SG123711A1 - Method and apparatus for cathodic arc deposition of materials on a substrate - Google Patents

Method and apparatus for cathodic arc deposition of materials on a substrate

Info

Publication number
SG123711A1
SG123711A1 SG200508038A SG200508038A SG123711A1 SG 123711 A1 SG123711 A1 SG 123711A1 SG 200508038 A SG200508038 A SG 200508038A SG 200508038 A SG200508038 A SG 200508038A SG 123711 A1 SG123711 A1 SG 123711A1
Authority
SG
Singapore
Prior art keywords
substrate
materials
cathodic arc
arc deposition
deposition
Prior art date
Application number
SG200508038A
Other languages
English (en)
Inventor
Russell A Beers
Asumini Kasule
Kevin Lee Collins
Original Assignee
United Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Technologies Corp filed Critical United Technologies Corp
Publication of SG123711A1 publication Critical patent/SG123711A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SG200508038A 2004-12-13 2005-12-13 Method and apparatus for cathodic arc deposition of materials on a substrate SG123711A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/010,890 US8241468B2 (en) 2004-12-13 2004-12-13 Method and apparatus for cathodic arc deposition of materials on a substrate

Publications (1)

Publication Number Publication Date
SG123711A1 true SG123711A1 (en) 2006-07-26

Family

ID=36177686

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200508038A SG123711A1 (en) 2004-12-13 2005-12-13 Method and apparatus for cathodic arc deposition of materials on a substrate

Country Status (6)

Country Link
US (1) US8241468B2 (ru)
EP (1) EP1683888A3 (ru)
JP (1) JP2006169630A (ru)
KR (1) KR20060066632A (ru)
SG (1) SG123711A1 (ru)
UA (1) UA86372C2 (ru)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8968528B2 (en) * 2008-04-14 2015-03-03 United Technologies Corporation Platinum-modified cathodic arc coating
US8211234B2 (en) * 2008-09-02 2012-07-03 United Technologies Corporation Coater platter homing tool
US10704136B2 (en) * 2013-03-05 2020-07-07 Raytheon Technologies Corporation Cathodic arc deposition stinger
US9786474B2 (en) 2013-10-08 2017-10-10 United Technologies Corporation Cathodic arc deposition apparatus and method
US20170016745A1 (en) * 2014-03-24 2017-01-19 Panasonic Intellectual Property Management Co., Ltd. Magnetic sensor
US10094890B2 (en) * 2014-10-09 2018-10-09 Panasonic Intellectual Property Management Co., Ltd. Magnetic sensor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3881256D1 (de) * 1987-03-06 1993-07-01 Balzers Hochvakuum Verfahren und vorrichtungen zum vakuumbeschichten mittels einer elektrischen bogenentladung.
DE4109213C1 (en) 1991-03-21 1992-04-09 Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De Arc-source for vacuum coating system - comprises cathode housing with double walled shell, and thin base, target, cooling water supply, drain, etc.
DE69227313T2 (de) 1991-04-29 1999-04-08 Scientific-Industrial Enterprise Novatech, Moscow Verfahren und vorrichtung zur behandlung von bauteilen in einem gasentladungsplasma
JPH06506986A (ja) 1991-04-29 1994-08-04 ナウチノ−プロイズボドストヴェノーエ・プレドプリェティエ・“ノヴァテク” ガス放電プラズマ中での製品の処理方法と装置
JP3252565B2 (ja) 1993-10-20 2002-02-04 トヨタ自動車株式会社 摺動部材およびその製造方法
US5401543A (en) 1993-11-09 1995-03-28 Minnesota Mining And Manufacturing Company Method for forming macroparticle-free DLC films by cathodic arc discharge
US6009829A (en) 1997-08-30 2000-01-04 United Technologies Corporation Apparatus for driving the arc in a cathodic arc coater
US6036828A (en) 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US5972185A (en) 1997-08-30 1999-10-26 United Technologies Corporation Cathodic arc vapor deposition apparatus (annular cathode)
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus

Also Published As

Publication number Publication date
EP1683888A2 (en) 2006-07-26
UA86372C2 (ru) 2009-04-27
US20060124450A1 (en) 2006-06-15
JP2006169630A (ja) 2006-06-29
EP1683888A3 (en) 2010-02-17
KR20060066632A (ko) 2006-06-16
US8241468B2 (en) 2012-08-14

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