UA71573C2 - Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ - Google Patents
Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ Download PDFInfo
- Publication number
- UA71573C2 UA71573C2 UA2001042221A UA200142221A UA71573C2 UA 71573 C2 UA71573 C2 UA 71573C2 UA 2001042221 A UA2001042221 A UA 2001042221A UA 200142221 A UA200142221 A UA 200142221A UA 71573 C2 UA71573 C2 UA 71573C2
- Authority
- UA
- Ukraine
- Prior art keywords
- coating
- chamber
- electron beam
- parts
- coating material
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 165
- 239000011248 coating agent Substances 0.000 title claims abstract description 146
- 238000005328 electron beam physical vapour deposition Methods 0.000 title abstract 5
- 238000010894 electron beam technology Methods 0.000 claims abstract description 48
- 239000000463 material Substances 0.000 claims abstract description 40
- 238000009833 condensation Methods 0.000 claims description 10
- 230000005494 condensation Effects 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 9
- 239000012808 vapor phase Substances 0.000 claims description 6
- 230000006870 function Effects 0.000 claims description 3
- 239000006249 magnetic particle Substances 0.000 claims description 3
- 238000007689 inspection Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 239000012768 molten material Substances 0.000 claims 2
- 238000012876 topography Methods 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 22
- 239000000919 ceramic Substances 0.000 abstract description 10
- 239000012720 thermal barrier coating Substances 0.000 abstract 1
- 229910010293 ceramic material Inorganic materials 0.000 description 23
- 230000008569 process Effects 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 238000000151 deposition Methods 0.000 description 10
- 238000009792 diffusion process Methods 0.000 description 10
- 238000005524 ceramic coating Methods 0.000 description 9
- 238000001704 evaporation Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 7
- 230000008021 deposition Effects 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000005755 formation reaction Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 230000006872 improvement Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000000739 chaotic effect Effects 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- YPFNIPKMNMDDDB-UHFFFAOYSA-K 2-[2-[bis(carboxylatomethyl)amino]ethyl-(2-hydroxyethyl)amino]acetate;iron(3+) Chemical group [Fe+3].OCCN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O YPFNIPKMNMDDDB-UHFFFAOYSA-K 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910000951 Aluminide Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 201000005505 Measles Diseases 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 235000011389 fruit/vegetable juice Nutrition 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000004901 spalling Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Электронно-лучевое устройство (10) для нанесения покрытия на изделия конденсацией из паровой фазы (ЭЛНПКПФ) и способ его использования для нанесения покрытия (например керамического теплоизоляционного покрытия) на изделие (20). Устройство (10) ЭЛНПКПФ вообще включает покровную камеру (12), которая функционирует в условиях повышенных температур и субатмосферных давлений. Электронно-лучевая пушка (30) проецирует электронный луч (28) в покровную камеру (12) и на расположенный в ней покровный материал (26), расплавляя и испаряя его при этом. Изделие (20) поддерживается в покровной камере (12) таким образом, чтобы пары покровного материала (26) осаждались на изделии (20). Эксплуатация устройства ЭЛНПКПФ облегчается встроенным полем индикации (48) для возможности слежения за процессом, который выполняется в устройстве (10).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14723399P | 1999-08-04 | 1999-08-04 | |
| US62175700A | 2000-07-24 | 2000-07-24 | |
| PCT/US2000/021175 WO2001057288A1 (en) | 1999-08-04 | 2000-08-03 | Electron beam physical vapor deposition apparatus and viewport therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| UA71573C2 true UA71573C2 (ru) | 2004-12-15 |
Family
ID=26844718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| UA2001042221A UA71573C2 (ru) | 1999-08-04 | 2000-03-08 | Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1198608A1 (ru) |
| JP (1) | JP5132023B2 (ru) |
| UA (1) | UA71573C2 (ru) |
| WO (1) | WO2001057288A1 (ru) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8709160B2 (en) | 2008-08-22 | 2014-04-29 | United Technologies Corporation | Deposition apparatus having thermal hood |
| US20100104773A1 (en) * | 2008-10-24 | 2010-04-29 | Neal James W | Method for use in a coating process |
| US8343591B2 (en) * | 2008-10-24 | 2013-01-01 | United Technologies Corporation | Method for use with a coating process |
| JP2011003464A (ja) * | 2009-06-19 | 2011-01-06 | Tokyo Electron Ltd | プラズマ処理装置及びプラズマ処理装置用冷却装置 |
| US9581042B2 (en) | 2012-10-30 | 2017-02-28 | United Technologies Corporation | Composite article having metal-containing layer with phase-specific seed particles and method therefor |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0797684B2 (ja) | 1987-07-08 | 1995-10-18 | 理化学研究所 | 常温型多重反射セル |
| US4866239A (en) * | 1988-05-31 | 1989-09-12 | The Boc Group, Inc. | Vapor source assembly with crucible |
| JPH02294479A (ja) * | 1989-05-10 | 1990-12-05 | Sumitomo Electric Ind Ltd | 線材の連続真空処理装置 |
| JP3056222B2 (ja) * | 1989-10-26 | 2000-06-26 | 東京エレクトロン株式会社 | スパッタ装置およびスパッタ方法 |
| DE4137414C2 (de) * | 1991-11-14 | 1995-06-14 | Leybold Ag | Vorrichtung zum Beobachten von Prozeßabläufen |
| JPH0830261B2 (ja) * | 1993-07-05 | 1996-03-27 | 日本電気株式会社 | 真空装置の回転動力伝達機構 |
| JPH0762527A (ja) * | 1993-08-23 | 1995-03-07 | Toyota Motor Corp | レーザｐｖｄ装置 |
| JPH0797684A (ja) * | 1993-09-30 | 1995-04-11 | Kao Corp | 薄膜形成装置 |
| US5534314A (en) * | 1994-08-31 | 1996-07-09 | University Of Virginia Patent Foundation | Directed vapor deposition of electron beam evaporant |
| JPH08134643A (ja) * | 1994-11-11 | 1996-05-28 | Laser Noshuku Gijutsu Kenkyu Kumiai | 観測窓への蒸気付着防止装置 |
| US5698273A (en) * | 1995-11-24 | 1997-12-16 | General Electric Company | Electron beam physical vapor deposition method |
| DE59702062D1 (de) * | 1996-05-30 | 2000-08-24 | Siemens Ag | Beschichtungsvorrichtung und verfahren zur beschichtung eines bauteils mit einer wärmedämmschicht |
| JPH10280134A (ja) * | 1997-04-10 | 1998-10-20 | Toshiba Corp | セラミックス被覆部材の製造装置およびその製造方法 |
-
2000
- 2000-03-08 UA UA2001042221A patent/UA71573C2/ru unknown
- 2000-08-03 JP JP2001555910A patent/JP5132023B2/ja not_active Expired - Fee Related
- 2000-08-03 WO PCT/US2000/021175 patent/WO2001057288A1/en not_active Ceased
- 2000-08-03 EP EP00952447A patent/EP1198608A1/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001057288A1 (en) | 2001-08-09 |
| JP2003521584A (ja) | 2003-07-15 |
| JP5132023B2 (ja) | 2013-01-30 |
| EP1198608A1 (en) | 2002-04-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| UA71572C2 (ru) | Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ НА ИЗДЕЛИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ | |
| EP1123422B1 (en) | Electron beam physical vapor deposition apparatus and method | |
| US6946034B1 (en) | Electron beam physical vapor deposition apparatus | |
| EP1177327B1 (en) | Electron beam physical vapor deposition method | |
| KR0157302B1 (ko) | 물리적 증착 2중 코팅 장치 및 방법 | |
| EP2261387B1 (en) | Electron beam vapor deposition apparatus for depositing multi-layer coating | |
| JP2001521989A (ja) | 被膜形成方法及びこの方法を実施するための装置 | |
| KR20190040130A (ko) | 유출 셀, 유출 셀을 포함하는 증착 시스템, 및 관련 방법들 | |
| UA71573C2 (ru) | Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ | |
| US4472453A (en) | Process for radiation free electron beam deposition | |
| UA71922C2 (ru) | Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ, КОТОРАЯ СОДЕРЖИТ МАГАЗИН СО СЛИТКАМИ ПОКРОВНОГО МАТЕРИАЛА | |
| UA72742C2 (en) | An electron beam coating deposition apparatus by vapor phase condensation (variants) | |
| UA71924C2 (en) | An electron beam physical vapor deposition apparatus for deposition of coating by condensation of vapor phase | |
| EP1131474B1 (en) | Electron beam physical vapor deposition apparatus with ingot magazine | |
| JP4662323B2 (ja) | 電子ビーム物理蒸着被覆装置と該装置用のるつぼ | |
| EP2182087B1 (en) | A vacuum vapor coating device for coating a substrate | |
| EP1121476B1 (en) | Electron beam physical vapor deposition apparatus | |
| US20030019849A1 (en) | Electron beam gun with water cooled interlocking crucible cover | |
| WO2001011103A2 (en) | Electron beam physical vapor deposition apparatus and control panel therefor |