SG55315A1 - Method of manufacturing bi-layered ferroelectric thin film - Google Patents

Method of manufacturing bi-layered ferroelectric thin film

Info

Publication number
SG55315A1
SG55315A1 SG1997001534A SG1997001534A SG55315A1 SG 55315 A1 SG55315 A1 SG 55315A1 SG 1997001534 A SG1997001534 A SG 1997001534A SG 1997001534 A SG1997001534 A SG 1997001534A SG 55315 A1 SG55315 A1 SG 55315A1
Authority
SG
Singapore
Prior art keywords
manufacturing
thin film
ferroelectric thin
layered ferroelectric
layered
Prior art date
Application number
SG1997001534A
Other languages
English (en)
Inventor
Yukoh Hochido
Hidekimi Kadokura
Masamichi Matsumoto
Koji Arita
Masamichi Azuma
Tatsuo Otsuki
Original Assignee
Matsushita Electronics Corp
Kojundo Chemical Lab Co Ltd
Symetrix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP11935096A external-priority patent/JP3503790B2/ja
Priority claimed from JP12201496A external-priority patent/JP3503791B2/ja
Application filed by Matsushita Electronics Corp, Kojundo Chemical Lab Co Ltd, Symetrix Corp filed Critical Matsushita Electronics Corp
Publication of SG55315A1 publication Critical patent/SG55315A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
    • H10P14/69398—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides the material having a perovskite structure, e.g. BaTiO3
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1279—Process of deposition of the inorganic material performed under reactive atmosphere, e.g. oxidising or reducing atmospheres
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
    • H10D1/684—Capacitors having no potential barriers having dielectrics comprising perovskite structures the dielectrics comprising multiple layers, e.g. comprising buffer layers, seed layers or gradient layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H10P14/6336—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H10P14/6338—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition the reactions being activated by other means than plasma or thermal, e.g. photo-CVD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Semiconductor Memories (AREA)
  • Inorganic Insulating Materials (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
SG1997001534A 1996-05-14 1997-05-13 Method of manufacturing bi-layered ferroelectric thin film SG55315A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11935096A JP3503790B2 (ja) 1996-05-14 1996-05-14 Ｂｉ層状構造強誘電体薄膜の製造方法
JP12201496A JP3503791B2 (ja) 1996-05-16 1996-05-16 Ｂｉ層状構造強誘電体薄膜の製造方法

Publications (1)

Publication Number Publication Date
SG55315A1 true SG55315A1 (en) 1998-12-21

Family

ID=26457115

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1997001534A SG55315A1 (en) 1996-05-14 1997-05-13 Method of manufacturing bi-layered ferroelectric thin film

Country Status (9)

Country Link
US (1) US5932281A (fr)
EP (1) EP0807965B1 (fr)
KR (1) KR100295870B1 (fr)
CN (1) CN1113399C (fr)
CA (1) CA2205189C (fr)
DE (1) DE69730076T2 (fr)
MY (1) MY119325A (fr)
SG (1) SG55315A1 (fr)
TW (1) TW346676B (fr)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6500489B1 (en) * 1996-11-27 2002-12-31 Advanced Technology Materials, Inc. Low temperature CVD processes for preparing ferroelectric films using Bi alcoxides
JP3195265B2 (ja) * 1997-01-18 2001-08-06 東京応化工業株式会社 Ｂｉ系強誘電体薄膜形成用塗布液およびこれを用いて形成した強誘電体薄膜、強誘電体メモリ
US6174463B1 (en) * 1997-03-27 2001-01-16 Sony Corporation Layer crystal structure oxide, production method thereof and memory element using the same
JPH10313097A (ja) * 1997-05-13 1998-11-24 Sharp Corp 強誘電体薄膜、製造方法及び強誘電体薄膜を含んでなる素子
AT407586B (de) * 1997-05-23 2001-04-25 Sez Semiconduct Equip Zubehoer Anordnung zum behandeln scheibenförmiger gegenstände, insbesondere von siliziumwafern
GB9814048D0 (en) * 1998-06-30 1998-08-26 Inorgtech Ltd Novel precursors for the growth of heterometal oxide films by MOCVD
KR20020015048A (ko) * 1999-06-10 2002-02-27 시메트릭스 코포레이션 높은 유전상수 어플리케이션용 금속 옥사이드 박막
US6495878B1 (en) 1999-08-02 2002-12-17 Symetrix Corporation Interlayer oxide containing thin films for high dielectric constant application
JP3592218B2 (ja) * 2000-09-06 2004-11-24 株式会社ヒューモラボラトリー 水晶薄膜の製造方法
US6787181B2 (en) 2001-10-26 2004-09-07 Symetrix Corporation Chemical vapor deposition method of making layered superlattice materials using trimethylbismuth
KR20030042482A (ko) * 2001-11-22 2003-06-02 (주) 디엔에프솔루션 비스무스 란타늄 티타네이트 강유전체막 형성용 용액
EP1533835A1 (fr) * 2002-05-29 2005-05-25 Kabushiki Kaisha Watanabe Shoko Evaporateur, differents appareils l'incorporant et procede de vaporisation
JP2004128195A (ja) * 2002-10-02 2004-04-22 Oki Electric Ind Co Ltd 保護膜の製造方法
JP4720969B2 (ja) * 2003-03-28 2011-07-13 セイコーエプソン株式会社 強誘電体膜、圧電体膜、強誘電体メモリ及び圧電素子
CN1610076A (zh) * 2003-06-30 2005-04-27 松下电器产业株式会社 强电介质膜的形成方法以及半导体装置
JP4029295B2 (ja) * 2004-02-05 2008-01-09 セイコーエプソン株式会社 強誘電体メモリ
JP4632765B2 (ja) * 2004-10-21 2011-02-16 株式会社Adeka アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法
CN100505169C (zh) * 2006-01-26 2009-06-24 财团法人工业技术研究院 介电层以及形成此介电层的组合物及方法
US20080220542A1 (en) * 2007-03-07 2008-09-11 Micheli Adolph L Low-fire ferroelectric material
KR101398884B1 (ko) * 2013-12-31 2014-05-27 한국세라믹기술원 경사 기능성 코팅층 형성에 적합한 서스펜션 플라즈마 용사 장치용 서스펜션 공급기

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5323035A (en) * 1992-10-13 1994-06-21 Glenn Leedy Interconnection structure for integrated circuits and method for making same
US5688565A (en) * 1988-12-27 1997-11-18 Symetrix Corporation Misted deposition method of fabricating layered superlattice materials
US6072207A (en) * 1991-02-25 2000-06-06 Symetrix Corporation Process for fabricating layered superlattice materials and making electronic devices including same
JP2851193B2 (ja) * 1991-11-14 1999-01-27 ローム株式会社 強誘電体薄膜微細パターン形成方法
US5612082A (en) * 1991-12-13 1997-03-18 Symetrix Corporation Process for making metal oxides
JPH07252664A (ja) * 1994-03-14 1995-10-03 Texas Instr Japan Ltd ゾルーゲル法による強誘電体膜の形成方法、キャパシタの製造方法、その原料溶液の調製方法及びその原料溶液
US5478610A (en) * 1994-09-02 1995-12-26 Ceram Incorporated Metalorganic chemical vapor deposition of layered structure oxides
US5527567A (en) * 1994-09-02 1996-06-18 Ceram Incorporated Metalorganic chemical vapor deposition of layered structure oxides

Also Published As

Publication number Publication date
KR970077335A (ko) 1997-12-12
CN1113399C (zh) 2003-07-02
EP0807965A3 (fr) 1998-02-04
DE69730076D1 (de) 2004-09-09
DE69730076T2 (de) 2005-01-27
EP0807965A2 (fr) 1997-11-19
MY119325A (en) 2005-05-31
CA2205189C (fr) 2005-06-21
CN1182286A (zh) 1998-05-20
TW346676B (en) 1998-12-01
KR100295870B1 (ko) 2001-10-24
CA2205189A1 (fr) 1997-11-14
US5932281A (en) 1999-08-03
EP0807965B1 (fr) 2004-08-04

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