TW201416323A - 氧化鎵粉末及其製作方法 - Google Patents

氧化鎵粉末及其製作方法 Download PDF

Info

Publication number: TW201416323A
Authority: TW; Taiwan
Prior art keywords: gallium oxide; gallium; oxide powder; precipitate; less
Prior art date: 2012-10-18

Application number

TW101138460A

Other languages

English (en)

Chinese (zh)

Other versions

TWI476157B (fr

Inventor

yu-lun Zhang

hong-jin Lin

Bai-Ying Su

Original Assignee

Solar Applied Mat Tech Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2012-10-18

Filing date

2012-10-18

Publication date

2014-05-01

2012-10-18 Application filed by Solar Applied Mat Tech Corp filed Critical Solar Applied Mat Tech Corp

2012-10-18 Priority to TW101138460A priority Critical patent/TW201416323A/zh

2013-10-08 Priority to JP2013210783A priority patent/JP5769776B2/ja

2014-05-01 Publication of TW201416323A publication Critical patent/TW201416323A/zh

2015-03-11 Application granted granted Critical

2015-03-11 Publication of TWI476157B publication Critical patent/TWI476157B/zh

Links

AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 title claims abstract description 120
229910001195 gallium oxide Inorganic materials 0.000 title claims abstract description 120
239000000843 powder Substances 0.000 title claims abstract description 74
238000002360 preparation method Methods 0.000 title abstract description 4
239000002245 particle Substances 0.000 claims abstract description 72
239000002244 precipitate Substances 0.000 claims abstract description 26
150000002258 gallium Chemical class 0.000 claims abstract description 24
239000012266 salt solution Substances 0.000 claims abstract description 21
CKHJYUSOUQDYEN-UHFFFAOYSA-N gallium(3+) Chemical compound [Ga+3] CKHJYUSOUQDYEN-UHFFFAOYSA-N 0.000 claims abstract description 18
238000000034 method Methods 0.000 claims abstract description 17
238000001354 calcination Methods 0.000 claims abstract description 10
239000007788 liquid Substances 0.000 claims abstract description 5
238000000926 separation method Methods 0.000 claims abstract description 5
230000007423 decrease Effects 0.000 claims abstract description 4
238000001035 drying Methods 0.000 claims abstract 2
238000004519 manufacturing process Methods 0.000 claims description 16
239000013078 crystal Substances 0.000 claims description 10
229910052733 gallium Inorganic materials 0.000 claims description 6
GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
239000003795 chemical substances by application Substances 0.000 claims description 3
230000003647 oxidation Effects 0.000 claims 1
238000007254 oxidation reaction Methods 0.000 claims 1
238000005245 sintering Methods 0.000 abstract description 9
229910052751 metal Inorganic materials 0.000 description 17
239000002184 metal Substances 0.000 description 17
230000000052 comparative effect Effects 0.000 description 16
238000004544 sputter deposition Methods 0.000 description 8
VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 7
239000000243 solution Substances 0.000 description 7
210000001161 mammalian embryo Anatomy 0.000 description 5
238000001878 scanning electron micrograph Methods 0.000 description 5
CHPZKNULDCNCBW-UHFFFAOYSA-N gallium nitrate Chemical compound [Ga+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CHPZKNULDCNCBW-UHFFFAOYSA-N 0.000 description 4
238000000227 grinding Methods 0.000 description 4
229910044991 metal oxide Inorganic materials 0.000 description 4
150000004706 metal oxides Chemical class 0.000 description 4
YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 3
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
239000000908 ammonium hydroxide Substances 0.000 description 3
230000003247 decreasing effect Effects 0.000 description 3
150000002739 metals Chemical class 0.000 description 3
238000000465 moulding Methods 0.000 description 3
239000002253 acid Substances 0.000 description 2
238000000498 ball milling Methods 0.000 description 2
-1 gallium ions Chemical class 0.000 description 2
229940044658 gallium nitrate Drugs 0.000 description 2
239000012535 impurity Substances 0.000 description 2
238000002156 mixing Methods 0.000 description 2
238000005498 polishing Methods 0.000 description 2
238000001694 spray drying Methods 0.000 description 2
NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
230000002159 abnormal effect Effects 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
238000009694 cold isostatic pressing Methods 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
210000002257 embryonic structure Anatomy 0.000 description 1
238000005265 energy consumption Methods 0.000 description 1
238000001914 filtration Methods 0.000 description 1
238000010304 firing Methods 0.000 description 1
230000002431 foraging effect Effects 0.000 description 1
UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
238000005259 measurement Methods 0.000 description 1
239000007769 metal material Substances 0.000 description 1
239000002923 metal particle Substances 0.000 description 1
239000000203 mixture Substances 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
230000001376 precipitating effect Effects 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
239000002904 solvent Substances 0.000 description 1
QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
238000005406 washing Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

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Physical Vapour Deposition (AREA)
Compositions Of Oxide Ceramics (AREA)
Catalysts (AREA)

TW101138460A 2012-10-18 2012-10-18 氧化鎵粉末及其製作方法 TW201416323A (zh)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
TW101138460A TW201416323A (zh)	2012-10-18	2012-10-18	氧化鎵粉末及其製作方法
JP2013210783A JP5769776B2 (ja)	2012-10-18	2013-10-08	酸化ガリウム粉末及びその製造方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
TW101138460A TW201416323A (zh)	2012-10-18	2012-10-18	氧化鎵粉末及其製作方法

Publications (2)

Publication Number	Publication Date
TW201416323A true TW201416323A (zh)	2014-05-01
TWI476157B TWI476157B (fr)	2015-03-11

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TW101138460A TW201416323A (zh)	2012-10-18	2012-10-18	氧化鎵粉末及其製作方法

Country Status (2)

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JP (1)	JP5769776B2 (fr)
TW (1)	TW201416323A (fr)

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KR101514945B1 (ko) *	2014-07-07	2015-04-28	(주)티에스엠	디에틸렌글리콜을 사용한 산화갈륨 나노입자의 제조방법 및 이로부터 제조된 산화갈륨
JP7170617B2 (ja) *	2019-10-24	2022-11-14	信越化学工業株式会社	ガリウム前駆体の製造方法およびこれを用いた積層体の製造方法
CN117561116A (zh) *	2021-06-11	2024-02-13	Dic株式会社	氧化镓颗粒以及用于制造氧化镓颗粒的方法
KR102731513B1 (ko)	2022-11-14	2024-11-18	한국세라믹기술원	산화갈륨 단결정 성장용 분말 및 이의 제조방법
CN118145696A (zh) *	2024-03-13	2024-06-07	郑州大学	均匀分散的球状氧化镓粉体的制备方法

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FR2485508A1 (fr) *	1980-06-27	1981-12-31	Rhone Poulenc Ind	Procede de fabrication d'oxyde de gallium
JPH10273318A (ja) *	1997-03-28	1998-10-13	Mitsubishi Materials Corp	酸化ガリウム粉末の製造方法
JP2002020122A (ja) *	2000-06-30	2002-01-23	Tosoh Corp	ガリウム化合物粉末、酸化ガリウム粉末及びこれらの製造方法
JP4257959B2 (ja) *	2002-10-22	2009-04-30	Ｄｏｗａエレクトロニクス株式会社	酸化ガリウムの製造方法
JP2006335616A (ja) *	2005-06-03	2006-12-14	Nippon Light Metal Co Ltd	酸化ガリウム単結晶
JP5640749B2 (ja) *	2010-01-07	2014-12-17	住友化学株式会社	酸化ガリウム及びその製造方法
JP2011162429A (ja) *	2010-01-15	2011-08-25	Sumitomo Chemical Co Ltd	酸化ガリウムの製造方法
JP5729926B2 (ja) *	2010-06-11	2015-06-03	三井金属鉱業株式会社	酸化ガリウム粉末
JP5588815B2 (ja) *	2010-10-06	2014-09-10	三井金属鉱業株式会社	酸化ガリウム粉末
JP5640775B2 (ja) *	2011-01-31	2014-12-17	住友化学株式会社	顆粒状酸化ガリウムの製造方法
JP2012162432A (ja) *	2011-02-09	2012-08-30	Jx Nippon Mining & Metals Corp	酸化ガリウム粉末及びその製造方法並びに酸化物焼結体スパッタリングターゲット及びその製造方法

2012
- 2012-10-18 TW TW101138460A patent/TW201416323A/zh unknown
2013
- 2013-10-08 JP JP2013210783A patent/JP5769776B2/ja active Active

Also Published As

Publication number	Publication date
JP2014084270A (ja)	2014-05-12
TWI476157B (fr)	2015-03-11
JP5769776B2 (ja)	2015-08-26

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