TW200305794A - Method for determining the concentration of alkaline developer and method for preparing developer - Google Patents

Method for determining the concentration of alkaline developer and method for preparing developer Download PDF

Info

Publication number: TW200305794A
Authority: TW; Taiwan
Prior art keywords: concentration; imaging; solution; liquid; alkaline
Prior art date: 2002-03-29

Application number

TW92106924A

Other languages

English (en)

Chinese (zh)

Other versions

TWI313794B (cs

Inventor

Norio Yamaguchi

Michio Igarashi

Takeshi Inoue

Original Assignee

Matsushita Environmental & Air Conditioning Engineering Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-03-29

Filing date

2003-03-27

Publication date

2003-11-01

2003-03-27 Application filed by Matsushita Environmental & Air Conditioning Engineering Co Ltd filed Critical Matsushita Environmental & Air Conditioning Engineering Co Ltd

2003-11-01 Publication of TW200305794A publication Critical patent/TW200305794A/zh

2009-08-21 Application granted granted Critical

2009-08-21 Publication of TWI313794B publication Critical patent/TWI313794B/zh

Links

238000000034 method Methods 0.000 title claims abstract description 52
238000003384 imaging method Methods 0.000 claims description 102
238000005259 measurement Methods 0.000 claims description 30
239000007788 liquid Substances 0.000 claims description 24
238000012360 testing method Methods 0.000 claims description 18
238000002059 diagnostic imaging Methods 0.000 claims description 16
150000003839 salts Chemical class 0.000 claims description 16
239000002253 acid Substances 0.000 claims description 11
239000002699 waste material Substances 0.000 claims description 11
239000003513 alkali Substances 0.000 claims description 10
229910052799 carbon Inorganic materials 0.000 claims description 9
230000000694 effects Effects 0.000 claims description 9
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
230000001568 sexual effect Effects 0.000 claims description 8
BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 6
238000001514 detection method Methods 0.000 claims description 6
238000011084 recovery Methods 0.000 claims description 6
230000002378 acidificating effect Effects 0.000 claims description 4
239000002585 base Substances 0.000 claims description 3
230000001590 oxidative effect Effects 0.000 claims description 2
238000009434 installation Methods 0.000 claims 2
206010029412 Nightmare Diseases 0.000 claims 1
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims 1
101100218353 Talaromyces purpureogenus axeA gene Proteins 0.000 claims 1
230000015556 catabolic process Effects 0.000 claims 1
230000003749 cleanliness Effects 0.000 claims 1
239000010808 liquid waste Substances 0.000 claims 1
238000000691 measurement method Methods 0.000 claims 1
230000003472 neutralizing effect Effects 0.000 claims 1
239000000243 solution Substances 0.000 description 61
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 28
238000004448 titration Methods 0.000 description 23
229910002092 carbon dioxide Inorganic materials 0.000 description 16
150000005323 carbonate salts Chemical class 0.000 description 15
238000011161 development Methods 0.000 description 15
230000018109 developmental process Effects 0.000 description 15
229960004424 carbon dioxide Drugs 0.000 description 14
239000001569 carbon dioxide Substances 0.000 description 13
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 10
BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 9
-1 dimethyl dicholine Chemical compound 0.000 description 9
150000002500 ions Chemical class 0.000 description 9
238000006386 neutralization reaction Methods 0.000 description 9
238000004519 manufacturing process Methods 0.000 description 7
238000005516 engineering process Methods 0.000 description 5
238000007726 management method Methods 0.000 description 5
229920002120 photoresistant polymer Polymers 0.000 description 5
239000004065 semiconductor Substances 0.000 description 5
239000012085 test solution Substances 0.000 description 5
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 4
239000000203 mixture Substances 0.000 description 4
230000008929 regeneration Effects 0.000 description 4
238000011069 regeneration method Methods 0.000 description 4
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
238000010521 absorption reaction Methods 0.000 description 3
125000005588 carbonic acid salt group Chemical group 0.000 description 3
239000001257 hydrogen Substances 0.000 description 3
229910052739 hydrogen Inorganic materials 0.000 description 3
239000004973 liquid crystal related substance Substances 0.000 description 3
238000003918 potentiometric titration Methods 0.000 description 3
239000000758 substrate Substances 0.000 description 3
QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Natural products CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
241001674048 Phthiraptera Species 0.000 description 2
235000011114 ammonium hydroxide Nutrition 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
239000012159 carrier gas Substances 0.000 description 2
125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
238000010790 dilution Methods 0.000 description 2
239000012895 dilution Substances 0.000 description 2
235000013399 edible fruits Nutrition 0.000 description 2
239000012458 free base Substances 0.000 description 2
150000004679 hydroxides Chemical class 0.000 description 2
239000012216 imaging agent Substances 0.000 description 2
239000004615 ingredient Substances 0.000 description 2
229910052757 nitrogen Inorganic materials 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
229910052760 oxygen Inorganic materials 0.000 description 2
230000001172 regenerating effect Effects 0.000 description 2
239000012086 standard solution Substances 0.000 description 2
125000005207 tetraalkylammonium group Chemical group 0.000 description 2
WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
206010011469 Crying Diseases 0.000 description 1
206010034972 Photosensitivity reaction Diseases 0.000 description 1
239000007983 Tris buffer Substances 0.000 description 1
150000008043 acidic salts Chemical class 0.000 description 1
125000005210 alkyl ammonium group Chemical group 0.000 description 1
229910000147 aluminium phosphate Inorganic materials 0.000 description 1
239000000908 ammonium hydroxide Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
229910001626 barium chloride Inorganic materials 0.000 description 1
HQABUPZFAYXKJW-UHFFFAOYSA-O butylazanium Chemical compound CCCC[NH3+] HQABUPZFAYXKJW-UHFFFAOYSA-O 0.000 description 1
150000004649 carbonic acid derivatives Chemical class 0.000 description 1
150000001767 cationic compounds Chemical class 0.000 description 1
150000001768 cations Chemical group 0.000 description 1
239000003610 charcoal Substances 0.000 description 1
150000001793 charged compounds Chemical class 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
239000000470 constituent Substances 0.000 description 1
238000012937 correction Methods 0.000 description 1
239000013078 crystal Substances 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000007865 diluting Methods 0.000 description 1
125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
238000004945 emulsification Methods 0.000 description 1
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
QUSNBJAOOMFDIB-UHFFFAOYSA-O ethylaminium Chemical compound CC[NH3+] QUSNBJAOOMFDIB-UHFFFAOYSA-O 0.000 description 1
125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
239000007789 gas Substances 0.000 description 1
238000002309 gasification Methods 0.000 description 1
239000011521 glass Substances 0.000 description 1
150000007857 hydrazones Chemical class 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
150000007529 inorganic bases Chemical class 0.000 description 1
229910052806 inorganic carbonate Inorganic materials 0.000 description 1
238000007689 inspection Methods 0.000 description 1
230000010354 integration Effects 0.000 description 1
230000000873 masking effect Effects 0.000 description 1
238000004377 microelectronic Methods 0.000 description 1
230000007935 neutral effect Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
XEBWQGVWTUSTLN-UHFFFAOYSA-M phenylmercury acetate Chemical compound CC(=O)O[Hg]C1=CC=CC=C1 XEBWQGVWTUSTLN-UHFFFAOYSA-M 0.000 description 1
230000036211 photosensitivity Effects 0.000 description 1
238000012545 processing Methods 0.000 description 1
238000004445 quantitative analysis Methods 0.000 description 1
239000012492 regenerant Substances 0.000 description 1
238000011160 research Methods 0.000 description 1
230000000284 resting effect Effects 0.000 description 1
239000012266 salt solution Substances 0.000 description 1
239000012488 sample solution Substances 0.000 description 1
STECJAGHUSJQJN-FWXGHANASA-N scopolamine Chemical class C1([C@@H](CO)C(=O)O[C@H]2C[C@@H]3N([C@H](C2)[C@@H]2[C@H]3O2)C)=CC=CC=C1 STECJAGHUSJQJN-FWXGHANASA-N 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
238000000926 separation method Methods 0.000 description 1
239000002689 soil Substances 0.000 description 1
238000009331 sowing Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
230000009182 swimming Effects 0.000 description 1
238000010998 test method Methods 0.000 description 1
CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
239000010409 thin film Substances 0.000 description 1
235000012431 wafers Nutrition 0.000 description 1

Classifications

- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
- G01N31/162—Determining the equivalent point by means of a discontinuity
- G01N31/164—Determining the equivalent point by means of a discontinuity by electrical or electrochemical means

Landscapes

Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Chemical & Material Sciences (AREA)
General Physics & Mathematics (AREA)
Analytical Chemistry (AREA)
Biochemistry (AREA)
General Health & Medical Sciences (AREA)
Immunology (AREA)
Pathology (AREA)
Spectroscopy & Molecular Physics (AREA)
Molecular Biology (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Investigating Or Analysing Materials By Optical Means (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

TW92106924A 2002-03-29 2003-03-27 Method for determining the concentration of alkaline developer and method for preparing developer TW200305794A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2002097479A JP4097973B2 (ja)	2002-03-29	2002-03-29	アルカリ現像液の濃度測定方法

Publications (2)

Publication Number	Publication Date
TW200305794A true TW200305794A (en)	2003-11-01
TWI313794B TWI313794B (cs)	2009-08-21

Family

ID=29239963

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW92106924A TW200305794A (en)	2002-03-29	2003-03-27	Method for determining the concentration of alkaline developer and method for preparing developer

Country Status (3)

Country	Link
JP (1)	JP4097973B2 (cs)
KR (1)	KR100916986B1 (cs)
TW (1)	TW200305794A (cs)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4097973B2 (ja) *	2002-03-29	2008-06-11	松下環境空調エンジニアリング株式会社	アルカリ現像液の濃度測定方法
JP4366490B2 (ja) *	2003-08-22	2009-11-18	長瀬産業株式会社	現像液供給方法及び装置
JP2006189646A (ja) *	2005-01-06	2006-07-20	Nagase & Co Ltd	レジスト現像液中の炭酸塩の除去方法、除去装置、及びレジスト現像液の濃度管理方法
JP5000246B2 (ja) *	2005-09-28	2012-08-15	株式会社半導体エネルギー研究所	排液処理方法及び処理装置
JP6721157B2 (ja) *	2015-07-22	2020-07-08	株式会社平間理化研究所	現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置
JP6551784B2 (ja) *	2015-08-31	2019-07-31	パナソニックＩｐマネジメント株式会社	レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置
JP6551787B2 (ja) *	2015-09-28	2019-07-31	パナソニックＩｐマネジメント株式会社	レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置
CN106596840B (zh) *	2016-12-15	2019-01-22	深圳市华星光电技术有限公司	显影液碱液浓度测量方法及调节方法
JP2018120901A (ja) *	2017-01-23	2018-08-02	株式会社平間理化研究所	現像装置
JP2018120900A (ja) *	2017-01-23	2018-08-02	株式会社平間理化研究所	現像液管理装置
JP2018120895A (ja) *	2017-01-23	2018-08-02	株式会社平間理化研究所	現像装置
JP2018120893A (ja) *	2017-01-23	2018-08-02	株式会社平間理化研究所	現像液の成分濃度測定装置、及び現像液管理装置
JP6624762B2 (ja) *	2019-01-30	2019-12-25	株式会社平間理化研究所	現像液の管理方法及び装置
CN120594741B (zh) *	2025-08-06	2025-10-10	信联电子材料科技股份有限公司	一种tmah显影液碳酸检测方法、装置及系统

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* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH05142781A (ja) *	1991-11-19	1993-06-11	Konica Corp	感光材料の現像廃液の処理方法及び該処理方法に用いる自動現像機
JP2001154373A (ja) *	1999-11-26	2001-06-08	Fuji Photo Film Co Ltd	感光性平版印刷版の処理方法
JP4097973B2 (ja) *	2002-03-29	2008-06-11	松下環境空調エンジニアリング株式会社	アルカリ現像液の濃度測定方法

2002
- 2002-03-29 JP JP2002097479A patent/JP4097973B2/ja not_active Expired - Fee Related
2003
- 2003-03-26 KR KR20030018961A patent/KR100916986B1/ko not_active Expired - Fee Related
- 2003-03-27 TW TW92106924A patent/TW200305794A/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
TWI313794B (cs)	2009-08-21
KR20030078694A (ko)	2003-10-08
KR100916986B1 (ko)	2009-09-14
JP2003295470A (ja)	2003-10-15
JP4097973B2 (ja)	2008-06-11

Legal Events

Date	Code	Title	Description
2021-05-21	MM4A	Annulment or lapse of patent due to non-payment of fees

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