SG26695G - Deep uv photoresist compositions containg polycyclic cyclopentane-2-diazo-1, 3-dione - Google Patents

Deep uv photoresist compositions containg polycyclic cyclopentane-2-diazo-1, 3-dione

Info

Publication number
SG26695G
SG26695G SG26695A SG26695A SG26695G SG 26695 G SG26695 G SG 26695G SG 26695 A SG26695 A SG 26695A SG 26695 A SG26695 A SG 26695A SG 26695 G SG26695 G SG 26695G
Authority
SG
Singapore
Prior art keywords
diazo
cyclopentane
dione
polycyclic
deep
Prior art date
Application number
SG26695A
Other languages
English (en)
Inventor
Chengjiu Wu
Anne M Mooring
James T Yardley
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Priority to SG26695A priority Critical patent/SG26695G/en
Publication of SG26695G publication Critical patent/SG26695G/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C245/00—Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond
    • C07C245/12—Diazo compounds, i.e. compounds having the free valencies of >N2 groups attached to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/60—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members
    • C07C2603/66—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members containing five-membered rings
    • C07C2603/68—Dicyclopentadienes; Hydrogenated dicyclopentadienes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/90—Ring systems containing bridged rings containing more than four rings
    • C07C2603/91—Polycyclopentadienes; Hydrogenated polycyclopentadienes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
SG26695A 1989-06-29 1995-02-17 Deep uv photoresist compositions containg polycyclic cyclopentane-2-diazo-1, 3-dione SG26695G (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG26695A SG26695G (en) 1989-06-29 1995-02-17 Deep uv photoresist compositions containg polycyclic cyclopentane-2-diazo-1, 3-dione

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/373,358 US5039596A (en) 1989-06-29 1989-06-29 Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione
SG26695A SG26695G (en) 1989-06-29 1995-02-17 Deep uv photoresist compositions containg polycyclic cyclopentane-2-diazo-1, 3-dione

Publications (1)

Publication Number Publication Date
SG26695G true SG26695G (en) 1995-08-18

Family

ID=23472082

Family Applications (1)

Application Number Title Priority Date Filing Date
SG26695A SG26695G (en) 1989-06-29 1995-02-17 Deep uv photoresist compositions containg polycyclic cyclopentane-2-diazo-1, 3-dione

Country Status (8)

Country Link
US (1) US5039596A (ja)
EP (1) EP0405957B1 (ja)
JP (1) JP2986858B2 (ja)
KR (1) KR0175140B1 (ja)
CA (1) CA2019555A1 (ja)
DE (1) DE69015899T2 (ja)
HK (1) HK55395A (ja)
SG (1) SG26695G (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5654354A (en) * 1991-11-14 1997-08-05 E. I. Du Pont De Nemours And Company Compositions for diffusion patterning
US5275689A (en) * 1991-11-14 1994-01-04 E. I. Du Pont De Nemours And Company Method and compositions for diffusion patterning
KR100564535B1 (ko) * 1998-03-16 2006-05-25 삼성전자주식회사 포토레지스트, 이의 제조 방법 및 이를 이용한 사진 식각 방법
KR100557620B1 (ko) * 1999-07-30 2006-03-10 주식회사 하이닉스반도체 신규의 포토레지스트용 단량체, 그의 공중합체 및 이를 이용한포토레지스트 조성물
US7022452B2 (en) * 2002-09-04 2006-04-04 Agilent Technologies, Inc. Contrast enhanced photolithography
US8349990B2 (en) * 2008-02-20 2013-01-08 The Research Foundation Of State University Of New York Chain scission polyester polymers for photoresists
US8404795B2 (en) * 2009-08-26 2013-03-26 The Research Foundation For The State University Of New York Photolytic acid-generating polymers and monomers for their construction

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53127496A (en) * 1977-04-08 1978-11-07 Idemitsu Kosan Co Ltd Novel cyclopentene-1,3-dione derivative
US4339522A (en) * 1979-06-18 1982-07-13 International Business Machines Corporation Ultra-violet lithographic resist composition and process
US4284706A (en) * 1979-12-03 1981-08-18 International Business Machines Corporation Lithographic resist composition for a lift-off process
US4522911A (en) * 1983-06-28 1985-06-11 International Business Machines Corporation Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
US4626491A (en) * 1983-10-07 1986-12-02 J. T. Baker Chemical Company Deep ultra-violet lithographic resist composition and process of using
US4622283A (en) * 1983-10-07 1986-11-11 J. T. Baker Chemical Company Deep ultra-violet lithographic resist composition and process of using
US4571375A (en) * 1983-10-24 1986-02-18 Benedikt George M Ring-opened polynorbornene negative photoresist with bisazide
US4624908A (en) * 1985-04-15 1986-11-25 J. T. Baker Chemical Company Deep ultra-violet lithographic resist composition and process of using
US4735885A (en) * 1985-12-06 1988-04-05 Allied Corporation Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
JP2650895B2 (ja) * 1986-07-02 1997-09-10 松下電器産業株式会社 露光装置および露光方法
US4853315A (en) * 1988-01-15 1989-08-01 International Business Machines Corporation O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists

Also Published As

Publication number Publication date
US5039596A (en) 1991-08-13
JP2986858B2 (ja) 1999-12-06
CA2019555A1 (en) 1990-12-29
DE69015899T2 (de) 1995-07-06
JPH03213864A (ja) 1991-09-19
EP0405957B1 (en) 1995-01-11
DE69015899D1 (de) 1995-02-23
EP0405957A1 (en) 1991-01-02
KR910001465A (ko) 1991-01-30
HK55395A (en) 1995-04-21
KR0175140B1 (ko) 1999-03-20

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