SE456607B - Elektrooptisk metanordning - Google Patents
Elektrooptisk metanordningInfo
- Publication number
- SE456607B SE456607B SE8104772A SE8104772A SE456607B SE 456607 B SE456607 B SE 456607B SE 8104772 A SE8104772 A SE 8104772A SE 8104772 A SE8104772 A SE 8104772A SE 456607 B SE456607 B SE 456607B
- Authority
- SE
- Sweden
- Prior art keywords
- pattern
- light
- layer
- grating
- deposited
- Prior art date
Links
- 238000000034 method Methods 0.000 title description 8
- 239000000463 material Substances 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 230000004044 response Effects 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 16
- 239000002131 composite material Substances 0.000 description 13
- 238000006073 displacement reaction Methods 0.000 description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 6
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 6
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 6
- 239000011651 chromium Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000010363 phase shift Effects 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000009931 harmful effect Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000012552 review Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- LGZVIFDFEQVAKL-UHFFFAOYSA-N azane cerium(3+) trinitrate Chemical compound N.[Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O LGZVIFDFEQVAKL-UHFFFAOYSA-N 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910001610 cryolite Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C11/00—Photogrammetry or videogrammetry, e.g. stereogrammetry; Photographic surveying
- G01C11/04—Interpretation of pictures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Multimedia (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/176,886 US4286871A (en) | 1980-08-11 | 1980-08-11 | Photogrammetric measuring system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| SE8104772L SE8104772L (sv) | 1982-02-12 |
| SE456607B true SE456607B (sv) | 1988-10-17 |
Family
ID=22646279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE8104772A SE456607B (sv) | 1980-08-11 | 1981-08-10 | Elektrooptisk metanordning |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4286871A (it) |
| JP (1) | JPS6029044B2 (it) |
| CA (1) | CA1154585A (it) |
| CH (1) | CH645186A5 (it) |
| DE (1) | DE3131269C2 (it) |
| FR (1) | FR2488395A1 (it) |
| IT (1) | IT1137863B (it) |
| SE (1) | SE456607B (it) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4538105A (en) * | 1981-12-07 | 1985-08-27 | The Perkin-Elmer Corporation | Overlay test wafer |
| US4437760A (en) | 1981-12-07 | 1984-03-20 | The Perkin-Elmer Corp. | Reusable electrical overlay measurement circuit and process |
| US4475811A (en) * | 1983-04-28 | 1984-10-09 | The Perkin-Elmer Corporation | Overlay test measurement systems |
| JPS60118912U (ja) * | 1984-01-18 | 1985-08-12 | アルプス電気株式会社 | 反射型光学式ロ−タリエンコ−ダのコ−ドホイ−ル |
| JPS60217361A (ja) * | 1984-04-13 | 1985-10-30 | Alps Electric Co Ltd | 光反射式コ−ド板 |
| IT1179627B (it) * | 1984-05-02 | 1987-09-16 | Olivetti & Co Spa | Disco otturatore per trasduttore ottico |
| JPS6196410A (ja) * | 1984-10-17 | 1986-05-15 | Asahi Chem Ind Co Ltd | ロ−タリ−エンコ−ダ−用デイスクの製造法 |
| GB8615197D0 (en) * | 1986-06-21 | 1986-07-23 | Renishaw Plc | Opto-electronic scale reading apparatus |
| US5021649A (en) * | 1989-03-28 | 1991-06-04 | Canon Kabushiki Kaisha | Relief diffraction grating encoder |
| JPH11183199A (ja) * | 1997-12-25 | 1999-07-09 | Merutekku:Kk | フォトセンサー用スケール |
| DE10011872A1 (de) | 2000-03-10 | 2001-09-27 | Heidenhain Gmbh Dr Johannes | Reflexions-Messteilung und Verfahren zur Herstellung derselben |
| DE10150099A1 (de) * | 2001-10-11 | 2003-04-17 | Heidenhain Gmbh Dr Johannes | Verfahren zur Herstellung eines Maßstabes, sowie derart hergestellter Maßstab und eine Positionsmesseinrichtung |
| JP4280509B2 (ja) * | 2003-01-31 | 2009-06-17 | キヤノン株式会社 | 投影露光用マスク、投影露光用マスクの製造方法、投影露光装置および投影露光方法 |
| US7235280B2 (en) * | 2003-11-12 | 2007-06-26 | Srs Technologies, Inc. | Non-intrusive photogrammetric targets |
| JP4427540B2 (ja) * | 2004-03-03 | 2010-03-10 | 三菱電機株式会社 | 光学式エンコーダ |
| JP4828612B2 (ja) * | 2007-06-01 | 2011-11-30 | 株式会社ミツトヨ | 反射型エンコーダ、そのスケール、及び、スケールの製造方法 |
| JP7563892B2 (ja) * | 2020-04-10 | 2024-10-08 | 株式会社キーエンス | 変位センサ |
| KR102617793B1 (ko) * | 2022-12-27 | 2023-12-27 | 주식회사 휴라이트 | 수소 발생 장치 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3116555A (en) * | 1958-12-01 | 1964-01-07 | Canadian Patents Dev | Photogrammetric plotter |
| US3330964A (en) * | 1963-09-09 | 1967-07-11 | Itck Corp | Photoelectric coordinate measuring system |
| DE1548707C3 (de) * | 1966-07-26 | 1979-02-15 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Fotoelektrischer Schrittgeber |
| US3839039A (en) * | 1969-11-18 | 1974-10-01 | Fuji Photo Optical Co Ltd | Process for producing color stripe filter |
| CA921695A (en) * | 1970-01-19 | 1973-02-27 | National Research Council Of Canada | Stereocompiler |
| GB1353470A (en) * | 1970-10-19 | 1974-05-15 | Post D | Position measuring apparatus utilizing moire fringe multiplication |
| US3768911A (en) * | 1971-08-17 | 1973-10-30 | Keuffel & Esser Co | Electro-optical incremental motion and position indicator |
| US3877810A (en) * | 1972-11-08 | 1975-04-15 | Rca Corp | Method for making a photomask |
| US3873203A (en) * | 1973-03-19 | 1975-03-25 | Motorola Inc | Durable high resolution silicon template |
| CH626169A5 (it) * | 1976-11-25 | 1981-10-30 | Leitz Ernst Gmbh |
-
1980
- 1980-08-11 US US06/176,886 patent/US4286871A/en not_active Expired - Lifetime
-
1981
- 1981-07-28 CA CA000382651A patent/CA1154585A/en not_active Expired
- 1981-08-06 JP JP56122555A patent/JPS6029044B2/ja not_active Expired
- 1981-08-07 DE DE3131269A patent/DE3131269C2/de not_active Expired
- 1981-08-10 CH CH513481A patent/CH645186A5/fr not_active IP Right Cessation
- 1981-08-10 IT IT23461/81A patent/IT1137863B/it active
- 1981-08-10 FR FR8115458A patent/FR2488395A1/fr active Granted
- 1981-08-10 SE SE8104772A patent/SE456607B/sv not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5763414A (en) | 1982-04-16 |
| CH645186A5 (fr) | 1984-09-14 |
| FR2488395A1 (fr) | 1982-02-12 |
| IT8123461A0 (it) | 1981-08-10 |
| DE3131269C2 (de) | 1985-08-22 |
| IT1137863B (it) | 1986-09-10 |
| FR2488395B1 (it) | 1985-03-29 |
| JPS6029044B2 (ja) | 1985-07-08 |
| US4286871A (en) | 1981-09-01 |
| SE8104772L (sv) | 1982-02-12 |
| CA1154585A (en) | 1983-10-04 |
| DE3131269A1 (de) | 1982-04-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NUG | Patent has lapsed |
Ref document number: 8104772-2 Effective date: 19940310 Format of ref document f/p: F |