WO2025190816A1 - Moteur à aimant permanent de type lorentz en 3d - Google Patents

Moteur à aimant permanent de type lorentz en 3d

Info

Publication number
WO2025190816A1
WO2025190816A1 PCT/EP2025/056335 EP2025056335W WO2025190816A1 WO 2025190816 A1 WO2025190816 A1 WO 2025190816A1 EP 2025056335 W EP2025056335 W EP 2025056335W WO 2025190816 A1 WO2025190816 A1 WO 2025190816A1
Authority
WO
WIPO (PCT)
Prior art keywords
coil
assembly
magnet
permanent magnet
coil assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/EP2025/056335
Other languages
English (en)
Inventor
Fidelus Adrianus Boon
Olof Martinus Josephus FISCHER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of WO2025190816A1 publication Critical patent/WO2025190816A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/035—DC motors; Unipolar motors
    • H02K41/0352—Unipolar motors
    • H02K41/0354—Lorentz force motors, e.g. voice coil motors
    • H02K41/0356—Lorentz force motors, e.g. voice coil motors moving along a straight path
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Definitions

  • the present invention relates to a Lorentz type permanent magnet motor capable of providing forces in two or more directions.
  • the present invention further relates to a positioning system for positioning a movable object, a lithographic tool and a method of exerting a force and/or a torque on a movable object.
  • a lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate.
  • a lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • a lithographic apparatus may, for example, project a pattern (also often referred to as “design layout” or “design”) of a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer).
  • a lithographic apparatus may use electromagnetic radiation.
  • the wavelength of this radiation determines the minimum size of features which are patterned on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm and 13.5 nm.
  • a lithographic apparatus which uses extreme ultraviolet (EUV) radiation, having a wavelength within a range of 4 nm to 20 nm, for example 6.7 nm or 13.5 nm, may be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm.
  • EUV extreme ultraviolet
  • motors such as planar motors are used to position the wafer and other movable objects.
  • Such motors can usually provide movement in one or two directions.
  • Such motors/actuators are usually of the Lorentz type. The forces that these motors generate can be divided into an in plane driving force (i.e.
  • planar motors comprise a coil assembly of multiple coils arranged side by side along a direction in the plane of the coils.
  • the motors also comprise a magnet assembly comprising multiple magnets, also arranged side by side along the same direction as the direction along which the coils are arranged side by side. It is this direction along which the motor can apply the in plane driving force.
  • the magnets have an alternating polarity, for example up-down-up-down or a Halbach array.
  • One of the magnet assembly and the coil assembly is connected to a substantially stationary environment while the other is connected to an object to be moved w.r.t. the substantially stationary environment.
  • planar motors can only generate force in one in plane direction (i.e. in the X, Y plane) and in the out of plane direction Z. Multiple motors are thus needed to allow force application in both in plane directions. This increases the room required and the mass of the motors.
  • a Lorentz type permanent magnet motor comprising: at least one coil assembly arranged in a coil plane defined by a first direction and a second direction perpendicular to the first direction, the at least one coil assembly having multiple coils, each coil comprising two or more main sections extending along the first direction and a turning section transitioning between two adjacent main sections, at least one magnet assembly arranged parallel and proximate to the at least one coil assembly, the at least one magnet assembly having a first magnet group comprising two or more primary magnets extending along the first direction, the two or more primary magnets being placed adjacent to each other along the second direction, the two or more primary magnets having alternating polarization directions, wherein: the at least one magnet assembly further comprises a second magnet group comprising two secondary magnets extending along the second direction, wherein a first secondary magnet is arranged on a first end of the first magnet group and a second secondary magnet is arranged on a second end of the first magnet group, wherein the second end of the
  • a positioning system for positioning a movable object comprising the permanent magnet motor according to any of claims 1 - 12, wherein one of the coil assembly and the magnet assembly is connected to the movable object and the other of the coil assembly and the magnet assembly is connected to an environment.
  • a lithographic tool for example a lithographic apparatus, comprising the positioning system according to claim 13.
  • a method of exerting a force and/or a torque on a movable object comprising: providing the permanent magnet motor according to any of claims 1 - 12, the positioning system according to claim 13 or the lithographic tool according to claim 14, connecting one of the coil assembly and the magnet assembly to the movable object and connecting the other of the coil assembly and the magnet assembly to an environment, preferably connecting the magnet assembly to the movable object and the coil assembly to the environment, providing an electric current to the coils of the coil assembly, wherein the electric current provided to each coil of the coil assembly is varied w.r.t.
  • At least one other coil of the coil assembly in order to exert a force or torque on the movable object by interaction of the coil assembly with the magnetic field generated by the magnet assembly, wherein the electric current provided to each coil is dependent on the position of said coil in the coil assembly and a position of the movable object when measured along the second direction.
  • a Lorentz type permanent magnet motor comprising: at least one coil assembly arranged in a coil plane defined by a first direction and a second direction perpendicular to the first direction, the at least one coil assembly having multiple coils, at least one magnet assembly arranged parallel and proximate to the at least one coil assembly, comprising two or more magnets extending along the first direction, the two or more primary magnets being placed adjacent to each other along the second direction, the two or more primary magnets having alternating polarization directions, wherein, the coil assembly comprises four or more even number of coils, each controllable for generating a first force in the second direction using a first current component and a second force in a third direction perpendicular to the first and the second direction using a second current component.
  • Figure 1 depicts a schematic overview of a lithographic apparatus
  • Figure 2 depicts a detailed view of a part of the lithographic apparatus of Figure 1 ;
  • Figure 3 schematically depicts a position control system
  • Figure 4 schematically depicts a side view of a prior art permanent magnet motor
  • Figure 5 schematically depicts a perspective view of the prior art permanent magnet motor of figure 4.
  • Figure 6 schematically depicts a perspective view of a first embodiment of a permanent magnet motor according to the invention
  • Figure 7 schematically depicts a perspective view of a second embodiment of a permanent magnet motor according to the invention.
  • Figure 8 schematically depicts a side view of the permanent magnet motor of figure 7 with some parts removed for clarity;
  • Figure 9 schematically depicts a Halbach array
  • Figure 10 schematically depicts a top view of a third embodiment of a permanent magnet motor according to the invention.
  • Figure 11 schematically depicts a perspective view of the permanent magnet motor of figure 10
  • Figure 12 schematically depicts a side view of a fourth embodiment of a permanent magnet motor according to the invention with some parts removed for clarity;
  • Figure 13 schematically depicts a side view of the permanent magnet motor of figure 12 from a different perspective than in figure 12;
  • Figure 14 schematically depicts a perspective view of a fifth embodiment of a permanent magnet motor according to the invention.
  • Figure 15 schematically depicts a top view of a sixth embodiment of a permanent magnet motor according to the invention.
  • Figure 16 schematically depicts a perspective view of another embodiment of a permanent magnet motor according to the invention.
  • Figure 17 schematically depicts a perspective view of yet another embodiment of a permanent magnet motor according to the invention.
  • Figure 18 and 19 schematically depict a top and a perspective view of yet another embodiment of a permanent magnet motor according to the invention.
  • Figure 20 and 21 schematically depict a side and a perspective view of yet another embodiment of a permanent magnet motor according to the invention.
  • Figure 22 schematically depicts a top view of yet another embodiment of a permanent magnet motor according to the invention.
  • the terms “radiation” and “beam” are used to encompass all types of electromagnetic radiation, including ultraviolet radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range of about 5-100 nm).
  • reticle may be broadly interpreted as referring to a generic patterning device that can be used to endow an incoming radiation beam with a patterned cross -section, corresponding to a pattern that is to be created in a target portion of the substrate.
  • the term “light valve” can also be used in this context.
  • examples of other such patterning devices include a programmable mirror array and a programmable LCD array.
  • FIG. 1 schematically depicts a lithographic apparatus LA.
  • the lithographic apparatus LA includes an illumination system (also referred to as illuminator) IL configured to condition a radiation beam B (e.g., UV radiation, DUV radiation or EUV radiation), a mask support (e.g., a mask table) MT constructed to support a patterning device (e.g., a mask) MA, and a positioning system 31 to position the patterning device MA and a substrate (e.g. a resist coated wafer) W.
  • the positioning system 31 comprises a first positioner PM and a second positioner PW.
  • the first positioner PM is configured to accurately position the patterning device MA in accordance with certain parameters.
  • the mask support MT is connected to the first positioner PM.
  • the second positioner PW is configured to accurately position the substrate support in accordance with certain parameters.
  • the second positioner PW is connected to a substrate support (e.g., a wafer table) WT constructed to hold the substrate W.
  • the lithographic apparatus LA further comprises a projection system (e.g., a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g., comprising one or more dies) of the substrate W.
  • a projection system e.g., a refractive projection lens system
  • the illumination system IL receives a radiation beam from a radiation source SO, e.g. via a beam delivery system BD.
  • the illumination system IL may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, and/or other types of optical components, or any combination thereof, for directing, shaping, and/or controlling radiation.
  • the illuminator IL may be used to condition the radiation beam B to have a desired spatial and angular intensity distribution in its cross section at a plane of the patterning device MA.
  • projection system PS used herein should be broadly interpreted as encompassing various types of projection system, including refractive, reflective, catadioptric, anamorphic, magnetic, electromagnetic and/or electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, and/or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may be considered as synonymous with the more general term “projection system” PS.
  • the lithographic apparatus LA may be of a type wherein at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e g , water, so as to fill a space between the projection system PS and the substrate W - which is also referred to as immersion lithography. More information on immersion techniques is given in US6952253, which is incorporated herein by reference.
  • the lithographic apparatus LA may also be of a type having two or more substrate supports WT (also named “dual stage”).
  • the substrate supports WT may be used in parallel, and/or steps in preparation of a subsequent exposure of the substrate W may be carried out on the substrate W located on one of the substrate support WT while another substrate W on the other substrate support WT is being used for exposing a pattern on the other substrate W.
  • the lithographic apparatus LA may comprise a measurement stage.
  • the measurement stage is arranged to hold a sensor and/or a cleaning device.
  • the sensor may be arranged to measure a property of the projection system PS or a property of the radiation beam B.
  • the measurement stage may hold multiple sensors.
  • the cleaning device may be arranged to clean part of the lithographic apparatus, for example a part of the projection system PS or a part of a system that provides the immersion liquid.
  • the measurement stage may move beneath the projection system PS when the substrate support WT is away from the projection system PS.
  • the radiation beam B is incident on the patterning device, e.g. mask, MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA. Having traversed the patterning device MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W. With the aid of the second positioner PW and a position measurement system PMS, the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at a focused and aligned position.
  • the patterning device e.g. mask, MA which is held on the mask support MT
  • the pattern (design layout) present on patterning device MA Having traversed the patterning device MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W.
  • the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation
  • the first positioner PM and possibly another position sensor may be used to accurately position the patterning device MA with respect to the path of the radiation beam B.
  • Patterning device MA and substrate W may be aligned using mask alignment marks Ml, M2 and substrate alignment marks Pl, P2.
  • the substrate alignment marks Pl, P2 as illustrated occupy dedicated target portions, they may be located in spaces between target portions.
  • Substrate alignment marks Pl, P2 are known as scribe-lane alignment marks when these are located between the target portions C.
  • a Cartesian coordinate system is used.
  • the Cartesian coordinate system has three axes, i.e., an x-axis, a y-axis and a z-axis.
  • Each of the three axes is orthogonal to the other two axes.
  • a rotation around the x-axis is referred to as an Rx-rotation.
  • a rotation around the y- axis is referred to as an Ry-rotation.
  • a rotation around about the z-axis is referred to as an Rz-rotation.
  • the x-axis and the y-axis define a horizontal plane, whereas the z-axis is in a vertical direction.
  • the Cartesian coordinate system is not limiting the invention and is used for clarification only. Instead, another coordinate system, such as a cylindrical coordinate system, may be used to clarify the invention.
  • the orientation of the Cartesian coordinate system may be different, for example, such that the z-axis has a component along the horizontal plane.
  • FIG. 2 shows a more detailed view of a part of the lithographic apparatus LA of Figure 1.
  • the lithographic apparatus LA may be provided with a base frame BF, a balance mass BM, a metrology frame MF and a vibration isolation system IS.
  • the metrology frame MF supports the projection system PS. Additionally, the metrology frame MF may support a part of the position measurement system PMS.
  • the metrology frame MF is supported by the base frame BF via the vibration isolation system IS.
  • the vibration isolation system IS is arranged to prevent or reduce vibrations from propagating from the base frame BF to the metrology frame MF.
  • the second positioner PW is arranged to accelerate the substrate support WT by providing a driving force between the substrate support WT and the balance mass BM.
  • the driving force accelerates the substrate support WT in a desired direction. Due to the conservation of momentum, the driving force is also applied to the balance mass BM with equal magnitude, but at a direction opposite to the desired direction.
  • the mass of the balance mass BM is significantly larger than the masses of the moving part of the second positioner PW and the substrate support WT.
  • the second positioner PW is supported by the balance mass BM.
  • the second positioner PW comprises a planar motor to levitate the substrate support WT above the balance mass BM.
  • the second positioner PW is supported by the base frame BF.
  • the second positioner PW comprises a linear motor and wherein the second positioner PW comprises a bearing, like a gas bearing, to levitate the substrate support WT above the base frame BF.
  • the position measurement system PMS may comprise any type of sensor that is suitable to determine a position of the substrate support WT.
  • the position measurement system PMS may comprise any type of sensor that is suitable to determine a position of the mask support MT.
  • the sensor may be an optical sensor such as an interferometer or an encoder.
  • the position measurement system PMS may comprise a combined system of an interferometer and an encoder.
  • the sensor may be another type of sensor, such as a magnetic sensor, a capacitive sensor or an inductive sensor.
  • the position measurement system PMS may determine the position relative to a reference, for example the metrology frame MF or the projection system PS.
  • the position measurement system PMS may determine the position of the substrate table WT and/or the mask support MT by measuring the position or by measuring a time derivative of the position, such as velocity or acceleration.
  • the position measurement system PMS may comprise an encoder system.
  • An encoder system is known from for example, United States patent application US2007/0058173A1, filed on September 7, 2006, hereby incorporated by reference.
  • the encoder system comprises an encoder head, a grating and a sensor.
  • the encoder system may receive a primary radiation beam and a secondary radiation beam. Both the primary radiation beam as well as the secondary radiation beam originate from the same radiation beam, i.e., the original radiation beam. At least one of the primary radiation beam and the secondary radiation beam is created by diffracting the original radiation beam with the grating.
  • the encoder system optically combines the primary radiation beam and the secondary radiation beam into a combined radiation beam.
  • a sensor in the encoder head determines a phase or phase difference of the combined radiation beam.
  • the sensor generates a signal based on the phase or phase difference.
  • the signal is representative of a position of the encoder head relative to the grating.
  • One of the encoder head and the grating may be arranged on the substrate structure WT.
  • the other of the encoder head and the grating may be arranged on the metrology frame MF or the base frame BF.
  • a plurality of encoder heads are arranged on the metrology frame MF, whereas a grating is arranged on a top surface of the substrate support WT.
  • a grating is arranged on a bottom surface of the substrate support WT, and an encoder head is arranged below the substrate support WT.
  • the position measurement system PMS may comprise an interferometer system.
  • An interferometer system is known from, for example, United States patent US6,020,964, filed on luly 13, 1998, hereby incorporated by reference.
  • the interferometer system may comprise a beam splitter, a mirror, a reference mirror and a sensor.
  • a beam of radiation is split by the beam splitter into a reference beam and a measurement beam.
  • the measurement beam propagates to the mirror and is reflected by the mirror back to the beam splitter.
  • the reference beam propagates to the reference mirror and is reflected by the reference mirror back to the beam splitter.
  • the measurement beam and the reference beam are combined into a combined radiation beam.
  • the combined radiation beam is incident on the sensor.
  • the sensor determines a phase or a frequency of the combined radiation beam.
  • the sensor generates a signal based on the phase or the frequency.
  • the signal is representative of a displacement of the mirror.
  • the mirror is connected to the substrate support WT.
  • the reference mirror may be connected to the metrology frame MF.
  • the measurement beam and the reference beam are combined into a combined radiation beam by an additional optical component instead of the beam splitter.
  • the first positioner PM may comprise a long-stroke module and a short-stroke module .
  • the short-stroke module is arranged to move the mask support MT relative to the long-stroke module with a high accuracy over a small range of movement.
  • the long-stroke module is arranged to move the shortstroke module relative to the projection system PS with a relatively low accuracy over a large range of movement.
  • the first positioner PM is able to move the mask support MT relative to the projection system PS with a high accuracy over a large range of movement.
  • the second positioner PW may comprise a long- stroke module and a short-stroke module.
  • the short-stroke module is arranged to move the substrate support WT relative to the long-stroke module with a high accuracy over a small range of movement.
  • the long-stroke module is arranged to move the short-stroke module relative to the projection system PS with a relatively low accuracy over a large range of movement.
  • the second positioner PW is able to move the substrate support WT relative to the projection system PS with a high accuracy over a large range of movement.
  • the first positioner PM and the second positioner PW each are provided with an actuator to move respectively the mask support MT and the substrate support WT.
  • the actuator comprises a planar actuator to provide a driving force along multiple axes.
  • the planar actuator may be arranged to move the substrate support WT in 6 degrees of freedom (i.e. move the substrate support WT along the three spatial axes and rotate the substrate support WT around the three spatial axes) .
  • the actuator may be an electro-magnetic actuator comprising at least one coil and at least one magnet.
  • the actuator is arranged to move the at least one coil relative to the at least one magnet by applying an electrical current to the at least one coil.
  • the actuator may be a moving-magnet type actuator, which has the at least one magnet coupled to the substrate support WT respectively to the mask support MT.
  • the actuator may be a moving -coil type actuator which has the at least one coil coupled to the substrate support WT respectively to the mask support MT.
  • the actuator may be a voice -coil actuator, a reluctance actuator, a Lorentz-actuator or a piezo-actuator, or any other suitable actuator.
  • the lithographic apparatus LA comprises a position control system PCS as schematically depicted in Figure 3.
  • the position control system PCS comprises a setpoint generator SP, a feedforward controller FF and a feedback controller FB.
  • the position control system PCS provides a drive signal to the actuator ACT.
  • the actuator ACT may be the actuator of the first positioner PM or the second positioner PW.
  • the actuator ACT drives the plant P, which may comprise the substrate support WT or the mask support MT.
  • An output of the plant P is a position quantity such as position or velocity or acceleration.
  • the position quantity is measured with the position measurement system PMS.
  • the position measurement system PMS generates a signal, which is a position signal representative of the position quantity of the plant P.
  • the setpoint generator SP generates a signal, which is a reference signal representative of a desired position quantity of the plant P.
  • the reference signal represents a desired trajectory of the substrate support WT.
  • a difference between the reference signal and the position signal forms an input for the feedback controller FB .
  • the feedback controller FB provides at least part of the drive signal for the actuator ACT.
  • the reference signal may form an input for the feedforward controller FF.
  • the feedforward controller FF provides at least part of the drive signal for the actuator ACT.
  • the feedforward FF may make use of information about dynamical characteristics of the plant P, such as mass, stiffness, resonance modes and eigenfrequencies.
  • Figure 4 schematically depicts a side view of a prior art permanent magnet motor 1.
  • Figure 5 schematically depicts this same permanent magnet motor 1 in a perspective view.
  • the permanent magnet motor 1 comprises two coil assemblies 3, i.e. a first coil assembly 27 and a second coil assembly 28, each having multiple coils 7. Systems with a single coil assembly 3 are also known.
  • the permanent magnet motor 1 further comprises a magnet assembly 10.
  • the coil assemblies 3 are each arranged in a coil plane 4 which is defined by the first direction 5 and the second direction 6, with the third direction 20 perpendicular to the coil plane 4.
  • the coil plane 4 is a plane which intersects each coil 7 of the coil assembly 3 at a same position relative to an axis of the coil 7.
  • Each coil 7 comprises two main sections 8 extending along the first direction 5 and two turning sections 9 transitioning between two adjacent main sections 8. This is more visible in e.g. figure 10. In figure 10, the turning sections 9 of the coils 7 are visible.
  • the magnet assembly 10 of the permanent magnet motor 1 is arranged parallel and proximate to the coil assemblies 3, such that the magnet assembly 10 also lies substantially parallel to the coil plane 4.
  • the magnet assembly 10 comprises a first magnet group 11 comprising multiple primary magnets 12 extending along the first direction 5.
  • the primary magnets 12 are placed adjacent to each other along the second direction 6 and have alternating polarization directions 13.
  • Each primary magnet 12 has an opposite polarization direction than the adjacent primary magnets 12.
  • Halbach arrays see also figure 9) or other types or magnet arrays with periodic polarization are also known to be used.
  • Figure 6 schematically depicts a perspective view of a first embodiment of a permanent magnet motor 1 according to the invention.
  • a second magnet group 14 comprising two secondary magnets 15 extending along the second direction 6.
  • a first secondary magnet 16 is arranged on a first end 17 of the first magnet group 11 and a second secondary magnet 18 is arranged on a second end 19 of the first magnet group 11.
  • the second end 19 of the first magnet group 11 is opposite to the first end 17 of the first magnet group 11 with respect to the first direction 5.
  • the secondary magnets 15 are arranged perpendicularly to the primary magnets 12 and they preferably extend along all primary magnets 12.
  • the secondary magnets 15 of the second magnet group 14 overlap with at least part of the turning sections 9 of the coil assemblies 3 seen from the third direction 20 which is perpendicular to the first direction 5, the second direction 6, and thus to the coil plane 4. This is better visible in e.g. figure 10.
  • the permanent magnet motor 1 of figure 6 also comprises two back irons 21 extending in a plane parallel to the coil plane 4.
  • the back irons 21 are arranged adjacent to the coil assemblies 3.
  • the back irons 21 may provide a return path for the magnetic flux, such that the magnetic field in the permanent magnet motor 1 may be strengthened.
  • the polarization directions 13 of the primary magnets 12 and of the secondary magnets 15 are oriented along the third direction 20 and each primary magnet 12 has an opposite polarization direction 13 than the adjacent primary magnets 12.
  • the primary magnets 12 may alternatively be arranged in a Halbach array (see figure 9).
  • the polarization direction 13 of the first secondary magnet 16 is opposite to the polarization direction 13 of the second secondary magnet 18.
  • the second magnet group 14 may allow the permanent magnet motor 1 to provide force not only in the second direction 6, like in prior art permanent magnet motors 1, but also in the first direction 5. Therefore, using multiple motors to allow force application in both in plane directions 5, 6 may no longer be needed, reducing the bulk, weight and complexity of the permanent magnet motor 1.
  • the permanent magnet motor 1 may be controlled by controlling the current in each of the coils 7 in a three phase system using a current controller. The current in a coil 7 is dependent on at least the position of the coil 7 in the coil assembly and the position of the movable object 32 (e.g. a substrate support WT or a mask support MT, see fig.
  • i hab is the current through coil M
  • I is a common amplitude for all coils
  • y is the position of the movable object 32 in the second direction 6
  • s is the spatial period of the primary magnets 12 (i.e. the distance between two magnets 12 of the same polarity 13)
  • a is a phase angle.
  • the ratio of cs:s is 2:3, i.e. 3 coils 7 over a width of 4 primary magnets 12 (2 of each polarity 13) along the second direction 6 (see e.g. fig. 4), and a 3 phase system is used. If this ratio were e g. 2:5 (5 coils 7 over a width of 4 primary magnets 12), a 5 phase system would be used. If this ratio were e.g. 3:4 (4 coils 7 over a width of 6 primary magnets 12), a 4 phase system would be used, for 2:7, a seven phase system, etcetera.
  • the number of phases preferably equals the smallest integer number of coils that fits in a same width as an integer multiple of the spatial period of the primary magnets v
  • An upper coil part 29 and a lower coil part 30 have the same coil number n.
  • the phase angle is zero if the coils are not split into an upper coil part 29 and a lower coil part 30. If the coils are split into an upper coil part 29 and a lower coil part 30, the operator + represents an addition for the upper coil part 29 and a subtraction for the lower coil part 30.
  • the current in a coil 7 can be rewritten into two parts, one that determines the driving force exerted by the permanent magnet motor 1 on the movable object 32 with respect to the environment in the second direction 6, and another that determines the levitation force exerted by the permanent magnet motor 1 on the movable object 32 with respect to the environment in the third direction 20.
  • the lower coil part 30 repulses the primary magnets 12 of the first magnet group 11, while the upper coil part attracts the primary magnets 12 of the first magnet group 11. Therefore, the sign of the sine term of the upper coil part 29 is opposite to the sign of the sine term of lower coil part 30.
  • Permanent magnet motors 1 using the above control are known from prior art.
  • the secondary magnets 15 allow the permanent magnet motor 1 to exert a force on the movable object 32 with respect to the environment not only in the second direction 6 and the third direction 20, but also in the first direction 5. This may be done by adding a current component I x to each of the coil currents, such that:
  • I x When I x is the same for all coils 7 (but may be for example dependent on time or a position of the movable object 32), all coils are attracted by one of the secondary magnets 15 and repulsed by the other of the secondary magnets 15. This results in a force exerted on the movable object 32 with respect to the environment in the first direction 5.
  • I x may also be varied per coil 7 to achieve other objects. In general, if the distribution of I x over the coils 7 is symmetric with respect to the center of mass of the movable object 32, the permanent magnet motor 1 can exert a force in the first direction 5 on the movable object 32 with respect to the environment.
  • the permanent magnet motor can exert a torque on the movable object 32 around the third direction 20 with respect to the environment.
  • a permanent magnet motor 1 comprising at least two instances of each phase, wherein the coils 7 are split into at least two coil groups 41, 42 such that each coil group 41, 42 comprises all phases (see fig. 15).
  • One I x may then be applied to the coils 7 of one group 41, 42 of coils 7, while another I x (for example -I x ) may be applied to the coils 7 of another group 41, 42 of coils 7. All coils 7 in each respective group 41, 42 then get the same /. as the other coils 7 in said respective group 41, 42. This may prevent disturbances in a force exerted onto the movable object 32 by the permanent magnet motor 1 in the second direction 6. This is discussed in more detail in relation to figure 15.
  • the permanent magnet motor 1 comprises a magnet assembly 10 arranged between two coil assemblies 3, a first coil assembly 27 and a second coil assembly 28.
  • Figure 7 schematically depicts a perspective view of a second embodiment of a permanent magnet motor 1 according to the invention, comprising one coil assembly 3 arranged between two magnet assemblies 10, a first magnet assembly 23 and a second magnet assembly 24.
  • the permanent magnet motor 1 can be integrated into a positioning system 31, for example a positioning system 31 of a lithographic apparatus LA or another lithographic tool (see figure 1).
  • a positioning system 31 one of the coil assembly 3 and the magnet assembly 10 is connected to a movable object 32 such as a substrate support WT or a mask support MT.
  • the other of the of the coil assembly 3 and the magnet assembly 10 is connected to a substantially stationary environment.
  • the permanent magnet motor 1 then can exert a force and/or torque on the movable object 32 with respect to the substantially stationary environment.
  • the magnet assembly 10 is connected to the movable object 32 while the coil assemblies 3 are connected to a substantially stationary environment.
  • Such an embodiment is called a moving magnet motor.
  • the coil assembly 3 is connected to the movable object 32 while the magnet assemblies 10 are connected to a substantially stationary environment.
  • a moving coil motor preferably the coil assembly 3 is connected to the movable object 32 while the magnet assemblies 10 are connected to a substantially stationary environment.
  • a moving coil motor or a moving magnet motor is preferred depends on the specific application.
  • An advantage of a moving magnet motor may be that the magnets do not need to be connected to any cables or wires for power and cooling. This can reduce the weight and bulk of the moving parts, reducing reaction forces and reaction torques when operating the permanent magnet motor 1. However, in some applications it may be beneficial to use a moving coil motor instead, if it turns out that leads to lighter moving parts due to other design parameters.
  • the positioning system 31 may be reduced. This may allow a more compact construction of the lithographic apparatus LA and/or may allow more room in the lithographic apparatus LA for other device parts. Furthermore, the reduced weight may allow faster accelerations of the movable object 32 and/or less vibrations, yielding a higher production throughput and/or higher accuracy and/or reduced wear of the lithographic apparatus LA.
  • Both the first embodiment of the permanent magnet motor 1 as shown in figure 6 and second embodiment of the permanent magnet motor 1 as shown in figure 7 comprise two back irons 21 , a first back iron 25 and a second back iron 26.
  • the first back iron 25 is arranged adjacent to the first coil assembly 27 and the second back iron 26 arranged adjacent to the second coil assembly 28.
  • the coils 7 of the first coil assembly 27 are arranged between the magnet assembly 10 and the first back iron 25, whereas coils 7 of the second coil assembly 28 are arranged between the magnet assembly 10 and the second back iron 26.
  • the first back iron 25 is arranged adjacent to the first magnet assembly 23 and the second back iron 26 is arranged adjacent to the second magnet assembly 24.
  • the first magnet group 11 and the second magnet group 14 of the first magnet assembly 23 are arranged between the coil assembly 3 and the first back iron 25, whereas the first magnet group 11 and the second magnet group 14 of the second magnet assembly 24 are arranged between the coil assembly 3 and the second back iron 26.
  • FIG 8 schematically depicts a side view of the permanent magnet motor of figure 7 with the second magnet group 14 removed for clarity.
  • the permanent magnet motor 1 is seen from the first direction 5.
  • Each coil 7 is split in a middle of said coil 7 along a split plane 44 parallel to the coil plane 4 into an upper coil part 29 and a lower coil part 30.
  • a torque can be exerted on the movable object 32 with respect to the environment by varying the current in the upper coil part 29 in relation to the lower coil part 30 of each coil 7 or a subset of the coils 7.
  • a torque can be generated around the first direction by applying a current which causes the upper coil parts 29 to be pulled in the opposite direction along the second direction 6 than the lower coil ( / Tl — 1 ⁇ ⁇
  • the cosine term has a minus instead of a plus. This way, no net force is exerted in the second direction 6, but a torque is exerted around the first direction 5, as the upper coil part 29 is pulled along the second direction 6 with a force which is equal in magnitude but opposite in sign as a force with which the associated lower coil part 30 is pulled along the second direction 6. Thus, the forces along the second direction 6 are canceled while a torque is generated around the first direction 5.
  • a torque can be generated around the second direction by applying a current which causes the upper coil parts 29 to be pulled in the opposite direction along the first direction 5 than the lower coil parts 30.
  • I x is modified for related upper coil parts 29 and lower coil parts 30. For example:
  • a torque can be exerted on the movable object 32 with respect to the environment around the second direction while a force is exerted in the first direction:
  • FIG 10 schematically depicts a top view of a third embodiment of a permanent magnet motor 1 according to the invention.
  • the permanent magnet motor 1 is seen from the third direction 20.
  • Figure 11 schematically depicts a perspective view of the permanent magnet motor 1 of figure 10.
  • the permanent magnet motor 1 comprises exactly one coil assembly 3 and exactly one magnet assembly 10.
  • a back iron 21 is arranged adjacent to either the coil assembly 3 or the magnet assembly 10.
  • the back iron is arranged adjacent to the magnet assembly 10, such that the magnet assembly 10 is arranged between the coil assembly 3 and the back iron 21.
  • the back iron 21 is arranged adjacent to the coil assembly 3 is arranged between the magnet assembly 10 and the back iron 21.
  • the back iron 21 may also be omitted.
  • This variant can be seen as a ‘half motor’ variant, seeing that the moving part of the motor is not enclosed by two stationary parts or vice versa.
  • Figure 12 schematically depicts a side view of a fourth embodiment of a permanent magnet motor 1 according to the invention with the second magnet group 14 removed for clarity.
  • Figure 13 schematically depicts the same permanent magnet motor 1 as figure 12 from a different perspective, showing also the second magnet group 14 comprising the first secondary magnet 16 and the second secondary magnet 18.
  • the permanent magnet motor 1 is seen from the first direction, whereas in figure 13 , the permanent magnet motor 1 is seen from the second direction 6.
  • the permanent magnet motor 1 according to the fourth embodiment is similar to the permanent magnet motor 1 according to the third embodiment as shown in figures 10 and 11 , in the sense that it is also a half motor design.
  • One difference is that it comprises not one back iron 21 but two back irons 21 and in that in the third embodiment.
  • the back iron is arranged adjacent to the magnet assembly 10
  • the fourth embodiment of the permanent magnet motor 1 according to the invention shown in figures 12 and 13 one of the back irons 21 is arranged adjacent to the coil assembly 3 and the other of the back irons 21 is arranged on the other side of the permanent magnet motor 1.
  • the permanent magnet motor 1 may be preferred to use the permanent magnet motor 1 according to the third embodiment as shown in figures 10 and 11 as a moving coil motor, wherein the coil assembly 3 is connected to the movable object 32 such as the substrate support WT or the mask support MT and the magnet assembly 10 is connected to the substantially stationary environment.
  • the permanent magnet motor 1 according to the fourth embodiment as shown in figures 12 and 13 as a moving magnet motor, wherein the magnet assembly 10 is connected to the movable object 32 such as the substrate support WT or the mask support MT and the coil assembly 3 and the back irons 21 are connected to the substantially stationary environment.
  • Figure 14 schematically depicts a perspective view of a fifth embodiment of a permanent magnet motor 1 according to the invention. This embodiment is similar to the fourth embodiment as shown in figures 12 and 13 , with the difference that it has no back irons 21. This may further reduce the bulk and weight of the permanent magnet motor 1.
  • FIG 15 schematically depicts a perspective view of a sixth embodiment of a permanent magnet motor 1 according to the invention.
  • This embodiment is similar to the fifth embodiment as shown in figure 14, with the difference that it has more coils 7 and more primary magnets 12.
  • the coils 7 are split in a first coil group 41 and a second coil group 42.
  • the first coil group 41 and the second coil group 42 are arranged on opposite sides of a line 43 extending in the first direction 5.
  • Providing a different current to the coils 7 of the first coil group 41 as compared to the coils 7 of the second coil group 42 allows exerting a torque on the movable object 32 around the third direction 20.
  • providing a second current component to the first coil group 41 and providing the negative of the second current component to the second coil group 42 may allow exerting a torque around the third direction 20 on the movable object 32, potentially without exerting a further linear force on the movable object 32.
  • one of the first coil group 41 and the second coil group 42 will be forced upwards (i.e. attracted to the first secondary magnet 16 and repulsed by the second secondary magnet 18) with respect to the magnet assembly 10 and the other of the first coil group 41 and the second coil group 42 will be forced downwards (i.e. attracted to the second secondary magnet 18 and repulsed by the first secondary magnet 16) with respect to the magnet assembly 10 in figure 15.
  • FIG 15 shows another embodiment of the permanent magnet motor 1 according to the invention, wherein the coil assembly comprises two coil groups 41 and 42. Due to the interaction of the secondary magnets with the electric currents in each coil, especially i y , an undesired parasitic moment may be generated around the third direction 20 on the movable object.
  • a second current component +I X to the coils of the first coil group 41, and the negative of the second current component -I x to the coils of the second coil group 42, potentially without exerting a further linear force on the movable object.
  • I x may be selected to have a magnitude dependent on i y and the physical dimensions of the coils, for example the coil widths and spaces along the second direction 6, and to have a phase offset with respect to i y .
  • the second current component may be provided to the leftmost coil only, whereas the negative of the second current component may be provided to the rightmost coil only.
  • the first coil group 41 comprises only the leftmost coil 7 and the second coil group 42 comprises only the rightmost coil 7.
  • Figures 16 and 17 schematically show yet another embodiment of the permanent magnet motor 1 according to the invention, wherein the coil assembly 3 comprises four coils 9. Due to the interaction of the primary magnets with the electric currents in each coil, especially z z , an undesired parasitic moment may be generated around the first direction 5 on the movable object.
  • Figure 16 is similar to the design of Figure 7 and 8 wherein the coil assembly is between two magnet assemblies 10 and
  • Figure 17 is similar to the “half motor” design of Figure 10 and 11 comprising exactly one coil assembly and exactly one magnet assembly.
  • the current phase difference between adjacent coils may be
  • R2 is the distance from the center of the two inner coils to the center of the coil assembly
  • R1 is the distance from the center of the two outer coils to the center of the coil assembly.
  • FIG. 18 and Figure 19 show yet another embodiment of a permanent magnet motor 1 according to the invention.
  • the permanent magnet motor 1 comprise a coil assembly 3 arranged in a coil plane defined by a first direction 5 and a second direction 6 perpendicular to the first direction, the coil assembly 3 having multiple coils 9.
  • the permanent magnet motor 1 further comprises a magnet assembly 10 arranged parallel and proximate to the coil assembly, comprising two or more magnets extending along the first direction, the two or more magnets being placed adjacent to each other along the second direction 6, the two or more primary magnets having alternating polarization directions.
  • the coil assembly 3 comprises four or more even number of adjacent coils 9, each controllable for generating a first force in the second direction 6 using a first current component and a second force in a third direction 20 perpendicular to the first and the second direction using a second current component. Similar to the previous embodiment, when the second current components
  • Figure 18 and Figure 19 show the embodiment according to a “half motor” design comprising exactly one coil assembly and exactly one magnet assembly. While in Figure 20 and 21, another embodiment is shown having a coil assembly 3 between two magnet assemblies 10. In this embodiment, each coil is split in a middle of said coil along a split plane 44 parallel to the coil plane 4 into an upper coil part 29 and a lower coil part 30, allowing to be separately controlled. Similarly, when the second current components of the coils are configured as
  • the undesired parasitic moment generated on the movable object due to i zn around the first direction 5 may be at least partly compensated or cancelled.
  • Figure 18 and 19 is showing a moving coil motor configuration, and it should be understood that a moving magnet motor would work similarly.
  • two or more of the permanent magnet motor designs in the embodiments can be combined to achieve more flexibilities in actuating the movable object. For example in an embodiment as shown in Figure 22, four such motors, Motor 1, 2, 3, 4, are disposed as a 2-by-2 matrix.
  • linear forces in the first, second, third direction and torques around the first, second, third directions may be generated, and moments around the directions may be at least partly compensated or cancelled. It should be understood that the design of each of the motors, the number of motors combined, and the manner of disposing the motors may be chosen otherwise for intended purposes and applications.
  • Embodiments of the invention may form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device). These apparatus may be generally referred to as lithographic tools. Such a lithographic tool may use vacuum conditions or ambient (non-vacuum) conditions.
  • a Lorentz type permanent magnet motor comprising: at least one coil assembly arranged in a coil plane defined by a first direction and a second direction perpendicular to the first direction, the at least one coil assembly having multiple coils, each coil comprising two or more main sections extending along the first direction and a turning section transitioning between two adjacent main sections, at least one magnet assembly arranged parallel and proximate to the at least one coil assembly, the at least one magnet assembly having a first magnet group comprising two or more primary magnets extending along the first direction, the two or more primary magnets being placed adjacent to each other along the second direction, the two or more primary magnets having alternating polarization directions, wherein: the at least one magnet assembly further comprises a second magnet group comprising two secondary magnets extending along the second direction, wherein a first secondary magnet is arranged on a first end of the first magnet group and a second secondary magnet is arranged on a second end of the first magnet group, wherein the second end of the first magnet group is opposite to the first end of the first magnet group with
  • the permanent magnet motor comprises a first back iron arranged adjacent to the first magnet assembly and a second back iron arranged adjacent to the second magnet assembly, the first magnet group and the second magnet group of the first magnet assembly are arranged between the coil assembly and the first back iron, the first magnet group and the second magnet group of the second magnet assembly are arranged between the coil assembly and the second back iron.
  • the permanent magnet motor comprises a first back iron arranged adjacent to the first coil assembly and a second back iron arranged adjacent to the second coil assembly, at least one coil of the first coil assembly is arranged between the magnet assembly and the first back iron, at least one coil of the second coil assembly is arranged between the magnet assembly and the second back iron.
  • each coil is split in a middle of said coil along a split plane parallel to the coil plane into an upper coil part and a lower coil part.
  • a positioning system for positioning a movable object comprising the permanent magnet motor according to any of clauses 1 - 13, wherein one of the coil assembly and the magnet assembly is connected to the movable object and the other of the coil assembly and the magnet assembly is connected to an environment.
  • a lithographic tool for example a lithographic apparatus, comprising the positioning system according to clause 14.
  • a method of exerting a force and/or a torque on a movable object comprising: providing the permanent magnet motor according to any of clauses 1 - 13, the positioning system according to clause 14 or the lithographic tool according to clause 15, connecting one of the coil assembly and the magnet assembly to the movable object and connecting the other of the coil assembly and the magnet assembly to an environment, preferably connecting the magnet assembly to the movable object and the coil assembly to the environment, providing an electric current to the coils of the coil assembly, wherein the electric current provided to each coil of the coil assembly is varied w.r.t.
  • the electric current provided to each coil is dependent on the position of said coil in the coil assembly and a position of the movable object when measured along the second direction.
  • the electric current provided to each coil of the coil assembly includes a first current component equal for each coil of the coil assembly, in order to exert a force on the movable object in the first direction.
  • each coil is split in a middle of said coil along a split plane parallel to the coil plane into an upper coil part and a lower coil part
  • the method comprising controlling a relation between a current provided to each upper coil part as compared to a current provided to its corresponding lower coil part in order to: exert a torque on the movable object around the first direction, and/or exert a torque on the movable object around the second direction.
  • a Lorentz type permanent magnet motor comprising: at least one coil assembly arranged in a coil plane defined by a first direction and a second direction perpendicular to the first direction, the at least one coil assembly having multiple coils, at least one magnet assembly arranged parallel and proximate to the at least one coil assembly, comprising two or more magnets extending along the first direction, the two or more primary magnets being placed adj acent to each other along the second direction, the two or more primary magnets having alternating polarization directions, wherein, the coil assembly comprises four or more even number of coils, each controllable for generating a first force in the second direction using a first current component and a second force in a third direction perpendicular to the first and the second direction using a second current component.
  • the permanent magnet motor according to clause 20, comprising exactly one coil assembly and exactly one magnet assembly, wherein: the magnet assembly is arranged between the coil assembly and the back iron, wherein the back iron is arranged adjacent to the magnet assembly, or the coil assembly is arranged between the magnet assembly and the back iron, wherein the back iron is arranged adjacent to the coil assembly.
  • each coil is split in a middle of said coil along a split plane parallel to the coil plane into an upper coil part and a lower coil part.
  • a lithographic tool for example a lithographic apparatus, comprising the permanent magnet motor according to any of clauses 20 - 25.
  • a method of exerting on a movable object a first force in a second direction and a second force in a third direction perpendicular to the first and a second direction comprising: providing the permanent magnet motor according to any of clauses 20 - 25, or the lithographic tool according to clause 26, connecting one of the coil assembly and the magnet assembly to the movable object and connecting the other of the coil assembly and the magnet assembly to an environment, providing to each coil of the coil assembly a first current component for generating a first force in the second direction, and a second current component for generating a second force in the third direction, wherein the second current components of at least two of the coils have different amplitudes for at least partly compensating or cancelling a parasitic moment around the first direction.
  • the amplitudes have a linear relationship dependent on the dimensions of the coil assembly.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Permanent Field Magnets Of Synchronous Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un moteur à aimant permanent de type Lorentz comprenant un moteur à aimant permanent, comprenant au moins un ensemble bobine et au moins un ensemble aimant. Ledit ensemble aimant comprend un premier groupe d'aimants comprenant deux aimants primaires ou plus s'étendant selon une première direction et un second groupe d'aimants comprenant deux aimants secondaires s'étendant selon une deuxième direction qui est perpendiculaire à la première direction. Les deux aimants primaires ou plus sont placés adjacents l'un à l'autre selon la deuxième direction et ont des directions de polarisation alternées. Un aimant secondaire est disposé sur chaque extrémité par rapport à la première direction du premier groupe d'aimants. Les aimants secondaires du second groupe d'aimants chevauchent au moins une partie d'une section de rotation dudit ensemble bobine vu depuis une troisième direction qui est perpendiculaire à la première direction et à la deuxième direction.
PCT/EP2025/056335 2024-03-15 2025-03-07 Moteur à aimant permanent de type lorentz en 3d Pending WO2025190816A1 (fr)

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Application Number Priority Date Filing Date Title
EP24163768.5 2024-03-15
EP24163768 2024-03-15

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060232142A1 (en) * 2004-09-08 2006-10-19 Nikon Corporation Split Coil Linear Motor for Z Force
US20070058173A1 (en) 2005-09-12 2007-03-15 Wolfgang Holzapfel Position-measuring device
JP4314555B2 (ja) * 2002-12-03 2009-08-19 株式会社ニコン リニアモータ装置、ステージ装置、及び露光装置
US20170199469A1 (en) * 2014-07-11 2017-07-13 Asml Netherlands B.V. Actuator, positioning device, lithographic apparatus, and method for manufacturing an actuator
US20180224756A1 (en) 2015-08-27 2018-08-09 Asml Netherlands B.V. Lorentz actuator, object positioning system, lithographic apparatus and lorentz actuator operating method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4314555B2 (ja) * 2002-12-03 2009-08-19 株式会社ニコン リニアモータ装置、ステージ装置、及び露光装置
US20060232142A1 (en) * 2004-09-08 2006-10-19 Nikon Corporation Split Coil Linear Motor for Z Force
US20070058173A1 (en) 2005-09-12 2007-03-15 Wolfgang Holzapfel Position-measuring device
US20170199469A1 (en) * 2014-07-11 2017-07-13 Asml Netherlands B.V. Actuator, positioning device, lithographic apparatus, and method for manufacturing an actuator
US20180224756A1 (en) 2015-08-27 2018-08-09 Asml Netherlands B.V. Lorentz actuator, object positioning system, lithographic apparatus and lorentz actuator operating method

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