PL442496A1 - Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym - Google Patents

Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym

Info

Publication number
PL442496A1
PL442496A1 PL442496A PL44249622A PL442496A1 PL 442496 A1 PL442496 A1 PL 442496A1 PL 442496 A PL442496 A PL 442496A PL 44249622 A PL44249622 A PL 44249622A PL 442496 A1 PL442496 A1 PL 442496A1
Authority
PL
Poland
Prior art keywords
sup
layer
bandgap
photovoltaic cell
energy level
Prior art date
Application number
PL442496A
Other languages
English (en)
Other versions
PL243315B1 (pl
Inventor
Paweł Węgierek
Justyna Pastuszak
Original Assignee
Politechnika Lubelska
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Politechnika Lubelska filed Critical Politechnika Lubelska
Priority to PL442496A priority Critical patent/PL243315B1/pl
Publication of PL442496A1 publication Critical patent/PL442496A1/pl
Publication of PL243315B1 publication Critical patent/PL243315B1/pl

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P30/00Ion implantation into wafers, substrates or parts of devices
    • H10P30/20Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/12Active materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90Thermal treatments, e.g. annealing or sintering
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

Przedmiotem zgłoszenia jest sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym (3) w paśmie zabronionym półprzewodnika (8), składającego się z warstwy krzemu typu p (2) i warstwy krzemu typu n (4), a także elektrody dolnej (1) i górnej (6) wraz z warstwą pasywującą powierzchnię i powłoką antyrefleksyjną (5), w którym teksturyzuje się, domieszkuje się metodą implantacji jonowej, wygrzewa się poimplantacyjnie i pasywuje, a następnie osadza się powłokę antyrefleksyjną i nanosi się elektrody oraz utwardza w piecu. Istotą sposobu jest to, że warstwę krzemu typu p (2), o rezystywności ρ od 0,01 Ω x cm, do 10 Ω x cm, korzystnie 0,4  Ω x cm, implantuje się jonami neonu o dawce D od 4,0 x 10<sup>13</sup> cm<sup>-2</sup> do 4,0 x 10<sup>14</sup> cm<sup>-2</sup>, korzystnie 2,2 x 10<sup>14</sup> cm<sup>-2</sup> i energii E 100 keV, a następnie wygrzewa izochronicznie w temperaturze T<sub>a</sub> = 598 K, w czasie t = 15 min.
PL442496A 2022-10-12 2022-10-12 Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym PL243315B1 (pl)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL442496A PL243315B1 (pl) 2022-10-12 2022-10-12 Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL442496A PL243315B1 (pl) 2022-10-12 2022-10-12 Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym

Publications (2)

Publication Number Publication Date
PL442496A1 true PL442496A1 (pl) 2023-03-13
PL243315B1 PL243315B1 (pl) 2023-07-31

Family

ID=85480568

Family Applications (1)

Application Number Title Priority Date Filing Date
PL442496A PL243315B1 (pl) 2022-10-12 2022-10-12 Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym

Country Status (1)

Country Link
PL (1) PL243315B1 (pl)

Also Published As

Publication number Publication date
PL243315B1 (pl) 2023-07-31

Similar Documents

Publication Publication Date Title
CN102792453B (zh) 太阳电池中降低表面再结合与强化光捕捉
CN101414648B (zh) 结晶硅太阳能电池的快速氢钝化的方法
TW200947720A (en) Establishing a high phosphorus concentration in solar cells
TW201110200A (en) Solar cell defect passivation method
CN106575684A (zh) 特别用于太阳能电池的在硅基板中产生不同掺杂区的方法
Madani et al. Comparison of passivation properties of plasma-assisted ALD and APCVD deposited Al2O3 with SiNx capping
US8338220B2 (en) Negatively charged passivation layer in a photovoltaic cell
US10461212B2 (en) Method for processing silicon material
JP2010118672A5 (pl)
PL442496A1 (pl) Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym
PL442643A1 (pl) Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym
PL443344A1 (pl) Sposób wytwarzania krzemowego ogniwa fotowoltaicznego z dodatkowym poziomem energetycznym w paśmie zabronionym
KR100964153B1 (ko) 태양전지의 제조방법 및 그에 의해 제조되는 태양전지
Ma et al. Numerical modelling of silicon p+ emitters passivated by a PECVD AlOx/SiNx stack
Janssens et al. Advanced phosphorous emitters for high efficiency Si solar cells
Macdonald et al. Electronically-coupled up-conversion: an alternative approach to impurity photovoltaics in crystalline silicon
Allebé et al. Sputtering for the Formation of Si-Based Passivating Contacts
Ohrdes et al. Solar cell emitter design with PV-tailored implantation
RU2845133C1 (ru) Структура фотоэлектрического преобразователя энергии на основе пористого кремния и антиотражающих покрытий и способ ее получения
Mok et al. Insights to emitter saturation current densities of boron implanted samples based on defects simulations
CN103081131A (zh) 用于生产光伏电池的方法
KR20090054731A (ko) 태양전지의 제조방법
CN110098283A (zh) 一种匹配激光选择性掺杂的离子注入磷扩散方法
RU2474926C1 (ru) Способ регулирования напряжения переключения силового полупроводникового прибора
Clarkson et al. Conformal P‐N junctions in macroporous silicon for photovoltaic energy conversion