PL424096A1 - Zestaw do bezdotykowej kontroli temperatury, sposób generowania frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych - Google Patents
Zestaw do bezdotykowej kontroli temperatury, sposób generowania frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowychInfo
- Publication number
- PL424096A1 PL424096A1 PL424096A PL42409618A PL424096A1 PL 424096 A1 PL424096 A1 PL 424096A1 PL 424096 A PL424096 A PL 424096A PL 42409618 A PL42409618 A PL 42409618A PL 424096 A1 PL424096 A1 PL 424096A1
- Authority
- PL
- Poland
- Prior art keywords
- generation
- application
- electromagnetic radiation
- touchless
- wave fronts
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 230000005670 electromagnetic radiation Effects 0.000 title 1
- 238000012544 monitoring process Methods 0.000 title 1
- 230000005855 radiation Effects 0.000 abstract 2
- 238000002604 ultrasonography Methods 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/0205—Mechanical elements; Supports for optical elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/12—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using thermoelectric elements, e.g. thermocouples
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/27—Control of temperature characterised by the use of electric means with sensing element responsive to radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/48—Thermography; Techniques using wholly visual means
- G01J5/485—Temperature profile
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Automation & Control Theory (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Radiation Pyrometers (AREA)
Abstract
Zestaw do kontroli temperatury, charakteryzuje się tym, że zawiera źródło fal elektromagnetycznych (1) jak laser albo diodę albo generator ultradźwięków połączone przewodami z specjalizowanym sterownikiem (3) z mikroprocesorem połączony przewodami z detektorem promieniowania cieplnego (2), jak detektor piroelektryczny albo detektor termoparowy, przy czym źródło fal elektromagnetycznych i detektor promieniowania cieplnego są umieszczone pod umieszczone pod kątem ? od 0° do 180° względem siebie. Przedmiotem zgłoszenia jest również sposób generowania profili frontów falowych promieniowania i zastosowanie zestawu do generowania profili pól temperaturowych wykorzystującego profile frontów falowych.
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PL424096A PL239727B1 (pl) | 2018-01-03 | 2018-01-03 | Zestaw do bezdotykowej kontroli temperatury, sposob generowania frontow falowych promieniowania elektromagnetycznego |
| CN201880084969.8A CN111556959A (zh) | 2018-01-03 | 2018-12-19 | 一种用于非接触式温度控制的装置、一种生成电磁辐射波阵面的方法和该装置生成温度场曲线的用途 |
| JP2020557112A JP7825940B2 (ja) | 2018-01-03 | 2018-12-19 | 無接触温度制御用の装置、電磁放射波面の生成方法、及び温度場プロファイルを生成するための装置の使用 |
| ES18898287T ES3019683T3 (en) | 2018-01-03 | 2018-12-19 | A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields |
| EP18898287.0A EP3735575B1 (en) | 2018-01-03 | 2018-12-19 | A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields |
| US16/959,947 US20210072777A1 (en) | 2018-01-03 | 2018-12-19 | A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields |
| PCT/PL2018/050068 WO2019135687A1 (en) | 2018-01-03 | 2018-12-19 | A set for contactless temperature control, a method of generating electromagnetic radiation wavefronts and the use of the set to generate profiles of temperature fields |
| PL18898287.0T PL3735575T3 (pl) | 2018-01-03 | 2018-12-19 | Zestaw do bezkontaktowej kontroli temperatury, sposób tworzenia profili frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych |
| JP2024014082A JP2024059644A (ja) | 2018-01-03 | 2024-02-01 | 無接触温度制御用の装置、電磁放射波面の生成方法、及び温度場プロファイルを生成するための装置の使用 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PL424096A PL239727B1 (pl) | 2018-01-03 | 2018-01-03 | Zestaw do bezdotykowej kontroli temperatury, sposob generowania frontow falowych promieniowania elektromagnetycznego |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| PL424096A1 true PL424096A1 (pl) | 2019-07-15 |
| PL239727B1 PL239727B1 (pl) | 2022-01-03 |
Family
ID=67143729
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL424096A PL239727B1 (pl) | 2018-01-03 | 2018-01-03 | Zestaw do bezdotykowej kontroli temperatury, sposob generowania frontow falowych promieniowania elektromagnetycznego |
| PL18898287.0T PL3735575T3 (pl) | 2018-01-03 | 2018-12-19 | Zestaw do bezkontaktowej kontroli temperatury, sposób tworzenia profili frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PL18898287.0T PL3735575T3 (pl) | 2018-01-03 | 2018-12-19 | Zestaw do bezkontaktowej kontroli temperatury, sposób tworzenia profili frontów falowych promieniowania elektromagnetycznego oraz zastosowanie zestawu do generowania profili pól temperaturowych |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20210072777A1 (pl) |
| EP (1) | EP3735575B1 (pl) |
| JP (2) | JP7825940B2 (pl) |
| CN (1) | CN111556959A (pl) |
| ES (1) | ES3019683T3 (pl) |
| PL (2) | PL239727B1 (pl) |
| WO (1) | WO2019135687A1 (pl) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5352038A (en) * | 1991-05-06 | 1994-10-04 | Hoechst Aktiengesellschaft | Method of and measuring arrangement for contactless on-line measurement |
| JPH06300645A (ja) * | 1993-04-15 | 1994-10-28 | Japan Radio Co Ltd | 温度測定装置 |
| JPH0933353A (ja) * | 1995-07-24 | 1997-02-07 | Toru Inai | 放射測温方法およびその測温装置 |
| EP1043759A2 (en) * | 1999-04-06 | 2000-10-11 | Lucent Technologies Inc. | Method for processing silicon workpieces using hybrid optical thermometer system |
| JP2001235373A (ja) * | 2001-01-17 | 2001-08-31 | Mitsubishi Electric Corp | 波面センサ |
| JP2011247980A (ja) * | 2010-05-25 | 2011-12-08 | Mitsubishi Electric Corp | マルチ画面表示装置 |
| WO2017205528A1 (en) * | 2016-05-24 | 2017-11-30 | Applied Materials, Inc. | Non-contact temperature measurement by dual-wavelength shift in brewster's angle |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4234342C2 (de) | 1992-10-12 | 1998-05-14 | Fraunhofer Ges Forschung | Verfahren zur Materialbearbeitung mit Laserstrahlung |
| ES2106520T3 (es) * | 1993-05-19 | 1997-11-01 | Fraunhofer Ges Forschung | Procedimiento que permite el trabajo de materiales por radiacion emitida por diodos. |
| DE59609070D1 (de) | 1996-10-20 | 2002-05-16 | Inpro Innovations Gmbh | Verfahren und Anordnung zur temperaturgeregelten Oberflächenbehandlung, insbesondere zum Härten von Werkstückoberflächen mittels Laserstrahlung |
| US6002113A (en) * | 1998-05-18 | 1999-12-14 | Lucent Technologies Inc. | Apparatus for processing silicon devices with improved temperature control |
| US6122440A (en) | 1999-01-27 | 2000-09-19 | Regents Of The University Of Minnesota | Optical heating device for rapid thermal processing (RTP) system |
| US7005601B2 (en) * | 2002-04-18 | 2006-02-28 | Applied Materials, Inc. | Thermal flux processing by scanning |
| US6768084B2 (en) * | 2002-09-30 | 2004-07-27 | Axcelis Technologies, Inc. | Advanced rapid thermal processing (RTP) using a linearly-moving heating assembly with an axisymmetric and radially-tunable thermal radiation profile |
| US6967342B2 (en) * | 2003-07-31 | 2005-11-22 | Fusion Uv Systems, Inc. | Method and apparatus for improved ultraviolet (UV) treatment of large three-dimensional (3D) objects |
| US20050106876A1 (en) * | 2003-10-09 | 2005-05-19 | Taylor Charles A.Ii | Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing |
| US8536492B2 (en) * | 2003-10-27 | 2013-09-17 | Applied Materials, Inc. | Processing multilayer semiconductors with multiple heat sources |
| JP2005231262A (ja) * | 2004-02-20 | 2005-09-02 | Keyence Corp | 紫外線照射装置、紫外線照射方法、紫外線照射条件設定プログラム及びコンピュータで読み取り可能な記録媒体並びに記憶した機器 |
| JP4864396B2 (ja) * | 2005-09-13 | 2012-02-01 | 株式会社東芝 | 半導体素子の製造方法、及び、半導体素子の製造装置 |
| US20160238453A1 (en) * | 2006-02-27 | 2016-08-18 | Yuriko Mizuta | Infrared sensor manufactured by method suitable for mass production |
| WO2008151469A1 (en) * | 2007-06-15 | 2008-12-18 | Changxue Ren | Heating device and method using a pseudo-uniform electromagnetic field |
| JP2010048429A (ja) * | 2008-08-19 | 2010-03-04 | Panasonic Corp | 加熱調理器 |
| JP2016001642A (ja) * | 2014-06-11 | 2016-01-07 | 坂口電熱株式会社 | レーザ加熱処理装置 |
| WO2016117077A1 (ja) * | 2015-01-22 | 2016-07-28 | オリンパス株式会社 | 超音波治療装置 |
-
2018
- 2018-01-03 PL PL424096A patent/PL239727B1/pl unknown
- 2018-12-19 ES ES18898287T patent/ES3019683T3/es active Active
- 2018-12-19 EP EP18898287.0A patent/EP3735575B1/en active Active
- 2018-12-19 PL PL18898287.0T patent/PL3735575T3/pl unknown
- 2018-12-19 JP JP2020557112A patent/JP7825940B2/ja active Active
- 2018-12-19 US US16/959,947 patent/US20210072777A1/en active Pending
- 2018-12-19 CN CN201880084969.8A patent/CN111556959A/zh active Pending
- 2018-12-19 WO PCT/PL2018/050068 patent/WO2019135687A1/en not_active Ceased
-
2024
- 2024-02-01 JP JP2024014082A patent/JP2024059644A/ja active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5352038A (en) * | 1991-05-06 | 1994-10-04 | Hoechst Aktiengesellschaft | Method of and measuring arrangement for contactless on-line measurement |
| JPH06300645A (ja) * | 1993-04-15 | 1994-10-28 | Japan Radio Co Ltd | 温度測定装置 |
| JPH0933353A (ja) * | 1995-07-24 | 1997-02-07 | Toru Inai | 放射測温方法およびその測温装置 |
| EP1043759A2 (en) * | 1999-04-06 | 2000-10-11 | Lucent Technologies Inc. | Method for processing silicon workpieces using hybrid optical thermometer system |
| JP2001235373A (ja) * | 2001-01-17 | 2001-08-31 | Mitsubishi Electric Corp | 波面センサ |
| JP2011247980A (ja) * | 2010-05-25 | 2011-12-08 | Mitsubishi Electric Corp | マルチ画面表示装置 |
| WO2017205528A1 (en) * | 2016-05-24 | 2017-11-30 | Applied Materials, Inc. | Non-contact temperature measurement by dual-wavelength shift in brewster's angle |
Non-Patent Citations (1)
| Title |
|---|
| ALEŚ DOBESCH JURAJ POLIAK, THERMOMETER WITH AUTOMATIC EMISSIVITY CORRECTION, December 2013 (2013-12-01) * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021509959A (ja) | 2021-04-08 |
| WO2019135687A1 (en) | 2019-07-11 |
| JP2024059644A (ja) | 2024-05-01 |
| EP3735575A1 (en) | 2020-11-11 |
| PL239727B1 (pl) | 2022-01-03 |
| PL3735575T3 (pl) | 2025-06-02 |
| JP7825940B2 (ja) | 2026-03-09 |
| US20210072777A1 (en) | 2021-03-11 |
| EP3735575B1 (en) | 2025-02-19 |
| CN111556959A (zh) | 2020-08-18 |
| EP3735575A4 (en) | 2021-10-27 |
| ES3019683T3 (en) | 2025-05-21 |
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