TW201214038A - Photosensitive resin composition - Google Patents

Abstract

To provide a kind of photosensitive resin composition that is able to form a film or pattern highly permeable to visible light. a kind of photosensitive composition includes resin (A), polymeric compounds (B), polymeric initiator (C) and solvent (D), wherein the polymeric initiator (C) contains polymeric compounds of formula (1), wherein R1 represents cycloalkyl radical having carbon number of 3 to 8; L1 represents alkyl radical having carbon number of 1 to 5 ; R2 represents methyl, phenyl benzyl or benzyl; R3 represents a sulfanyl radical or a carbazole radical as a replaceable radical.

Description

201214038 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a photosensitive resin composition. [Prior Art] In recent liquid crystal display panels and the like, a photosensitive resin composition is used in order to form a photo spacer or a cover layer. As such a photosensitive resin composition, for example, a photosensitive resin composition containing a resin, a polymerizable compound, a polymerization initiator, and a solvent, wherein the polymerization initiator is N-ethyloxy-l-[9- Ethyl-6-(2-methylbenzhydryl)-9H-preconazole-3-yl]ethane-1-imine (Patent Document 1). [Prior Art Document] [Patent Document 1] [Patent Document 1] JP-A-2008- 1 8 1 08 7 SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] However, the photosensitive resin composition proposed in the past In the point of the visible light transmittance of the obtained coating film or pattern, it may not be sufficiently satisfied. [Means for Solving the Problems] The present invention provides the following [1] to [6]. [1] A photosensitive resin composition comprising a resin (A), a polymerized 201214038 compound (B), a polymerization initiator (C), and a solvent (D), wherein the polymerization initiator (C) contains the formula (1) Polymerization initiator of the compound shown [Chemical 1]

[In the formula (1), R1 represents a cycloalkyl group having 3 to 8 carbon atoms; L1 represents an alkanediyl group having 1 to 5 carbon atoms; L2 represents a single bond or -CO-; and R2 represents a methyl group, a phenyl group or a benzyl group; R 3 represents a phenyl sulfanyl phenyl group which may have a substituent or a carbazolyl group which may have a substituent. [2] The photosensitive resin composition according to the above [1], wherein L2 in the formula (1) represents -CO-» [3] the photosensitive resin composition described in the above [1] or [2] The content of the compound represented by the formula (1) with respect to the total amount of the polymerization initiator (C) is 30 to 100% by mass. [4] The photosensitive resin composition according to any one of [1] to [3] wherein the resin (A) contains a cyclic ether structure having a carbon number of 2 to 4 and a carbon-carbon unsaturated double The resin of the structural unit of the monomer of the bond. [5] A coating film obtained by the photosensitive resin composition according to any one of the above [1] to [4]. [6] A pattern obtained by the photosensitive 201214038 resin composition according to any one of the above [1] to [4]. [7] A display device comprising at least one selected from the group consisting of the coating film according to the above [5] and the pattern described in the above [6]. [Effects of the Invention] According to the photosensitive resin composition of the present invention, a coating film or pattern having a high visible light transmittance can be formed. [Embodiment] [Embodiment of the Invention] Hereinafter, the present invention will be described in detail. The photosensitive resin composition of the present invention comprises a resin (A), a polymerizable compound (B), a polymerization initiator (C) containing a compound represented by the formula (1), and a solvent (D). [Chemical 2

(1) In the formula (1), R1 represents a cycloalkyl group having 3 to 8 carbon atoms; L1 represents an alkanediyl group having 1 to 5 carbon atoms; L2 represents a single bond or -CO-; and R2 represents a methyl group or a phenyl group. Or benzyl; R3 represents a phenylnonylphenyl group which may have a substituent or a carbazolyl group which may have a substituent. In the present specification, the compounds exemplified as the respective components may be used singly or in combination as long as they are not particularly specified. The photosensitive resin composition of the present invention contains a resin (A). As the resin (A), an alkali-soluble resin is preferred. The alkali-soluble resin is a resin which is dissolved in a developing liquid to be described later. The resin (A) used for the photosensitive resin composition of the present invention is, for example, a resin (A-1): at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides (a) (hereinafter also referred to as "(a)"), a monomer (b) having a cyclic ether structure having a carbon number of 2 to 4 and a carbon-carbon unsaturated double bond (hereinafter also referred to as "(b)") Polymerized copolymer, and resin (A-2): a monomer (c) copolymerized with (a), (b) and (a) and (b) (except that it does not have a carbon number of 2~) Copolymer resin (A-3) obtained by polymerizing a cyclic ether structure of 4 (hereinafter also referred to as "(c)"): a copolymer resin obtained by polymerizing (a) and (c) (A-4) A resin resin (A-5) obtained by reacting (a) with (c) a copolymer and (b): a resin obtained by reacting the copolymer of (b) with (c) and (a). The resin (A) is preferably a resin (A-1) and a resin (A-2). Specific examples of (a) include unsaturated monounsaturated acids such as acrylic acid, methacrylic acid, crotonic acid, o-vinylbenzoic acid, m-vinylbenzoic acid, and p-vinylbenzoic acid; -8- 201214038 Malay Acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinyl phthalic acid, 4-vinyl phthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1, An unsaturated dicarboxylic acid such as 2,3,6-tetrahydrophthalic acid, dimethyltetrahydrophthalic acid or 1,4-cyclohexene dicarboxylic acid; methyl-5-norbornene-2, 3-dicarboxylic acid, 5-carboxybicyclo[2.2.1]hept-2-ene, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene, 5-carboxy-5-methylbicyclo[2.2 .1]hept-2-ene, 5-carboxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2.1]hept-2-ene, 5 a carboxyl group-containing bicyclic unsaturated compound such as carboxy-6-ethylbicyclo[2.2.1]hept-2-ene; maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinyl phthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, 5 , 6-two Unsaturated dicarboxylic acid anhydride such as carboxybicyclo[2.2.1]hept-2-ene anhydride (helamine anhydride): succinic acid mono[2-(methyl)acryloxyethyl], phthalic acid An unsaturated mono[(meth)acryloxyalkylalkyl] ester of a polyvalent carboxylic acid of two or more valences such as [2-(meth) propylene methoxyethyl]; such as α-(hydroxymethyl) An unsaturated acrylate containing acrylic acid and a carboxyl group in the same molecule. Among these, acrylic acid, methacrylic acid, maleic anhydride, and the like are preferably used from the viewpoint of the point of copolymerization reactivity or the solubility of alkali. Here, "(meth)acrylic acid" as used herein means at least one selected from the group consisting of acrylic acid and methacrylic acid. The description of "(meth)acrylonitrile" and "(meth)acrylate" -9- 201214038 has the same meaning. (b) is, for example, a structure having a cyclic ether having a carbon number of 2 to 4 (for example, selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring (oxolane ring)) At least one of the polymerizable compounds. (b) preferably a monomer having a cyclic ether structure having a carbon number of 2 to 4 and a carbon-carbon unsaturated double bond, more preferably a cyclic ether structure having a carbon number of 2 to 4 and (meth)acrylic acid Monomer of oxygen. (b), for example, a monomer (b1) having an oxirane group (hereinafter also referred to as "(bl)") or a monomer (b2) having an oxetane group (hereinafter also referred to as The monomer (b3) having a tetrahydrofuran group (b3) (hereinafter also referred to as "(b3)"), etc., having an oxirane group, means having an epoxy group A polymerizable compound of an alkyl group. (bl), for example, a monomer having a structure in which an olefin is epoxidized and a carbon-carbon unsaturated double bond (bl-ι) (hereinafter also referred to as "(b 1 -1 )")) An epoxidized structure of an unsaturated alicyclic hydrocarbon and a monomer of a carbon-carbon unsaturated double bond (bl-2) (hereinafter also referred to as "(bl-2)"). It is preferable that (bl) ' is preferably a monomer having an oxirane group and a carbon-carbon unsaturated double bond, more preferably a monomer having an oxirane group and a (meth) acryloxy group. The monomer (b 1-2 ) having a (meth) acryloxy group as (bl-1) 'specifically includes glycidyl (meth) acrylate and β-methyl (meth) acrylate Glycidyl propyl ester, bismuth-ethyl methacrylate (meth) acrylate, epoxy propyl vinyl ether, o-vinyl benzyl epoxide -10- 201214038 ether, m-vinyl benzyl epoxy Propyl ether, p-vinylbenzyl epoxypropyl ether, α-methyl-o-vinylbenzylepoxypropyl ether, α-methyl-m-ethylidene benzyl epoxypropyl ether 'α- Methyl-p-vinylbenzylepoxypropyl ether, 2,3-bis(glycidoxymethyl)styrene, 2,4-bis(glycidoxymethyl)styrene, 2,5 - bis(glycidoxymethyl)styrene, 2,6-bis(glycidoxymethyl)styrene, 2,3,4-tris(glycidoxymethyl)styrene, 2,3,5-tris(glycidoxymethyl)styrene, 2,3,6-tris(glycidoxymethyl)benzene a compound described in the publications of the general public, 3,4,5-tris(glycidoxymethyl)styrene, 2,4,6-tris(glycidoxymethyl)styrene, and JP-A-7-248625 Wait. Examples of (bl-2) include vinylcyclohexene monooxide, 1,2-epoxy-4·vinylcyclohexane (for example, Celloxide 2000; manufactured by DAICEL Chemical Industry Co., Ltd.), and acrylic acid 3. 4_Epoxycyclohexylmethyl ester (eg Cyclomer A4 00; manufactured by DAICEL Chemical Industry Co., Ltd.), methyl propylene citrate 3,4-epoxycyclohexyl methyl ester (eg Cyclomer M100; DAICEL Chemical Industry ( The compound represented by the formula (I), the compound represented by the formula (II), and the like. [化3]

[Formula and formula (II), ^ and! ^ independently of each other, represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group may be substituted with a hydroxyl group; -11 - 201214038 X1 and X2 independently of each other represent a single bond, -Re-, *-Re-〇-, *-Rc-S-, 氺-RC_NH· 〇1^ represents an alkanediyl group having a carbon number of 1 to 6; * represents a bond with 0]. Specific examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group, a second butyl group, and a third butyl group. Examples of the hydroxy-substituted alkyl group include a hydroxymethyl group, a 1-hydroxyethyl group, a 2-hydroxyethyl group, a 1-hydroxypropyl group, a 2-hydroxypropyl group, a 3-hydroxypropyl group, and a 1-hydroxy-1 group. -methylethyl, 2-hydroxy-1-methylethyl, 1-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 4-hydroxybutyl, and the like. Examples of Rb and Rb include a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group, and a 2-hydroxyethyl group, and more preferably a hydrogen atom or a methyl group. Examples of the alkanediyl group include a methylene group, an ethylidene group, a propane-1,2-diyl group, a propane-1,3-diyl group, a butane-1,4-diyl group, and a pentane-1,5 group. - Diyl, hexane-1,6-diyl and the like. Preferred examples of X1 and X2 include a single bond, a methylene group, an exoethyl group, a *_CH2-0- (氺 represents a bond bond with 0) group, and a *-ch2ch2-o· group, and more preferably, Single bond, *-CH2CH2-0. The compound represented by the formula (I) may, for example, be a compound represented by the formula (ϊ-1) to the formula (1-15). Preferably, the formula (1-1), the formula (1-3), the formula (1-5), the formula (1-7), the formula (1-9), the formula (1-11) to the formula (1) -15). More preferably, the formula (1-1), the formula (1-7), the formula (1-9), and the formula (1-15) can be given. -12- 201214038 【化4】

H2C=CH-C-0-C2H4-S

Γ·4)

ο HjCsCH—C—Ο—〇2Η4—I ϊ‘One O—C2H4—s

Η2〇= (1-6)

C2H4OH ο h2c=c-C-ο

The compound represented by the formula (II) may, for example, be a compound represented by the formula (H-i) to the formula (11-15). Preferably, it is a formula (π_η, formula (ΙΙ-3), formula (ΙΙ-5), formula (ΙΙ-7), formula (ΙΙ-9), formula (Π_η)~式(11-15). Jia can refer to the formula (ΙΙ-1), formula (π_7), formula (ΙΙ-9), and formula (11-15).

II 201214038 【化5】 H2CiCH—C— Ο H2C: CH--C—Ο—CH2 Ο II Ο h2c:ch—ρ—ο—c2h4—ο ch3. I II ^2〇=〇—0,o. (IM)

(Π-5)

HzCCH—C-O-C2H4-S H2C:CH—C—Ό:—C2H4—N CH3O H2C=C—C—0—C2H4-S CH3o I II k, H2C=C—c—O—C2H4-N-

Ch3

II (Π-7) V(II*9) (pHs〇 H2〇=C—c—o CH3o l II HjjC=C—C—O—CHj HjG Earth C—.C-0~ejH4.

〇2Η4ΟΗ ο h2c=c-c—ό·

(Π-15>

(11-14) The compound represented by (I) and the compound represented by the formula (11) can be used singly. Moreover, they can be mixed at any ratio. When mixing, the mixing ratio is expressed by the molar ratio, and the formula (I): the formula (II) is preferably 5: 95 to 95: 5' is more preferably 1 〇: 90 to 90: 10, and particularly preferably 20: 80. ~80:20 « The monomer (b2) having an oxetane group means a polymerizable compound having an oxetanyl group. As (b2), a monomer having an oxetane group and a carbon-carbon unsaturated double bond is preferred, and a monomer having an oxacyclobutane group and a (meth)acryloxy group is more preferred. (b2), for example, 3-methyl-3-(methyl)propenyloxymethyloxetane-14-201214038, 3-ethyl-3-(methyl)propene oxime Methyl oxetanyl 3-(meth) propylene oxiranoxy oxetane, 3-ethyl; methyl) propyl oxiranoxyethyl oxetane and the like. The monomer (b3)' having a tetrahydrofuran group means a polymerizable compound having a furyl group. As (b3), a monomer having a quaternary group and a carbon-carbon unsaturated double bond is preferred, and a monomer having a tetrahydro group and a (meth) propylene fluorenyloxy group is more preferred. Specific examples of (b3) include tetrahydrofurfuryl acrylate Biscoat V#150, manufactured by Osaka Organic Chemical Industry Co., Ltd., and tetrahydrofurfuryl enoate. Examples of (c) include ethyl (meth)acrylate)ethyl acrylate, n-butyl (meth)acrylate, (secondary methyl methacrylate, and third butyl (meth) acrylate. (alkyl methacrylates; cyclohexyl (meth) acrylate, (meth) propylene cyclohexyl ester, tricyclo [5·2·1. 〇 2, 6] decane-8-yl (A Acrylate is commonly used in the technical field as dicyclopentyl (meth)acrylate), dicyclopentyloxyethyl acrylate, isobornyl (meth)acrylate (meth)acrylate; Phenyl (meth) acrylate, benzyl (meth) acrylate, etc. aryl acrylate or aryl acrylate; diethyl maleate, diethyl fumarate, diethyl carbonate of itaconic acid Ester; (methyl.) 2-hydroxyethyl acrylate, 2-hydroxyalkyl (meth) acrylate, etc.; 3-methyl S - 3 - (tetrahydrotetrahydrofuranyl (such as methyl propyl) (A) propylene) acrylic acid 2-formate ((methyl hydroxypropyl ester -15- 201214038 'ring [2·2·1] gen-2 - suspicion, 5-A Bicyclo[2.2.1]hept-2-diester, 5-ethylbi [2.2.1] Hept-2-ene, 5-hydroxybicyclo[2,2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2,-hydroxyl Ethyl)bicyclo[2.2.1]hept-2-ene,5.methoxybicyclo[2 21]hept-2-ene' 5-ethoxybicyclo[2.2.1]hept-2-ene, 5, 6_ Dihydroxybicyclo[2.2.1]hept-2-ene, 5,6-di(ylmethyl)bicyclo[221]hept-2-ene, 5,6-di(2,-hydroxyethyl)bicyclo [2.2.1] Hept-2-ene, 5,6-dimethoxybicyclo[2.2.1]hept-2-ene, 5,6-diethoxybicyclo[2 2丨]hept-2-ene, 5-hydroxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl·5·methyl Bicyclo[2.21]heptane-2-ene,5-t-butoxycarbonylbiguanide [2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5 -phenoxycarbonylbicyclo[2.2.1]hept-2-ene, 5,6.bis(t-butoxycarbonyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis(cyclohexyloxycarbonyl) a bicyclic unsaturated compound such as bicyclo [2.2.1] hept-2-ene; Ν-phenyl maleimide, Ν-cyclohexylmaleimide, Ν-benzyl maleimide, Ν-Amber 醯imino-3-maleimide benzoate, · Amber quinone imido-4-maleimine butyrate, Ν-amber quinone imine-6-maleimide caproate, Ν-amber quinone imine _3_Malay Dicarbonyl quinone imine derivatives such as imidopropionate, Ν-(9-acridinyl)maleimide: styrene, α-methylstyrene, m-methylstyrene, p-methyl Styrene, vinyl toluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, 〗 〖, 3-butyl Alkene, isoprene, 2,3-dimethyl-1,3-butadiene-16- 201214038, and the like. Among these, from the viewpoint of copolymerization reactivity and alkali solubility, styrene, N-phenylmaleimide, N-cyclohexylmaleene, and N-benzylmalay are preferred. Yttrium, bicyclo [2.2.1] hept-2-ene, and the like. In the resin (A-1), the ratio of the structural unit derived from each monomer is preferably in the following range with respect to the total number of moles of the structural unit constituting the resin (A-1). The structural unit derived from (a): 5 to 60 mol% (more preferably 10 to mol%) The structural unit derived from (b): 40 to 95 mol% (more preferably 50 90 mol%) Resin ( When the ratio of the structural unit of A-1) is in the above range, the storage stability of the optical resin composition, the development property when the photosensitive resin is formed into a pattern, and the resistance of the obtained coating film and pattern are obtained. Solvent resistance, resistance, and mechanical strength tend to be good. As the resin (A-1), a resin of (b) is preferably (b1), and a resin (b-1) of (b) is preferably a resin (A-1). For example, "polymer synthesis" can be referred to the literature. (The experiment is carried out in the method described in the publication of the publication of the vol. Specifically, a method in which a predetermined amount of (a) and (b), a polymerization initiator, a solvent, and the like are placed in a reaction container, for example, by replacing oxygen with nitrogen to form a deoxidizing environment, and heating and holding while stirring . The amine phase is less than 50, and the polymerization initiator and the solvent used herein are not particularly limited, and any one which is generally used in the field can be used. For example, examples of the polymerization initiator include an azo compound (2,2'-azobisisobutyronitrile, 2,2'-azobis(2,4·dimethylvaleronitrile), etc.) or organic Oxide (benzaldehyde peroxide, etc.): The solvent is not particularly limited as long as it dissolves each monomer; and as the solvent of the photosensitive resin composition, a solvent (D) or the like described later can be used. Further, the obtained copolymer may be used as it is, or a solution obtained by concentration or dilution may be used as a solid (powder) extractor by a method such as reprecipitation. In particular, as the solvent in the polymerization, the reaction solution can be used as it is by using the same solvent as the solvent (D) to be described later, and the process can be simplified. In the resin (A-2), the ratio of the structural unit derived from each monomer is preferably in the following range with respect to the total number of moles of all the structural units constituting the resin (A-2). The structural unit from (a): 2 to 40 mol% (more preferably 5 to 35 mol%) The structural unit from (b): 2 to 95 mol% (more preferably 5 to 80 mol%) The structural unit derived from (c): 1 to 65 mol% (more preferably 1 to 60 mol%). The ratio of the structural unit of the resin (A-2) is in the above range, and the photosensitive resin composition is preserved and stabilized. The development property in the case of forming a pattern from a photosensitive resin composition, and the solvent resistance, heat resistance, and mechanical strength of the obtained coating film and pattern tend to be improved. -18-201214038 is preferable that the resin (b) is a resin of (b1), and (b) is a resin of (bl-2). The resin (A_2) can be produced by the same method as the resin (A-1). In the resin (A-3), the ratio of the structural unit derived from each monomer is preferably in the following range with respect to the total number of moles of all the structural units constituting the resin (A-3). The structural unit from (a): 2 to 40 mol% (more preferably 5 to 35 mol%) The structural unit from (c): 60 to 98 mol% (more preferably 65 to 95 mol%) When the ratio of the structural unit of the resin (A_3) is in the above range, the storage stability of the photosensitive resin composition, the development property when the photosensitive resin composition forms a pattern, and the resistance of the obtained coating film and pattern are obtained. Solvent resistance, heat resistance, and mechanical strength tend to be good. The resin (A-3) can be produced by the same method as the resin (?_: ι). The resin (A-4) and the resin (A·5) can be produced, for example, by a two-stage process. In this case, you can also refer to the method described in the "Experimental Method for Polymer Synthesis" (Otsuka Ryokan, Ltd., 1st Edition, 1st Edition, 1st issue, March 1, 1972). It is produced by the method and the like described in the publication of 1_8 9 5 3 . The tree Sb (A-4) is obtained by first obtaining a copolymer of (a) and (c) in the same manner as in the above-described method for producing the resin (A_!). -19- 201214038 In this case, as in the above, the obtained copolymer may be used as it is, or may be used as a solid (powder) by reprecipitation or the like. By. The ratio of the structural unit derived from (a) and (c) is preferably in the following range with respect to the total number of moles constituting all the structural units of the copolymer. The structural unit from (a): 5 to 50 mol% (more preferably 10 to 45 mol%) The structural unit from (c): 50 to 95 mol% (more preferably 55 to 9 mol%) Next, as a second stage, a part of the carboxylic acid and the carboxylic anhydride of (a) from the obtained copolymer is reacted with the cyclic ether of (b). Since the reactivity of the cyclic ether is high and the unreacted (b) is not easily retained, (b) is preferably (bl), more preferably (bl-Ι). Specifically, after the above, the atmosphere in the flask is replaced by nitrogen to air '5 to 80 mol% relative to the number of moles of (a) (b), relative to (a), (b) And the total amount of (c), o.ooi to 5 mass% of a reaction catalyst of a carboxyl group and a cyclic ether (for example, tris(dimethylaminomethyl)phenylhydrazine, etc.), and relative to (a), 0.001 to 5% by mass of a polymerization inhibitor (for example, hydroquinone) is added to the flask in a total amount of (b) and (c), and the reaction is carried out at 60 to 130 ° C for 1 to 10 hours to obtain a resin (a- 4). Further, similarly to the polymerization conditions, the addition method or the reaction temperature can be appropriately adjusted in consideration of the heat generation amount by the production equipment or the polymerization. Further, at this time, the number of moles -20 to 201214038 of (b) is preferably 10 to 75 mol%, more preferably 15 to 70 mol%, relative to the number of moles of (a). When the number of moles of (b) is in this range, the balance between storage stability, solvent resistance, and heat resistance tends to be good. Specific examples of the resin (A-4) include a copolymer of (meth)acrylic acid/dimethylammonium (meth)acrylate and glycidyl (meth)acrylate. Resin, resin obtained by reacting a copolymer of (meth)acrylic acid/benzyl (meth)acrylate with glycidyl (meth)acrylate, and (meth)acrylic acid/(meth)acrylic acid cyclohexane a resin obtained by reacting an ester copolymer with a glycidyl (meth)acrylate, a resin obtained by reacting a copolymer of (meth)acrylic acid/styrene with glycidyl (meth)acrylate, and Copolymer obtained by reacting a copolymer of methyl methacrylate/methyl (meth) acrylate with glycidyl (meth) acrylate, a copolymer of (meth)acrylic acid/N-cyclohexylmaleimide a resin obtained by reacting with glycidyl (meth)acrylate, a copolymer of (meth)acrylic acid/dicyclopentyl (meth)acrylate/benzyl (meth)acrylate and a (meth)acrylic acid ring A resin obtained by reacting oxypropyl ester to give (meth)acrylic acid / dicyclopentanyl (meth)acrylate / a resin obtained by reacting a copolymer of cyclohexyl (meth)acrylate with glycidyl (meth)acrylate, and a copolymer of (meth)acrylic acid/dicyclopentyl (meth)acrylate/styrene and A resin obtained by reacting (meth)acrylic acid propylene acrylate, a copolymer of (meth)acrylic acid/dicyclopentyl (meth)acrylate/methyl (meth)acrylate and (meth)acrylic acid epoxy The resin obtained by the reaction of propyl ester is obtained by reacting a copolymer of (meth)acrylic acid/dicyclopentanyl (meth)acrylate/cyclohexylmaleimide with glycidyl (meth)acrylate. Tree-21 - 201214038 A resin obtained by reacting a copolymer of crotonic acid / dicyclopentan (meth) acrylate with glycidyl (meth) acrylate; making crotonic acid / benzyl (meth) acrylate a resin obtained by reacting an ester copolymer with a glycidyl (meth)acrylate, a resin obtained by reacting a copolymer of crotonic acid/cyclohexyl (meth)acrylate with glycidyl (meth)acrylate And reacting a copolymer of crotonic acid/styrene with glycidyl (meth)acrylate to obtain a resin obtained by reacting a copolymer of crotonic acid/methyl crotonate with glycidyl (meth)acrylate, a copolymer of crotonic acid/N-cyclohexylmaleimide and (meth) a resin obtained by reacting glycidyl acrylate, a resin obtained by reacting a copolymer of crotonic acid / dicyclopentyl (meth) acrylate / benzyl (meth) acrylate with glycidyl (meth) acrylate a resin obtained by reacting a copolymer of crotonic acid/dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate with glycidyl (meth)acrylate to make crotonic acid/(methyl) a resin obtained by reacting a copolymer of dicyclopentyl acrylate/styrene with glycidyl (meth) acrylate, a copolymer of crotonic acid / dicyclopentyl (meth) acrylate / methyl crotonate ( a resin obtained by reacting methyl acrylate propylene acrylate, a copolymer of crotonic acid / dicyclopentanyl (meth) acrylate / N-cyclohexyl maleimide and glycidyl (meth) acrylate Reactive resin; copolymer of maleic acid / dicyclopentanyl (meth)acrylate with (methyl) a resin obtained by reacting a propylene acrylate with a propylene acrylate, a resin obtained by reacting a copolymer of maleic acid / benzyl (meth) acrylate with glycidyl (meth) acrylate, and a maleic acid / (A) a resin obtained by reacting a copolymer of cyclohexyl acrylate with glycidyl (meth) acrylate, and reacting a copolymer of maleic acid/benzene-22-201214038 ethylene with glycidyl (meth)acrylate The obtained resin, a copolymer obtained by reacting a copolymer of maleic acid/methyl maleate with glycidyl (meth)acrylate, and copolymerization of maleic acid/N-cyclohexylmaleimide a resin obtained by reacting with glycidyl (meth)acrylate, a copolymer of maleic acid/dicyclopentyl (meth)acrylate/benzyl (meth)acrylate and (meth)acrylic epoxy a resin obtained by reacting a propyl ester, a resin obtained by reacting a copolymer of maleic acid/dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate with glycidyl (meth)acrylate, Copolymerization of maleic acid/dicyclopentanyl (meth)acrylate/styrene with glycidyl (meth)acrylate a resin obtained by reacting a copolymer of maleic acid/dicyclopentyl (meth)acrylate/methyl maleate with glycidyl (meth)acrylate to make maleic acid/(A) a resin obtained by reacting a copolymer of dicyclopentanyl acrylate/N-cyclohexylmaleimide with glycidyl (meth) acrylate; (meth)acrylic acid/maleic anhydride/(methyl) a resin obtained by reacting a copolymer of dicyclopentanyl acrylate with glycidyl (meth) acrylate, a copolymer of (meth)acrylic acid/maleic anhydride/benzyl (meth) acrylate and (methyl) a resin obtained by reacting glycidyl acrylate, a resin obtained by reacting a copolymer of (meth)acrylic acid/maleic anhydride/cyclohexyl (meth)acrylate with glycidyl (meth)acrylate, a resin obtained by reacting a copolymer of (meth)acrylic acid/maleic anhydride/styrene with glycidyl (meth)acrylate, and (meth)acrylic acid/maleic anhydride/methyl (meth)acrylate Resin obtained by reacting a copolymer with glycidyl (meth)acrylate to make (meth)acrylic acid /maleic anhydride/N-cyclohexylmalamica-23- 201214038 A copolymer of an amine and a glycidyl (meth)acrylate to obtain a (meth)acrylic acid/maleic anhydride/(A) a resin obtained by reacting a copolymer of dicyclopentyl acrylate / benzyl (meth) acrylate with glycidyl (meth) acrylate to make (meth)acrylic acid / maleic anhydride / (meth)acrylic acid a resin obtained by reacting a copolymer of dicyclopentyl ester / cyclohexyl (meth) acrylate with glycidyl (meth) acrylate to make (meth)acrylic acid / maleic anhydride / bicyclo(meth) acrylate a resin obtained by reacting a copolymer of amyl ester/styrene with glycidyl (meth)acrylate to make (meth)acrylic acid/maleic anhydride/dicyclopentyl (meth)acrylate/(meth)acrylic acid a resin obtained by reacting a copolymer of a methyl ester with a glycidyl (meth)acrylate to obtain (meth)acrylic acid/maleic anhydride/dicyclopentanyl (meth)acrylate/N-cyclohexylmalazone a resin obtained by reacting an amine copolymer with glycidyl (meth)acrylate; (meth)acrylic acid / (A) a resin obtained by reacting a copolymer of dicyclopentanyl acrylate with 3,4-epoxycyclohexylmethyl methacrylate, a copolymer of (meth)acrylic acid / benzyl (meth) acrylate and a methyl group A resin obtained by reacting 3,4-epoxycyclohexylmethyl acrylate, a copolymer of (meth)acrylic acid/cyclohexyl (meth)acrylate and 3,4-epoxycyclohexyl methacrylate a resin obtained by reacting a methyl ester, a resin obtained by reacting a copolymer of (meth)acrylic acid/styrene with 3,4-epoxycyclohexylmethyl methacrylate, and (meth)acrylic acid / (A) a resin obtained by reacting a copolymer of methyl acrylate with 3,4-epoxycyclohexylmethyl methacrylate, a copolymer of (meth)acrylic acid/N-cyclohexylmaleimide and Resin obtained by reacting 3,4-epoxycyclohexylmethyl methacrylate -24-201214038, (meth)acrylic acid / dicyclopentyl (meth)acrylate / benzyl (meth)acrylate a resin obtained by reacting a copolymer with 3,4-epoxycyclohexylmethyl methacrylate to obtain (meth)acrylic acid/(meth)acrylic acid a resin obtained by reacting a copolymer of dicyclopentyl ester / cyclohexyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate to make (meth)acrylic acid / (meth)acrylic acid A resin obtained by reacting a copolymer of cyclopentyl ester/styrene with 3,4-epoxycyclohexylmethyl methacrylate to give (meth)acrylic acid / dicyclopentanyl (meth)acrylate / (methyl a resin obtained by reacting a copolymer of methyl acrylate with 3,4-epoxycyclohexylmethyl methacrylate to obtain (meth)acrylic acid / dicyclopentanyl (meth) acrylate / N-cyclohexyl horse a resin obtained by reacting a copolymer of ruthenium imine with 3,4-epoxycyclohexylmethyl methacrylate; a copolymer of crotonic acid/dicyclopentanyl (meth)acrylate and methacrylic acid 3, a resin obtained by reacting 4-epoxycyclohexylmethyl ester, a resin obtained by reacting a copolymer of crotonic acid/benzyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate, a resin obtained by reacting a copolymer of crotonic acid/cyclohexyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate to make a resin a resin obtained by reacting a copolymer of soybean acid/styrene with 3,4-epoxycyclohexylmethyl methacrylate, a copolymer of crotonic acid/methyl crotonate and 3,4-epoxy methacrylate a resin obtained by reacting a cyclohexylmethyl ester, a resin obtained by reacting a copolymer of crotonic acid/N-cyclohexylmaleimide with 3,4-epoxycyclohexylmethyl methacrylate, and making a croton A resin obtained by reacting a copolymer of acid/dicyclopentyl (meth)acrylate/benzyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate to make Ba-25-201214038 beans A resin obtained by reacting a copolymer of dicyclopentanyl (meth)acrylate/cyclohexyl (meth)acrylate with 3,4·epoxycyclohexylmethyl methacrylate to make crotonic acid/(A) a resin obtained by reacting a copolymer of dicyclopentanyl acrylate/styrene with 3,4-epoxycyclohexylmethyl methacrylate to make crotonic acid / dicyclopentanyl (meth) acrylate / crotonic acid a resin obtained by reacting a copolymer of a methyl ester with 3,4-epoxycyclohexylmethyl methacrylate to make crotonic acid / dicyclopentanyl (meth)acrylate Resin obtained by reacting a copolymer of /N-cyclohexylmaleimide with 3,4-epoxycyclohexylmethyl methacrylate> to make maleic acid / dicyclopentanyl (meth)acrylate a resin obtained by reacting a copolymer with 3,4-epoxycyclohexylmethyl methacrylate, a copolymer of maleic acid / benzyl (meth) acrylate and a 3,4-epoxy ring of methacrylic acid a resin obtained by reacting hexylmethyl ester, a resin obtained by reacting a copolymer of maleic acid/cyclohexyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate, and maleic acid a resin obtained by reacting a copolymer of styrene with 3,4-epoxycyclohexylmethyl methacrylate, a copolymer of maleic acid/methyl maleate and 3,4-epoxy methacrylate a resin obtained by reacting a cyclohexylmethyl ester, a resin obtained by reacting a copolymer of maleic acid/N-cyclohexylmaleimide with 3,4·epoxycyclohexylmethyl methacrylate, and A resin obtained by reacting a copolymer of maleic acid/dicyclopentyl (meth)acrylate/benzyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate to make a horse A resin obtained by reacting a copolymer of acid/dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate to make maleic acid/ Copolymer of dicyclopentyl (meth)acrylate/styrene-26- 201214038 Resin obtained by reacting methyl 3,4-epoxycyclohexylmethyl methacrylate with maleic acid / (methyl a resin obtained by reacting a copolymer of dicyclopentyl acrylate/methyl maleate with methyl propyl succinic acid 3,4-epoxycyclohexyl ketone to make maleic acid/(meth)acrylic acid Resin from a copolymer of dicyclopentanacetic acid/N-cyclohexylmaleimide and 3,4-epoxycyclohexylmethyl methacrylate: »(meth)acrylic acid/maleic anhydride / (meth)acrylic acid / maleic anhydride / (meth)acrylic acid obtained by reacting a copolymer of dicyclopentanyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate A resin obtained by reacting a copolymer of a polyester with a 3,4-epoxycyclohexylmethyl methacrylate to make a copolymer of (meth)acrylic acid/maleic anhydride/cyclohexyl (meth)acrylate and Resin obtained by reacting 3,4-epoxycyclohexylmethyl acrylate, copolymer of (meth)acrylic acid/maleic anhydride/styrene and 3,4-epoxycyclohexylmethyl methacrylate a resin obtained by the reaction, a resin obtained by reacting a copolymer of (meth)acrylic acid/maleic anhydride/methyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate, and a resin obtained by reacting a copolymer of methyl)acrylic acid/maleic anhydride/N-cyclohexylmaleimide with 3,4-epoxycyclohexylmethyl methacrylate to make (meth)acrylic acid/horse (meth)acrylic acid obtained by reacting a copolymer of anhydride/dicyclopentyl (meth)acrylate/benzyl (meth)acrylate with 3,4·epoxycyclohexylmethyl methacrylate Resin obtained by reacting a copolymer of maleic anhydride/dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate with 3,4-epoxycyclohexylmethyl methacrylate Copolymer of acrylic acid/maleic anhydride/dicyclopentyl (meth)acrylate/styrene-27-201214038 and 3,4-epoxy ring of methacrylic acid a resin obtained by reacting a methyl group with a copolymer of (meth)acrylic acid/maleic anhydride/dicyclopentyl (meth)acrylate/methyl (meth)acrylate with 3,4-epoxy methacrylate a resin obtained by reacting a cyclohexylmethyl ester with a copolymer of (meth)acrylic acid/maleic anhydride/dicyclopentanyl (meth)acrylate/N-cyclohexylmaleimide with methacrylic acid 3, A resin obtained by reacting 4-epoxycyclohexylmethyl ester or the like. In the first step, the resin (A-5) obtained the copolymers of (b) and (c) in the same manner as in the production method of the above resin (A-1). In this case, as in the above, the obtained copolymer may be used as it is, or a solution obtained by concentration or dilution may be used, or a method of reprecipitation or the like may be used as a solid (powder) extractor. The ratio of the structural unit derived from (b) and (c) is preferably in the following range with respect to the total number of moles constituting all the structural units of the copolymer. The structural unit from (b): 5 to 95 mol% (more preferably 1 〇 to 90 mol%) The structural unit from (c): 5 to 95 mol% (more preferably 丨〇~90 mol) %) In the same manner as in the method for producing the resin (A·4), the cyclic ether derived from the copolymer of (b) and (c) and the carboxylic acid or carboxyl group (a) may be used. Obtained by an acid anhydride reaction. The amount of (a) used in the reaction with the copolymer described above is preferably from 5 to 80 mol% based on the number of moles of (b). Since the reactivity of the cyclic ether is high -28-201214038, and unreacted (b) is not easily retained, (b) is preferably (bl), more preferably (b 1-1). It is also possible to react a hydroxyl group produced by the reaction of a cyclic ether with a carboxylic acid or a carboxylic anhydride with a carboxylic anhydride. The acid value can be adjusted by reaction with a carboxylic anhydride. Examples of the carboxylic acid anhydride include maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, and 3,4,5,6-tetrahydrophthalic anhydride. 1,2,3,6-Tetraphthalic anhydride, dimethyltetrahydrophthalic anhydride, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride (Helming anhydride) Wait. The amount of the carboxylic anhydride used is preferably from 0.5 to 1 mol per 1 mol of the amount of (a). Specific examples of the resin (A-5) include a resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/glycidyl (meth)acrylate with (meth)acrylic acid. A resin obtained by reacting a copolymer of benzyl (meth)acrylate/glycidyl (meth)acrylate with (meth)acrylic acid, and cyclohexyl (meth)acrylate/glycidyl (meth)acrylate a resin obtained by reacting an ester copolymer with (meth)acrylic acid, a resin obtained by reacting a copolymer of styrene/glycidyl methacrylate with (meth)acrylic acid, and (meth)acrylic acid a resin obtained by reacting a copolymer of methyl ester / glycidyl (meth) acrylate with methyl acrylate, and a copolymer of N-cyclohexylmaleimide / glycidyl (meth) acrylate a resin obtained by reacting (meth)acrylic acid, and reacting a copolymer of dicyclopentyl (meth)acrylate/benzyl (meth)acrylate/glycidyl (meth)acrylate with (meth)acrylic acid Resin, make dicyclopentyl (meth)acrylate / cyclohexyl (meth)acrylate / (Meth)acrylic acid ring-29- 201214038 A copolymer of oxypropylene vinegar and (meth)acrylic acid, resulting in (meth)acrylic acid dicyclopentanacetic acid / phenylethyl benzene / (meth) propylene a resin obtained by reacting a copolymer of acid propylene vinegar with (meth)acrylic acid to make ((meth)acrylic acid dicyclopentane vinegar / (meth) acrylic acid vinegar / <Methyl) A copolymer of a copolymer of acrylic acid and propylene glycol with a (meth)propane acid which is obtained by reacting a resin with a methyl (meth) propylene succinic acid/N-cyclohexyl madame Amine/(meth)epoxy (a resin obtained by reacting a copolymer of propylene vinegar with (meth)acrylic acid; copolymerization of dicyclopentanyl (meth)acrylate/epoxypropyl acrylate (meth)acrylate a resin obtained by reacting with crotonic acid, a resin obtained by reacting a copolymer of benzyl (meth)acrylate/glycidyl (meth)acrylate with crotonic acid, and a (meth)acrylic acid a resin obtained by reacting a copolymer of a copolymer/glycidyl methacrylate with crotonic acid, a resin obtained by reacting a copolymer of styrene/glycidyl methacrylate with crotonic acid, and a croton Copolymer obtained by reacting a copolymer of methyl ester/(methyl)-propyl decanoic acid with crotonic acid and a copolymer of fluorene-cyclohexylmaleimide/glycidyl (meth)acrylate a resin obtained by reacting with crotonic acid to give a mixture of dicyclopentyl (meth)acrylate/benzyl (meth)acrylate/glycidyl (meth)acrylate a resin obtained by reacting crotonic acid with a resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate/glycidyl (meth)acrylate with crotonic acid a resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/styrene/glycidyl (meth)acrylate with crotonic acid to make dicyclopentyl (meth)acrylate/crotonate a copolymer of ester/glycidyl (meth)acrylate and a resin obtained by reacting Ba-30-201214038 tocoic acid, making a bicyclohexylmaleimide/(meth)acrylic acid ring of (meth)acrylic acid a resin obtained by reacting oxypropyl ketone with a total of soybean acid; a resin obtained by reacting a copolymer of dicyclopentyl (meth) acrylate / (meth) acrylate with maleic acid to make (methyl benzyl ester / a copolymer of a copolymer of glycidyl (meth)acrylate and a resin obtained from maleic acid, a copolymer of cyclohexyl (meth)acrylate/(meth)oxypropyl ester and maleic acid, and 3 Copolymer of methyl methacrylate propylene acrylate reacts with maleic acid to make methyl maleate/(meth)acrylic acid a resin obtained by the co-acid reaction of glycidyl ester, a copolymer of N-cyclohexylmaleimide/glycidyl acrylate and maleic acid obtained by reacting maleic acid with dicyclopentanyl acrylate / Benzyl (meth) acrylate / (Resin based on copolymer of propylene acrylate and maleic acid) Dicyclopentyl acrylate / Cyclohexyl (meth) acrylate / ( olefinic epoxy a resin obtained by reacting a copolymer of propyl ester with maleic acid, a resin-based dicyclopentyl acrylate/styrene/(meth)acrylic acid ring copolymer and maleic acid, and (meth)propane a resin obtained by reacting an ester/methyl maleate/glycidyl (meth)acrylate with a co-acid of (meth)acrylic acid bicyclohexylmaleimide/(meth)acrylic acid a resin obtained by a co-acid reaction of glycidyl ester; reacting a copolymer of (meth)acrylic acid dicyclopentanacetic acid / (meth) propyl vinegar with methyl) acrylic acid and maleic anhydride Derivatives/N-cyclopolymers reacted with acrylic acid of acrylic acid and acrylic acid, and ethylene epoxide is obtained. (Resin polymer and horse (methyl) grease, (methyl) (M, M), (Methoxypropyl enoate dicyclomer and equine/N- epomer with methacrylate, -31 - 201214038 a resin obtained by reacting benzyl acrylate / glycidyl (meth) acrylate with (meth)acrylic acid and maleic anhydride, and cyclohexyl acrylate / glycidyl (meth) acrylate a resin obtained by copolymerizing (meth)acrylic acid and maleic anhydride, a resin obtained by reacting a copolymer of styrene (meth)acrylic acid butyl acrylate with (meth)acrylic acid anhydride, and (meth)acrylic acid a copolymer of methyl ester/() propylene acrylate and a resin obtained by reacting (meth)acrylic acid with maleic acid to make (N-cyclohexylmaleimide / (methacrylic acid butyl acrylate) a copolymer of a copolymer with (meth)acrylic acid and maleic anhydride, a copolymer of dicyclopentyl (meth)acrylate/benzyl (meth) acrylate/glycidyl (meth)acrylate ( a resin obtained by reacting methonic acid with maleic anhydride, or amyl (meth) acrylate / cyclohexyl (meth) acrylate / ( Copolymer of (meth)acrylic acid propylene-propylene copolymer with (meth)acrylic acid and maleic anhydride, copolymer of dicyclopentyl (meth) acrylate/styrene / (meth) acrylate cyclic ester and (methyl) a copolymer of acrylic acid and maleic anhydride obtained by reacting dicyclopentyl (meth)acrylate/methyl (meth)acrylate>glycidyl acrylate with (meth)acrylic acid and maleic anhydride Reactive resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/N-maleimide/glycidyl (meth)acrylate with acryl and maleic anhydride Resin; benzyl (meth) acrylate/methacrylic acid obtained by reacting a copolymer of dicyclopentyl (meth) acrylate/3,4-epoxyhexyl methacrylate with (meth)acrylic acid 3,4-Epoxycyclohexylmethyl t copolymer: (A: with ethylene / ί and Methyl: anhydride) C: Reactive propylene) C - Twn monocyclic ester, oxypropylene resin '(methyl ketone) (Methyl ring, copolymer of -32-201214038 copolymer and (meth)acrylic acid a resin obtained by reacting a copolymer of cyclohexyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate with (meth)acrylic acid to make styrene/methacrylic acid 3, Copolymer of 4-epoxycyclohexylmethyl ester copolymer with (meth)acrylic acid, copolymer of methyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate a resin obtained by reacting with (meth)acrylic acid, and a copolymer of N-cyclohexylmaleimide/3,4-epoxycyclohexylmethyl methacrylate reacted with (meth)acrylic acid a resin, a resin obtained by reacting a copolymer of (meth)acrylic acid dicyclopentyl ester/(methyl benzyl acrylate/3,4-epoxycyclohexyl methacrylate with (meth)acrylic acid, a resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate with (meth)acrylic acid to make a resin Copolymer of dicyclopentyl (meth)acrylate/styrene/3,4-epoxycyclohexylmethyl methacrylate with (meth) propyl A resin obtained by acid reaction, reacting a copolymer of dicyclopentyl (meth)acrylate/methyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate with (meth)acrylic acid And the resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/N-cyclohexylmaleimide/3,4-epoxycyclohexylmethyl methacrylate with (meth)acrylic acid And a resin obtained by reacting a copolymer of dicyclopentanyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate with crotonic acid to make benzyl (meth) acrylate a resin obtained by reacting a copolymer of 3,4-epoxycyclohexylmethyl methacrylate with crotonic acid to make cyclohexyl (meth)acrylate/3,4-epoxycyclohexyl methacrylate The ester copolymer is reacted with crotonic acid to obtain a resin of -33-201214038, a copolymer obtained by reacting a copolymer of styrene/methylpropionic acid 3,4-epoxycyclohexylmethacrylate with crotonic acid, and a resin obtained by reacting a copolymer of methyl crotonate/methyl propyl succinic acid 3,4-epoxycyclohexylmethyl ester with crotonic acid to make N-cyclohexane a resin obtained by reacting a copolymer of carbamazepine/methacrylic acid 3,4·epoxycyclohexylmethyl ester with crotonic acid, and an ester methyl group having a (meth) propylene pentane ring Acid ring oxy ring 4 3 acid propyl propyl propyl acetate propyl glutamate glutaryl methacrylate C propyl group Anti-propionic acid > Bean keba and C compound acid-resistant Beans and esters co-existing ester methyl hexyl oxocycline / ethyl benzene / pentyl glutamate _ _ _ The ring tree 4 of 3 is sour and it is supposed to be a propanol and should be a reciprocal bean and a polyester. The cyclic ester of the polyester is exemplified by a cyclopentyl dicarboxylate. ' 4 致 3, then the acid olefinic acid Beans and the copolyester of the ester methyl hexyl ring} benzyl hexyl cycline t N / ester pentane carboxylic acid acrylic acid / The amines should be derived from the fat tree, but the acid methyl hexacyclic ring a resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate with maleic acid, and benzyl (meth)acrylate/ A resin obtained by reacting a copolymer of 3,4-epoxycyclohexylmethyl methacrylate with maleic acid, and cyclohexyl (meth)acrylate/3,4·epoxycyclohexyl methacrylate a resin obtained by reacting an ester copolymer with maleic acid, a resin obtained by reacting a copolymer of styrene/3,4-epoxycyclohexylmethyl methacrylate with maleic acid, and a maleic acid a copolymer of ester/methacrylic acid 3,4-epoxycyclohexylmethyl ester and maleic acid to obtain a tree-34-201214038 lipid, N-cyclohexylmaleimide/methacrylic acid 3, a resin obtained by reacting a copolymer of 4-epoxycyclohexylmethyl ester with maleic acid, dicyclopentyl (meth)acrylate / benzyl (meth)acrylate / 3,4-epoxy methacrylate a resin obtained by reacting a copolymer of cyclohexylmethyl ester with maleic acid, and dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate/methacrylic acid 3,4- Copolymer of oxycyclohexylmethyl ester copolymer and maleic acid, copolymer of dicyclopentyl (meth)acrylate/styrene/3,4-epoxycyclohexylmethyl methacrylate a resin obtained by reacting with maleic acid, reacting a copolymer of dicyclopentyl (meth)acrylate/methyl maleate/3,4-epoxycyclohexylmethyl methacrylate with maleic acid a resin obtained by reacting a copolymer of (meth)acrylic acid dicyclopentanyl ester/N-cyclohexylmaleimide/3,4-epoxycyclohexylmethyl methacrylate with maleic acid Resin»A resin obtained by reacting a copolymer of dicyclopentyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate with (meth)acrylic acid and maleic anhydride to make ( a copolymer of benzyl methacrylate/3,4-epoxycyclohexylmethyl methacrylate and (meth)acrylic acid and maleic anhydride, and cyclohexyl (meth)acrylate/ a copolymer of 3,4-epoxycyclohexylmethyl methacrylate and a resin obtained by reacting (meth)acrylic acid with maleic anhydride to make styrene/a a resin obtained by reacting a copolymer of 3,4-epoxycyclohexylmethyl acrylate with (meth)acrylic acid and maleic anhydride, and a methyl (meth)acrylate/methacrylic acid 3,4·epoxy group a resin obtained by reacting a copolymer of cyclohexylmethyl ester with (meth)acrylic acid and maleic anhydride, and N-cyclohexylmaleimide/3,4-epoxycyclohexylmethyl methacrylate- 35- 201214038 Resin obtained by copolymerization of (meth)acrylic acid and maleic anhydride, dicyclopentyl (meth)acrylate / benzyl (meth)acrylate / 3,4-epoxy methacrylate a resin obtained by reacting a copolymer of cyclohexylmethyl ester with (meth)acrylic acid and maleic anhydride, and dicyclopentyl (meth)acrylate/cyclohexyl (meth)acrylate/methacrylic acid 3,4- a resin obtained by reacting a copolymer of epoxycyclohexylmethyl ester with (meth)acrylic acid and maleic anhydride, and a dicyclopentyl (meth)acrylate/styrene/methacrylic acid 3,4-epoxy group a resin obtained by reacting a copolymer of cyclohexylmethyl ester with (meth)acrylic acid and maleic anhydride to make (meth)acrylic acid a resin obtained by reacting a copolymer of cyclopentyl ester/methyl (meth)acrylate/3,4-epoxycyclohexylmethyl methacrylate with (meth)acrylic acid and maleic anhydride to make (meth) A resin obtained by reacting a copolymer of dicyclopentanyl acrylate/N-cyclohexylmaleimide/3,4-epoxycyclohexylmethyl methacrylate with (meth)acrylic acid and maleic anhydride. The polystyrene-equivalent weight average molecular weight of the resin (A) is preferably from 3,000 to 100,000, more preferably from 5,000 to 50,000. When the weight average molecular weight of the resin (A) is in the above range, the coating property of the photosensitive resin composition tends to be good, and the pixel portion of the uncured coating film due to the development of the pattern is formed. The film thinning is less likely to occur, and the non-pixel portion of the unhardened coating film (i.e., solubility in the developing liquid) tends to be improved at the time of development. The molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (?π)] of the resin (A) is preferably from 1.1 to 6.0, more preferably from 1.2 to 4.0. When the molecular weight distribution is in the above range, the developability tends to be excellent. -36- 201214038 The acid value of the resin (A) is 20 to 150 mg-KOH/g, preferably 40 to 135 mg-KOH/g, more preferably 50 to 135 mg-KOH/g. The acid value herein is determined by measuring the amount (mg) of potassium hydroxide required for neutralizing the lg resin (A), and titrating it with an aqueous potassium hydroxide solution. The content of the resin (A) is preferably from 5 to 95% by mass, more preferably from 20 to 80% by mass, particularly preferably from 40 to 60%, based on the total amount of the resin (A) and the polymerizable compound (B). quality%. When the content of the resin (A) is in the above range, the developability, the adhesion, the solvent resistance, and the mechanical properties tend to be improved. The photosensitive resin composition of the present invention contains a polymerizable compound (B). The polymerizable compound (B) is a compound which can be polymerized by a living radical generated by a polymerization initiator (C), and examples thereof include polymerization. A compound of a carbon-carbon unsaturated double bond or the like is preferably a (meth) acrylate compound. The polymerizable compound (B) having one polymerizable carbon-carbon unsaturated double bond is exemplified as the compounds exemplified in (a), (b) and (c), and among them, (methyl) is preferred. ) acrylates. Examples of the polymerizable compound (B) having two polymerizable carbon-carbon unsaturated double bonds include 1,3-butanediol di(meth)acrylate and 13-butanediol (meth)acrylate. 1,6-hexanediol di(meth)acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate , triethylene glycol di(meth) acrylate, tetraethylene glycol di(meth) acrylate, polyethylene glycol dipropyl-37- 201214038 enoate, bisphenol A bis (acryloxy ethoxylate B) Ether, ethoxylated bisphenol A di(meth) acrylate, propoxylated neopentyl glycol di(meth) acrylate, ethoxylated neopentyl glycol di(meth) acrylate , 3-methylpentanediol di(meth)acrylate, and the like. Examples of the polymerizable compound (B) having three or more polymerizable carbon-carbon unsaturated double bonds include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, and tri (( 2·hydroxyethyl)isocyanate tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, propoxylated trimethylolpropane tris(methyl) ) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tripentaerythritol tetra (meth) acrylate, tripentaerythritol 5 (a) Reaction of acrylate, tripentaerythritol hexa(meth) acrylate, tripentaerythritol hepta (meth) acrylate, tripentaerythritol octa (meth) acrylate, pentaerythritol tri(meth) acrylate and anhydride, Reaction of pentaerythritol penta (meth) acrylate with an acid anhydride, tripentaerythritol hepta (meth) acrylate and anhydride caprolactone modified trimethylolpropane tri(meth) acrylate, caprolactone modification Pentaerythritol tri(meth)acrylate, caprolactone modified tris(2-hydroxyethyl)isocyanate tri(meth)acrylate, caprolactone modified pentaerythritol tetra(meth)acrylate Ester, caprolactone modified dipentaerythritol penta (meth) acrylate, caprolactone modified dipentaerythritol hexa(meth) acrylate, caprolactone modified tripentaerythritol tetra (meth) acrylate, caprolactone Modified tripentaerythritol penta (meth) acrylate, caprolactone modified tripellitate hexa(meth) acrylate, caprolactone change -38- 201214038 sex tripentaerythritol hepta (meth) acrylate, caprolactone modification Reaction of pentaerythritol octa(methyl) acrylate vinegar, caprolactone modified pentaerythritol tris(meth) acrylate with anhydride, reaction of caprolactone-modified dipentaerythritol penta (meth) acrylate with anhydride A reaction product of a caprolactone-modified tripentaerythritol hepta(meth)acrylate and an acid anhydride. Among them, a monomer of preferably 3 or more is more preferably dipentaerythritol hexa(meth)acrylate. The content of the polymerizable compound (B) is preferably 5 to 9.5 mass%, more preferably 20 to 80 mass%, based on the total amount of the resin (a) and the polymerizable compound (B). When the content of the polymerizable compound (B) is in the above range, the strength, smoothness, reliability, and mechanical strength of the sensitivity or the cured pattern tend to be improved. The photosensitive resin composition of the present invention contains a polymerization initiator (C), and the polymerization initiator (C) contains a compound represented by the formula (1) (hereinafter also referred to as "compound (1)"). The so-called polymerization initiator is a compound which initiates polymerization by the action of light or heat. 【化6】

[In the formula (1), R1 represents a cycloalkyl group having 3 to 8 carbon atoms; L1 represents an alkanediyl group having 1 to 5 carbon atoms; L2 represents a single bond or -CO-; and R2 represents a methyl group, a phenyl group or a benzyl group; R 3 represents a phenyl nonylphenyl group which may have a substituent or a carbazolyl group which may have a substituent -39-201214038]. Examples of the ring-backed base having a carbon number of 3 to 8 include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and a norbornyl group. Among them, it is preferably a cyclopentyl group. Examples of the alkanediyl group having a carbon number of 1 to 5 include a methylene group, an ethylidene group, a propylenediyl group, a butyldiyl group, and a pentanediyl group. Among them, a methylene group and an ethylidene group are preferred as L2, preferably -CO-. When L2 is -CO-, the visible light transmittance of the obtained coating film or pattern tends to be high. The compound (1) is preferably a compound represented by the formula (1 - 1) to the formula (1-3). If these compounds are used, the visible light transmittance of the obtained coating film or pattern tends to be high.

(1-1)

(1-2) (1-3) -40-201214038 The photosensitive resin composition of the present invention may contain a polymerization initiator (polymerization initiator (C0)) different from the compound (1) as (C). The polymerization initiator is a compound which initiates polymerization by the action of light or heat, and a well-known polymerization initiator can be used. The polymerization initiator (C0) may, for example, be a bisacetophenone compound, a triterpene compound or a mercaptophosphine oxide compound. Further, it is also possible to use JP-A-2008-8 8 087 and/or a thermal cationic polymerization initiator (for example, an anion composed of iron cation). Among them, a mixture of a compound, an acetophenone compound and a hydrazine compound is preferred as a biimidazole compound. The polymerization initiator (C0)-based compound together with the compound (1) has a high sensitivity. As the biimidazole compound, 2,2'-)-4,4',5,5'-tetraphenyl is exemplified. Bis-imidazole, 2,2,-bis (2,3 4,4',5,5'-tetraphenylbisimidazole (for example, see JP-A-Hei, JP-A-6-7 5 3 73, etc.), 2, 2,-bis(4,4',5,5'-tetraphenylbisimidazole, 2,2,-bis(2-chlorobenzene | tetra(indolyloxyphenyl) bismuth, 2,2' - Bis(4,4',5,5'-tetrakis(dialkoxyphenyl)bisimidazole, 2,:yl)-4,4',5,5'-tetra(di-tertyloxyphenyl) double Japanese Patent Publication No. Sho 48-38403, No. 62-174204, No. 62-174204, No. 4, 4', 5, 5'-position of a phenyl group substituted by a carbon alkoxy group, see Japanese Patent Publication No. 7-1 09 1 3 (b), etc. Preferably, the polymerization initiator is hereinafter referred to as "(C0), as long as there is no particular imidazole compound, a compound, or a photon described in the oxime report and at least one type derived from Lewis free diimidazole. It is preferred to use the above d. Bis(2-chlorophenyl-dichlorophenyl)-;-7 5 3 72, 2-chlorophenyl)-g) -4,4 , 5,5, 2-chlorophenyl)-2'-bis(2-chlorobenzene (for example, refer to the special tiger bulletin, etc.), an azole compound (for example, 2,2'-bis-41 - 201214038 (2- Chlorophenyl)-4,4',5,5'-tetraphenylbisimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenyl Bis-imidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenylbisimidazole. As the aforementioned acetophenone compound, diethyl Oxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethylketal, 2-hydroxy-1-[4-(2-hydroxyethoxy) Phenyl]_2-methylpropan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propenyl)-benzyl]-phenyl}-2- Methyl-propan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinylpropan-1-one, 2-benzyl -2-dimethylamino-1-(4-morpholinylphenyl)butan-1-one, 2-(2-methylbenzyl)-2-dimethylamino-1-( 4 -morpholinylphenyl)butanone, 2-(3-methylbenzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(4-methyl Benzyl)-2-dimethylamino-1(4-morpholinylphenyl)butanone, 2-(2-ethylbenzyl) -2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(2-propylbenzyl)-2-dimethylamino-1-(4-morpholine) Butyl ketone, 2-(2-butylbenzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-( 2,3-dimethyl Benzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(2,4-dimethylbenzyl)-2-dimethylamino-1- (4-morpholinylphenyl)butanone, 2-(2-chlorobenzyl)-2-dimethylamino-1(4-morpholinylphenyl)butanone, 2-(2-bromo) Benzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(3-chlorobenzyl)-2-dimethylamino-1-(4-? Phenylphenyl)butanone, 2-(4-chlorobenzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(3-bromobenzyl)- 2-Dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(4-bromobenzyl)-2-dimethylamino-1-(4-?-42- 201214038 Phenylphenyl)butanone, 2-(2-methoxybenzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(3-methoxy Benzyl)-2-dimethylamino-indole-(4-morpholinylphenyl)butanone, 2-(4-methoxybenzyl)-2-dimethylamino-1-(4) -Morpholine Phenyl)butanone, 2-(2-methyl-4-methoxybenzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2·( 2- Methyl-4-bromobenzyl)-2-dimethylamino-1-(4-morpholinylphenyl)butanone, 2-(2-bromo-4-methoxybenzyl)-2- Dimethylamino-1-(4-morpholinylphenyl)butanone, 2-hydroxy-2-methyl-1-[4-(1-methylvinyl)phenyl]propan-1-one Oligomers and the like. Examples of the above triterpene compound include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-three tillage, and 2,4-bis (three) Chloromethyl)-6-(4-methoxynaphthyl)-1,3, 5-trin, 2,4-bis(trichloromethyl)-6-piperidin-1,3,5-three Bismuth, 2,4-bis(trichloromethyl)-6-(4-methoxystyryl)-1,3,5-three tillage, 2,4-bis(trichloromethyl)-6- [2-(5-Methylfuran-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl) )vinyl]-1,3,5-three tillage, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)vinyl] -1,3,5-three tillage, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl]-1,3,5-three Hey. The above-mentioned mercaptophosphine oxide compound may, for example, be 2,4,6-trimethylbenzimidyldiphenylphosphine oxide. The above hydrazine compound may, for example, be N-benzylideneoxy-1-(4-phenylmercaptophenyl)butan-1-one-2-imine or N-ethoxycarbonyloxy group- 1-phenylpropan-2-one, N-benzylideneoxy-1-(4-phenylmercaptophenyl)-43- 201214038 octane-1-one-2-imine, N-acetoxy-l-[9-ethyl-6(2-methylbenzhydryl)-9Η-oxazol-3-yl]ethane-1-imine, oxime-ethoxime -1-[9-ethyl-6-{2-methyl-4-(3,3-dimethyl-2,4-dioxolanylmethoxy)benzimidyl}-911 -oxazol-3-yl]ethane-1-imine and the like. Commercial products such as Irgacure ΟΧΕ-01, ΟΧΕ-02 (above, CIBA Japan) and N-1919 (made by ADEKA) can also be used. Further, examples of the polymerization initiator (C0) include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether. Acryl compound; diphenyl ketone, methyl o-bezoyl benzoate, 4-phenyl diphenyl ketone, 4-benzylidene-4'-methyl diphenyl sulfide, 3, 3' a diphenyl ketone compound such as 4,4'-tetrakis(t-butylperoxycarbonyl)diphenyl ketone or 2,4,6-trimethyldiphenyl ketone; 9,10·phenanthrenequinone, 2 An anthraquinone compound such as ethyl hydrazine or camphor quinone; 10-butyl-2-chloroacridone, benzophenone, methyl phenylglyoxylate, and a titanocene compound. These are preferably used in combination with a polymerization initiation aid (C 1 ) to be described later. Further, as the polymerization initiator (C0), a polymerization initiator having a group capable of causing chain transfer as described in JP-A-2002-5 4U 05 can also be used. The polymerization initiator having a group capable of causing chain transfer may, for example, be a compound of the following formulas (a) to (f). -44 - 201214038 【化8】 (8)

(Φ

H3c〇〇c iH3 h3C〇oc

Vc-S^H^S-^^k4-W (f) The above-mentioned polymerization initiator having a group capable of causing chain transfer can also be used as the component (C) constituting the resin (A). In the photosensitive resin composition of the present invention, the above polymerization initiator (C) together with a polymerization initiation aid (ci) can be used. The polymerization initiation aid (C 1 ) may, for example, be a compound represented by the formula (III). -45- 201214038

[Chemical 9 I w1

οII ς : CH—C-R5 NI R4 (m) [In the formula (III), the dotted line indicated by w1 represents an aromatic ring having a carbon number of 6 to 12 which may be substituted by a halogen atom; Y1 represents -〇· or -S-; R4 represents a monovalent saturated hydrocarbon group having 1 to 6 carbon atoms; and R5 represents a saturated hydrocarbon group having 1 to 12 carbon atoms which may be substituted by a halogen atom or an aryl group having 6 to 12 carbon atoms which may be substituted with a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom. Examples of the aromatic ring having 6 to 12 carbon atoms include a benzene ring and a naphthalene ring. Examples of the aromatic ring having 6 to 12 carbon atoms which may be substituted by a halogen atom include a benzene ring, a methylbenzene ring, a dimethylbenzene ring, an ethylbenzene ring, a propylbenzene ring, a butylbenzene ring, and a pentane group. Alkylbenzene ring, hexylbenzene ring, cyclohexylbenzene ring, chlorobenzene ring, dichlorobenzene ring, bromobenzene ring, dibromobenzene ring, phenylbenzene ring, chlorophenylbenzene ring, bromophenylbenzene ring, naphthalene ring , chloronaphthalene ring, bromine naphthalene ring, etc. Examples of the saturated hydrocarbon group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a n-propyl group, an isopropyl group, a n-butyl group, a 1-methylpropyl group, a 2-methylpropyl group, and a t-butyl group. , n-pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1,1-dimethylpropyl' 1,2·dimethylpropyl, 2,2- Dimethylpropyl, n-hexyl, cyclohexyl and the like. The saturated hydrocarbon group having 1 to 12 carbon atoms which may be substituted by a halogen atom, for example, in addition to the above-mentioned saturated hydrocarbon group having 1 to 6 carbon atoms, may also be a heptyl group, an octyl-46-201214038, a fluorenyl group or a fluorenyl group. Eleven, twelve, 1-chlorobutyl, 2-chlorobutyl, 3-chlorobutyl, and the like. Examples of the aryl group having 6 to 12 carbon atoms which may be substituted by a halogen atom include a phenyl group, a chlorophenyl group, a dichlorophenyl group, a bromophenyl group, a dibromophenyl group, a chlorobromophenyl group, a biphenyl group, and a chlorine group. Biphenyl, dichlorobiphenyl, bromophenyl, dibromophenyl, naphthyl, chloronaphthyl, dichloronaphthyl, bromonaphthyl, dibromonaphthyl and the like. Specific examples of the compound represented by the formula (III) include 2-[2-oxo-2-(2-phenyl)ethylidene]-3-methylnaphtho[2, fluorene-d]thiazole. Porphyrin, 2-[2-oxo-2-(2-phenyl)ethylidene]-3-methylnaphtho[1,2-d]thiazoline, 2-[2-oxo-2- 2-phenyl)ethylidene]-3-methylnaphtho[2,3-d]thiazoline, 2-[2-oxo-2-(2-naphthyl)ethylene]-3-methyl Benzothiazoline, 2-[2-oxo-2-(1-naphthyl)ethylidene]-3-methylbenzothiazoline, 2-[2-oxo-2-(2-naphthalene) Ethylene]-3-methyl-5-phenylbenzothiazoline, 2-[2-oxo-2-(1-naphthyl)ethylidene]-3-methyl-5-benzene Benzothiazoline, 2-[2-oxo-2-(2.naphthyl)ethylidene]-3-methyl-5-fluorobenzothiazoline, 2-[2-oxo-2- (1-Naphthyl)ethylidene]-3-methyl-5-fluorobenzothiazoline, 2-[2-oxo-2-(2-naphthyl)ethylidene]-3-methyl- 5-chlorobenzothiazoline, 2-[2-oxo-2-(1-naphthyl)ethylidene]-3-methyl-5-chlorobenzothiazoline, 2-[2-oxo- 2-(2-Naphthyl)ethylidene]-3-methyl-5-bromobenzothiazoline, 2-[2-oxo-2-(1-naphthyl)ethylene]-3-methyl 5-bromobenzothiazoline, 2-[2-oxo-2- (4- Phenyl)ethylidene]-3-methylbenzothiazoline, 2-[2-oxo-2-(4-phenylphenyl)ethylidene]-3-methyl-5-phenyl Benzothiazoline, 2-[2-oxo-2-(2-naphthyl)ethylene]-3-methylnaphtho[2,1-(1]thiazoline, 2-[2-oxo -2-(2-naphthyl)ethylidene-47- 201214038 yl]-3-methylnaphtho[1,2-d]thiazoline, 2-[2-oxo-2-(4-phenylbenzene) Ethylene]-3-methylnaphtho[2,1-(1]thiazoline, 2-[2-oxo-2-(4-phenylphenyl)ethylidene]-3- Naphtho[1,2-d]thiazoline, 2-[2-oxo-2-(4-fluorophenyl)ethylidene]-3-methylnaphtho[2,1-d]thiazoline , 2-[2-oxo-2-(4-fluorophenyl)ethylidene]-3-methylnaphtho[l,2-d]thiazoline, 2-[2-oxo-2-( 2-phenyl)ethylidene]-3-methylnaphtho[2,1-d]oxazoline, 2-[2-oxo-2-(2-phenyl)ethylidene-3- Methylnaphtho[i,2-d]oxazoline, 2-[2-oxo-2-(2-phenyl)ethylidene-3-methylnaphtho[2,3-d]indole Oxazoline, 2-[2-oxo-2-(2-naphthyl)ethylidene]-3-methylbenzoxazoline, 2-[2-oxo-2-(1-naphthyl) Ethylene]-3-methylbenzoxazoline, 2-[2-oxo-2-(2-naphthyl)ethylidene]-3-methyl-5 -Phenylbenzoxazoline, 2-[2-oxo-2-(1-naphthyl)ethylidene]-3-methyl-5-phenylbenzoxazoline, 2-[2- Oxo-2-(2-naphthyl)ethylidene]-3-methyl-5-fluorobenzoxazoline, 2-[2-oxo-2·(1-naphthyl)ethylene] 3-methyl-5-fluorobenzoxazoline, 2-[2-oxo-2-(2-naphthyl)ethylidene]-3-methyl-5-chlorobenzoxazoline, 2-[2-oxo-2-(1-naphthyl)ethylidene]'3-methyl-5-chlorobenzoxazoline, 2·[2-oxo-2-(2-naphthyl) Ethylene]-3-methyl-5-bromobenzoxazoline, 2-[2-oxo-2-(1-naphthyl)ethylidene]-3-methyl-5-bromobenzene And oxazoline, 2-[2-oxo-2-(4-phenylphenyl)ethylidene]-3-methylbenzoxazoline, 2·[2-oxo-2- (4 -phenylphenyl)ethylidene-3-methyl-5-phenylbenzoxazoline, 2-[2-oxo-2-(1-naphthyl)ethylene]-3- Naphtho[2,ld]oxazoline, 2-[2-oxo-2-(1-naphthyl)ethylidene]-3-methylnaphtho[1,2-£1]-transoxazoline , 2-[2-oxo-2-(4-phenylphenyl)ethylidene 3-methylnaphtho[2,1-(1] oxazoline, 2-[2-oxo-2 -(4-phenylphenyl) sub-48- 201214038 ethyl]-3-methylnaphtho[1,2-(1]噚Porphyrin, 2-[2-oxo-2-(4-fluorophenyl)ethylidene]-3-methylnaphtho[2,1-d]oxazoline, 2-[2-oxo-2 - (4-Fluorophenyl)ethylidene]-3-methylnaphtho[l,2-d]oxazoline and the like. Further, as the polymerization initiation aid (C 1 ), a compound represented by the formula (IV) or the formula (V) can also be used. [化1 0]

[In the formulae (IV) and (V), the ring W2, the ring W3 and the ring W4 independently of each other represent an aromatic ring having 6 to 12 carbon atoms or a heterocyclic ring having 2 to 10 carbon atoms which may be substituted by a halogen atom; Y2~ Y5 independently of each other represents -〇- or -S-; R6 to R9 represent a monovalent saturated hydrocarbon group having 1 to 12 carbon atoms or an aryl group having 6 to 12 carbon atoms, and the saturated hydrocarbon group and a hydrogen atom contained in the aryl group It may also be substituted by a halogen atom, a hydroxyl group or an alkoxy group having 1 to 6 carbon atoms]. The aromatic ring may be an aromatic ring similar to those of the formula (III), and a hydrogen atom contained in the aromatic ring may be optionally substituted by the above-exemplified halogen atom. Examples of the heterocyclic ring which may be substituted by a halogen atom include a pyridine ring, a pyrimidine ring, an anthracene ring, a pyridinium ring, a pyran ring, etc., and a monovalent hydroxy group-substituted saturated hydrocarbon group, and examples thereof include a hydroxymethyl group and a hydroxy group B. Base, hydroxypropyl, hydroxybutyl and the like. Examples of the hydroxy-substituted aryl group include a hydroxyphenyl group and a hydroxynaphthyl group. -49- 201214038 Examples of the monovalent alkoxy-substituted saturated hydrocarbon group include a methoxymethyl group, a methoxyethyl group, a methoxypropyl 'methoxybutyl group, a butoxymethyl group, and an ethoxy group. Ethyl ethyl, ethoxypropyl, propoxybutyl and the like. The alkoxy-substituted aryl group may, for example, be a methoxyphenyl group or an ethoxynaphthyl group. Specific examples of the compound represented by the formula (IV) and the formula (V) include dimethoxynaphthalene, diethoxynaphthalene, dipropoxynaphthalene, diisopropoxynaphthalene, and dibutoxynaphthalene. Iso-alkoxynaphthalenes; 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9 , 10-diethoxy hydrazine, dipropoxy hydrazine, diisopropoxy hydrazine, dibutoxy fluorene, dipentyl fluorene, dihexyloxy hydrazine, methoxy ethoxy hydrazine, methoxy Propyl methoxy oxime, methoxyisopropoxy oxime, methoxybutoxy oxime, ethoxy propoxy oxime, ethoxyisopropoxy oxime, ethoxybutoxy oxime, propoxy a dialkoxy anthracene such as an isopropoxy oxime, a propoxy oxybutoxy fluorene or an isopropoxy butyl hydrazine; a dimethoxy fused tetraphenyl, a diethoxy fused tetraphenyl, a dipropylene a dialkoxy fused tetraphenyl such as oxy-fused tetraphenyl, diisopropoxy fused tetraphenyl or dibutoxy fused tetraphenyl: Further, as the polymerization initiation aid (C 1 ), a thioxanthone compound can also be used. Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, and 2,4-dichlorothioxanthone. -Chloro-4-propoxythioxanthone, etc. Further, 'as a polymerization initiation aid (C1), an amine compound, a carboxylic acid compound, etc. are mentioned. The amine compound may, for example, be an aliphatic amine compound such as triethanolamine, methyldiethanolamine or tri-50-201214038 isopropanolamine, such as methyl 4-dimethylaminobenzoate or 4-dimethylamine. Ethyl benzoate, isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, N, N - dimethyl-p-toluidine, 4,4'-bis(dimethylamino)diphenyl ketone (general name; Michler's ketone), 4,4'-bis(diethylamino)diphenyl ketone Aromatic amine compound. Examples of the carboxylic acid compound include phenylmercaptoacetic acid, methylphenyl thioglycolic acid, ethylphenylmercaptoacetic acid, methylethylphenylmercaptoacetic acid, dimethylphenylmercaptoacetic acid, and A. Oxyphenyl phenyl thioglycolic acid, dimethoxyphenyl thioglycolic acid, chlorophenyl thioglycolic acid, dichlorophenyl thioglycolic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N An aromatic heteroacetic acid such as naphthylglycine or naphthyloxyacetic acid. The content of the compound (1) is preferably from 30 to 100% by mass, more preferably from 50 to 100% by mass, based on the total amount of the polymerization initiator (C). When the content of the compound (1) is within the above range, the pattern can be obtained with high sensitivity. The content of the polymerization initiator (C) is preferably from 0.5 to 30 parts by mass, more preferably from 1 to 20 parts by mass, based on 100 parts by mass of the resin (Α) and the polymerizable compound (Β). It is 1 to 10 parts by mass. When the content of the polymerization initiator (C) is within the above range, the pattern can be obtained with high sensitivity, and the visible light transmittance of the obtained pattern tends to be high. The content of the polymerization initiation aid (C1) is relatively high. The content of the resin (Α) and the polymerizable compound (Β) is preferably 0 to 1 part by mass, more preferably 0 to 7 parts by mass, per 100 parts by mass. When the amount of the polymerization initiation aid (C 1 ) is in the above range of 201214038, the shape of the pattern obtained by the pattern can be obtained with high sensitivity. The photosensitive resin composition of the present invention contains a solvent (D). The solvent usable in the present invention can be, for example, an ester solvent (a solvent containing -coo - but not containing - in the molecule), an ether solvent (a solvent containing -0 in the molecule but not containing -COO-), an ether ester solvent. (a solvent containing -COO- and -0 in the molecule), a ketone solvent (a solvent containing -CO- in the molecule but not containing -C 0 -), an alcohol solvent, an aromatic hydrocarbon solvent, a guanamine solvent, and a dimethyl solvent Azolium or the like is selected to use ° as the ester solvent, and examples thereof include methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutyrate, ethyl acetate, n-butyl acetate, isobutyl acetate, and formic acid. Ester, isoamyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl ethyl acetate, B Ethyl acetate, cyclohexanol acetate, butyrolactone, and the like. Examples of the ether solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, and diethyl ether. Glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol , 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydrofuran, 1,4 - bismuth, diethylene glycol monomethyl hydrazine, diethyl ether diethyl ether, diethyl Glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenethyl ether, methyl anisole, and the like. Examples of the ether ester solvent include methyl methoxyacetate, methoxyacetic acid-52-201214038 ethyl ester, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, and 3-methyl. Methyl oxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, 2-methyl Ethyl oxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, 2-methoxy-2-methylpropanoate Ester '2-ethoxy-2-methylpropionic acid ethyl ester, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol Monoethyl ether acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate , diethylene glycol monobutyl ether acetate, and the like. Examples of the ketone solvent include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, and 4-methyl-2- Pentanone, cyclopentanone, cyclohexanone, isophorone, etc. As the alcohol solvent, methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, glycerin may be mentioned. Wait. Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, and trimethylbenzene. The guanamine solvent may, for example, be N,N-dimethylformamide, N,N-dimethylacetamide or N-methylpyrrolidone. These solvents may be used alone or in combination of two or more. Among the above-mentioned solvents, from the viewpoint of coatability and drying property, an organic solvent having a boiling point of from 120 ° C to 18 (TC or less) is preferred. Among them, propylene glycol monomethyl ether and propylene glycol are preferred. Monomethyl ether acetate, diethylene glycol methyl ethyl ether, ethyl 3-ethoxypropionate, 3-methoxybutyl acetate-53-201214038, 3-methoxy-1-butyl The content of the solvent (D) in the photosensitive resin composition is preferably from 60 to 95% by mass, more preferably from 70 to 90% by mass, based on the photosensitive resin composition. In other words, the photosensitive resin The solid content of the composition is preferably from 5 to 40% by mass, more preferably from 1 to 30% by mass. Here, the solid content means that the solvent (D) is removed from the photosensitive resin composition. When the content of the solvent (D) is within the above range, the flatness of the film to which the photosensitive resin composition is applied tends to be high. Further, the photosensitive resin composition of the present invention may further contain polyfunctional sulfur. The alcohol compound (T). The so-called polyfunctional thiol compound (T) means that there are two or more molecules in the molecule. The compound of the fluorenyl group (-SH). In particular, when a compound having two or more fluorenyl groups bonded to a carbon atom derived from an aliphatic hydrocarbon group is used, the sensitivity of the photosensitive resin composition of the present invention becomes high. Specific examples of the polyfunctional thiol compound (T) include hexanedithiol, decanedithiol, 1,4-bis(methylindenyl)benzene, and butanediol bis(3-indenyl). Propionate), butanediol bis(3-mercaptoacetate), ethylene glycol bis(3-mercaptoacetate), trimethylolpropane tris(3-mercaptoacetate), butyl Diol bis(3-mercaptopropionate), trimethylolpropane tris(3-3⁄43⁄4 propyl propionate), trimethylolpropane tris(3-mercaptoacetate), pentaerythritol tetra(3- Mercaptopropionate, pentaerythritol tetrakis(3-mercaptoacetate), trishydroxyethyltris(3-mercaptopropionate), pentaerythritol tetrakis(3-mercaptobutyrate), 1,4-double (3-mercaptobutoxy)butane, etc. The content of the polyfunctional thiol compound (T) is preferably 0.1 to 10 parts by mass based on 100 parts by mass of the polymerization initiator -54 - 201214038 (C). More preferably 0.5 When the content of the polyfunctional thiol compound (T) is in the above range, the sensitivity of the photosensitive resin composition becomes high, and the development property in forming a pattern tends to be good, which is preferable. The photosensitive resin composition of the present invention preferably contains a surfactant (E). Examples of the surfactant include a polyfluorene-based surfactant, a fluorine-based surfactant, and a polyfluorene-based system having a fluorine atom. Examples of the surfactant, such as a surfactant, include a surfactant having a decane bond. Specifically, Toray Silicone DC3PA, the same SH7PA, the same DC11PA, the same SH21PA, the same SH28PA, the same SH29PA, the same SH30PA, polyether modified polyoxyl SH8400 (trade name: Toray Dow Corning Co., Ltd.), KP321, KP322, KP323, KP324, KP3 26, KP340, KP341 (Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452, TSF4460 (manufactured by Momentive Performance Materials, Japan). The fluorine-based surfactant is a surfactant having a fluorocarbon chain. Specifically, Fluorinert (registered trademark) FC43 0, FC431 (Sumitomo 3M (share) system), Megafac (registered trademark) F142D, F171, F172, F173, F177, F183, and R30 (F30) DIC (share) system, Eftop (registered trademark) EF301, same as EF3 03, -55- 201214038 with EF351, with EF3 5 2 (Mitsubishi Materials Electronics Co., Ltd.), Surflon (registered trademark) S381, same as S382, Same as SC101, SC105 (Asahi Glass Co., Ltd.), E5844 (manufactured by DAIKIN Precision Chemical Research Institute). Examples of the polyfluorene-based surfactant having a fluorine atom include a surfactant having a sand oxide bond and a fluorocarbon chain. Specifically, Megafac (registered trademark) R08, the same BL20, the same F475, the same F477, the same F443 (DIC system), and the like can be given. Preferably, Megafac (registered trademark) F475 is mentioned. The content of the surfactant (E) is preferably 0.001% by mass or more and 0.2% by mass or less based on the photosensitive resin composition, and is preferably 〇.〇〇2% by mass or more and 0% by mass or less. 1% by mass or more 〇·〇5 mass% or less. By including the surfactant in the above range, the flatness of the coating film can be improved. The photosensitive resin composition of the present invention may contain various additives such as a smear, another polymer compound, an adhesion promoter, an antioxidant, an ultraviolet absorber, a photostabilizer, and a chain transfer agent, as needed. The photosensitive resin composition of the present invention does not substantially contain a coloring agent such as a pigment or a dye. In the photosensitive resin composition of the present invention, the content of the colorant is preferably less than 1% by mass, more preferably less than 0.5% by mass, based on the entire composition. When the photosensitive resin composition of the present invention is filled in a quartz cell having an optical path length of 1 cm, the average transmittance is preferably measured by using a spectrophotometer at a measurement wavelength of 4 Å to 700 nm. 70% to -56- 201214038, and more preferably 80% or more. When the photosensitive resin composition of the present invention is a coating film, the average transmittance of the coating film is preferably 90% or more, and more preferably 95% or more. The average transmittance is a coating film having a thickness of 3 μm after heat curing (for example, 100 to 25 ° C for 5 minutes to 3 hours), and an average of the measurement results at a measurement wavelength of 400 to 70 nm using a spectrophotometer. value. Thereby, a coating film excellent in transparency in the visible light region can be provided. The coating film produced from the conventionally known resin composition containing no coloring agent has a high transmittance at a measurement wavelength of around 400 nra, and is colored in a yellow or brown color. However, the photosensitive resin composition of the present invention can provide a coating film or pattern which exhibits a high transmittance in the entire visible light region (400 to 700 nm). The photosensitive resin composition of the present invention can be formed, for example, by coating on a substrate such as a glass, metal, plastic, or the like, a color filter, or various insulating or conductive films to form a driving circuit. . The coating film is preferably dried and hardened. After being applied onto a substrate, it is patterned into a desired shape to form a pattern. First, the photosensitive resin composition of the present invention is applied onto a substrate. The coating system is as described above, and a spin coater, a slit & spin coater, a slit coater, an ink jet apparatus, and a roll coater can be used. Various coating devices such as dip coaters are used. Next, it is preferred to carry out drying or prebaking to remove the stomach component such as a solvent to dry. Thereby, a smooth unhardened coating film can be obtained. The film thickness of the coating film at this time is not particularly limited, and can be appropriately adjusted according to the materials, applications, and the like used, and for example, about 1 to 6 μm can be exemplified. Further, the obtained uncured coating film is irradiated with light, for example, ultraviolet light generated from a mercury lamp or a light-emitting diode, by a mask for forming a desired pattern. The shape of the reticle at this time is not particularly limited, and the shape or size can be selected according to the use of the pattern. In the exposure machine of recent years, a filter that cuts off the wavelength region of light of less than 350 nm can be used, or a band pass filter capable of taking out a wavelength region of light in the vicinity of 4 3 6 nm, around 408 nm, and around 3 65 nm can be used. It is selectively taken out, and the entire surface of the exposure surface is uniformly irradiated with parallel rays. In this case, in order to properly align the mask and the substrate, a mask can be used to align the exposure machine, stepper, and the like. The exposed coating film is brought into contact with the developing solution, and a predetermined portion, for example, a non-exposed portion (i.e., a non-pixel portion) is dissolved, and development is performed to obtain a desired pattern shape. The developing method may be any one of a liquid coating method, a dipping method, a spray method, and the like. Further, at the time of development, the substrate can be inclined at an arbitrary angle. The developing solution used for development is preferably an aqueous solution of a basic compound. The basic compound may be any of an inorganic or organic basic compound. Specific examples of the inorganic basic compound include sodium hydroxide, potassium hydroxide, disodium hydrogen phosphate, sodium dihydrogen phosphate, and phosphoric acid. Diammonium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, sodium silicate, potassium silicate, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, sodium borate, potassium borate, ammonia, and the like. Examples of the organic basic compound include tetramethylammonium hydroxide, -58-201214038 2-hydroxyethyltrimethylammonium hydroxide, monomethylamine, dimethylamine, trimethylamine, monoethylamine, and diethylamine. Amine, triethylamine, monoisopropylamine, diisopropylamine, ethanolamine, and the like. The concentration of the inorganic and organic basic compounds in the aqueous solution is preferably from 0.01 to 10% by mass, more preferably from 3 to 5% by mass. The aforementioned developing solution may also contain a surfactant. The surfactant may be any of a nonionic surfactant, an anionic surfactant, or a cationic surfactant. Examples of the nonionic surfactant include polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyoxyethylene alkyl aryl ether, other polyoxyethylene derivatives, and ethylene oxide/propylene oxide block copolymerization. , sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, glycerin fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine, etc. . Examples of the anionic surfactant include higher alcohol sulfate salts such as sodium lauryl sulfate or sodium oleyl sulfate, alkyl sulfates such as sodium lauryl sulfate or ammonium lauryl sulfate, such as ten. An alkyl aryl sulfonate such as sodium dibasic benzene sulfonate or sodium dodecyl sulfonate. Examples of the cationic surfactant include a concentration of a surfactant in a β-base developing solution such as an amine salt of stearylamine hydrochloride or lauryl trimethylammonium chloride or a fourth-order ammonium salt. Preferably, it is in the range of 0.01 to 10% by mass, more preferably 0.05 to 8% by mass, and particularly preferably 0.: [~5 mass%. After development, the water is washed to obtain a pattern. Furthermore, post-baking can be performed as needed. The post-baking is preferably, for example, from 1 50 to 240. (: Temperature range -59 - 201214038 for 10 to 180 minutes) When the unhardened coating film is exposed, the light-stomach formed with the pattern is not used, and the entire surface is irradiated with light and/or the development is omitted. The coating film having the pattern M. The pattern obtained by the photosensitive resin composition of the present invention, for example, is applied as a photo spacer which can form a color filter substrate and/or an array substrate, and can be patterned. The overcoat layer, the interlayer insulating film, the liquid crystal matching protrusion, the microlens, the coating layer for adjusting the film thickness, and the like, and the member for the touch panel, which is obtained by the above-mentioned coating film having no pattern, is applicable. The overcoat layer constituting a part of the color filter substrate and/or the array substrate. The color filter substrate and the array substrate are applied to a liquid crystal display device, an organic EL display device, electronic paper, etc. [Embodiment] The present invention will be described in more detail by way of examples. In the examples, "%" and "parts" are mass% and parts by mass unless otherwise specified. (Synthesis Example 1) A reflux condenser, a dropping funnel, and a mixer are provided. Burning Inside, a nitrogen gas was introduced at a rate of 0.02 L/min to form a nitrogen atmosphere, and 200 parts by mass of 3-methoxy-1-butanol and 105 parts by mass of 3-methoxybutyl acetate were added, and the mixture was heated to 70 with stirring. Next, 60 parts by mass of methacrylic acid, 3,4-epoxytricyclo[5.2.1.0 2 6]decyl acrylate (the compound represented by the formula (1-1) and the formula (II-1) The compound shown has a molar ratio of 50:50 to 60-201214038) 240 parts by mass dissolved in 140 parts by mass of 3-methoxybutyl acetate to prepare a solution, using a dropping funnel, fee 4 The solution was dropped to a flask maintained at 70 ° C for an hour. On the other hand, another polymerization funnel was used, and a polymerization initiator was dissolved in 225 parts by mass of 3-methoxybutyl acetate for 4 hours. 30 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) was dropped into the flask, and after the completion of the dropwise addition of the solution of the polymerization initiator, it was kept at 70 ° C for 4 hours, and then cooled. A solution of a copolymer (resin Aa) having a solid content of 32.6 mass% and an acid value of UOmg-KOH/g (in terms of solid content) was obtained at room temperature. Aa weight average molecular weight Mw of 13,400, a molecular weight distribution (M w / Μη) is 2.50. [Chemical 11]

(Synthesis Example 2) In a flask equipped with a reflux condenser, a dropping funnel, and a stirrer, nitrogen gas was introduced at a rate of 0.02 L/min to form a nitrogen atmosphere, and 200 parts by mass of 3-methoxy-1-butanol was added thereto. 105 parts by mass of 3-methoxybutyl acetate was heated to 70 ° C with stirring. Next, 5 parts by mass of methacrylic acid and 3,4-epoxytricyclo[5.2.1.02 6]nonyl acrylate (the compound represented by the formula (1-1) and the formula (II-1)) The compound was dissolved in 70 parts by mass of 3-methoxyhexyl acetate in an amount of 175 parts by mass of 50:50 molar ratio and 70 parts by mass of N-cyclohexylmaleimine to prepare a solution, using a drip pump. The dissolution was dropped to a flask maintained at 70 ° C for 4 hours. On the other hand, using another drip pump, the polymerization initiator 2,2'-azobis (2,4-) is dissolved in the 225-61 - 201214038 parts by mass of 3-methoxybutyl acetate for 5 hours. A solution of 30 parts by mass of dimethyl valeronitrile was dropped into the flask. After the completion of the dropwise addition of the solution of the polymerization initiator, it was kept at 70 ° C for 4 hours, and then cooled to room temperature to obtain a viscosity (23 ° C) of 1 14 mPa·s, a solid content of 32.6% by mass, and an acid value of 34.311^- 1<: a solution of a copolymer (resin Ab) of 〇11^ (acid value of 105.211^-〇11/8 in terms of solid content). The obtained resin Ab had a weight average molecular weight of 13,600 and a molecular weight distribution (1^你/?11) of 2.54. Further, the viscosity of the copolymer solution was measured using a Brookfield viscometer. The weight average molecular weight (Mw) & the number average molecular weight (?n) of the obtained resin Aa and resin Ab was measured by the GPC method under the following conditions. Device: Κ2479 (made by Shimadzu Corporation)

Column: SHIMADZU Shim-pack GPC-80M

Column temperature: 40 ° C Solvent: THF (tetrahydrofuran)

Flow rate: 1.0 mL/min Detector: RI The ratio of the polystyrene-equivalent weight average molecular weight and the number average molecular weight (Mw/Μη) obtained above was taken as a molecular weight distribution. (Examples 1 to 4 and Comparative Example 1) <Preparation of photosensitive resin composition> Each of the components of Table 1 was mixed to obtain a photosensitive resin composition. -62-201214038 I Table 1] Polymerization initiator ( C) (parts) Resin (A) (parts) Polymeric compound CB) (parts? Compound

Solvent (D) (mass ratio) (C0) 1 (Da) (DbT (Dc) (Όά) Solid content (%) 丄 33T?T? 23

H 3?~~ IT~~ Jz~ 23

The components in Table 1 are as follows. Resin (A); Resin Aa obtained in Synthesis Example 1. The parts in the table represent the parts by mass of the solid content conversion. Polymerizable compound (B): dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.) Compound (1); 1-1; Compound represented by formula (1 -1) (butyl caliper - PBG -3) 0 4 ; Changzhou Qiang 'power electronic new material (made) system compound (1) ' 1_2' formula (1-3) compound (Ding Han - PBG - 3 0 5; Changzhou strong electronic new material (Yes) Compound (1); 丨·3; compound represented by formula (1-2) (TR_PBG-309; manufactured by Changzhou Strong Electronic New Material (Y)) Polymerization Initiator (CO); N-Ethyloxy _丨_[9_Ethyl_6-(2-methylbenzhydryl)-9H-indazol-3-yl]ethane-indole-imine (IRGACURE OXE 02; manufactured by BASF Japan) Solvent ( D), (Da); 3-methoxy-1-butanol solvent (D); (Db); propylene glycol monomethyl ether acetate-63- 201214038 solvent (D); (Dc): 3-B Ethyl oxypropionate solvent (D); (Dd): 3-methoxybutyl acetate solvent (D) The solid content of the photosensitive resin composition is "solid content (%)" in Table 1. By mixing, the solvent components (Da) to (Dd) in the solvent (D) are represented by Solvent (D) in a mass ratio. [1 2]

<Average transmittance of the composition> The obtained photosensitive resin composition was measured using an ultraviolet-visible near-infrared spectrophotometer (V-650; manufactured by JASCO Corporation) (quartz case, optical path length: 1 cm). The average transmittance (%) at .4 00 to 700 nm. Table 2 shows no results. -64 - 201214038 <Formation of Coating Film> A glass substrate (Eagle XG; manufactured by Corning Co., Ltd.) of 2 square meters was washed with a neutral detergent, water and alcohol in this order, followed by drying. On the glass substrate, the photosensitive resin composition obtained above was spin-coated so that the film thickness after post-baking became 3.0 μm, and then pre-baked at 90 ° C for 3 minutes in a clean oven. Then, it was heated at 23 ° C for 20 minutes to obtain a coating film. <Transmission rate of coating film> The obtained coating film was measured for transmittance (%) at 400 nm and average transmittance at 400 to 700 nm using a microscopic spectrophotometer (OSP-SP200; manufactured by OLYMPUS). %). The higher the transmittance at 400 nm, the less the color of yellow is indicated. Further, if the transmittance of the coating film is high, the pattern formed as described below also has a high transmittance. The results are shown in Table 2. <Formation of the pattern> The glass substrate (Eagle XG; manufactured by Corning Co., Ltd.) of 2 square meters was washed with a neutral detergent, water and alcohol in this order, and then dried. On this glass substrate, a photosensitive resin composition was spin-coated so that the film thickness after post-baking was 3.0 μm, and it was pre-baked at 80 ° C for 2 minutes on a hot plate to be dried. After cooling, the distance between the substrate coated with the photosensitive resin composition and the mask made of quartz glass was set to 200 μm, and an exposure machine (TME-150RSK; Topcon Co., Ltd., light source; ultrahigh pressure mercury lamp) was used in the atmosphere. In the environment, light having an exposure amount of 60 mJ/cm 2 (base of 365 nm) was irradiated. Further, at this time, the irradiation of the photosensitive resin composition was carried out by irradiating the light from the ultrahigh pressure mercury lamp to the optical filter (UV-33; 曰 曰 ( ( 。). Further, as the photomask, a mask having a pattern (having a light-transmitting portion of a square having a side of 13 μm and a square interval of ΙΟΟμίη) (that is, a light-transmitting portion) has been formed on the same plane. After the light irradiation, the coating film was immersed and shaken at 25 ° C for 60 seconds in a water-based developing solution containing a nonionic surfactant 〇1.2% and potassium hydroxide 0.04%, and after washing with water, after washing with water The pattern was formed by post-baking in an oven at 23 5 ° C for 15 minutes. When the pattern is not peeled off and remains, it is regarded as 〇. The results are shown in Table 2. [Table 2] mm\Comparative Example 3 2 3 4 1 Transmittance of coating film 400nm 9.6,8% 98.3⁄43⁄4 9». 9% 97, 0% 94. 3% 400 〜70_0nm 99. 5% 99. 63⁄4 99 7% 99. 5% 99.13⁄4 Permeability of composition (%) 99...3% 89.3%: 96.3% 83. 0% 98..7% Formation of pattern Ο 〇〇 本 by the present invention Since the coating film or pattern obtained by the photosensitive resin composition exhibits the above results, the display device can be manufactured by using the coating film and/or the pattern formed of the photosensitive resin composition of the present invention, and the display can be improved. Display characteristics of the device. (Examples 5 to 8) '<Preparation of photosensitive resin composition> Each component of Table 3 was mixed' to obtain a photosensitive resin composition. In addition, each component in Table 3 is the same component as that of Table 1 - 66 - 201214038 [Table 3] Real 5 _ 5 6 7 8 Resin (A) (part) Resin Aa 50 Resin Ab 60 60 60 Polymerizable compound (B) (part) 40 40 40 50 Polymerization initiator (C) (part) Compound 1 1-1 1 1-2 1 1-3 1 1 Solvent (D) (mass ratio) (Da) 8 8 8 8 ( Db) 42 42 26 33 (Dc) 0 0 16 16 (Dd) 20 20 20 13 Solid content (%) 23 23 23 23 <Formation of pattern> The photosensitive resin composition of Examples 5 to 8 In the same manner as in the first embodiment, a coating film having a high transmittance at 400 nm and a pattern are obtained. [Industrial Applicability] The photosensitive resin composition of the present invention is a coating film or a visible light of a pattern. High transmission rate. -67-

Claims (1)

201214038 VII. Patent application scope: 1. A photosensitive resin composition containing a resin (A), a polymerizable compound (B), a polymerization initiator (C), and a solvent (D) where a polymerization initiator (C) is Polymerization initiator containing a compound represented by formula (1) [Chemical 1] [In the formula (1), R1 represents a cycloalkyl group having 3 to 8 carbon atoms; L1 represents an alkanediyl group having 1 to 5 carbon atoms; L2 represents a single bond or -CO-; and R2 represents a methyl group, a phenyl group or a benzyl group; R3 represents a phenyl sulfanyl phenyl group which may have a substituent or a carbazolyl group which may have a substituent] 2. The photosensitive resin composition of the first aspect of the patent application, wherein the formula (1) L2 represents -CO-. In the photosensitive resin composition of the first or second aspect of the invention, the content of the compound represented by the formula (1) is from 30 to 100% by mass based on the total amount of the polymerization initiator (C). 4. The photosensitive resin composition of any one of claims 1 to 3 wherein the resin (A) contains a cyclic ether structure having a carbon number of 2 to 4 and a carbon-carbon unsaturated double bond. The resin of the structural unit of the monomer. A coating film obtained by a photosensitive resin composition according to any one of the items -1 to 4 of the patent application No. -68-201214038. A pattern obtained by the photosensitive resin composition according to any one of claims 1 to 4 of the patent application. A display device comprising at least one selected from the group consisting of a coating film of claim 5 and a pattern of claim 6 of the patent application. -69- 201214038 IV. Designated representative map: (1) The representative representative of the case is: No (2) The symbol of the representative figure is simple: No 201214038 V. If there is a chemical formula in this case, please reveal the best indication of the characteristics of the invention. Chemical formula: