PL447826A1 - Urządzenie do wytwarzania cienkich warstw i sposób wytwarzania cienkich warstw - Google Patents

Urządzenie do wytwarzania cienkich warstw i sposób wytwarzania cienkich warstw

Info

Publication number
PL447826A1
PL447826A1 PL447826A PL44782624A PL447826A1 PL 447826 A1 PL447826 A1 PL 447826A1 PL 447826 A PL447826 A PL 447826A PL 44782624 A PL44782624 A PL 44782624A PL 447826 A1 PL447826 A1 PL 447826A1
Authority
PL
Poland
Prior art keywords
thin layers
producing thin
head
substrate
producing
Prior art date
Application number
PL447826A
Other languages
English (en)
Inventor
Paweł Dąbczyński
Kamil AWSIUK
Joanna Zemła
Jakub RYSZ
Andrzej BUDKOWSKI
Katarzyna BUCKA
Original Assignee
Uniwersytet Jagielloński
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uniwersytet Jagielloński filed Critical Uniwersytet Jagielloński
Priority to PL447826A priority Critical patent/PL447826A1/pl
Priority to EP25158974.3A priority patent/EP4608113A1/en
Publication of PL447826A1 publication Critical patent/PL447826A1/pl

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/50—Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/441—Thermal treatment, e.g. annealing in the presence of a solvent vapour in the presence of solvent vapors, e.g. solvent vapour annealing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
    • B05D3/0453—After-treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Przedmiotem zgłoszenia jest urządzenie do wytwarzania cienkich warstw na podłożu, zawierające pierwszą głowicę do dozowania substancji tworzącej cienką warstwę na podłożu ruchomym względem pierwszej głowicy. Charakteryzujące się tym, że zawiera ponadto drugą głowicę (120) do dozowania, na nałożoną na podłoże (10) cienką warstwę (20), par środków procesowych w obojętnym gazie nośnym, przy czym druga głowica (120) jest zainstalowana w pewnej odległości (X) od pierwszej głowicy (110). Zgłoszenie obejmuje, ponadto, sposób wytwarzania cienkich warstw na podłożu z wykorzystaniem powyższego urządzenia.
PL447826A 2024-02-21 2024-02-21 Urządzenie do wytwarzania cienkich warstw i sposób wytwarzania cienkich warstw PL447826A1 (pl)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PL447826A PL447826A1 (pl) 2024-02-21 2024-02-21 Urządzenie do wytwarzania cienkich warstw i sposób wytwarzania cienkich warstw
EP25158974.3A EP4608113A1 (en) 2024-02-21 2025-02-19 A device and a method for producing thin films on a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL447826A PL447826A1 (pl) 2024-02-21 2024-02-21 Urządzenie do wytwarzania cienkich warstw i sposób wytwarzania cienkich warstw

Publications (1)

Publication Number Publication Date
PL447826A1 true PL447826A1 (pl) 2025-08-25

Family

ID=94768147

Family Applications (1)

Application Number Title Priority Date Filing Date
PL447826A PL447826A1 (pl) 2024-02-21 2024-02-21 Urządzenie do wytwarzania cienkich warstw i sposób wytwarzania cienkich warstw

Country Status (2)

Country Link
EP (1) EP4608113A1 (pl)
PL (1) PL447826A1 (pl)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06286120A (ja) * 1993-03-30 1994-10-11 Toppan Printing Co Ltd 印刷塗布装置
TW201410334A (zh) * 2012-08-09 2014-03-16 Dsm Ip Assets Bv 輥塗方法及裝置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL234389B1 (pl) 2017-12-04 2020-02-28 Akademia Gorniczo Hutnicza Im Stanislawa Staszica W Krakowie Urządzenie i sposób prowadzenia reakcji fotochemicznej w przesuwanym menisku
PL240157B1 (pl) 2018-03-23 2022-02-21 Univ Jagiellonski Urządzenie do oddziaływania na ciecz w menisku przesuwanym po podłożu i sposób prowadzenia reakcji
PL425045A1 (pl) 2018-03-28 2019-10-07 Uniwersytet Jagielloński Sposób wytwarzania nanoporowatych warstw półprzewodzących tlenków metali
US20210159426A1 (en) * 2018-04-02 2021-05-27 The University Of North Carolina At Chapel Hill Perovskite compositions comprising mixed solvent systems
FR3115632B1 (fr) * 2020-10-26 2023-05-05 Commissariat Energie Atomique Procédé de fabrication d’une couche de pérovskite à multi-cations

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06286120A (ja) * 1993-03-30 1994-10-11 Toppan Printing Co Ltd 印刷塗布装置
TW201410334A (zh) * 2012-08-09 2014-03-16 Dsm Ip Assets Bv 輥塗方法及裝置
CN104540600A (zh) * 2012-08-09 2015-04-22 帝斯曼知识产权资产管理有限公司 辊式涂布方法和设备

Also Published As

Publication number Publication date
EP4608113A1 (en) 2025-08-27

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