US3627669A - Electrodes for electrochemical cells - Google Patents

Electrodes for electrochemical cells Download PDF

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Publication number
US3627669A
US3627669A US878885A US3627669DA US3627669A US 3627669 A US3627669 A US 3627669A US 878885 A US878885 A US 878885A US 3627669D A US3627669D A US 3627669DA US 3627669 A US3627669 A US 3627669A
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United States
Prior art keywords
coating
titanium
antimony
percent
chlorine
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US878885A
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English (en)
Inventor
John Hubert Entwisle
Anthony Scrutton
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Imperial Chemical Industries Ltd
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Imperial Chemical Industries Ltd
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/922Static electricity metal bleed-off metallic stock
    • Y10S428/9335Product by special process
    • Y10S428/934Electrical process

Definitions

  • An electrode for use in electrochemical processes comprising a film-forming metal support member carrying a semiconducting coating consisting of tin dioxide, oxides of antimony and optionally a chlorine-discharge catalyst selected from the difluorides of manganese, iron,
  • the present invention relates to electrodes 'for electrochemical cells. More particularly it relates to electrodes which are particularly useful as anodes in corrosive media.
  • the present invention provides an electrode of the coated film-forming metal variety which avoids the use of the expensive platinum metals.
  • the parent compound must contain an element of variable valency.
  • a solid solution is formed between the parent compound and the added material (dopant) in which a minor proportion of the cations in the parent crystal lattice are replaced by cations of the dopant which are one unit higher or lower in valency, whereby an equal number of the ions of the element of variable valency are induced to take up a valency state correspondingly one unit lower or higher than normal in the parent lattice so as to preserve electrical neutrality in the whole crystal lattice.
  • an electrode for use in electrochemical processes which comprises a support of a film-forming metal as hereinafter defined carrying on at least a part of its surface a coating consisting of a semiconducting mixture of tin dioxide and oxides of antimony alone or in admixture with a chlorine-discharge catalyst, wherein the weight ratio of tin dioxidezoxides of antimony calculated as Sb,0 is in the range 5:! to and the chlorine-discharge catalyst is present in an amount up to 3 percent by weight of the total coating and is selected from the difluorides of manganese, iron, cobalt, nickel and mixtures thereof.
  • the preferred electrode coatings contain 0.1-1 percent by weight of the chlorine-discharge catalyst.
  • the preferred catalyst is manganese fluoride.
  • a film-forming metal we mean one of the metals titanium, zirconium, niobium, tantalum and tungsten or an alloy consisting mainly of these elements and having anodic polarization properties similar to the commercially pure elements as is known in the art.
  • the preferred film-forming metals are titanium and alloys which are based on titanium and have anodic polarization properties comparable with those of titanium.
  • a semiconducting coating consisting of tin dioxide and oxides of antimony may suitably be bonded to the surface of a film-forming metal support by coating the chemically cleaned support with a solution of a thermally decomposable organo compound of tin e.g., a tin alkoxide, and an antimony halide, e.g., antimony trichloride, in an organic solvent, drying the coating by heating, e.g., at l00-200 C., to evaporate the solvent and then heating the coating in an oxidizing atmosphere, e.g., air, at a higher temperature, suitably in the range 250-80 0 C., to convert the tin and antimony compounds to oxides of these elements.
  • a thermally decomposable organo compound of tin e.g., a tin alkoxide
  • an antimony halide e.g., antimony trichloride
  • a desired thickness of the semiconducting layer may be built up by repeating as many times as necessary these coating, drying and further heating steps.
  • the further heating step to convert the tin and antimony compounds to oxides may be carried out each time after applying and drying a number of coatings, for instance after each second or third coating has been applied.
  • a suitable modification of this coating technique for incorporation of a chlorine-discharge catalyst into the electrode coating when desired is to suspend in the aforesaid coating solution of tin and antimony compounds a fine particulate preformed sinter of tin dioxide, antimony trioxide and the catalyst, e.g., manganese fluoride, which has been obtained by mixing together these ingredients in particulate form, compacting the mixture, heating the compacts, suitably at about 1,000 C., and then reducing the sintered compacts to fine particulate form, e.g., less than 5 microns.
  • tin and antimony compounds e.g., manganese fluoride
  • the ratio of tin compoundszantimony compounds in both the solution and the sintered material are chosen so as to be approximately the same and to lie in the previously defined range of 5:1 to 100: l.
  • the proportion of catalyst in the sintered material is chosen so as to provide up to 3 percent by weight, preferably 0.1-l percent by weight, of catalyst calculated on the total tin and antimony compounds and catalyst in the coating composition when the tin and antimony compounds are calculated as equivalent SnO and Sb O
  • EXAMPLE 1 A composition suitable for coating on to an electrode suppot was prepared by boiling under a reflux condenser for 12 hours a mixture of 15 g. of stannic chloride, 0.4 g. of water and 55 g. of n-amyl alcohol and then stirring into 5.8 g. of the resultant mixture 0. l 25 g. of antimony trichloride. Twelve coats of this composition were painted on to a strip of titanium which had been immesed overnight in hot oxalic acid solution to etch the surface, then washed and dried. Each coating was dried in an oven at 200 C. before the next coat was applied and after each third coat the structure was heated in air in a furnace at 450 C.
  • the total weight of the finished coating was 1 1.0 g./m. of the titanium surface.
  • the theoretical composition of the finished coating was SnO, 90 percent, oxides of antimony (calculated as 819 percent by weight.
  • the coated titanium was operated successfully as an anode in chlorinated brine containing 21.5 percent w/w NaCl at pH 3 and 65 C. with a current density of 8 kA/m.”
  • the chlorine overpotential was initially 470 mv. and had risen to 480 mv. after 5 days.
  • EXAMPLE 2 The procedure of example 1 was-repeated but with the amount of antimony trichloride in the coating composition reduced to provide a finished coating on the electrode of theoretical composition SnO, 99 percent, oxides of antimony (calculated as Sb O 1 percent by weight. Under the same conditions of test as an anode as in example 1 the initial chlorine overpotential was greater than 1,000 mv.
  • EXAMPLE 3 The procedure of example 1 was repeated but with the amount of antimony trichloride in the coating composition increased to provide a finished coating on the electrode of theoretical composition SnO, 85.5 percent, oxides of antimony (calculated as Sb O 14.5 percent by weight.
  • the chlorine overpotential recorded in the test was the same as with the electrode of example 1, both initially and after 5 days.
  • EXAMPLE 4 Eighteen grams of antimony trioxide were boiled in concentrated nitric acid until evolution of oxides of nitrogen ceased. Eighty-four grams of metallic tin were dissolved in concentrated nitric acid with heating, and the precipitated tin dioxide formed was thoroughly mixed with the precipitate of antimony oxide and heated for a further period in concentrated nitric acid. The precipitated mixture was washed free from acid and dried in air at 200 C. To the dried mixed oxides was added 3 percent by weight of manganese difluoride. The resultant mixture was pressed into pellets 1,000 lb./in. and fired in air in a furnace at 800 C. for 24 hours. After firing, the mixture was crushed and the particle size reduced to 60p. it was subsequently recompacted into pellets and fired as before at 1,000 C. for 24 hours. The resultant material was crushed and the particle size reduced to 5 by ball milling.
  • a solution of an alltoxy-tin compound was prepared by boiling under reflux for 24 hours a mixture of g. of stannic chloride and 55 g. of namyl alcohol. Into the resultant solution were dissolved 2.13 g. of antimony trichloride.
  • a composition suitable for coating on to an electrode support was prepared by suspending 0.17 g. of the above-mixed fluoride/oxide material in 3.6 g. of the antimony-trichlorideaikoxy-tin solution.
  • This coating composition was painted on to a strip of titanium which had been immersed overnight in hot oxalic acid solution to etch the surface, washed and dried.
  • the coating of paint was dried in an oven at 150 C. and then two further coats of the same composition were applied and dried in the same manner, after which the coated strip was heated in a furnace in air at 450 C. for 15 minutes to convert the coating substantially to oxides of antimony and tin with manganese fluoride. The whole coating operation and final heating in air at 450 C.
  • the total weight of the finished coating was 21.2 g./m. and the theoretical composition of the coating was SnO 85.6 percent, oxides of antimony (calculated as Sb,0 13.7 percent, MnF, 0.7 percent by e coated titanium was operated successfully as an anode in chlorinated brine under the same conditions as in the test of example 1.
  • the chlorine overpotential was 275 mv. initially and this had risen to 330 mv. after 5 days.
  • Another titanium strip was coated in the same manner. When operated under the same conditions as an anode, except that the current density was raised to 10 kA/m., the initial chlorine overpotential was again 275 mv. and after 30 days operation the overpotcntial was still stable at 330 mv.
  • EXAMPLE 5 A coated titanium electrode was prepared by the method of example 4 but with 5 percent by weight of cobalt difiuoride added to the mixture of tin and antimony oxides before pressing and firing instead of 3 percent of manganese difluoride.
  • the total weight of the finished coating on the titanium strip was 12.3 g./m. and the theoretical composition of the coating was SnO, 85.2 percent, antimony oxides (calculated as Sb O 13.6 percent, Col, 1.2 percent by weight.
  • An electrode for use in electrochemical processes which comprises a support selected from titanium, zirconium, niobium, tantalum, tungsten and alloys thereof, and a coating on at least a part of the surface of said support, said coating consisting essentially of a semiconducting mixture of tin dioxide and oxides of antimony, wherein the weight ratio of tin dioxide to oxides of antimony is in the range 5:1 to :1, calculated as Sb203.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Chemically Coating (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
US878885A 1968-12-13 1969-11-21 Electrodes for electrochemical cells Expired - Lifetime US3627669A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB59450/68A GB1277033A (en) 1968-12-13 1968-12-13 Electrodes for electrochemical cells

Publications (1)

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US3627669A true US3627669A (en) 1971-12-14

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US (1) US3627669A (de)
AT (1) AT294012B (de)
BE (1) BE742894A (de)
CH (1) CH538302A (de)
DE (1) DE1962860C3 (de)
ES (1) ES374540A1 (de)
FR (1) FR2026099A1 (de)
GB (1) GB1277033A (de)
IL (1) IL33450A (de)
NL (1) NL6918662A (de)
SE (1) SE351991B (de)
ZA (1) ZA698468B (de)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793164A (en) * 1973-04-19 1974-02-19 Diamond Shamrock Corp High current density brine electrolysis
US3875043A (en) * 1973-04-19 1975-04-01 Electronor Corp Electrodes with multicomponent coatings
US3882002A (en) * 1974-08-02 1975-05-06 Hooker Chemicals Plastics Corp Anode for electrolytic processes
US3917518A (en) * 1973-04-19 1975-11-04 Diamond Shamrock Corp Hypochlorite production
US3951766A (en) * 1974-08-02 1976-04-20 Hooker Chemicals & Plastics Corporation Electrolytic cell and method of using same
US4028215A (en) * 1975-12-29 1977-06-07 Diamond Shamrock Corporation Manganese dioxide electrode
US4040939A (en) * 1975-12-29 1977-08-09 Diamond Shamrock Corporation Lead dioxide electrode
US4098669A (en) * 1976-03-31 1978-07-04 Diamond Shamrock Technologies S.A. Novel yttrium oxide electrodes and their uses
US4208450A (en) * 1975-12-29 1980-06-17 Diamond Shamrock Corporation Transition metal oxide electrodes
US4243503A (en) * 1978-08-29 1981-01-06 Diamond Shamrock Corporation Method and electrode with admixed fillers
US4265728A (en) * 1978-11-03 1981-05-05 Diamond Shamrock Corporation Method and electrode with manganese dioxide coating
US4514274A (en) * 1971-09-16 1985-04-30 Imperial Chemical Industries Plc Electrode for electrochemical processes
US5364509A (en) * 1993-01-21 1994-11-15 Eltech Systems Corporation Wastewater treatment
EP1597415A4 (de) * 2003-02-14 2006-04-05 Versitech Ltd Vorrichtung und verfahren zur erzeugung von ozon

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH671408A5 (de) * 1987-02-20 1989-08-31 Bbc Brown Boveri & Cie
JPH0633285A (ja) * 1992-07-17 1994-02-08 Permelec Electrode Ltd 電解用電極及びその製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2947651A (en) * 1958-09-23 1960-08-02 Itt Method of making storage electrode for charge storage tube
US3267009A (en) * 1962-10-08 1966-08-16 Engelhard Ind Inc Electrodeposition of platinum containing minor amounts of bismuth
US3428544A (en) * 1965-11-08 1969-02-18 Oronzio De Nora Impianti Electrode coated with activated platinum group coatings
US3544361A (en) * 1965-06-25 1970-12-01 Glaverbel Process of producing tin oxide coating

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2947651A (en) * 1958-09-23 1960-08-02 Itt Method of making storage electrode for charge storage tube
US3267009A (en) * 1962-10-08 1966-08-16 Engelhard Ind Inc Electrodeposition of platinum containing minor amounts of bismuth
US3544361A (en) * 1965-06-25 1970-12-01 Glaverbel Process of producing tin oxide coating
US3428544A (en) * 1965-11-08 1969-02-18 Oronzio De Nora Impianti Electrode coated with activated platinum group coatings

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Chemical Abstracts 61: 10172 b & c 1964 *

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4514274A (en) * 1971-09-16 1985-04-30 Imperial Chemical Industries Plc Electrode for electrochemical processes
US3793164A (en) * 1973-04-19 1974-02-19 Diamond Shamrock Corp High current density brine electrolysis
US3875043A (en) * 1973-04-19 1975-04-01 Electronor Corp Electrodes with multicomponent coatings
US3917518A (en) * 1973-04-19 1975-11-04 Diamond Shamrock Corp Hypochlorite production
US3882002A (en) * 1974-08-02 1975-05-06 Hooker Chemicals Plastics Corp Anode for electrolytic processes
US3951766A (en) * 1974-08-02 1976-04-20 Hooker Chemicals & Plastics Corporation Electrolytic cell and method of using same
US4040939A (en) * 1975-12-29 1977-08-09 Diamond Shamrock Corporation Lead dioxide electrode
US4208450A (en) * 1975-12-29 1980-06-17 Diamond Shamrock Corporation Transition metal oxide electrodes
US4028215A (en) * 1975-12-29 1977-06-07 Diamond Shamrock Corporation Manganese dioxide electrode
US4098669A (en) * 1976-03-31 1978-07-04 Diamond Shamrock Technologies S.A. Novel yttrium oxide electrodes and their uses
US4243503A (en) * 1978-08-29 1981-01-06 Diamond Shamrock Corporation Method and electrode with admixed fillers
US4265728A (en) * 1978-11-03 1981-05-05 Diamond Shamrock Corporation Method and electrode with manganese dioxide coating
US5364509A (en) * 1993-01-21 1994-11-15 Eltech Systems Corporation Wastewater treatment
EP1597415A4 (de) * 2003-02-14 2006-04-05 Versitech Ltd Vorrichtung und verfahren zur erzeugung von ozon
CN1751140B (zh) * 2003-02-14 2011-02-02 克拉里宗有限公司 产生臭氧的装置和方法

Also Published As

Publication number Publication date
ZA698468B (en) 1971-07-28
FR2026099A1 (de) 1970-09-11
GB1277033A (en) 1972-06-07
BE742894A (de) 1970-06-10
IL33450A (en) 1972-12-29
ES374540A1 (es) 1972-01-01
NL6918662A (de) 1970-06-16
IL33450A0 (en) 1970-01-29
AT294012B (de) 1971-11-10
DE1962860C3 (de) 1978-07-13
DE1962860A1 (de) 1970-07-02
SE351991B (de) 1972-12-18
DE1962860B2 (de) 1977-11-03
CH538302A (de) 1973-06-30

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