TW202544566A - 3d羅倫茲型永磁馬達 - Google Patents

3d羅倫茲型永磁馬達

Info

Publication number
TW202544566A
TW202544566A TW114109500A TW114109500A TW202544566A TW 202544566 A TW202544566 A TW 202544566A TW 114109500 A TW114109500 A TW 114109500A TW 114109500 A TW114109500 A TW 114109500A TW 202544566 A TW202544566 A TW 202544566A
Authority
TW
Taiwan
Prior art keywords
coil
assembly
magnet
permanent magnet
coil assembly
Prior art date
Application number
TW114109500A
Other languages
English (en)
Chinese (zh)
Inventor
費德勒斯 安卓那司 布恩
歐拉夫 馬迪尼司 喬塞福爾斯 費雪
Original Assignee
荷蘭商Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荷蘭商Ａｓｍｌ荷蘭公司 filed Critical 荷蘭商Ａｓｍｌ荷蘭公司
Publication of TW202544566A publication Critical patent/TW202544566A/zh

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/035—DC motors; Unipolar motors
    • H02K41/0352—Unipolar motors
    • H02K41/0354—Lorentz force motors, e.g. voice coil motors
    • H02K41/0356—Lorentz force motors, e.g. voice coil motors moving along a straight path
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Permanent Field Magnets Of Synchronous Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW114109500A 2024-03-15 2025-03-14 3d羅倫茲型永磁馬達 TW202544566A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP24163768 2024-03-15
EP24163768.5 2024-03-15

Publications (1)

Publication Number Publication Date
TW202544566A true TW202544566A (zh) 2025-11-16

Family

ID=90366424

Family Applications (1)

Application Number Title Priority Date Filing Date
TW114109500A TW202544566A (zh) 2024-03-15 2025-03-14 3d羅倫茲型永磁馬達

Country Status (2)

Country Link
TW (1) TW202544566A (fr)
WO (1) WO2025190816A1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
SG2010050110A (en) 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4314555B2 (ja) * 2002-12-03 2009-08-19 株式会社ニコン リニアモータ装置、ステージ装置、及び露光装置
US20060049697A1 (en) * 2004-09-08 2006-03-09 Nikon Corporation Split coil linear motor for z force
DE102005043569A1 (de) 2005-09-12 2007-03-22 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
WO2016005568A1 (fr) * 2014-07-11 2016-01-14 Asml Netherlands B.V. Actionneur, dispositif de positionnement, appareil lithographique, et procédé pour la fabrication d'un actionneur
WO2017032540A1 (fr) 2015-08-27 2017-03-02 Asml Netherlands B.V. Actionneur de lorentz, système de positionnement d'objet, appareil lithographique et procédé de fonctionnement d'actionneur de lorentz

Also Published As

Publication number Publication date
WO2025190816A1 (fr) 2025-09-18

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