TWI328675B - - Google Patents

Download PDF

Info

Publication number: TWI328675B
Authority: TW; Taiwan
Prior art keywords: layer; thickness; point; refractive index; film
Prior art date: 2007-07-27

Application number

TW96127529A

Other languages

English (en)

Chinese (zh)

Other versions

TW200905158A (en

Original Assignee

Univ Nat Central

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-07-27

Filing date

2007-07-27

Publication date

2010-08-11

2007-07-27 Application filed by Univ Nat Central filed Critical Univ Nat Central

2007-07-27 Priority to TW96127529A priority Critical patent/TW200905158A/zh

2007-08-20 Priority to JP2007213453A priority patent/JP2009031235A/ja

2009-02-01 Publication of TW200905158A publication Critical patent/TW200905158A/zh

2010-08-11 Application granted granted Critical

2010-08-11 Publication of TWI328675B publication Critical patent/TWI328675B/zh

Links

238000012544 monitoring process Methods 0.000 claims description 24
238000000034 method Methods 0.000 claims description 20
230000003287 optical effect Effects 0.000 claims description 20
238000012937 correction Methods 0.000 claims description 11
238000007747 plating Methods 0.000 claims description 10
230000008901 benefit Effects 0.000 claims description 8
239000011248 coating agent Substances 0.000 claims description 8
238000000576 coating method Methods 0.000 claims description 8
230000008859 change Effects 0.000 claims description 5
238000004519 manufacturing process Methods 0.000 claims description 3
238000002310 reflectometry Methods 0.000 claims description 3
230000035945 sensitivity Effects 0.000 claims description 3
238000002834 transmittance Methods 0.000 claims 2
239000010408 film Substances 0.000 description 24
238000001228 spectrum Methods 0.000 description 8
239000000463 material Substances 0.000 description 5
230000035515 penetration Effects 0.000 description 4
230000008569 process Effects 0.000 description 4
238000004364 calculation method Methods 0.000 description 2
238000006243 chemical reaction Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
230000003595 spectral effect Effects 0.000 description 2
FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
230000000295 complement effect Effects 0.000 description 1
238000013461 design Methods 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
230000010354 integration Effects 0.000 description 1
239000012528 membrane Substances 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
239000012788 optical film Substances 0.000 description 1
239000002243 precursor Substances 0.000 description 1
230000000750 progressive effect Effects 0.000 description 1
239000010453 quartz Substances 0.000 description 1
230000008439 repair process Effects 0.000 description 1
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1

Landscapes

Length Measuring Devices By Optical Means (AREA)
Investigating Or Analysing Materials By Optical Means (AREA)

TW96127529A 2007-07-27 2007-07-27 Monitoring method for precision optical film coating with effects of refraction and thickness correction TW200905158A (en)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
TW96127529A TW200905158A (en)	2007-07-27	2007-07-27	Monitoring method for precision optical film coating with effects of refraction and thickness correction
JP2007213453A JP2009031235A (ja)	2007-07-27	2007-08-20	屈折率と厚さの修正効果を有する精密光学コーティングモニタリング法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
TW96127529A TW200905158A (en)	2007-07-27	2007-07-27	Monitoring method for precision optical film coating with effects of refraction and thickness correction

Publications (2)

Publication Number	Publication Date
TW200905158A TW200905158A (en)	2009-02-01
TWI328675B true TWI328675B (fr)	2010-08-11

Family

ID=40401879

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW96127529A TW200905158A (en)	2007-07-27	2007-07-27	Monitoring method for precision optical film coating with effects of refraction and thickness correction

Country Status (2)

Country	Link
JP (1)	JP2009031235A (fr)
TW (1)	TW200905158A (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP5461376B2 (ja) *	2010-12-06	2014-04-02	國立中央大學	動的干渉計を使用した薄膜形成監視方法
CN103726019B (zh) *	2013-12-13	2015-10-28	中国科学院上海光学精密机械研究所	改善球面光学元件镀膜均匀性的挡板的设计方法
CN104360422B (zh) *	2014-12-02	2016-12-07	中国航天科工集团第三研究院第八三五八研究所	一种低损耗超高透过率激光减反射薄膜的制备方法
CN111063627A (zh) *	2019-12-30	2020-04-24	中电国基南方集团有限公司	Bcb厚度的在片监测与控制方法及装置
CN113774353A (zh) *	2021-09-15	2021-12-10	佛山市博顿光电科技有限公司	镀膜过程的工艺参数优化方法、装置及镀膜实时监控系统
CN113862630B (zh) *	2021-11-04	2024-06-18	中山市博顿光电科技有限公司	窄带滤光片的制备方法和镀膜机
CN115356288B (zh) *	2022-08-05	2025-05-27	山东大学	基于原位生长聚合物的微纳光纤气体传感器及制备方法
CN116005117B (zh) *	2023-03-24	2023-06-16	江苏新超科氢动力系统有限公司	一种金属双极板表面纳米涂层的制备方法
CN116463588B (zh) *	2023-04-23	2023-11-03	有研国晶辉新材料有限公司	一种红外滤光薄膜的制备方法、红外陷波光学元件
CN116463603B (zh) *	2023-04-27	2025-08-08	杭州科汀光学技术有限公司	一种任意厚度膜系的监控方法

2007
- 2007-07-27 TW TW96127529A patent/TW200905158A/zh not_active IP Right Cessation
- 2007-08-20 JP JP2007213453A patent/JP2009031235A/ja active Pending

Also Published As

Publication number	Publication date
TW200905158A (en)	2009-02-01
JP2009031235A (ja)	2009-02-12

Similar Documents

Publication	Publication Date	Title
TWI328675B (fr)	2010-08-11
CN102703880B (zh)	2014-01-15	利用原子层沉积制备高精度光学宽带抗反射多层膜的方法
US20090267803A1 (en)	2009-10-29	Scale for photoelectric encoder
JP2019035954A5 (fr)	2020-10-01
CN103018902A (zh)	2013-04-03	一种光学薄膜膜系设计的方法
TW201107872A (en)	2011-03-01	Mask blank and method for manufacturing transfer mask
CN107290813A (zh)	2017-10-24	一种中红外双层纳米金属光栅及其制备方法
JP2018106023A5 (fr)	2019-10-24
US20240377569A1 (en)	2024-11-14	Diffractive optical waveguide and preparation method thereof, and augmented reality display device
CN103176231A (zh)	2013-06-26	单层膜反射式平面金属光栅及其制作方法
CN102621601B (zh)	2014-03-05	一种平面像场超分辨成像透镜的制备方法
JP2012036479A (ja)	2012-02-23	成膜方法およびそれを用いた成膜装置
TW414858B (en)	2000-12-11	Method of determining the coating thickness on the substrate
US8200448B2 (en)	2012-06-12	Optical monitor for rugate filter deposition
TWI442172B (zh)	2014-06-21	Gray tone mask substrate, gray tone mask and product processing mark or product information marking method
CN107462941A (zh)	2017-12-12	用于生产光学元件的方法
CN101900848A (zh)	2010-12-01	一种树脂基底窄带负滤光膜膜系、滤光片及其制备方法
CN104849861A (zh)	2015-08-19	一种用于制备高性能光学薄膜的方法
JP4477475B2 (ja)	2010-06-09	ルアーの製造方法
CN211263835U (zh)	2020-08-14	一种半透半反射镜
CN115453675A (zh)	2022-12-09	一种均匀衍射闪耀光栅的制备方法及闪耀光栅
CN105629355A (zh)	2016-06-01	一种介质金属膜堆的低偏振灵敏度分色膜的制作方法
CN103376486B (zh)	2015-08-05	一种介质膜光栅的制作方法
CN208399717U (zh)	2019-01-18	一种线栅偏振器的制造系统
CN102540303A (zh)	2012-07-04	反射式艾里环衍射光栅

Legal Events

Date	Code	Title	Description
2017-05-11	MM4A	Annulment or lapse of patent due to non-payment of fees