SG53005A1 - Method for depositing substituted fluorcarbon polymeric layers - Google Patents

Method for depositing substituted fluorcarbon polymeric layers

Info

Publication number
SG53005A1
SG53005A1 SG1997002341A SG1997002341A SG53005A1 SG 53005 A1 SG53005 A1 SG 53005A1 SG 1997002341 A SG1997002341 A SG 1997002341A SG 1997002341 A SG1997002341 A SG 1997002341A SG 53005 A1 SG53005 A1 SG 53005A1
Authority
SG
Singapore
Prior art keywords
fluorcarbon
depositing
substituted
polymeric layers
polymeric
Prior art date
Application number
SG1997002341A
Other languages
English (en)
Inventor
Mark A Logan
Original Assignee
Novellus Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Novellus Systems Inc filed Critical Novellus Systems Inc
Publication of SG53005A1 publication Critical patent/SG53005A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Physical Vapour Deposition (AREA)
SG1997002341A 1996-07-03 1996-07-02 Method for depositing substituted fluorcarbon polymeric layers SG53005A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/675,664 US5759635A (en) 1996-07-03 1996-07-03 Method for depositing substituted fluorocarbon polymeric layers

Publications (1)

Publication Number Publication Date
SG53005A1 true SG53005A1 (en) 1998-09-28

Family

ID=24711484

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1997002341A SG53005A1 (en) 1996-07-03 1996-07-02 Method for depositing substituted fluorcarbon polymeric layers

Country Status (6)

Country Link
US (1) US5759635A (fr)
EP (1) EP0815953A3 (fr)
JP (1) JP3219379B2 (fr)
KR (1) KR100294816B1 (fr)
SG (1) SG53005A1 (fr)
TW (1) TW374770B (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6243112B1 (en) 1996-07-01 2001-06-05 Xerox Corporation High density remote plasma deposited fluoropolymer films
SG53005A1 (en) * 1996-07-03 1998-09-28 Novellus Systems Inc Method for depositing substituted fluorcarbon polymeric layers
JP3773340B2 (ja) * 1996-12-18 2006-05-10 大日本印刷株式会社 低屈折率ＳｉＯ２ 膜及びその製造方法
TW417249B (en) * 1997-05-14 2001-01-01 Applied Materials Inc Reliability barrier integration for cu application
FR2792003B1 (fr) * 1999-04-09 2001-06-01 Saint Gobain Vitrage Substrat transparent comportant un revetement hydrophobe/ oleophobe forme par cvd plasma
WO2001060496A1 (fr) 2000-02-15 2001-08-23 Hollingsworth & Vose Company Materiau filtrant hepa composite de fusion-soufflage et poche sous vide
US6566263B1 (en) 2000-08-02 2003-05-20 Taiwan Semiconductor Manufacturing Company Method of forming an HDP CVD oxide layer over a metal line structure for high aspect ratio design rule
WO2002077320A1 (fr) * 2001-03-23 2002-10-03 Dow Corning Corporation Procede de production de films d'oxycarbure de silicium hydrogene
EP1385597A1 (fr) * 2001-05-02 2004-02-04 HOLLINGSWORTH & VOSE COMPANY Media filtrant presentant une rigidite et une capacite de retention de poussiere accrues
US20030203696A1 (en) * 2002-04-30 2003-10-30 Healey David Thomas High efficiency ashrae filter media
US6869818B2 (en) * 2002-11-18 2005-03-22 Redwood Microsystems, Inc. Method for producing and testing a corrosion-resistant channel in a silicon device
EP1670298A1 (fr) * 2004-12-07 2006-06-14 Samsung SDI Germany GmbH Substrat pour afficheur et son procédé de fabrication
JP5074059B2 (ja) * 2007-02-28 2012-11-14 東京エレクトロン株式会社 層間絶縁膜および配線構造と、それらの製造方法
KR20100081115A (ko) 2009-01-05 2010-07-14 주식회사 만도 디스크 브레이크
US20100212272A1 (en) * 2009-02-24 2010-08-26 Hollingsworth & Vose Company Filter media suitable for ashrae applications
CN104114649A (zh) * 2011-12-05 2014-10-22 索尔维公司 常压等离子体用于无机颗粒表面的用途和包括有机含氟表面改性物的无机颗粒
TWI627192B (zh) * 2015-03-13 2018-06-21 Murata Manufacturing Co., Ltd. 原子層堆積抑制材料
US9899291B2 (en) * 2015-07-13 2018-02-20 Asm Ip Holding B.V. Method for protecting layer by forming hydrocarbon-based extremely thin film
CN106906456B (zh) * 2017-01-23 2018-04-20 江苏菲沃泰纳米科技有限公司 一种交联度可控的涂层的制备方法
CN107177835B (zh) * 2017-05-21 2018-06-19 江苏菲沃泰纳米科技有限公司 一种循环大占空比脉冲放电制备多功能性纳米防护涂层的方法
US10985009B2 (en) 2018-04-27 2021-04-20 Applied Materials, Inc. Methods to deposit flowable (gap-fill) carbon containing films using various plasma sources

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3205345A1 (de) * 1982-02-15 1983-09-01 Philips Patentverwaltung Gmbh, 2000 Hamburg "verfahren zur herstellung von fluordotierten lichtleitfasern"
US4557945A (en) * 1982-06-07 1985-12-10 Toshiharu Yagi Process for fluorination by inorganic fluorides in glow discharge
US4981713A (en) * 1990-02-14 1991-01-01 E. I. Du Pont De Nemours And Company Low temperature plasma technology for corrosion protection of steel
US5156919A (en) * 1990-04-03 1992-10-20 Segate Technology, Inc. Fluorocarbon coated magnesium alloy carriage and method of coating a magnesium alloy shaped part
JPH06101462B2 (ja) * 1991-04-30 1994-12-12 インターナショナル・ビジネス・マシーンズ・コーポレイション 過フッ化炭化水素ポリマ膜を基板に接着する方法および 基板
US5244730A (en) * 1991-04-30 1993-09-14 International Business Machines Corporation Plasma deposition of fluorocarbon
US5230929A (en) * 1992-07-20 1993-07-27 Dow Corning Corporation Plasma-activated chemical vapor deposition of fluoridated cyclic siloxanes
JPH07254592A (ja) * 1994-03-16 1995-10-03 Fujitsu Ltd 半導体装置の製造方法
JP3482725B2 (ja) * 1995-02-23 2004-01-06 東亞合成株式会社 フッ素含有シリコン酸化膜の製造方法
SG53005A1 (en) * 1996-07-03 1998-09-28 Novellus Systems Inc Method for depositing substituted fluorcarbon polymeric layers

Also Published As

Publication number Publication date
JPH10107023A (ja) 1998-04-24
TW374770B (en) 1999-11-21
KR100294816B1 (ko) 2001-07-12
KR980009508A (ko) 1998-04-30
JP3219379B2 (ja) 2001-10-15
EP0815953A3 (fr) 2002-07-31
US5759635A (en) 1998-06-02
EP0815953A2 (fr) 1998-01-07

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