US3562140A - Sequential sputtering apparatus - Google Patents

Sequential sputtering apparatus Download PDF

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Publication number
US3562140A
US3562140A US677160A US3562140DA US3562140A US 3562140 A US3562140 A US 3562140A US 677160 A US677160 A US 677160A US 3562140D A US3562140D A US 3562140DA US 3562140 A US3562140 A US 3562140A
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United States
Prior art keywords
drum
coating
objects
sputtering
blades
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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US677160A
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English (en)
Inventor
James R Skinner
Lawrence F Herte
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Eversharp Inc
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Eversharp Inc
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Publication date
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Publication of US3562140A publication Critical patent/US3562140A/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D53/00—Making other particular articles
    • B21D53/60—Making other particular articles cutlery wares; garden tools or the like
    • B21D53/64—Making other particular articles cutlery wares; garden tools or the like knives; scissors; cutting blades
    • B21D53/645—Making other particular articles cutlery wares; garden tools or the like knives; scissors; cutting blades safety razor blades
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Definitions

  • the present invention relates in general to sputtering apparatus and in particular to apparatus for sequentially coating the cutting edges of a plurality of cutting instruments, for example, doubled edged razor blades, or coating plural surfaces of other items, such as the opposite surfaces of silicon wafers used in electronic devices.
  • Sputtering apparatus of the described type is known in which the cutting edges of razor blades in stacks are presented sequentially to a sputtering target for predetermined time intervals. After one cutting edge of the blades is coated, the stacks are rotated 180 degrees for presenting the opposite cutting edge of the blades to the targets for another predetermined sputtering interval. After both edges of a double edged blade are coated, the apparatus must be brought up to air, loaded with three more stacks of blades and then evacuated in preparation for another sputtering cycle.
  • the cutting edges of as many as 18,000 razor blades may be coated with approximately 600 A. of chromium during a 36 minute sputtering interval wherein one cutting edge of each blade is exposed for coating for a period of approximately three minutes.
  • each of the bayonets is disposed about the periphery of a rotatable flanged drum which is driven by means of a chain coupled to a motor.
  • Each of the bayonets is held in cantilever fashion by a rotatable flanged member which is in turn itself rotated by a chain drive coupled to a stationary sprocket located at the axis of the drum.
  • a chain drive coupled to a stationary sprocket located at the axis of the drum.
  • a primary object of the present invention is an improved sputtering apparatus for coating different surfaces of an item to be coated, for example, coating plural cutting edges of cutting instruments, which apparatus greatly increases the number of items which may be coated per pumpdown cycle.
  • Another object of the invention is sputtering apparatus as described which used a rotatable drum, attached to the periphery of which are a plurality of rotatable bayonets for holding the objects to be coated.
  • FIG. 1 is a fragmentary view partially broken away of apparatus embodying the present invention
  • FIG. 2 is a cross sectional view taken along line 2-2 of FIG. 1,
  • FIG. 3 is cross sectional view taken along line 33 of FIG. 2,
  • FIG. 4 is an enlarged detail view of the bayonet-razor blade assembly
  • FIG. 5 is an enlarged view taken on the line 5-5 of FIG. 2.
  • FIG. 1 there is shown sputtering apparatus embodying the present invention enclosed within a vacuum chamber 1 comprised of a bell jar 2 seated in a vacuum tight manner on a stainless steel spool vacuum manifold 3.
  • An anodized aluminum frame 4 fastened to manifold 3 in any well known manner supports a rotatable drum 5 provided at one end with a radially extended flange 6.
  • Flange 6 is provided with a plurality of equally spaced apertures, which are located about the drum and are adapted to hold a plurality of rotatable arbors 7 into each of which may be inserted a removable bayonet assembly 8 previously loaded with as many as 1500 razor blades 9 as seen in FIGS. 2 and 4.
  • drum 5 Attached to drum 5 at its axis on the end opposite flange 6, there is provided a sprocket 10 which is coupled to a motor 11 by means of a chain 12.
  • motor 11 is adapted to have an output speed of .13 rpm. such that drum 5 is angularly displaced 60 degrees every three minutes.
  • a shield 15 is attached to the bottom of module 13 to restrict the sputtering of target material to only those blades 9 which are exposed to and horizontally positioned beneath module 13.
  • a glOW discharge is developed between targets 14 by means of electrical energy applied to target electrodes 14' to which targets 14 are attached.
  • targets 14 consist of nonconductive or dielectric material, such as quartz.
  • the electrical energy could be applied directly to the targets.
  • ions developed within the discharge are accelerated toward and strike targets 14 whereupon electrically neutral target material is ejected and deposited on surrounding surfaces, such as, the cutting edges of blades 9.
  • target electrodes 14 and associated electrical circuitry With the exception of targets 14, target electrodes 14 and associated electrical circuitry, the structure including drum and blades 9 are maintained at ground potential as is true of a well developed glow discharge. Sinc the sputtered material is electrically neutral, it will deposit on any surface; however, the ground plane is necessary in order to prevent sputtering of surrounding structure as would occur if the surrounding structure were permitted to take on a negative potential relative to the glow discharge.
  • FIG. 2 there is shown the drum 5 supported at each end by frame 4.
  • Motor 11, mounted on manifold 3 is coupled to chain 12 by means of a sprocket :16.
  • Bayonet assemblies 8, described more fully with respect to FIG. 4 are inserted in the rotatable arbors 7 for rotation with the arbors.
  • the arbors 7 are driven by sprockets 17, shown in FIGS. 3 and 4.
  • Sprockets 17 are coupled to a stationary sprocket 18, shown in FIG. 3 by means of a second chain 19.
  • the sprocket 18 is positioned on the axis of drum 5 but is rigidly attached to the left frame portion 4 so it will not rotate.
  • a shield 20* is provided about sprockets 17 and 18, and chain 19 to prevent their being coated by sputtered material.
  • each of the sprockets 17 is coupled to one of the rotatable arbors 7 for imparting rotary motion to bayonets 8.
  • the ratio of the number of teeth or gear ratio of sprockets 17 and 18 is 2:1 such that each of the sprockets 17 revolves /2 revolution relative to the drum 5 for each revolution of the drum, and 1 /2 revolutions relative to the sputtering targets 14 for each revolution of the drum.
  • arrows shown on each of sprockets 17 in FIG. 3 indicate the relative orientation of bayonet assemblies 8 at any instant in time as further shown in FIG. 1.
  • the time required to lay down 600 A, of chromium on the cutting surface of blades 9 is three minutes.
  • other time intervals with other materials and thickness may be used depending on the density of the plasma used in generating the ions needed for sputtering as well as the electrical parameters selected for operating the targets.
  • FIGS. 4 and 5 there is shown a particular arrangement for bayonets 8.
  • a narrow flat elongated metal strip or plate 21 is slotted at one end and adapted to receive a holding fixture or bracket 22.
  • Bracket 22 is made in two pieces which fit on opposite sides of the strip 21, as shown in FIG. 1. The two pieces of bracket 22 are held together by a tightening screw 23 which may be loosened to allow bracket 22 to be slipped off of the end of plate 21 for loading and unloading of successive stacks of razor blades 9.
  • Bracket 22 is further adapted to hold the blades 9 firmly in place adjacent one another or to hold the blades 9 loosely to permit cleaning by such means as ultrasonic baths.
  • Bracket 25 is further provided with an aligning and driving dowel 28 which slides into a recess provided in each arbor 7.
  • a supply of bayonets 8 may be provided at an assembly line station. As a stack of 1500 razor blades are formed, the stack may be speared with plate 21. Bracket 22 is then placed over the slotted end of plate 21 and tightened to firmly hold the blades 9 in place. The loaded bayonets 8 are then inserted in arbors 7 and chamber 1 is evacuated to a pressure of approximately 10* torr after which sputtering is started.
  • drum 5 is rotated by motor 11 at a rate of 20 degrees per minute such that each cutting edge of each blade is exposed to targets 14 for sputtering for an interval of about 3 minutes.
  • each of arbors 7 together with bayonets 8 are in turn rotated by virtue of the chain 19 coupling stationary sprocket 18 to each one of sprockets 17.
  • the resulting epicyclic motion of the bayonets 8 relative to the targets 14 is such that both edges of each of blades 9 is exposed to targets 14 for coating for a three minute interval. Since in the preferred embodiment twelve bayonets are used, the total elapsed sputtering time is 36 minutes.
  • the described apparatus and specifically the described bayonets 8 may be modified for receiving other types of objects for coating. All that is necessary is that the objects be restrained from falling as the arbors 7 are rotated.
  • An apparatus for coating a plurality of selected surfaces of a plurality of objects with selected material comprising:
  • said second moving means comprising an attachment connecting said holding means to said first moving means for rotation of said holding means relative to said first moving means about an axis of rotation which travels with said first moving means;
  • said depositing means being positioned to direct the deposit toward the side of said axis of rotation;
  • said moveable holding means comprises a plurality of bayonet assemblies
  • said first moving means comprises a radially projecting flange member, means supporting said flange for rotation about its axis, and means for rotating said flange;
  • said attachment between said first and second moving means comprises a plurality of spaced apart arbors disposed about and rotatably supported in said flange and adapted to receive and removably hold said plurality of bayonet assemblies in cantilever fashion, and means for rotating said arbors relative to said flange.
  • said means for rotating said arbors comprises a sprocket attached to each of said rotatable arbors, a stationary sprocket positioned coaxial with said flange, and a drive chain connecting said stationary sprocket to each of said sprockets on the arbors.
  • said means for supporting said flange comprises a drum, said flange being positioned adjacent one end of said drum and said bayonet assemblies being positioned to surround said drum.
  • said depositing means comprises means for sputtering, and said first and said second moving means are operated continuously and simultaneously during sputtering.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
US677160A 1967-10-23 1967-10-23 Sequential sputtering apparatus Expired - Lifetime US3562140A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US67716067A 1967-10-23 1967-10-23

Publications (1)

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US3562140A true US3562140A (en) 1971-02-09

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US677160A Expired - Lifetime US3562140A (en) 1967-10-23 1967-10-23 Sequential sputtering apparatus

Country Status (5)

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US (1) US3562140A (de)
CH (1) CH479411A (de)
DE (1) DE1781319A1 (de)
FR (1) FR1589781A (de)
GB (1) GB1240700A (de)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3652443A (en) * 1970-08-25 1972-03-28 Gillette Co Deposition apparatus
DE2856309A1 (de) * 1977-12-27 1979-06-28 Coulter Systems Corp Sputter-beschichtungsverfahren und einrichtung zur durchfuehrung dieses verfahrens
US4560462A (en) * 1984-06-22 1985-12-24 Westinghouse Electric Corp. Apparatus for coating nuclear fuel pellets with a burnable absorber
US4610775A (en) * 1985-07-26 1986-09-09 Westinghouse Electric Corp. Method and apparatus for clearing short-circuited, high-voltage cathodes in a sputtering chamber
US4661233A (en) * 1985-07-05 1987-04-28 Westinghouse Electric Corp. Cathode/ground shield arrangement in a sputter coating apparatus
US4909695A (en) * 1986-04-04 1990-03-20 Materials Research Corporation Method and apparatus for handling and processing wafer-like materials
US5124013A (en) * 1988-02-08 1992-06-23 Optical Coating Laboratory, Inc. High ratio planetary drive system and method for vacuum chamber
WO1996040472A1 (en) * 1995-06-07 1996-12-19 Materials Research Corporation Process equipment for razor blades with simultaneous or sequential deposition and etching capabilities
US6060129A (en) * 1996-03-04 2000-05-09 Polar Materials, Inc. Method for bulk coating using a plasma process
US20010036507A1 (en) * 1998-10-02 2001-11-01 Sumitomo Special Metals Co., Ltd. Surface-treating holder having tubular structure and method using the same
US20040016406A1 (en) * 2000-11-14 2004-01-29 Oleg Siniaguine Plasma processing comprising three rotational motions of an article being processed
US20050064215A1 (en) * 2003-08-12 2005-03-24 Sandvik Ab Metal strip product
US20050241586A1 (en) * 2004-04-30 2005-11-03 Hon Hai Precision Industry Co., Ltd. Vacuum vapor deposition apparatus
US20070224350A1 (en) * 2006-03-21 2007-09-27 Sandvik Intellectual Property Ab Edge coating in continuous deposition line
US20080190758A1 (en) * 2004-09-08 2008-08-14 Vassilis Papachristos Method of Deposition of a Layer on a Razor Blade Edge and Razor Blade

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3422718A1 (de) * 1984-06-19 1986-01-09 Plasmainvent AG, Zug Vakuum-plasma-beschichtungsanlage

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3652443A (en) * 1970-08-25 1972-03-28 Gillette Co Deposition apparatus
DE2856309A1 (de) * 1977-12-27 1979-06-28 Coulter Systems Corp Sputter-beschichtungsverfahren und einrichtung zur durchfuehrung dieses verfahrens
US4560462A (en) * 1984-06-22 1985-12-24 Westinghouse Electric Corp. Apparatus for coating nuclear fuel pellets with a burnable absorber
US4661233A (en) * 1985-07-05 1987-04-28 Westinghouse Electric Corp. Cathode/ground shield arrangement in a sputter coating apparatus
US4610775A (en) * 1985-07-26 1986-09-09 Westinghouse Electric Corp. Method and apparatus for clearing short-circuited, high-voltage cathodes in a sputtering chamber
US4909695A (en) * 1986-04-04 1990-03-20 Materials Research Corporation Method and apparatus for handling and processing wafer-like materials
US5124013A (en) * 1988-02-08 1992-06-23 Optical Coating Laboratory, Inc. High ratio planetary drive system and method for vacuum chamber
WO1996040472A1 (en) * 1995-06-07 1996-12-19 Materials Research Corporation Process equipment for razor blades with simultaneous or sequential deposition and etching capabilities
US5958134A (en) * 1995-06-07 1999-09-28 Tokyo Electron Limited Process equipment with simultaneous or sequential deposition and etching capabilities
US6060129A (en) * 1996-03-04 2000-05-09 Polar Materials, Inc. Method for bulk coating using a plasma process
US20010036507A1 (en) * 1998-10-02 2001-11-01 Sumitomo Special Metals Co., Ltd. Surface-treating holder having tubular structure and method using the same
EP0992605A3 (de) * 1998-10-02 2002-11-13 Sumitomo Special Metals Co., Ltd. Tragelement, Haltevorrichtung, Prozess und Apparat im Anwendungsbereich der Oberflächenbehandlung
US6878210B2 (en) 1998-10-02 2005-04-12 Sumitomo Special Metals Co., Ltd. Surface-treating holder having tubular structure and method using the same
US6821560B2 (en) 1998-10-02 2004-11-23 Neomax Co. Ltd. Surface-treating support member and method using the same
US20040016406A1 (en) * 2000-11-14 2004-01-29 Oleg Siniaguine Plasma processing comprising three rotational motions of an article being processed
US20050064214A1 (en) * 2003-08-12 2005-03-24 Sandvik Ab Metal strip product
US20050064215A1 (en) * 2003-08-12 2005-03-24 Sandvik Ab Metal strip product
US7147931B2 (en) 2003-08-12 2006-12-12 Sandvik Intellectual Property Ab Metal strip product
US7147932B2 (en) 2003-08-12 2006-12-12 Sandvik Intellectual Property Ab Metal strip product
US20070042204A1 (en) * 2003-08-12 2007-02-22 Sandvik Intellectual Property Ab Metal strip product
US20070042205A1 (en) * 2003-08-12 2007-02-22 Sandvik Intellectual Property Ab Metal strip product
US20070072008A1 (en) * 2003-08-12 2007-03-29 Sandvik Intellectual Property Ab Metal strip product
US20050241586A1 (en) * 2004-04-30 2005-11-03 Hon Hai Precision Industry Co., Ltd. Vacuum vapor deposition apparatus
US20080190758A1 (en) * 2004-09-08 2008-08-14 Vassilis Papachristos Method of Deposition of a Layer on a Razor Blade Edge and Razor Blade
US9180599B2 (en) * 2004-09-08 2015-11-10 Bic-Violex S.A. Method of deposition of a layer on a razor blade edge and razor blade
US20070224350A1 (en) * 2006-03-21 2007-09-27 Sandvik Intellectual Property Ab Edge coating in continuous deposition line

Also Published As

Publication number Publication date
DE1781319A1 (de) 1970-12-03
GB1240700A (en) 1971-07-28
CH479411A (de) 1969-10-15
FR1589781A (de) 1970-04-06

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