PT3761348T - Sistema para transportar um substrato entre estações de processamento de um aparelho de processamento, aparelho de processamento e métodos de manusear um substrato - Google Patents

Sistema para transportar um substrato entre estações de processamento de um aparelho de processamento, aparelho de processamento e métodos de manusear um substrato

Info

Publication number
PT3761348T
PT3761348T PT191847219T PT19184721T PT3761348T PT 3761348 T PT3761348 T PT 3761348T PT 191847219 T PT191847219 T PT 191847219T PT 19184721 T PT19184721 T PT 19184721T PT 3761348 T PT3761348 T PT 3761348T
Authority
PT
Portugal
Prior art keywords
substrate
processing apparatus
processing
conveying
handling
Prior art date
Application number
PT191847219T
Other languages
English (en)
Original Assignee
Atotech Deutschland Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh & Co Kg filed Critical Atotech Deutschland Gmbh & Co Kg
Publication of PT3761348T publication Critical patent/PT3761348T/pt

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0402Apparatus for fluid treatment
    • H10P72/0418Apparatus for fluid treatment for etching
    • H10P72/0422Apparatus for fluid treatment for etching for wet etching
    • H10P72/0426Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3312Vertical transfer of a batch of workpieces
PT191847219T 2019-07-05 2019-07-05 Sistema para transportar um substrato entre estações de processamento de um aparelho de processamento, aparelho de processamento e métodos de manusear um substrato PT3761348T (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP19184721.9A EP3761348B1 (en) 2019-07-05 2019-07-05 System for conveying a substrate between processing stations of a processing apparatus, processing apparatus and methods of handling a substrate

Publications (1)

Publication Number Publication Date
PT3761348T true PT3761348T (pt) 2024-07-02

Family

ID=67437605

Family Applications (1)

Application Number Title Priority Date Filing Date
PT191847219T PT3761348T (pt) 2019-07-05 2019-07-05 Sistema para transportar um substrato entre estações de processamento de um aparelho de processamento, aparelho de processamento e métodos de manusear um substrato

Country Status (2)

Country Link
EP (1) EP3761348B1 (pt)
PT (1) PT3761348T (pt)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6077886B2 (ja) * 2013-03-04 2017-02-08 株式会社荏原製作所 めっき装置
US9388504B2 (en) * 2013-03-26 2016-07-12 Ebara Corporation Plating apparatus and plating method
TW201502315A (zh) * 2013-07-10 2015-01-16 荏原製作所股份有限公司 濕式處理裝置及鍍覆裝置
EP3176288A1 (en) 2015-12-03 2017-06-07 ATOTECH Deutschland GmbH Method for galvanic metal deposition
JP6878056B2 (ja) * 2017-03-14 2021-05-26 株式会社荏原製作所 めっき方法

Also Published As

Publication number Publication date
EP3761348B1 (en) 2024-03-27
EP3761348A1 (en) 2021-01-06

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