SG123759A1 - Method and apparatus for placing assist features - Google Patents

Method and apparatus for placing assist features

Info

Publication number
SG123759A1
SG123759A1 SG200508332A SG200508332A SG123759A1 SG 123759 A1 SG123759 A1 SG 123759A1 SG 200508332 A SG200508332 A SG 200508332A SG 200508332 A SG200508332 A SG 200508332A SG 123759 A1 SG123759 A1 SG 123759A1
Authority
SG
Singapore
Prior art keywords
assist features
placing assist
placing
features
assist
Prior art date
Application number
SG200508332A
Other languages
English (en)
Inventor
Lawrence S Melvin Iii
Original Assignee
Synopsys Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Synopsys Inc filed Critical Synopsys Inc
Publication of SG123759A1 publication Critical patent/SG123759A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2119/00—Details relating to the type or aim of the analysis or the optimisation
    • G06F2119/18—Manufacturability analysis or optimisation for manufacturability
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200508332A 2005-01-03 2005-12-22 Method and apparatus for placing assist features SG123759A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/028,980 US7509621B2 (en) 2005-01-03 2005-01-03 Method and apparatus for placing assist features by identifying locations of constructive and destructive interference

Publications (1)

Publication Number Publication Date
SG123759A1 true SG123759A1 (en) 2006-07-26

Family

ID=36499963

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200508332A SG123759A1 (en) 2005-01-03 2005-12-22 Method and apparatus for placing assist features

Country Status (7)

Country Link
US (1) US7509621B2 (de)
EP (1) EP1677221B1 (de)
JP (1) JP4817840B2 (de)
KR (1) KR100743325B1 (de)
CN (1) CN1801159B (de)
SG (1) SG123759A1 (de)
TW (1) TWI357004B (de)

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US7424699B2 (en) * 2005-06-10 2008-09-09 Texas Instruments Incorporated Modifying sub-resolution assist features according to rule-based and model-based techniques
US7640522B2 (en) * 2006-01-14 2009-12-29 Tela Innovations, Inc. Method and system for placing layout objects in a standard-cell layout
US8541879B2 (en) 2007-12-13 2013-09-24 Tela Innovations, Inc. Super-self-aligned contacts and method for making the same
US9230910B2 (en) 2006-03-09 2016-01-05 Tela Innovations, Inc. Oversized contacts and vias in layout defined by linearly constrained topology
US7956421B2 (en) 2008-03-13 2011-06-07 Tela Innovations, Inc. Cross-coupled transistor layouts in restricted gate level layout architecture
US9563733B2 (en) 2009-05-06 2017-02-07 Tela Innovations, Inc. Cell circuit and layout with linear finfet structures
US8225239B2 (en) 2006-03-09 2012-07-17 Tela Innovations, Inc. Methods for defining and utilizing sub-resolution features in linear topology
US8448102B2 (en) 2006-03-09 2013-05-21 Tela Innovations, Inc. Optimizing layout of irregular structures in regular layout context
US7446352B2 (en) 2006-03-09 2008-11-04 Tela Innovations, Inc. Dynamic array architecture
US8658542B2 (en) 2006-03-09 2014-02-25 Tela Innovations, Inc. Coarse grid design methods and structures
US8225261B2 (en) 2006-03-09 2012-07-17 Tela Innovations, Inc. Methods for defining contact grid in dynamic array architecture
US7943967B2 (en) * 2006-03-09 2011-05-17 Tela Innovations, Inc. Semiconductor device and associated layouts including diffusion contact placement restriction based on relation to linear conductive segments
US8247846B2 (en) 2006-03-09 2012-08-21 Tela Innovations, Inc. Oversized contacts and vias in semiconductor chip defined by linearly constrained topology
US8653857B2 (en) 2006-03-09 2014-02-18 Tela Innovations, Inc. Circuitry and layouts for XOR and XNOR logic
US9009641B2 (en) 2006-03-09 2015-04-14 Tela Innovations, Inc. Circuits with linear finfet structures
US7763534B2 (en) * 2007-10-26 2010-07-27 Tela Innovations, Inc. Methods, structures and designs for self-aligning local interconnects used in integrated circuits
US8245180B2 (en) 2006-03-09 2012-08-14 Tela Innovations, Inc. Methods for defining and using co-optimized nanopatterns for integrated circuit design and apparatus implementing same
US9035359B2 (en) 2006-03-09 2015-05-19 Tela Innovations, Inc. Semiconductor chip including region including linear-shaped conductive structures forming gate electrodes and having electrical connection areas arranged relative to inner region between transistors of different types and associated methods
US7932545B2 (en) 2006-03-09 2011-04-26 Tela Innovations, Inc. Semiconductor device and associated layouts including gate electrode level region having arrangement of six linear conductive segments with side-to-side spacing less than 360 nanometers
US7917879B2 (en) 2007-08-02 2011-03-29 Tela Innovations, Inc. Semiconductor device with dynamic array section
US8839175B2 (en) 2006-03-09 2014-09-16 Tela Innovations, Inc. Scalable meta-data objects
KR100874913B1 (ko) 2006-12-12 2008-12-19 삼성전자주식회사 마스크 패턴을 배치하는 방법 및 이를 이용한 장치
KR100881184B1 (ko) 2006-12-12 2009-02-05 삼성전자주식회사 마스크 패턴을 배치하는 방법 및 이를 이용한 장치
US8341561B2 (en) * 2006-12-12 2012-12-25 Samsung Electronics Co., Ltd. Methods of arranging mask patterns and associated apparatus
US8286107B2 (en) 2007-02-20 2012-10-09 Tela Innovations, Inc. Methods and systems for process compensation technique acceleration
US7979829B2 (en) 2007-02-20 2011-07-12 Tela Innovations, Inc. Integrated circuit cell library with cell-level process compensation technique (PCT) application and associated methods
US8667443B2 (en) 2007-03-05 2014-03-04 Tela Innovations, Inc. Integrated circuit cell library for multiple patterning
US8028252B2 (en) * 2007-09-14 2011-09-27 Luminescent Technologies Inc. Technique for determining mask patterns and write patterns
US8453094B2 (en) 2008-01-31 2013-05-28 Tela Innovations, Inc. Enforcement of semiconductor structure regularity for localized transistors and interconnect
US7939443B2 (en) 2008-03-27 2011-05-10 Tela Innovations, Inc. Methods for multi-wire routing and apparatus implementing same
JP5106220B2 (ja) * 2008-04-10 2012-12-26 キヤノン株式会社 原版データ生成プログラム、原版データ生成方法、照明条件決定プログラム、照明条件決定方法およびデバイス製造方法
KR101903975B1 (ko) 2008-07-16 2018-10-04 텔라 이노베이션스, 인코포레이티드 동적 어레이 아키텍쳐에서의 셀 페이징과 배치를 위한 방법 및 그 구현
US9122832B2 (en) 2008-08-01 2015-09-01 Tela Innovations, Inc. Methods for controlling microloading variation in semiconductor wafer layout and fabrication
US8010913B2 (en) * 2009-04-14 2011-08-30 Synopsys, Inc. Model-based assist feature placement using inverse imaging approach
DE102009038558A1 (de) * 2009-08-24 2011-03-10 Carl Zeiss Sms Gmbh Verfahren zur Emulation eines fotolithographischen Prozesses und Maskeninspektionsmikroskop zur Durchführung des Verfahrens
JP5185235B2 (ja) * 2009-09-18 2013-04-17 株式会社東芝 フォトマスクの設計方法およびフォトマスクの設計プログラム
US8661392B2 (en) 2009-10-13 2014-02-25 Tela Innovations, Inc. Methods for cell boundary encroachment and layouts implementing the Same
US8321822B2 (en) 2010-05-27 2012-11-27 United Microelectronics Corp. Method and computer-readable medium of optical proximity correction
US9159627B2 (en) 2010-11-12 2015-10-13 Tela Innovations, Inc. Methods for linewidth modification and apparatus implementing the same
JP6192372B2 (ja) * 2013-06-11 2017-09-06 キヤノン株式会社 マスクパターンの作成方法、プログラムおよび情報処理装置
US20170053058A1 (en) * 2015-08-21 2017-02-23 Taiwan Semiconductor Manufacturing Company, Ltd. Model-based rule table generation
CN108882832B (zh) 2016-03-01 2020-11-03 库克医学技术有限责任公司 转向内窥镜配件通道
CN113196179A (zh) * 2018-12-21 2021-07-30 Asml控股股份有限公司 用于对准信号的噪声校正
US12051183B2 (en) * 2020-04-30 2024-07-30 KLA Corp. Training a machine learning model to generate higher resolution images from inspection images
CN115268204B (zh) * 2022-05-14 2025-05-02 东方晶源微电子科技(北京)股份有限公司 一种光学掩模修正模型优化构建方法、装置及计算机设备

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US5682323A (en) * 1995-03-06 1997-10-28 Lsi Logic Corporation System and method for performing optical proximity correction on macrocell libraries
JPH0934098A (ja) * 1995-07-20 1997-02-07 Hitachi Ltd ホトマスク、ホトマスクの製造方法、パタン形成方法、半導体装置の製造方法及びマスクパタン設計用の装置
JP3805936B2 (ja) * 1999-12-28 2006-08-09 株式会社東芝 マスクパターン補正方法及びマスクパターン作成システム
JP3223919B2 (ja) * 2001-01-29 2001-10-29 松下電器産業株式会社 マスクデータ作成方法
US6519760B2 (en) * 2001-02-28 2003-02-11 Asml Masktools, B.V. Method and apparatus for minimizing optical proximity effects
JP4713781B2 (ja) * 2001-07-30 2011-06-29 株式会社リコー 画像形成装置
JP4171647B2 (ja) * 2001-11-28 2008-10-22 エーエスエムエル マスクツールズ ビー．ブイ． プロセス・ラチチュードを改善するために利用した補助形態を除去する方法
JP4102728B2 (ja) * 2002-07-26 2008-06-18 エーエスエムエル マスクツールズ ビー．ブイ． 自動光近接補正（ｏｐｃ）ルール作成
KR100719154B1 (ko) * 2003-01-14 2007-05-17 에이에스엠엘 마스크툴즈 비.브이. 콘택홀 마스크를 위한 광근접성보정설계 방법
EP1439419B1 (de) 2003-01-14 2006-10-04 ASML MaskTools B.V. Methode und Gerät zur Erstellung von optischen Näherungseffekt-Korrekturelementen für ein Maskenmuster in der Optischen Lithographie
KR100927454B1 (ko) * 2003-10-31 2009-11-19 에이에스엠엘 마스크툴즈 비.브이. 개선된 간섭 매핑 리소그래피를 이용하는 피처 최적화
US7506299B2 (en) * 2003-12-19 2009-03-17 Asml Holding N.V. Feature optimization using interference mapping lithography
US7620930B2 (en) * 2004-08-24 2009-11-17 Asml Masktools B.V. Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography

Also Published As

Publication number Publication date
US7509621B2 (en) 2009-03-24
KR100743325B1 (ko) 2007-07-26
EP1677221B1 (de) 2017-09-20
EP1677221A2 (de) 2006-07-05
JP2006189845A (ja) 2006-07-20
KR20060079758A (ko) 2006-07-06
US20060147815A1 (en) 2006-07-06
TW200710693A (en) 2007-03-16
CN1801159A (zh) 2006-07-12
CN1801159B (zh) 2013-05-01
TWI357004B (en) 2012-01-21
JP4817840B2 (ja) 2011-11-16
EP1677221A3 (de) 2006-07-26

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