TWI336358B - Device and method for electrolytically treating electrically insulated structures - Google Patents

Device and method for electrolytically treating electrically insulated structures Download PDF

Info

Publication number: TWI336358B
Authority: TW; Taiwan
Prior art keywords: contact; electrode; workpieces; treatment liquid; workpiece
Prior art date: 2003-09-12

Application number

TW093126281A

Other languages

English (en)

Chinese (zh)

Other versions

TW200510577A (en

Inventor

Michael Guggemos

Franz Kohnle

Original Assignee

Atotech Deutschland Gmbh

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-09-12

Filing date

2004-08-31

Publication date

2011-01-21

2004-08-31 Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh

2005-03-16 Publication of TW200510577A publication Critical patent/TW200510577A/zh

2011-01-21 Application granted granted Critical

2011-01-21 Publication of TWI336358B publication Critical patent/TWI336358B/zh

Links

238000000034 method Methods 0.000 title claims abstract description 51
239000007788 liquid Substances 0.000 claims abstract description 124
238000005868 electrolysis reaction Methods 0.000 claims abstract description 48
230000008569 process Effects 0.000 claims abstract description 6
238000012545 processing Methods 0.000 claims description 84
238000007789 sealing Methods 0.000 claims description 84
229910052751 metal Inorganic materials 0.000 claims description 43
239000002184 metal Substances 0.000 claims description 43
238000000576 coating method Methods 0.000 claims description 38
239000011248 coating agent Substances 0.000 claims description 37
238000005192 partition Methods 0.000 claims description 11
238000003860 storage Methods 0.000 claims description 10
239000012530 fluid Substances 0.000 claims description 7
125000006850 spacer group Chemical group 0.000 claims description 7
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239000010949 copper Substances 0.000 description 22
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 21
229910052802 copper Inorganic materials 0.000 description 21
239000003792 electrolyte Substances 0.000 description 19
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VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
229910052691 Erbium Inorganic materials 0.000 description 1
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
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239000002202 Polyethylene glycol Substances 0.000 description 1
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NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
239000005864 Sulphur Substances 0.000 description 1
MJOQJPYNENPSSS-XQHKEYJVSA-N [(3r,4s,5r,6s)-4,5,6-triacetyloxyoxan-3-yl] acetate Chemical compound CC(=O)O[C@@H]1CO[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O MJOQJPYNENPSSS-XQHKEYJVSA-N 0.000 description 1
239000002250 absorbent Substances 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
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229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
150000001412 amines Chemical class 0.000 description 1
210000003423 ankle Anatomy 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
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229910000085 borane Inorganic materials 0.000 description 1
239000003990 capacitor Substances 0.000 description 1
239000000969 carrier Substances 0.000 description 1
238000012993 chemical processing Methods 0.000 description 1
ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
239000003245 coal Substances 0.000 description 1
239000004020 conductor Substances 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
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ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
238000012937 correction Methods 0.000 description 1
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238000005137 deposition process Methods 0.000 description 1
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MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 description 1
XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
235000011180 diphosphates Nutrition 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
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238000011049 filling Methods 0.000 description 1
238000001914 filtration Methods 0.000 description 1
239000011521 glass Substances 0.000 description 1
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
229910052737 gold Inorganic materials 0.000 description 1
239000010931 gold Substances 0.000 description 1
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239000010439 graphite Substances 0.000 description 1
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239000011796 hollow space material Substances 0.000 description 1
230000002706 hydrostatic effect Effects 0.000 description 1
239000012535 impurity Substances 0.000 description 1
230000006698 induction Effects 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
239000011810 insulating material Substances 0.000 description 1
230000003993 interaction Effects 0.000 description 1
238000012432 intermediate storage Methods 0.000 description 1
238000001459 lithography Methods 0.000 description 1
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150000002736 metal compounds Chemical class 0.000 description 1
239000002923 metal particle Substances 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
239000008267 milk Substances 0.000 description 1
210000004080 milk Anatomy 0.000 description 1
235000013336 milk Nutrition 0.000 description 1
239000011707 mineral Substances 0.000 description 1
239000000203 mixture Substances 0.000 description 1
150000002898 organic sulfur compounds Chemical class 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052763 palladium Inorganic materials 0.000 description 1
NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
239000002245 particle Substances 0.000 description 1
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ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
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IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
235000011149 sulphuric acid Nutrition 0.000 description 1
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GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
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Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0621—In horizontal cells
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating Methods And Accessories (AREA)
Treatments Of Macromolecular Shaped Articles (AREA)
Processes Specially Adapted For Manufacturing Cables (AREA)
Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Electrolytic Production Of Metals (AREA)

TW093126281A 2003-09-12 2004-08-31 Device and method for electrolytically treating electrically insulated structures TWI336358B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE10342512A DE10342512B3 (de)	2003-09-12	2003-09-12	Vorrichtung und Verfahren zum elektrolytischen Behandeln von elektrisch gegeneinander isolierten, elektrisch leitfähigen Strukturen auf Oberflächen von bandförmigem Behandlungsgut

Publications (2)

Publication Number	Publication Date
TW200510577A TW200510577A (en)	2005-03-16
TWI336358B true TWI336358B (en)	2011-01-21

Family

ID=33039358

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW093126281A TWI336358B (en)	2003-09-12	2004-08-31	Device and method for electrolytically treating electrically insulated structures

Country Status (12)

Country	Link
US (1)	US20060201817A1 (de)
EP (1)	EP1664390B1 (de)
JP (1)	JP4474414B2 (de)
KR (1)	KR101076947B1 (de)
CN (1)	CN1849415A (de)
AT (1)	ATE350514T1 (de)
BR (1)	BRPI0413715B1 (de)
CA (1)	CA2532451A1 (de)
DE (2)	DE10342512B3 (de)
MX (1)	MXPA06002649A (de)
TW (1)	TWI336358B (de)
WO (1)	WO2005026415A1 (de)

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2003
- 2003-09-12 DE DE10342512A patent/DE10342512B3/de not_active Expired - Fee Related
2004
- 2004-08-19 KR KR1020067003313A patent/KR101076947B1/ko not_active Expired - Fee Related
- 2004-08-19 DE DE602004004164T patent/DE602004004164T2/de not_active Expired - Lifetime
- 2004-08-19 CN CNA2004800260338A patent/CN1849415A/zh active Pending
- 2004-08-19 EP EP04764415A patent/EP1664390B1/de not_active Expired - Lifetime
- 2004-08-19 MX MXPA06002649A patent/MXPA06002649A/es active IP Right Grant
- 2004-08-19 CA CA002532451A patent/CA2532451A1/en not_active Abandoned
- 2004-08-19 JP JP2006525683A patent/JP4474414B2/ja not_active Expired - Fee Related
- 2004-08-19 AT AT04764415T patent/ATE350514T1/de not_active IP Right Cessation
- 2004-08-19 BR BRPI0413715-9B1A patent/BRPI0413715B1/pt not_active IP Right Cessation
- 2004-08-19 US US10/566,227 patent/US20060201817A1/en not_active Abandoned
- 2004-08-19 WO PCT/EP2004/009436 patent/WO2005026415A1/en not_active Ceased
- 2004-08-31 TW TW093126281A patent/TWI336358B/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
CN1849415A (zh)	2006-10-18
EP1664390B1 (de)	2007-01-03
ATE350514T1 (de)	2007-01-15
KR101076947B1 (ko)	2011-10-26
BRPI0413715B1 (pt)	2013-09-17
US20060201817A1 (en)	2006-09-14
DE602004004164T2 (de)	2007-10-11
JP4474414B2 (ja)	2010-06-02
WO2005026415A1 (en)	2005-03-24
CA2532451A1 (en)	2005-03-24
MXPA06002649A (es)	2006-06-06
EP1664390A1 (de)	2006-06-07
TW200510577A (en)	2005-03-16
KR20060058116A (ko)	2006-05-29
DE10342512B3 (de)	2004-10-28
JP2007505213A (ja)	2007-03-08
DE602004004164D1 (de)	2007-02-15
BRPI0413715A (pt)	2006-10-17
HK1084423A1 (en)	2006-07-28

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2016-10-21	MM4A	Annulment or lapse of patent due to non-payment of fees

Publication	Publication Date	Title
TWI336358B (en)	2011-01-21	Device and method for electrolytically treating electrically insulated structures
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