SG71490G - Volatile metal complexes - Google Patents

Volatile metal complexes

Info

Publication number
SG71490G
SG71490G SG714/90A SG71490A SG71490G SG 71490 G SG71490 G SG 71490G SG 714/90 A SG714/90 A SG 714/90A SG 71490 A SG71490 A SG 71490A SG 71490 G SG71490 G SG 71490G
Authority
SG
Singapore
Prior art keywords
metal complexes
volatile metal
diketonates
dimethoxyethane
magnesium
Prior art date
Application number
SG714/90A
Other languages
English (en)
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of SG71490G publication Critical patent/SG71490G/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F3/00Compounds containing elements of Groups 2 or 12 of the Periodic Table
    • C07F3/02Magnesium compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F3/00Compounds containing elements of Groups 2 or 12 of the Periodic Table
    • C07F3/003Compounds containing elements of Groups 2 or 12 of the Periodic Table without C-Metal linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Electroluminescent Light Sources (AREA)
SG714/90A 1984-10-19 1990-08-30 Volatile metal complexes SG71490G (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/662,829 US4558144A (en) 1984-10-19 1984-10-19 Volatile metal complexes

Publications (1)

Publication Number Publication Date
SG71490G true SG71490G (en) 1990-11-23

Family

ID=24659384

Family Applications (1)

Application Number Title Priority Date Filing Date
SG714/90A SG71490G (en) 1984-10-19 1990-08-30 Volatile metal complexes

Country Status (18)

Country Link
US (1) US4558144A (da)
EP (1) EP0178786B1 (da)
JP (1) JPS61100585A (da)
KR (1) KR890004346B1 (da)
AT (1) ATE42537T1 (da)
AU (1) AU568778B2 (da)
BR (1) BR8505045A (da)
CA (1) CA1234822A (da)
DE (1) DE3569723D1 (da)
DK (1) DK158654C (da)
ES (1) ES8802290A1 (da)
FI (1) FI79711C (da)
HK (1) HK86590A (da)
IL (1) IL76692A (da)
IN (1) IN166292B (da)
MX (1) MX164081B (da)
NO (1) NO163858C (da)
SG (1) SG71490G (da)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4604118A (en) * 1985-08-13 1986-08-05 Corning Glass Works Method for synthesizing MgO--Al2 O3 --SiO2 glasses and ceramics
US5250740A (en) * 1988-03-31 1993-10-05 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Precursors for metal fluoride deposition and use thereof
US5140003A (en) * 1989-03-22 1992-08-18 Siemens Aktiengesellschaft Method for manufacturing layers from an oxide-ceramic superconductor material on a substrate using a cvd-process
NL8901507A (nl) * 1989-06-14 1991-01-02 Tno Vluchtige aardkalimetaal-organische verbindingen en werkwijze voor de bereiding van gelaagde materialen met aardkalimetaaloxiden of -fluoriden uit deze verbindingen.
DE69030145T2 (de) * 1989-08-18 1997-07-10 Galileo Electro Optics Corp Kontinuierliche Dünnschicht-Dynoden
FR2662164A1 (fr) * 1990-05-18 1991-11-22 Centre Nat Rech Scient Complexes heteropolymetalliques, leur preparation et leur utilisation pour la preparation d'oxydes, notamment d'oxydes supraconducteurs.
US5252733A (en) * 1990-06-05 1993-10-12 Air Products And Chemicals, Inc. Volatile crown ligand β-diketonate alkaline earth metal complexes
US5840897A (en) * 1990-07-06 1998-11-24 Advanced Technology Materials, Inc. Metal complex source reagents for chemical vapor deposition
US5145714A (en) * 1990-10-30 1992-09-08 Mcnc Metal-organic chemical vapor deposition for repairing broken lines in microelectronic packages
EP0508345A3 (en) * 1991-04-09 1994-06-01 Hoechst Ag Volatile alkaline earth complex and its application
GB9117562D0 (en) * 1991-08-14 1991-10-02 Ass Octel Group ii metal betadiketonates
US5319118A (en) * 1991-10-17 1994-06-07 Air Products And Chemicals, Inc. Volatile barium precursor and use of precursor in OMCVD process
JP2799134B2 (ja) 1992-09-22 1998-09-17 三菱電機株式会社 チタン酸バリウムストロンチウム系誘電体薄膜用cvd原料およびメモリー用キャパシタ
US6103002A (en) * 1993-09-14 2000-08-15 Mitsubishi Denki Kabushiki Kaisha CVD method for forming oxide-system dielectric thin film
EP0596458A1 (de) * 1992-11-06 1994-05-11 Hoechst Aktiengesellschaft Mehrfunktionelle Tertiäralkohole, Verfahren zu deren Herstellung und ihre Verwendung für Precursoren zur Auftragung von Erdalkalimetalloxiden nach dem Verfahren der chemical vapour deposition
US5411778A (en) * 1994-09-26 1995-05-02 International Business Machines Corp. Rollers for use in electrophotographic development
WO2002020695A1 (de) * 2000-09-08 2002-03-14 Nanosolutions Gmbh Dotierte nanopartikel
EP1458016A1 (en) * 2003-03-12 2004-09-15 Corning Incorporated Rare-earth complexes for the manufacture of optical fibers
US7154086B2 (en) * 2003-03-19 2006-12-26 Burle Technologies, Inc. Conductive tube for use as a reflectron lens
US20080073516A1 (en) * 2006-03-10 2008-03-27 Laprade Bruce N Resistive glass structures used to shape electric fields in analytical instruments
US9724651B2 (en) * 2015-07-14 2017-08-08 Lg Nanoh2O, Inc. Chemical additives for water flux enhancement

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4015980A (en) * 1975-08-04 1977-04-05 General Mills Chemicals, Inc. Use of fluorinated β-diketones in the solvent extraction of zinc
US4424352A (en) * 1980-06-13 1984-01-03 Minnesota Mining And Manufacturing Company Palladium(II) bis(hexafluoroacetylacetonate) adducts and their preparation
US4425281A (en) * 1981-07-13 1984-01-10 Exxon Research And Engineering Co. Copper or silver complexes with fluorinated diketones and unsaturated ligands
US4500722A (en) * 1982-09-15 1985-02-19 Corning Glass Works Volatile metal complexes
DE3301225A1 (de) * 1983-01-15 1984-07-19 Merck Patent Gmbh, 6100 Darmstadt Verfahren zur herstellung wasserfreier, fluorhaltiger 1,3-diketonato-metall-komplexe

Also Published As

Publication number Publication date
FI79711B (fi) 1989-10-31
JPS61100585A (ja) 1986-05-19
ES547080A0 (es) 1988-05-01
HK86590A (en) 1990-11-02
CA1234822A (en) 1988-04-05
AU568778B2 (en) 1988-01-07
FI854069L (fi) 1986-04-20
KR890004346B1 (ko) 1989-10-31
NO163858B (no) 1990-04-23
DK158654C (da) 1990-11-26
IL76692A (en) 1988-06-30
IL76692A0 (en) 1986-02-28
EP0178786B1 (en) 1989-04-26
FI79711C (fi) 1990-02-12
ATE42537T1 (de) 1989-05-15
AU4853285A (en) 1986-04-24
DK158654B (da) 1990-07-02
DE3569723D1 (en) 1989-06-01
ES8802290A1 (es) 1988-05-01
US4558144A (en) 1985-12-10
KR860003265A (ko) 1986-05-21
EP0178786A1 (en) 1986-04-23
DK479885D0 (da) 1985-10-18
IN166292B (da) 1990-04-07
NO163858C (no) 1990-08-22
BR8505045A (pt) 1986-07-29
NO854087L (no) 1986-04-21
JPH0529230B2 (da) 1993-04-28
MX164081B (es) 1992-07-13
DK479885A (da) 1986-04-20
FI854069A0 (fi) 1985-10-18

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