TW200905158A - Monitoring method for precision optical film coating with effects of refraction and thickness correction - Google Patents

Monitoring method for precision optical film coating with effects of refraction and thickness correction Download PDF

Info

Publication number: TW200905158A
Authority: TW; Taiwan
Prior art keywords: thickness; layer; film; monitoring; value
Prior art date: 2007-07-27

Application number

TW96127529A

Other languages

English (en)

Chinese (zh)

Other versions

TWI328675B (fr

Inventor

zheng-zhong Li

Kai Wu

Original Assignee

Univ Nat Central

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-07-27

Filing date

2007-07-27

Publication date

2009-02-01

2007-07-27 Application filed by Univ Nat Central filed Critical Univ Nat Central

2007-07-27 Priority to TW96127529A priority Critical patent/TW200905158A/zh

2007-08-20 Priority to JP2007213453A priority patent/JP2009031235A/ja

2009-02-01 Publication of TW200905158A publication Critical patent/TW200905158A/zh

2010-08-11 Application granted granted Critical

2010-08-11 Publication of TWI328675B publication Critical patent/TWI328675B/zh

Links

238000012544 monitoring process Methods 0.000 title claims abstract description 29
238000000034 method Methods 0.000 title claims abstract description 22
238000012937 correction Methods 0.000 title claims abstract description 9
230000000694 effects Effects 0.000 title claims abstract description 9
239000012788 optical film Substances 0.000 title abstract description 3
238000009501 film coating Methods 0.000 title abstract 5
230000003287 optical effect Effects 0.000 claims abstract description 21
238000007747 plating Methods 0.000 claims description 12
230000008901 benefit Effects 0.000 claims description 6
238000004519 manufacturing process Methods 0.000 claims description 4
230000035945 sensitivity Effects 0.000 claims description 4
238000004364 calculation method Methods 0.000 claims description 2
229910052500 inorganic mineral Inorganic materials 0.000 claims description 2
239000012528 membrane Substances 0.000 claims description 2
239000011707 mineral Substances 0.000 claims description 2
230000033558 biomineral tissue development Effects 0.000 claims 1
229910052703 rhodium Inorganic materials 0.000 claims 1
239000010948 rhodium Substances 0.000 claims 1
MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 1
238000002834 transmittance Methods 0.000 claims 1
239000010408 film Substances 0.000 abstract description 22
239000011248 coating agent Substances 0.000 abstract description 6
238000000576 coating method Methods 0.000 abstract description 6
238000013461 design Methods 0.000 abstract description 2
230000003595 spectral effect Effects 0.000 abstract description 2
239000007888 film coating Substances 0.000 abstract 3
238000012545 processing Methods 0.000 abstract 1
230000008859 change Effects 0.000 description 4
238000010586 diagram Methods 0.000 description 4
230000035515 penetration Effects 0.000 description 4
230000008569 process Effects 0.000 description 4
238000001228 spectrum Methods 0.000 description 4
239000000463 material Substances 0.000 description 2
241000233805 Phoenix Species 0.000 description 1
230000000295 complement effect Effects 0.000 description 1
238000009795 derivation Methods 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012856 packing Methods 0.000 description 1
230000035699 permeability Effects 0.000 description 1
239000010453 quartz Substances 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1

Landscapes

Length Measuring Devices By Optical Means (AREA)
Investigating Or Analysing Materials By Optical Means (AREA)

TW96127529A 2007-07-27 2007-07-27 Monitoring method for precision optical film coating with effects of refraction and thickness correction TW200905158A (en)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
TW96127529A TW200905158A (en)	2007-07-27	2007-07-27	Monitoring method for precision optical film coating with effects of refraction and thickness correction
JP2007213453A JP2009031235A (ja)	2007-07-27	2007-08-20	屈折率と厚さの修正効果を有する精密光学コーティングモニタリング法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
TW96127529A TW200905158A (en)	2007-07-27	2007-07-27	Monitoring method for precision optical film coating with effects of refraction and thickness correction

Publications (2)

Publication Number	Publication Date
TW200905158A true TW200905158A (en)	2009-02-01
TWI328675B TWI328675B (fr)	2010-08-11

Family

ID=40401879

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW96127529A TW200905158A (en)	2007-07-27	2007-07-27	Monitoring method for precision optical film coating with effects of refraction and thickness correction

Country Status (2)

Country	Link
JP (1)	JP2009031235A (fr)
TW (1)	TW200905158A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN103726019A (zh) *	2013-12-13	2014-04-16	中国科学院上海光学精密机械研究所	改善球面光学元件镀膜均匀性的挡板的设计方法
CN115356288A (zh) *	2022-08-05	2022-11-18	山东大学	基于原位生长聚合物的微纳光纤气体传感器及制备方法
CN116463588A (zh) *	2023-04-23	2023-07-21	有研国晶辉新材料有限公司	一种红外滤光薄膜的制备方法、红外陷波光学元件

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JP5461376B2 (ja) *	2010-12-06	2014-04-02	國立中央大學	動的干渉計を使用した薄膜形成監視方法
CN104360422B (zh) *	2014-12-02	2016-12-07	中国航天科工集团第三研究院第八三五八研究所	一种低损耗超高透过率激光减反射薄膜的制备方法
CN111063627A (zh) *	2019-12-30	2020-04-24	中电国基南方集团有限公司	Bcb厚度的在片监测与控制方法及装置
CN113774353A (zh) *	2021-09-15	2021-12-10	佛山市博顿光电科技有限公司	镀膜过程的工艺参数优化方法、装置及镀膜实时监控系统
CN113862630B (zh) *	2021-11-04	2024-06-18	中山市博顿光电科技有限公司	窄带滤光片的制备方法和镀膜机
CN116005117B (zh) *	2023-03-24	2023-06-16	江苏新超科氢动力系统有限公司	一种金属双极板表面纳米涂层的制备方法
CN116463603B (zh) *	2023-04-27	2025-08-08	杭州科汀光学技术有限公司	一种任意厚度膜系的监控方法

2007
- 2007-07-27 TW TW96127529A patent/TW200905158A/zh not_active IP Right Cessation
- 2007-08-20 JP JP2007213453A patent/JP2009031235A/ja active Pending

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN103726019A (zh) *	2013-12-13	2014-04-16	中国科学院上海光学精密机械研究所	改善球面光学元件镀膜均匀性的挡板的设计方法
CN103726019B (zh) *	2013-12-13	2015-10-28	中国科学院上海光学精密机械研究所	改善球面光学元件镀膜均匀性的挡板的设计方法
CN115356288A (zh) *	2022-08-05	2022-11-18	山东大学	基于原位生长聚合物的微纳光纤气体传感器及制备方法
CN116463588A (zh) *	2023-04-23	2023-07-21	有研国晶辉新材料有限公司	一种红外滤光薄膜的制备方法、红外陷波光学元件
CN116463588B (zh) *	2023-04-23	2023-11-03	有研国晶辉新材料有限公司	一种红外滤光薄膜的制备方法、红外陷波光学元件

Also Published As

Publication number	Publication date
TWI328675B (fr)	2010-08-11
JP2009031235A (ja)	2009-02-12

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Legal Events

Date	Code	Title	Description
2017-05-11	MM4A	Annulment or lapse of patent due to non-payment of fees