7825940B2/ja
Priority to CN201880084969.8A priority patent/CN111556959A/zh
Priority to EP18898287.0A priority patent/EP3735575B1/en
Priority to US16/959,947 priority patent/US20210072777A1/en
Priority to PL18898287.0T priority patent/PL3735575T3/pl
Priority to PCT/PL2018/050068 priority patent/WO2019135687A1/en
Priority to ES18898287T priority patent/ES3019683T3/es
Publication of PL424096A1 publication Critical patent/PL424096A1/pl
Publication of PL239727B1 publication Critical patent/PL239727B1/pl
Priority to JP2024014082A priority patent/JP2024059644A/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/0205—Mechanical elements; Supports for optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/12—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using thermoelectric elements, e.g. thermocouples
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/27—Control of temperature characterised by the use of electric means with sensing element responsive to radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/48—Thermography; Techniques using wholly visual means
    • G01J5/485—Temperature profile

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Automation & Control Theory (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Radiation Pyrometers (AREA)

Abstract

Zestaw do kontroli temperatury, charakteryzuje się tym, że zawiera źródło fal elektromagnetycznych (1) jak laser albo diodę albo generator ultradźwięków połączone przewodami z specjalizowanym sterownikiem (3) z mikroprocesorem połączony przewodami z detektorem promieniowania cieplnego (2), jak detektor piroelektryczny albo detektor termoparowy, przy czym źródło fal elektromagnetycznych i detektor promieniowania cieplnego są umieszczone pod umieszczone pod kątem ? od 0° do 180° względem siebie. Przedmiotem zgłoszenia jest również sposób generowania profili frontów falowych promieniowania i zastosowanie zestawu do generowania profili pól temperaturowych wykorzystującego profile frontów falowych.
PL424096A 2018-01-03 2018-01-03 Zestaw do bezdotykowej kontroli temperatury, sposob generowania frontow falowych promieniowania elektromagnetycznego PL239727B1 (pl)

Priority Applications (9)

Application Number Priority Date Filing Date Title
PL424096A PL239727B1 (pl) 2018-01-03 2018-01-03 Zestaw do bezdotykowej kontroli temperatury, sposob generowania frontow falowych promieniowania elektromagnetycznego
JP2020557112A JP7825940B2 (ja) 2018-01-03 2018-12-19 無接触温度制御用の装置、電磁放射波面の生成方法、及び温度場プロファイルを生成するための装置の使用
CN201880084969.8A CN111556959A (zh) 2018-01-03 2018-12-19 一种用于非接触式温度控制的装置、一种生成电磁辐射波阵面的方法和该装置生成温度场曲线的用途
EP18898287.0A EP3735575B1 (en) 2018-01-03 2018-12-19 A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields
US16/959,947 US20210072777A1 (en) 2018-01-03 2018-12-19 A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields
PL18898287.0T PL3735575T3 (pl) 2018-01-03 2018-12-19 Zestaw do bezkontaktowej kontroli temperatury, sposób tworzenia profili frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych
PCT/PL2018/050068 WO2019135687A1 (en) 2018-01-03 2018-12-19 A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields
ES18898287T ES3019683T3 (en) 2018-01-03 2018-12-19 A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields
JP2024014082A JP2024059644A (ja) 2018-01-03 2024-02-01 無接触温度制御用の装置、電磁放射波面の生成方法、及び温度場プロファイルを生成するための装置の使用

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL424096A PL239727B1 (pl) 2018-01-03 2018-01-03 Zestaw do bezdotykowej kontroli temperatury, sposob generowania frontow falowych promieniowania elektromagnetycznego

Publications (2)

Publication Number Publication Date
PL424096A1 true PL424096A1 (pl) 2019-07-15
PL239727B1 PL239727B1 (pl) 2022-01-03

Family

ID=67143729

Family Applications (2)

Application Number Title Priority Date Filing Date
PL424096A PL239727B1 (pl) 2018-01-03 2018-01-03 Zestaw do bezdotykowej kontroli temperatury, sposob generowania frontow falowych promieniowania elektromagnetycznego
PL18898287.0T PL3735575T3 (pl) 2018-01-03 2018-12-19 Zestaw do bezkontaktowej kontroli temperatury, sposób tworzenia profili frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych

Family Applications After (1)

Application Number Title Priority Date Filing Date
PL18898287.0T PL3735575T3 (pl) 2018-01-03 2018-12-19 Zestaw do bezkontaktowej kontroli temperatury, sposób tworzenia profili frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych

Country Status (7)

Country Link
US (1) US20210072777A1 (pl)
EP (1) EP3735575B1 (pl)
JP (2) JP7825940B2 (pl)
CN (1) CN111556959A (pl)
ES (1) ES3019683T3 (pl)
PL (2) PL239727B1 (pl)
WO (1) WO2019135687A1 (pl)

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US5352038A (en) * 1991-05-06 1994-10-04 Hoechst Aktiengesellschaft Method of and measuring arrangement for contactless on-line measurement
JPH06300645A (ja) * 1993-04-15 1994-10-28 Japan Radio Co Ltd 温度測定装置
JPH0933353A (ja) * 1995-07-24 1997-02-07 Toru Inai 放射測温方法およびその測温装置
EP1043759A2 (en) * 1999-04-06 2000-10-11 Lucent Technologies Inc. Method for processing silicon workpieces using hybrid optical thermometer system
JP2001235373A (ja) * 2001-01-17 2001-08-31 Mitsubishi Electric Corp 波面センサ
JP2011247980A (ja) * 2010-05-25 2011-12-08 Mitsubishi Electric Corp マルチ画面表示装置
WO2017205528A1 (en) * 2016-05-24 2017-11-30 Applied Materials, Inc. Non-contact temperature measurement by dual-wavelength shift in brewster's angle

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WO1994026459A1 (de) * 1993-05-19 1994-11-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur materialbearbeitung mit diodenstrahlung
EP0836905B1 (de) 1996-10-20 2002-04-10 INPRO Innovationsgesellschaft für fortgeschrittene Produktionssysteme in der Fahrzeugindustrie mbH Verfahren und Anordnung zur temperaturgeregelten Oberflächenbehandlung, insbesondere zum Härten von Werkstückoberflächen mittels Laserstrahlung
US6002113A (en) * 1998-05-18 1999-12-14 Lucent Technologies Inc. Apparatus for processing silicon devices with improved temperature control
US6122440A (en) 1999-01-27 2000-09-19 Regents Of The University Of Minnesota Optical heating device for rapid thermal processing (RTP) system
US7005601B2 (en) * 2002-04-18 2006-02-28 Applied Materials, Inc. Thermal flux processing by scanning
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US6967342B2 (en) * 2003-07-31 2005-11-22 Fusion Uv Systems, Inc. Method and apparatus for improved ultraviolet (UV) treatment of large three-dimensional (3D) objects
US20050106876A1 (en) * 2003-10-09 2005-05-19 Taylor Charles A.Ii Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5352038A (en) * 1991-05-06 1994-10-04 Hoechst Aktiengesellschaft Method of and measuring arrangement for contactless on-line measurement
JPH06300645A (ja) * 1993-04-15 1994-10-28 Japan Radio Co Ltd 温度測定装置
JPH0933353A (ja) * 1995-07-24 1997-02-07 Toru Inai 放射測温方法およびその測温装置
EP1043759A2 (en) * 1999-04-06 2000-10-11 Lucent Technologies Inc. Method for processing silicon workpieces using hybrid optical thermometer system
JP2001235373A (ja) * 2001-01-17 2001-08-31 Mitsubishi Electric Corp 波面センサ
JP2011247980A (ja) * 2010-05-25 2011-12-08 Mitsubishi Electric Corp マルチ画面表示装置
WO2017205528A1 (en) * 2016-05-24 2017-11-30 Applied Materials, Inc. Non-contact temperature measurement by dual-wavelength shift in brewster's angle

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Also Published As

Publication number Publication date
EP3735575B1 (en) 2025-02-19
PL239727B1 (pl) 2022-01-03
EP3735575A1 (en) 2020-11-11
CN111556959A (zh) 2020-08-18
JP2021509959A (ja) 2021-04-08
JP7825940B2 (ja) 2026-03-09
PL3735575T3 (pl) 2025-06-02
WO2019135687A1 (en) 2019-07-11
US20210072777A1 (en) 2021-03-11
JP2024059644A (ja) 2024-05-01
ES3019683T3 (en) 2025-05-21
EP3735575A4 (en) 2021-10-27

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