TW367536B - Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma - Google Patents

Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma

Info

Publication number: TW367536B
Authority: TW; Taiwan
Prior art keywords: surface treatment; workpiece; plasma; damage; employ
Prior art date: 1995-11-07

Application number

TW085115628A

Other languages

English (en)

Chinese (zh)

Inventor

Takuya Miyakawa

Takujji Tsutsui

Yoshiaki Mori

Original Assignee

Seiko Epson Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1995-11-07

Filing date

1996-12-18

Publication date

1999-08-21

1996-12-18 Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp

1999-08-21 Application granted granted Critical

1999-08-21 Publication of TW367536B publication Critical patent/TW367536B/zh

Links

238000004381 surface treatment Methods 0.000 title abstract 4
238000000034 method Methods 0.000 title abstract 3
239000007789 gas Substances 0.000 abstract 3
239000000463 material Substances 0.000 abstract 2
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract 1
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
239000002131 composite material Substances 0.000 abstract 1
238000000354 decomposition reaction Methods 0.000 abstract 1
229910052731 fluorine Inorganic materials 0.000 abstract 1
239000011737 fluorine Substances 0.000 abstract 1
150000004820 halides Chemical group 0.000 abstract 1
229910052736 halogen Inorganic materials 0.000 abstract 1
150000002367 halogens Chemical class 0.000 abstract 1
239000001307 helium Substances 0.000 abstract 1
229910052734 helium Inorganic materials 0.000 abstract 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract 1
229910000039 hydrogen halide Inorganic materials 0.000 abstract 1
239000012433 hydrogen halide Substances 0.000 abstract 1
229910000679 solder Inorganic materials 0.000 abstract 1
TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 abstract 1

Landscapes

ing And Chemical Polishing (AREA)
Cleaning Or Drying Semiconductors (AREA)
Physical Or Chemical Processes And Apparatus (AREA)
Electric Connection Of Electric Components To Printed Circuits (AREA)
Drying Of Semiconductors (AREA)

TW085115628A 1995-11-07 1996-12-18 Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma TW367536B (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP32814595		1995-11-07
JP30254096A JP3796857B2 (ja)	1995-11-07	1996-10-28	表面処理方法及びその装置

Publications (1)

Publication Number	Publication Date
TW367536B true TW367536B (en)	1999-08-21

Family

ID=26563154

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW085115628A TW367536B (en)	1995-11-07	1996-12-18	Surface treatment method the apparatus thereof for changing the surface properties of the object without damage by plasma

Country Status (3)

Country	Link
JP (1)	JP3796857B2 (ja)
SG (1)	SG43457A1 (ja)
TW (1)	TW367536B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP1043766A4 (en) *	1998-09-17	2001-12-19	Tamura Seisakusho Kk	BUMPER PRODUCTION METHOD, METHOD AND DEVICE FOR SOLDER PROCESSING AND METHOD AND DEVICE FOR SOLDERING
JP2004006511A (ja) *	2002-05-31	2004-01-08	Toppan Printing Co Ltd	プラズマ処理装置
EP1731480B1 (en) *	2004-03-31	2018-05-23	Kanto Denka Kogyo Co., Ltd.	Method for producing f2-containing gas and method for modifying article surface
JP5679139B2 (ja) *	2008-03-06	2015-03-04	東洋炭素株式会社	表面処理装置
JP6138441B2 (ja) *	2011-09-21	2017-05-31	株式会社Ｎｂｃメッシュテック	浮遊ウイルス除去ユニット
JP7773277B2 (ja) *	2021-04-14	2025-11-19	東京エレクトロン株式会社	基板処理方法

1996
- 1996-10-28 JP JP30254096A patent/JP3796857B2/ja not_active Expired - Lifetime
- 1996-12-18 TW TW085115628A patent/TW367536B/zh not_active IP Right Cessation
- 1996-12-24 SG SG1996011908A patent/SG43457A1/en unknown

Also Published As

Publication number	Publication date
JPH09205272A (ja)	1997-08-05
SG43457A1 (en)	1997-10-17
JP3796857B2 (ja)	2006-07-12

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Legal Events

Date	Code	Title	Description
2017-02-01	MK4A	Expiration of patent term of an invention patent