TW200707511A - Substrate Processing method and substrate processing apparatus - Google Patents

Substrate Processing method and substrate processing apparatus

Info

Publication number: TW200707511A
Authority: TW; Taiwan
Prior art keywords: substrate; substrate processing; fluid; process liquid; processing apparatus
Prior art date: 2005-06-23

Application number

TW095122478A

Other languages

English (en)

Chinese (zh)

Other versions

TWI311336B (2

Inventor

Kenji Sekiguchi

Noritaka Uchida

Satoru Tanaka

Hiroki Ohno

Original Assignee

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-06-23

Filing date

2006-06-22

Publication date

2007-02-16

2006-06-22 Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd

2007-02-16 Publication of TW200707511A publication Critical patent/TW200707511A/zh

2009-06-21 Application granted granted Critical

2009-06-21 Publication of TWI311336B publication Critical patent/TWI311336B/zh

Links

239000000758 substrate Substances 0.000 title abstract 8
238000003672 processing method Methods 0.000 title 1
239000012530 fluid Substances 0.000 abstract 6
239000007788 liquid Substances 0.000 abstract 4
239000008367 deionised water Substances 0.000 abstract 1
229910021641 deionized water Inorganic materials 0.000 abstract 1
239000002245 particle Substances 0.000 abstract 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1

Landscapes

Cleaning Or Drying Semiconductors (AREA)

TW095122478A 2005-06-23 2006-06-22 Substrate Processing method and substrate processing apparatus TW200707511A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2005183549		2005-06-23

Publications (2)

Publication Number	Publication Date
TW200707511A true TW200707511A (en)	2007-02-16
TWI311336B TWI311336B (2)	2009-06-21

Family

ID=45072406

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW095122478A TW200707511A (en)	2005-06-23	2006-06-22	Substrate Processing method and substrate processing apparatus

Country Status (1)

Country	Link
TW (1)	TW200707511A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI409876B (zh) *	2007-02-23	2013-09-21	積水化學工業股份有限公司	Etching method and device
TWI607487B (zh) *	2015-06-10	2017-12-01	思可林集團股份有限公司	基板處理方法及基板處理裝置

2006
- 2006-06-22 TW TW095122478A patent/TW200707511A/zh unknown

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI409876B (zh) *	2007-02-23	2013-09-21	積水化學工業股份有限公司	Etching method and device
TWI607487B (zh) *	2015-06-10	2017-12-01	思可林集團股份有限公司	基板處理方法及基板處理裝置

Also Published As

Publication number	Publication date
TWI311336B (2)	2009-06-21

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