TWI297762B - - Google Patents

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Info

Publication number: TWI297762B
Authority: TW; Taiwan
Prior art keywords: fluid; heating device; tube; heat source; fluid heating
Prior art date: 2005-07-08

Application number

TW095124856A

Other languages

English (en)

Chinese (zh)

Other versions

TW200716923A (en

Inventor

Yuji Kamikawa

Mikio Nakashima

Osamu Tsuda

Original Assignee

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-07-08

Filing date

2006-07-07

Publication date

2008-06-11

2006-07-07 Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd

2007-05-01 Publication of TW200716923A publication Critical patent/TW200716923A/zh

2008-06-11 Application granted granted Critical

2008-06-11 Publication of TWI297762B publication Critical patent/TWI297762B/zh

Links

239000012530 fluid Substances 0.000 claims description 97
238000010438 heat treatment Methods 0.000 claims description 63
239000003973 paint Substances 0.000 claims description 31
229910052736 halogen Inorganic materials 0.000 claims description 23
150000002367 halogens Chemical class 0.000 claims description 23
230000005855 radiation Effects 0.000 claims description 13
229910052751 metal Inorganic materials 0.000 claims description 10
239000002184 metal Substances 0.000 claims description 10
230000001105 regulatory effect Effects 0.000 claims description 6
239000000126 substance Substances 0.000 claims description 6
239000011261 inert gas Substances 0.000 claims description 5
239000011248 coating agent Substances 0.000 claims description 3
238000000576 coating method Methods 0.000 claims description 3
230000031700 light absorption Effects 0.000 claims description 3
239000003960 organic solvent Substances 0.000 claims description 3
239000012774 insulation material Substances 0.000 claims 1
238000004140 cleaning Methods 0.000 description 25
239000007788 liquid Substances 0.000 description 25
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 15
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 13
235000012431 wafers Nutrition 0.000 description 10
238000000034 method Methods 0.000 description 8
238000005406 washing Methods 0.000 description 7
229910052757 nitrogen Inorganic materials 0.000 description 6
229910001220 stainless steel Inorganic materials 0.000 description 6
239000010935 stainless steel Substances 0.000 description 6
229920003002 synthetic resin Polymers 0.000 description 6
239000000057 synthetic resin Substances 0.000 description 6
238000001035 drying Methods 0.000 description 5
229940058401 polytetrafluoroethylene Drugs 0.000 description 5
229920001343 polytetrafluoroethylene Polymers 0.000 description 5
239000004810 polytetrafluoroethylene Substances 0.000 description 5
239000010453 quartz Substances 0.000 description 5
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
239000000463 material Substances 0.000 description 4
239000004065 semiconductor Substances 0.000 description 4
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
229910001873 dinitrogen Inorganic materials 0.000 description 3
239000007789 gas Substances 0.000 description 3
239000011810 insulating material Substances 0.000 description 3
-1 polytetrafluoroethylene Polymers 0.000 description 3
229910052782 aluminium Inorganic materials 0.000 description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
230000000694 effects Effects 0.000 description 2
230000002093 peripheral effect Effects 0.000 description 2
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
239000005977 Ethylene Substances 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
229910052770 Uranium Inorganic materials 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
230000001276 controlling effect Effects 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
238000001514 detection method Methods 0.000 description 1
229940079593 drug Drugs 0.000 description 1
239000003814 drug Substances 0.000 description 1
229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
210000002784 stomach Anatomy 0.000 description 1
239000000758 substrate Substances 0.000 description 1
JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
238000009834 vaporization Methods 0.000 description 1
230000008016 vaporization Effects 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D7/00—Heat-exchange apparatus having stationary tubular conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
- F28D7/10—Heat-exchange apparatus having stationary tubular conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall the conduits being arranged one within the other, e.g. concentrically
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
- F24H1/00—Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters
- F24H1/10—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium
- F24H1/101—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium using electric energy supply
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24H—FLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
- F24H1/00—Water heaters, e.g. boilers, continuous-flow heaters or water-storage heaters
- F24H1/10—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium
- F24H1/12—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium
- F24H1/14—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium by tubes, e.g. bent in serpentine form
- F24H1/16—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium by tubes, e.g. bent in serpentine form helically or spirally coiled
- F24H1/162—Continuous-flow heaters, i.e. heaters in which heat is generated only while the water is flowing, e.g. with direct contact of the water with the heating medium in which the water is kept separate from the heating medium by tubes, e.g. bent in serpentine form helically or spirally coiled using electrical energy supply
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D7/00—Heat-exchange apparatus having stationary tubular conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D7/00—Heat-exchange apparatus having stationary tubular conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
- F28D7/02—Heat-exchange apparatus having stationary tubular conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall the conduits being helically coiled
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F2245/00—Coatings; Surface treatments
- F28F2245/06—Coatings; Surface treatments having particular radiating, reflecting or absorbing features, e.g. for improving heat transfer by radiation

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Thermal Sciences (AREA)
Mechanical Engineering (AREA)
General Engineering & Computer Science (AREA)
Chemical & Material Sciences (AREA)
Combustion & Propulsion (AREA)
Instantaneous Water Boilers, Portable Hot-Water Supply Apparatuses, And Control Of Portable Hot-Water Supply Apparatuses (AREA)
Cleaning Or Drying Semiconductors (AREA)
Resistance Heating (AREA)
Weting (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

TW095124856A 2005-07-08 2006-07-07 Fluid heating apparatus TW200716923A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2005199899A JP4743495B2 (ja)	2005-07-08	2005-07-08	流体加熱装置

Publications (2)

Publication Number	Publication Date
TW200716923A TW200716923A (en)	2007-05-01
TWI297762B true TWI297762B (fr)	2008-06-11

Family

ID=37124282

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW095124856A TW200716923A (en)	2005-07-08	2006-07-07	Fluid heating apparatus

Country Status (6)

Country	Link
US (1)	US7593625B2 (fr)
EP (1)	EP1741995A3 (fr)
JP (1)	JP4743495B2 (fr)
KR (1)	KR101123994B1 (fr)
CN (1)	CN100554760C (fr)
TW (1)	TW200716923A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI422267B (zh) *	2010-09-13	2014-01-01	東京威力科創股份有限公司	And a liquid heating unit including the liquid processing device and the liquid treatment method

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2008244318A (ja) *	2007-03-28	2008-10-09	Tokyo Electron Ltd	基板搬送部材の洗浄方法、基板搬送装置及び基板処理システム
ITVE20080012U1 (it) *	2008-04-24	2009-10-24	D H E S R L	Scambiatore di calore per fluidi.
JP5184631B2 (ja) *	2008-06-02	2013-04-17	東京エレクトロン株式会社	流体加熱器、その製造方法、流体加熱器を備えた基板処理装置および基板処理方法
JP5138515B2 (ja)	2008-09-05	2013-02-06	東京エレクトロン株式会社	蒸気発生器、蒸気発生方法および基板処理装置
JP5415797B2 (ja) *	2009-03-24	2014-02-12	株式会社Ｋｅｌｋ	流体加熱装置
JP2011075145A (ja) *	2009-09-29	2011-04-14	Fuji Heavy Ind Ltd	流体加熱装置およびこれを用いた循環式加熱処理システム
DE102010011702A1 (de)	2010-03-10	2011-09-15	E.G.O. Elektro-Gerätebau GmbH	Einrichtung zum Erhitzen von Wasser bzw. Dampf
CN201839457U (zh) *	2010-05-24	2011-05-18	小田(中山)实业有限公司	发热器以及即热式电热水机
KR101036509B1 (ko) *	2010-09-30	2011-05-24	정광호	탄소히터를 이용한 온수생성장치
JP2012087983A (ja) *	2010-10-19	2012-05-10	Tokyo Electron Ltd	流体加熱装置及び基板処理装置
JP2012189385A (ja) *	2011-03-09	2012-10-04	Fujifilm Corp	放射線画像検出装置の保守方法
DE102011013810B4 (de) *	2011-03-14	2022-03-03	Stiebel Eltron Gmbh & Co. Kg	Elektronisch geregelter Durchlauferhitzer und Verfahren zum Betrieb eines elektronisch geregelten Durchlauferhitzers
US10222091B2 (en)	2012-07-17	2019-03-05	Eemax, Inc.	Next generation modular heating system
US9140466B2 (en)	2012-07-17	2015-09-22	Eemax, Inc.	Fluid heating system and instant fluid heating device
US9234674B2 (en) *	2012-12-21	2016-01-12	Eemax, Inc.	Next generation bare wire water heater
JP6244529B2 (ja) *	2013-03-05	2017-12-13	国立研究開発法人農業・食品産業技術総合研究機構	加熱媒体発生装置及び該加熱媒体発生装置を含む加熱処理装置
US10264629B2 (en) *	2013-05-30	2019-04-16	Osram Sylvania Inc.	Infrared heat lamp assembly
JP6021767B2 (ja) *	2013-09-04	2016-11-09	日本サーモスタット株式会社	液化ガス加温用ヒータ装置
KR101522714B1 (ko) *	2014-01-14	2015-06-17	주식회사 미니맥스	반도체 및 엘씨디 제조 설비용 감압 장치
US9451792B1 (en) *	2014-09-05	2016-09-27	Atmos Nation, LLC	Systems and methods for vaporizing assembly
AU2015364502B2 (en)	2014-12-17	2017-12-14	Rheem Manufacturing Company	Tankless electric water heater
EP3300102B1 (fr) *	2015-05-22	2019-04-17	FUJI Corporation	Dispositif de connexion de composants électroniques par application de pression et machine de montage de composants électroniques
CN106288332B (zh) *	2015-06-08	2019-03-22	福建斯狄渢电开水器有限公司	一种即热式加热器
TW201829961A (zh) *	2016-10-25	2018-08-16	伊馬德馬哈維利	蒸汽產生器及反應器
KR101837891B1 (ko) *	2017-02-22	2018-03-13	이우주	액체 순환형 이중관 램프
KR101846509B1 (ko) *	2017-03-29	2018-04-09	(주)앤피에스	열원 장치 및 이를 구비하는 기판 처리 장치
JP6961211B2 (ja) *	2017-07-20	2021-11-05	メトロ電気工業株式会社	流体加熱器
JP2020009628A (ja) *	2018-07-09	2020-01-16	有限会社フィンテック	光加熱式ヒータ
JP2020064764A (ja) *	2018-10-17	2020-04-23	シャープ株式会社	流体加熱装置、加熱調理器
JP7190888B2 (ja) *	2018-12-06	2022-12-16	東京エレクトロン株式会社	配管加熱装置及び基板処理装置
EP4066591A4 (fr) *	2019-11-26	2024-02-28	NxStage Medical, Inc.	Dispositifs de chauffage, procédés et systèmes
KR102089228B1 (ko) *	2019-12-05	2020-03-13	신영현	조명 온수기
US11705345B2 (en)	2020-04-30	2023-07-18	Edwards Vacuum Llc	Semiconductor system with steam generator and reactor
IT202200005471A1 (it) *	2022-03-21	2023-09-21	Rudi Foini	Dispositivo di nebulizzazione e metodo di scambio termico abbreviato per vaporizzazione sostanza liquida
KR20240164573A (ko) *	2022-03-24	2024-11-19	화이트 나이트 플루이드 핸들링 인크.	유체 히터
CN115440626B (zh) *	2022-08-30	2024-11-26	浙江大学	一种高效、高精度红外石英加热器
CN121795137A (zh) *	2023-09-15	2026-04-03	东京毅力科创株式会社	流体供给系统、基板处理装置以及基板处理方法
WO2025207004A1 (fr) *	2024-03-25	2025-10-02	Kanthal Ab	Dispositif de chauffage de fluide de module de guidage de fluide et appareil de chauffage de fluide

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US1767122A (en) *	1929-07-03	1930-06-24	Charles G Dean	Portable electric water heater
US3546431A (en) *	1969-04-25	1970-12-08	Erich L Gibbs	Immersion heater and method of making the same
US5054107A (en) *	1989-05-19	1991-10-01	Geoffrey Batchelder	Radiating lamp fluid heating system
GB8919700D0 (en)	1989-08-31	1989-10-11	Electricity Council	Infra-red radiation emission arrangement
JPH0342637U (fr) *	1989-09-01	1991-04-23
US5127465A (en) *	1990-12-28	1992-07-07	Fischer Industries, Inc.	Heat exchanger
JP2583159B2 (ja) *	1991-02-08	1997-02-19	株式会社小松製作所	流体加熱器
JPH06221677A (ja) *	1993-01-22	1994-08-12	Nishibori Minoru	ガス加熱装置
JP3501887B2 (ja) *	1995-09-29	2004-03-02	小松エレクトロニクス株式会社	流体加熱装置
JP3033047B2 (ja) *	1995-11-30	2000-04-17	株式会社小松製作所	流体の温度制御装置
JPH1024102A (ja) *	1996-07-15	1998-01-27	Meteku:Kk	透析液加温ヒーター
JPH10220909A (ja)	1996-12-03	1998-08-21	Komatsu Ltd	流体温度制御装置
JP3847469B2 (ja) *	1998-10-02	2006-11-22	小松エレクトロニクス株式会社	流体加熱装置
JP2000111155A (ja) *	1998-10-02	2000-04-18	Komatsu Electronics Kk	液体加熱装置
JP2000146298A (ja) *	1998-11-13	2000-05-26	Matsushita Electric Ind Co Ltd	触媒燃焼装置
JP3963610B2 (ja) *	1999-04-20	2007-08-22	三益半導体工業株式会社	液体加熱装置
JP3587249B2 (ja) *	2000-03-30	2004-11-10	東芝セラミックス株式会社	流体加熱装置
JP2002162113A (ja) *	2000-11-24	2002-06-07	Ses Co Ltd	恒温液用昇温装置
AU2002313719A1 (en)	2001-08-03	2003-02-24	Integrated Circuit Development Corporation	In-line fluid heating system
JP2003090613A (ja) *	2001-09-18	2003-03-28	Komatsu Electronics Inc	流体加熱装置
JP2003097849A (ja) *	2001-09-25	2003-04-03	Orion Mach Co Ltd	流体加熱装置
JP3936644B2 (ja) *	2002-08-29	2007-06-27	ニチアス株式会社	流体加熱装置
AU2003296942A1 (en) *	2002-12-11	2004-06-30	Thomas Johnston	Method device for heating fluids

2005
- 2005-07-08 JP JP2005199899A patent/JP4743495B2/ja not_active Expired - Lifetime
2006
- 2006-06-29 KR KR1020060059168A patent/KR101123994B1/ko active Active
- 2006-07-06 US US11/481,253 patent/US7593625B2/en active Active
- 2006-07-07 CN CNB2006101054930A patent/CN100554760C/zh active Active
- 2006-07-07 EP EP06014160A patent/EP1741995A3/fr not_active Withdrawn
- 2006-07-07 TW TW095124856A patent/TW200716923A/zh unknown

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI422267B (zh) *	2010-09-13	2014-01-01	東京威力科創股份有限公司	And a liquid heating unit including the liquid processing device and the liquid treatment method

Also Published As

Publication number	Publication date
EP1741995A3 (fr)	2007-08-01
EP1741995A2 (fr)	2007-01-10
KR101123994B1 (ko)	2012-03-23
TW200716923A (en)	2007-05-01
JP4743495B2 (ja)	2011-08-10
CN1892094A (zh)	2007-01-10
KR20070006558A (ko)	2007-01-11
US20070017502A1 (en)	2007-01-25
US7593625B2 (en)	2009-09-22
JP2007017098A (ja)	2007-01-25
CN100554760C (zh)	2009-10-28

Publication	Publication Date	Title
TWI297762B (fr)	2008-06-11
CN1138117C (zh)	2004-02-11	干燥处理方法及其装置
KR101357056B1 (ko)	2014-02-03	유체 가열 장치
US9485807B2 (en)	2016-11-01	Liquid heating apparatus and liquid heating method
TWI441246B (zh)	2014-06-11	基板處理裝置
CN100494821C (zh)	2009-06-03	热介质循环装置及使用其的热处理装置
KR101704946B1 (ko)	2017-02-08	적외선 가열 장치 및 건조로
KR102860288B1 (ko)	2025-09-17	액 처리 장치 및 처리액의 온도 조정 방법
TWI583540B (zh)	2017-05-21	Dehydration device
WO1997020179A1 (fr)	1997-06-05	Systeme de regulation multi-temperature du type a dispersion et dispositif de regulation de temperature de fluide applicable a ce systeme
CN103377972B (zh)	2016-12-28	基板处理装置和供给处理溶液的方法
KR102890999B1 (ko)	2025-11-25	기판 처리 장치
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US20230268189A1 (en)	2023-08-24	Selective silicon trim by thermal etching
US20190240361A1 (en)	2019-08-08	Fluid sterilization device
JP4618288B2 (ja)	2011-01-26	熱媒体循環装置及びこれを用いた熱処理装置
US7326877B2 (en)	2008-02-05	Laser thermal processing chuck with a thermal compensating heater module
JP3901765B2 (ja)	2007-04-04	マルチ温度制御システム及び同システムが適用された反応処理装置
KR20140043863A (ko)	2014-04-11	액자 발생 억제 방법 및 액자 발생 억제 장치
JPH10312943A (ja)	1998-11-24	温度制御装置
KR100730378B1 (ko)	2007-06-19	반응가스 가열 수단
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