TWI494475B - 網狀電極基材之邊緣折曲工模,網狀電極基材之邊緣折曲方法,網狀電極基材之吊掛工模以及網狀電極基材之吊掛方法 - Google Patents
網狀電極基材之邊緣折曲工模,網狀電極基材之邊緣折曲方法,網狀電極基材之吊掛工模以及網狀電極基材之吊掛方法 Download PDFInfo
- Publication number
- TWI494475B TWI494475B TW101113423A TW101113423A TWI494475B TW I494475 B TWI494475 B TW I494475B TW 101113423 A TW101113423 A TW 101113423A TW 101113423 A TW101113423 A TW 101113423A TW I494475 B TWI494475 B TW I494475B
- Authority
- TW
- Taiwan
- Prior art keywords
- electrode substrate
- edge
- mesh electrode
- mesh
- substrate
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims description 246
- 238000000034 method Methods 0.000 title claims description 55
- 238000005452 bending Methods 0.000 title claims description 53
- 238000003825 pressing Methods 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 description 16
- 239000002184 metal Substances 0.000 description 16
- 230000037303 wrinkles Effects 0.000 description 12
- 239000000725 suspension Substances 0.000 description 10
- 238000001354 calcination Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 240000006829 Ficus sundaica Species 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
- C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Cell Electrode Carriers And Collectors (AREA)
- Electrolytic Production Of Metals (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Photovoltaic Devices (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Prevention Of Electric Corrosion (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011096507 | 2011-04-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201247939A TW201247939A (en) | 2012-12-01 |
| TWI494475B true TWI494475B (zh) | 2015-08-01 |
Family
ID=46168571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101113423A TWI494475B (zh) | 2011-04-22 | 2012-04-16 | 網狀電極基材之邊緣折曲工模,網狀電極基材之邊緣折曲方法,網狀電極基材之吊掛工模以及網狀電極基材之吊掛方法 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP2699712B1 (fr) |
| JP (1) | JP5409967B1 (fr) |
| CN (1) | CN103492609B (fr) |
| TW (1) | TWI494475B (fr) |
| WO (1) | WO2012144651A2 (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6360464B2 (ja) * | 2015-08-28 | 2018-07-18 | デノラ・ペルメレック株式会社 | 電極の製造方法 |
| CN106676616A (zh) * | 2016-12-15 | 2017-05-17 | 哈尔滨飞机工业集团有限责任公司 | 一种对平板铝合金零件表面处理的夹具 |
| US11612404B2 (en) | 2019-08-14 | 2023-03-28 | Biosense Webster (Israel) Ltd. | Jig for straightening and bending a malleable tool |
| DE102022114060A1 (de) * | 2022-06-03 | 2023-12-14 | Ks Gleitlager Gmbh | Verfahren zum Herstellen einer metallischen Trägerstruktur für eine Elektrode, metallische Trägerstruktur und Elektrode |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5891136A (en) * | 1996-01-19 | 1999-04-06 | Ep Technologies, Inc. | Expandable-collapsible mesh electrode structures |
| TWI271326B (en) * | 2005-11-01 | 2007-01-21 | Jr-Fang Liang | Apparatus for embossing metal sheet and product for the same |
| CN101225692A (zh) * | 2007-01-15 | 2008-07-23 | 梁志方 | 具压花的金属板及其加工模具 |
| CN201385053Y (zh) * | 2009-03-07 | 2010-01-20 | 谷占波 | 金属型材压型模具 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1815080A (en) * | 1928-08-21 | 1931-07-21 | Westinghouse Electric & Mfg Co | Electrode for apparatus for electrolysis of water |
| US3259956A (en) * | 1964-01-21 | 1966-07-12 | Service Machine Company | Machine for applying suspension loops to the electrodes used in electrolytic operations |
| CA1132484A (fr) * | 1979-08-13 | 1982-09-28 | Cominco Ltd. | Cathode |
| US4606804A (en) * | 1984-12-12 | 1986-08-19 | Kerr-Mcgee Chemical Corporation | Electrode |
| JPH1150293A (ja) * | 1997-08-01 | 1999-02-23 | Sumitomo Metal Mining Co Ltd | 陰極板の組立装置 |
| JP2000109392A (ja) | 1998-10-08 | 2000-04-18 | Fuji Elelctrochem Co Ltd | Lpe法用の基板吊下げ治具 |
| JP3220101B2 (ja) * | 1999-02-03 | 2001-10-22 | トーホーテック株式会社 | 電解用電極 |
| JP2002190284A (ja) * | 2000-12-20 | 2002-07-05 | Sony Corp | 電池の外形寸法成型装置 |
| US6746581B2 (en) * | 2002-10-22 | 2004-06-08 | William A. Ebert | Edge protector systems for cathode plates and methods of making same |
| JP4198726B2 (ja) * | 2006-09-06 | 2008-12-17 | クロリンエンジニアズ株式会社 | イオン交換膜電解槽 |
-
2012
- 2012-04-16 TW TW101113423A patent/TWI494475B/zh active
- 2012-04-19 JP JP2013521339A patent/JP5409967B1/ja active Active
- 2012-04-19 EP EP12723753.5A patent/EP2699712B1/fr active Active
- 2012-04-19 WO PCT/JP2012/061161 patent/WO2012144651A2/fr not_active Ceased
- 2012-04-19 CN CN201280019683.4A patent/CN103492609B/zh active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5891136A (en) * | 1996-01-19 | 1999-04-06 | Ep Technologies, Inc. | Expandable-collapsible mesh electrode structures |
| TWI271326B (en) * | 2005-11-01 | 2007-01-21 | Jr-Fang Liang | Apparatus for embossing metal sheet and product for the same |
| CN101225692A (zh) * | 2007-01-15 | 2008-07-23 | 梁志方 | 具压花的金属板及其加工模具 |
| CN201385053Y (zh) * | 2009-03-07 | 2010-01-20 | 谷占波 | 金属型材压型模具 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5409967B1 (ja) | 2014-02-05 |
| TW201247939A (en) | 2012-12-01 |
| EP2699712A2 (fr) | 2014-02-26 |
| WO2012144651A3 (fr) | 2013-04-18 |
| CN103492609B (zh) | 2015-06-24 |
| JP2014503034A (ja) | 2014-02-06 |
| WO2012144651A2 (fr) | 2012-10-26 |
| EP2699712B1 (fr) | 2015-06-03 |
| CN103492609A (zh) | 2014-01-01 |
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