SE500333C2 - Anordning för elektrolytisk oxidation av kiselskivor - Google Patents

Anordning för elektrolytisk oxidation av kiselskivor

Info

Publication number: SE500333C2
Authority: SE; Sweden
Prior art keywords: cathode; anode; silicon wafer; electrolyte; pct
Prior art date: 1993-03-17

Application number

SE9300881A

Other languages

English (en)

Swedish (sv)

Other versions

SE9300881D0 (sv

SE9300881L (sv

Inventor

Hermann Grimmeiss

Anders Christer Lindbladh

Carl-Fredrik Anton Mandenius

Mats Otto Persson

Original Assignee

Herman Georg Grimmeiss

Anders Christer Lindbladh

Carl Fredrik Anton Mandenius

Mats Otto Persson

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1993-03-17

Filing date

1993-03-17

Publication date

1994-06-06

1993-03-17 Application filed by Herman Georg Grimmeiss, Anders Christer Lindbladh, Carl Fredrik Anton Mandenius, Mats Otto Persson filed Critical Herman Georg Grimmeiss

1993-03-17 Priority to SE9300881A priority Critical patent/SE500333C2/sv

1993-03-17 Publication of SE9300881D0 publication Critical patent/SE9300881D0/xx

1994-03-17 Priority to DE69406777T priority patent/DE69406777T2/de

1994-03-17 Priority to EP94910635A priority patent/EP0689621B1/de

1994-03-17 Priority to US08/522,406 priority patent/US5725742A/en

1994-03-17 Priority to PCT/SE1994/000237 priority patent/WO1994021845A1/en

1994-03-17 Priority to AT94910635T priority patent/ATE160181T1/de

1994-03-17 Priority to JP6520940A priority patent/JPH08507829A/ja

1994-06-06 Publication of SE9300881L publication Critical patent/SE9300881L/

1994-06-06 Publication of SE500333C2 publication Critical patent/SE500333C2/sv

Links

235000012431 wafers Nutrition 0.000 title claims abstract description 22
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 21
229910052710 silicon Inorganic materials 0.000 title claims abstract description 21
239000010703 silicon Substances 0.000 title claims abstract description 21
230000003647 oxidation Effects 0.000 title claims abstract description 10
238000007254 oxidation reaction Methods 0.000 title claims abstract description 10
239000003792 electrolyte Substances 0.000 claims abstract description 10
125000006850 spacer group Chemical group 0.000 claims abstract description 6
230000005484 gravity Effects 0.000 claims abstract 2
239000007853 buffer solution Substances 0.000 claims 1
BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 claims 1
239000000463 material Substances 0.000 claims 1
229910000403 monosodium phosphate Inorganic materials 0.000 claims 1
235000019799 monosodium phosphate Nutrition 0.000 claims 1
239000011148 porous material Substances 0.000 claims 1
AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 claims 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
239000000377 silicon dioxide Substances 0.000 description 6
229920001296 polysiloxane Polymers 0.000 description 2
229910052814 silicon oxide Inorganic materials 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
239000007983 Tris buffer Substances 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
239000012153 distilled water Substances 0.000 description 1
239000010439 graphite Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
230000010354 integration Effects 0.000 description 1
229910000162 sodium phosphate Inorganic materials 0.000 description 1
239000001488 sodium phosphate Substances 0.000 description 1
239000007787 solid Substances 0.000 description 1
LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/32—Anodisation of semiconducting materials

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Formation Of Insulating Films (AREA)
Crystals, And After-Treatments Of Crystals (AREA)
Weting (AREA)
Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

SE9300881A 1993-03-17 1993-03-17 Anordning för elektrolytisk oxidation av kiselskivor SE500333C2 (sv)

Priority Applications (7)

Application Number	Priority Date	Filing Date	Title
SE9300881A SE500333C2 (sv)	1993-03-17	1993-03-17	Anordning för elektrolytisk oxidation av kiselskivor
DE69406777T DE69406777T2 (de)	1993-03-17	1994-03-17	Vorrichtung zur elektrolytischen oxidation von silizium-wafern
EP94910635A EP0689621B1 (de)	1993-03-17	1994-03-17	Vorrichtung zur elektrolytischen oxidation von silizium-wafern
US08/522,406 US5725742A (en)	1993-03-17	1994-03-17	Device for electrolytic oxidation of silicon wafers
PCT/SE1994/000237 WO1994021845A1 (en)	1993-03-17	1994-03-17	Device for electrolytic oxidation of silicon wafers
AT94910635T ATE160181T1 (de)	1993-03-17	1994-03-17	Vorrichtung zur elektrolytischen oxidation von silizium-wafern
JP6520940A JPH08507829A (ja)	1993-03-17	1994-03-17	シリコンウェーハの電解酸化のための装置

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
SE9300881A SE500333C2 (sv)	1993-03-17	1993-03-17	Anordning för elektrolytisk oxidation av kiselskivor

Publications (3)

Publication Number	Publication Date
SE9300881D0 SE9300881D0 (sv)	1993-03-17
SE9300881L SE9300881L (sv)	1994-06-06
SE500333C2 true SE500333C2 (sv)	1994-06-06

Family

ID=20389257

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE9300881A SE500333C2 (sv)	1993-03-17	1993-03-17	Anordning för elektrolytisk oxidation av kiselskivor

Country Status (7)

Country	Link
US (1)	US5725742A (de)
EP (1)	EP0689621B1 (de)
JP (1)	JPH08507829A (de)
AT (1)	ATE160181T1 (de)
DE (1)	DE69406777T2 (de)
SE (1)	SE500333C2 (de)
WO (1)	WO1994021845A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE19914905A1 (de) *	1999-04-01	2000-10-05	Bosch Gmbh Robert	Elektrochemische Ätzanlage und Verfahren zur Ätzung eines Ätzkörpers

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3324015A (en) *	1963-12-03	1967-06-06	Hughes Aircraft Co	Electroplating process for semiconductor devices
US3419480A (en) *	1965-03-12	1968-12-31	Westinghouse Electric Corp	Anodic oxidation
DE1496883A1 (de) *	1965-09-20	1969-08-14	Licentia Gmbh	Anordnung zur elektrolytischen Oxydation von Siliciumscheiben unter Einbau von Dotierungsmitteln
US4043894A (en) *	1976-05-20	1977-08-23	Burroughs Corporation	Electrochemical anodization fixture for semiconductor wafers
FR2444500A1 (fr) *	1978-12-20	1980-07-18	Ecopol	Dispositif d'electrolyse
JP2737416B2 (ja) *	1991-01-31	1998-04-08	日本電気株式会社	めっき処理装置
JP2734269B2 (ja) *	1991-12-26	1998-03-30	日本電気株式会社	半導体製造装置
JP3200468B2 (ja) *	1992-05-21	2001-08-20	日本エレクトロプレイテイング・エンジニヤース株式会社	ウエーハ用めっき装置
DE69312636T2 (de) *	1992-11-09	1998-02-05	Canon Kk	Anodisierungsapparat mit einer Trägervorrichtung für das zu behandelnde Substrat

1993
- 1993-03-17 SE SE9300881A patent/SE500333C2/sv unknown
1994
- 1994-03-17 AT AT94910635T patent/ATE160181T1/de active
- 1994-03-17 JP JP6520940A patent/JPH08507829A/ja active Pending
- 1994-03-17 US US08/522,406 patent/US5725742A/en not_active Expired - Fee Related
- 1994-03-17 WO PCT/SE1994/000237 patent/WO1994021845A1/en not_active Ceased
- 1994-03-17 EP EP94910635A patent/EP0689621B1/de not_active Expired - Lifetime
- 1994-03-17 DE DE69406777T patent/DE69406777T2/de not_active Expired - Fee Related

Also Published As

Publication number	Publication date
JPH08507829A (ja)	1996-08-20
SE9300881D0 (sv)	1993-03-17
WO1994021845A1 (en)	1994-09-29
ATE160181T1 (de)	1997-11-15
EP0689621B1 (de)	1997-11-12
DE69406777D1 (de)	1997-12-18
DE69406777T2 (de)	1998-05-28
EP0689621A1 (de)	1996-01-03
SE9300881L (sv)	1994-06-06
US5725742A (en)	1998-03-10

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