US5646954A - Maintenance strategy control system and monitoring method for gas discharge lasers - Google Patents

Maintenance strategy control system and monitoring method for gas discharge lasers Download PDF

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Publication number
US5646954A
US5646954A US08/599,744 US59974496A US5646954A US 5646954 A US5646954 A US 5646954A US 59974496 A US59974496 A US 59974496A US 5646954 A US5646954 A US 5646954A
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laser
pulse
sub
laser system
interval
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Palash P. Das
Gary R. Stephenson
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Cymer LLC
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Cymer Inc
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Priority to US08/599,744 priority Critical patent/US5646954A/en
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Assigned to SILICON VALLEY BANK reassignment SILICON VALLEY BANK SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CYMERLASER TECHNOLOGIES
Assigned to CYMER, INC. reassignment CYMER, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CYMER LASER TECHNOLOGIES
Priority to DE69707323T priority patent/DE69707323T2/de
Priority to EP97300339A priority patent/EP0789431B1/de
Priority to CA002196130A priority patent/CA2196130A1/en
Priority to JP03836497A priority patent/JP3226473B2/ja
Priority to KR1019970004090A priority patent/KR100246725B1/ko
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/223Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Definitions

  • the present invention is related to gas discharge lasers, and particularly to a control system for predicting the time remaining until maintenance is required on various laser subsystems.
  • Pulsed laser applications such as materials processing, require a known amount of laser energy incident upon the material being processing. In most of these applications, process control is achieved by controlling the energy incident upon the surface of the material. Therefore, for such industrial applications, laser systems utilize all energy detector which measures the energy of each laser pulse. This energy information is communicated to the system user by the laser-based micro-controller, wherein the user can modify operating conditions to maintain constant laser energy or change the laser's energy to a new value.
  • gas discharge type lasers have to be maintained at specified intervals during use in a production environment, and the various subsystems must be refurbished due to contamination resulting from the various laser gasses reacting with the electrodes and chamber materials.
  • This type of contamination generally in the form of a metal fluoride dust in excimer laser systems, causes deterioration in the beam profile and bandwidth increases as a result of deposition and/or etching of the laser's windows. Erosion of the lasers electrodes during operation as a result of arcing and fluorine passivation in turn causes degradation of the laser's bandwidth, degradation of pulse-to-pulse energy stability, inconsistent burst mode behavior and degradation in beam profile.
  • sub-components such as the thyratron switch and the line narrowing modules likewise degrade in performance, resulting in less-than-expected energy output from the laser and an overall loss of process control.
  • the laser controller will terminate laser operation, thereby resulting in costly down-time for the user.
  • the present invention is made in response to the above-referenced need for a predictive diagnostic which will allow users to schedule in advance the required maintenance on the laser's operation-limited sub-components, thereby preventing the degradation in laser output and the possible unscheduled downtime associated with sub-component failure.
  • the present invention is particularly suitable for use in a manufacturing environment, but is equally well suited to other industrial and research environments which require the laser system to operate reliably and within critically defined parameters.
  • a microprocessor based laser control system such as that provided in the excimer laser system disclosed in the '215 patent, retains in its non-volatile memory a limit number or threshold pulse number for each pulse-limited sub-component used in the laser system.
  • This limit number is based upon each sub-component's requirement for maintenance after a specified number of pulses is fired by the laser, with each sub-component having its own unique pulse-limit value.
  • a pulse counter which is used by the laser system for controlling other subsystems, such as a halogen injection system like that disclosed in the '215 patent, maintains a real-time count of the number of laser pulses fired by the system during operation.
  • a sub-program in accordance with the present invention, operates in conjunction with the control system diagnostics to compute a real-time difference between the user defined pulse-limit value and the current pulse count.
  • the subprogram determines an average pulse repetition rate over a user-specified time period, and uses this average value to calculate an accurate estimate, based upon the laser's current operation, of the time remaining before required maintenance (TBM) and/or end of the usable life of a sub-component, by dividing the real-time differences between the pulse-limit value and the pulse count by the computed average pulse rate value.
  • TBM time remaining before required maintenance
  • This predicted time value in hours or other specified time reference, is presented to the user upon user inquiry via the diagnostics, and is updated at either a fixed or a user-defined interval.
  • an alert can be issued of the impending end-of-life of the sub-components, or an automated signal can be generated to shut-down the laser system.
  • FIG. 1 depicts a flow chart schematically illustrating how the control system estimates the time remaining until TBM and/or the end of usable life for a particular laser sub-component.
  • FIG. 2 depicts a flowchart schematically illustrating how the alternative embodiment, utilizing a rolling average of laser pulses fired over a sample interval, SampInt, estimates the time remaining until TBM and/or end of usable life for a particular laser sub-component.
  • a micro processor-based implementation of a predictive maintenance control system is described in terms of a gas discharge laser, and particularly an excimer laser.
  • the predictive maintenance control system is equally adaptable to other pulsed laser systems having pulse limited sub-components, as well as other types of laser systems whose output can be converted to a time referenced and that incorporate sub-components having a specified TBM and/or end of useful life governed by the laser's output.
  • FIG. 1 The specifics of the predictive maintenance control system are shown in the flow chart shown in FIG. 1.
  • the following paragraph are numbered to correspond to numbered steps in FIG. 1.
  • the paragraph numbered "3" below refers to the step numbered as "3" in FIG. 1.
  • the numbers in FIG. 1 are to the left of the designated steps in the flowchart.
  • Maintenance prediction sub-program START initiates the diagnostic sub-program, allowing the user to predict and schedule required maintenance for laser system sub-components which have a specified operating life based upon the number of pulses fired by the laser.
  • These components for an excimer based system include the laser gas, chamber, high voltage power supply, metal fluoride filter, front and rear windows, commutator, compression head, front and rear optics, wave control meter and beam splitter.
  • the front and rear window components may have a useful life of 500 million pulse life before service is required, while the commutator may have a 3000 million pulse life.
  • This value is stored as a configurable in units of hours, in the control system's memory, and acts as a timer for the laser as it operates at a particular facility;
  • the defined variables are initialized. Each of the variables is linked in the sense that initializing one variable will affect, and therefore require initialization of the other variables.
  • the time period for MaintInt is set, based upon the user's operational requirements, which is generally an established maintenance interval, such as two weeks (336 hours), specific to the user's manufacturing operation.
  • LaserTimeOn can be initialized to zero.
  • AveRepRt is initially set equal to the maximum pulse repetition rate for the laser system, RepRtMax, such as 1000 Hz.
  • the Configurable RepRtMax is used for initialization when a viable AveRepRt cannot be computed.
  • TotalShtNM is set to the value indicated by the pulse counter, TotalSht, which may be some value other than zero due to laser system testing at the manufacturer prior to shipment or pre-production operation.
  • Dummy integer variable NM used by the sub-program to determine when MaintInt is reached, as later explained, is set to an arbitrary integer, such as 1.
  • Time-to-Maintenance, expressed in hours is, therefore, initially calculated as follows: ##EQU1## this can be more easily expressed as: ##EQU2## where % is optionally set by the user to provide a lead time buffer before the components end of life is reached, such as 110%, to allow the control system to warn the user to prepare to service the component prior to the true TBM.
  • LaserTimeOn is down-loaded from the control system memory. Diagnostic information, including the most recent TBM estimate, is updated at a user-specified interval, either hourly or after a specified fraction of an hour, and communicated to the user via a Serial Interface.
  • the sub-routine CHECK is performed, as shown schematically in FIG. 2, where the program checks the value of INIT against the defined integer variable NM.
  • INT is defined as the ratio of the time the laser is in a powered state (LaserTimeOn) over the user-defined maintenance interval period (MaintInt).
  • NM designated as a "1," and MaintInt specified as 336 hours
  • the inquiry 320 ⁇ (1) (336), or NM ⁇ 1 i.e., ratio of LaserTimeOn/MaintInt ⁇ , NM
  • INT is set at zero, wherein the program returns to step 4, and waits the user-defined interval to again recalculate LaserTimeOn.
  • LaserTimeOn was read as 365 hours, the relation NM ⁇ , 1 is true and INT would be set at 1.
  • the program proceeds to calculate AveRepRt as described in step 6.
  • the average pulse repetition rate of the laser over the interval, AveRepRt is calculated by taking the total number of pulses fired by the laser during the specified time interval divided by the interval period.
  • the dock for measuring MaintInt will not advance when the laser is in a power-off state.
  • the clock will continue to advance from its stopped position whenever the laser is in the LaserOn state. This calculation is based upon the following algorithm. ##EQU3## where the laser's running pulse counter will indicate TotalShtNM by the following relationship:
  • TBM for the component is calculated as described in step 3; however the value AveRepRt is substituted for RepRtMax, as follows: ##EQU4## TBM for a given MaintInt is, therefore, based upon the AveRepRt of the preceding MaintInt. This result is reported to the user via the serial interface and laser system diagnostics, as provided in step 4.
  • Table 1 provides an exemplary listing of subsystem components for an excimer laser system for which TBM, as provided herein, is reported. Each item listed is identified by its configuration name, with the associated response string indicating the control system's response when a query via the serial interface, is issued by the user.
  • TBM response provides the user a predictive estimate of the time remaining before the respective sub-component will exceed its life limit, not its maintenance limit.
  • the lifetime limit is signaled when the actual sub-component pulse count exceeds the life-pulse limit threshold for that sub-component. Because TBM is based upon the average pulse repetition rate of the laser system, it can be very different from actual time remaining if a large change is made to the programed repetition rate without initializing the defined variables. As previously discussed, it is for this reason that the variables are linked.
  • the subsystem GasShots is provided in Table 1.
  • the laser's gas is also limited by an actual time threshold, referred to as the static gas life.
  • This time threshold can be set by a first gas Configurable (i.e., Static Lf), with the time since the last gas refill reported as a second gas Configurable (i.e., Static Tm).
  • the time maintenance threshold for the gas can, for example, then be set by the user as a time at which Static Tm ⁇ 0.90 Static Lf, or some other percentage of StaticLf, and the life threshold for the sub-component be expressed as the point at which StaticTm>StaticLf.
  • the TBM for gas life prior to reaching the above-referenced threshold limits, would be reported in step 7 as the lesser of: ##EQU5##
  • control system can be configured to automatically transition from a state in which the laser can be fired to a standby state, or it can be configured to continue to operate while providing repeated alert messages to the user that the output characteristics of the laser may have degraded and the subsystem failure is imminent.
  • steps 1 to 4 are performed by the laser's control system as previously described; however, the AveRepRt is computed as a rolling average of laser pulses over a sample interval, SampInt (i.e. 6 minutes or 0.1 hours).
  • SampInt i.e. 6 minutes or 0.1 hours.
  • step 5 is omitted, with AveRepRt being determined directly after LaserTimeOn is downloaded from the control system memory in step 4.
  • the average pulse repetition rate in this embodiment is determined as follows: ##EQU6## where: ⁇ Shots Per Sec is the repetition rate in pulses per second during a previous SampInt;
  • 1/N is the weighting factor, based upon the designated sample interval, assigned to ⁇ Shots Per Sec, and is computed in each sample interval, SampInt.
  • AveRepRt is itself an averaged value which is computed each SampInt period, which in the aforementioned example was specified as 6 min. For example, if the maintenance interval, MaintInt, is specified at 24 hours, and the sample interval, SampInt, is specified as 0.1 hour (6 min) as previously described; and AveRepRt is equal to RepRtMax (1000 pulses/sec), with the pulses per second in the previous SampInt, ⁇ set at 100 then: ##EQU8## 8.
  • the estimated TBM is calculated for each sub-component based upon the current AveRepRt for the laser system, by taking the difference between a user-specified percentage or LifeTimeCt (i.e., 110%) for the sub-component and of LifeCounter. This difference is divided by AveRepRt and converted to a user-friendly time frame, such as hours, as follows: ##EQU9##

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
US08/599,744 1996-02-12 1996-02-12 Maintenance strategy control system and monitoring method for gas discharge lasers Expired - Lifetime US5646954A (en)

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Application Number Priority Date Filing Date Title
US08/599,744 US5646954A (en) 1996-02-12 1996-02-12 Maintenance strategy control system and monitoring method for gas discharge lasers
EP97300339A EP0789431B1 (de) 1996-02-12 1997-01-20 Wartungsstrategie-Steuerungssystem für Gasentladungslaser
DE69707323T DE69707323T2 (de) 1996-02-12 1997-01-20 Wartungsstrategie-Steuerungssystem für Gasentladungslaser
CA002196130A CA2196130A1 (en) 1996-02-12 1997-01-28 Maintenance strategy control system for gas discharge lasers
JP03836497A JP3226473B2 (ja) 1996-02-12 1997-02-06 部品の耐用期間の終焉を予測可能なレーザーシステム及びその予測方法
KR1019970004090A KR100246725B1 (ko) 1996-02-12 1997-02-12 가스 방전 레이저용 보수 전략 제어 시스템

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EP (1) EP0789431B1 (de)
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Cited By (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5764505A (en) * 1996-01-23 1998-06-09 Cymer, Inc. Gas discharge laser control systems using multiple CPU's with shared memory on a common bus
US6154470A (en) * 1999-02-10 2000-11-28 Lamba Physik Gmbh Molecular fluorine (F2) laser with narrow spectral linewidth
US6212214B1 (en) 1998-10-05 2001-04-03 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6243406B1 (en) 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6285701B1 (en) 1998-08-06 2001-09-04 Lambda Physik Ag Laser resonator for improving narrow band emission of an excimer laser
US6298080B1 (en) 1999-03-12 2001-10-02 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with adjustable bandwidth
US20010032066A1 (en) * 2000-03-01 2001-10-18 Gunter Nowinski Laser software control system
US20010049618A1 (en) * 2000-03-23 2001-12-06 Rainer Patzel Method for allocating predictable costs for consumable items
US6330267B1 (en) 1998-10-05 2001-12-11 Lambda Physik Ag Performance control system and method for gas discharge lasers
WO2001097345A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Gas discharge laser long life electrodes
WO2001097344A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
US6345065B1 (en) 1998-06-04 2002-02-05 Lambda Physik Ag F2-laser with line selection
US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6393037B1 (en) 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US6393040B1 (en) 1999-02-24 2002-05-21 Lambda Physik Ag Molecular fluorine (F2) excimer laser with reduced coherence length
US6421365B1 (en) 1999-11-18 2002-07-16 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6424666B1 (en) 1999-06-23 2002-07-23 Lambda Physik Ag Line-narrowing module for high power laser
US6426966B1 (en) 1999-02-10 2002-07-30 Lambda Physik Ag Molecular fluorine (F2) laser with narrow spectral linewidth
US6476987B1 (en) 1999-08-04 2002-11-05 Lambda Physik Ag Excimer laser with line narrowing
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6522681B1 (en) 1999-04-26 2003-02-18 Lambda Physik Ag Laser for the generation of narrow band radiation
US6526085B2 (en) 1998-10-05 2003-02-25 Lambda Physik Ag Performance control system and method for gas discharge lasers
USRE38039E1 (en) 1996-02-01 2003-03-18 Lambda Physik Ag Laser for generating narrow-band radiation
US6553050B1 (en) 1999-11-18 2003-04-22 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6603788B1 (en) 1999-11-23 2003-08-05 Lambda Physik Ag Resonator for single line selection
US6603789B1 (en) 2000-07-05 2003-08-05 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with improved beam parameters
US6697695B1 (en) * 2000-04-25 2004-02-24 Komatsu Ltd. Laser device management system
US6700915B2 (en) 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
US6717973B2 (en) 1999-02-10 2004-04-06 Lambda Physik Ag Wavelength and bandwidth monitor for excimer or molecular fluorine laser
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US20040186609A1 (en) * 2000-02-16 2004-09-23 Patel Parthiv S. Process monitoring system for lithography lasers
US6801561B2 (en) 2000-09-25 2004-10-05 Lambda Physik Ag Laser system and method for spectral narrowing through wavefront correction
US20050162633A1 (en) * 2004-01-28 2005-07-28 Canon Kabushiki Kaisha Exposure apparatus
US20060056478A1 (en) * 1999-02-10 2006-03-16 Hans-Stephen Albrecht Laser gas replenishment method
US7075963B2 (en) 2000-01-27 2006-07-11 Lambda Physik Ag Tunable laser with stabilized grating
US20070196104A1 (en) * 2005-01-03 2007-08-23 Finisar Corporation Optical transceiver with clock for providing maintenance and lifetime information
US20080179548A1 (en) * 2003-04-08 2008-07-31 Cymer, Inc. Laser produced plasma EUV light source
US20090057567A1 (en) * 2007-08-31 2009-03-05 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US20090154642A1 (en) * 2007-12-14 2009-06-18 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US20100032590A1 (en) * 2008-08-06 2010-02-11 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US8629417B2 (en) 2010-02-22 2014-01-14 Gigaphoton Inc. Extreme ultraviolet light generation apparatus
US9647415B2 (en) 2012-07-26 2017-05-09 Gigaphoton Inc. Laser apparatus and method of controlling laser apparatus
US10177520B2 (en) * 2013-12-25 2019-01-08 Gigaphoton Inc. Excimer laser apparatus and excimer laser system
WO2022039898A1 (en) * 2020-08-18 2022-02-24 Cymer, Llc Predictive calibration scheduling apparatus and method
WO2023178055A3 (en) * 2022-03-13 2023-11-16 Far Uv Technologies, Inc. Excimer illuminator with replaceable lamp
CN120722675A (zh) * 2025-08-20 2025-09-30 新毅东(北京)科技有限公司 准分子激光器剩余使用寿命的预测方法、装置及电子设备

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* Cited by examiner, † Cited by third party
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US12360466B2 (en) * 2021-03-17 2025-07-15 Cymer, Llc Maintenance of modules for light sources used in semiconductor photolithography

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3899750A (en) * 1973-09-21 1975-08-12 Urs E Hochuli Long life gas laser system and method
US4429392A (en) * 1981-12-21 1984-01-31 Sumitomo Electric Industries, Ltd. Laser output controlling device
US4716569A (en) * 1986-04-09 1987-12-29 A.L.E. Systems, Inc. Power supply for negative impedance gas discharge lasers
US4740982A (en) * 1985-09-28 1988-04-26 Central Glass Company, Limited Method of refining rare gas halide excimer laser gas
US4763336A (en) * 1986-04-24 1988-08-09 Clark Stephens F Switching gas-discharge ion lasers
US4977573A (en) * 1989-03-09 1990-12-11 Questek, Inc. Excimer laser output control device
US5090020A (en) * 1989-12-01 1992-02-18 British Aerospace Public Limited Company Apparatus for controlling the composition of a laser gas or gas mixture
US5260961A (en) * 1990-11-01 1993-11-09 Florod Corporation Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
US5440578A (en) * 1993-07-16 1995-08-08 Cymer Laser Technologies Gas replenishment method and apparatus for excimer lasers

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021189A (ja) * 1988-05-24 1990-01-05 Fanuc Ltd Ncレーザ装置
JPH02241071A (ja) * 1989-03-15 1990-09-25 Fanuc Ltd Ncレーザ装置
JPH0352278A (ja) * 1989-07-20 1991-03-06 Fanuc Ltd Ncレーザ装置
JP2601556B2 (ja) * 1990-03-08 1997-04-16 富士通株式会社 レーザ寿命検出方式
US5172365A (en) * 1991-09-11 1992-12-15 International Business Machines Corporation System for predicting laser end-of life from the power vs. current curve of the diode
JP2716622B2 (ja) * 1992-04-13 1998-02-18 ファナック株式会社 レーザ発振器の制御装置

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3899750A (en) * 1973-09-21 1975-08-12 Urs E Hochuli Long life gas laser system and method
US4429392A (en) * 1981-12-21 1984-01-31 Sumitomo Electric Industries, Ltd. Laser output controlling device
US4740982A (en) * 1985-09-28 1988-04-26 Central Glass Company, Limited Method of refining rare gas halide excimer laser gas
US4716569A (en) * 1986-04-09 1987-12-29 A.L.E. Systems, Inc. Power supply for negative impedance gas discharge lasers
US4763336A (en) * 1986-04-24 1988-08-09 Clark Stephens F Switching gas-discharge ion lasers
US4977573A (en) * 1989-03-09 1990-12-11 Questek, Inc. Excimer laser output control device
US5090020A (en) * 1989-12-01 1992-02-18 British Aerospace Public Limited Company Apparatus for controlling the composition of a laser gas or gas mixture
US5260961A (en) * 1990-11-01 1993-11-09 Florod Corporation Sealed excimer laser with longitudinal discharge and transverse preionization for low-average-power uses
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
US5440578A (en) * 1993-07-16 1995-08-08 Cymer Laser Technologies Gas replenishment method and apparatus for excimer lasers
US5440578B1 (en) * 1993-07-16 2000-10-24 Cymer Inc Gas replenishment method ad apparatus for excimer lasers

Cited By (86)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5764505A (en) * 1996-01-23 1998-06-09 Cymer, Inc. Gas discharge laser control systems using multiple CPU's with shared memory on a common bus
USRE38039E1 (en) 1996-02-01 2003-03-18 Lambda Physik Ag Laser for generating narrow-band radiation
US6477187B2 (en) 1998-06-04 2002-11-05 Lambda Physik Ag F2-laser with line selection
US6556613B2 (en) 1998-06-04 2003-04-29 Lambda Physik Ag F2-laser with line selection
US6466598B2 (en) 1998-06-04 2002-10-15 Lambda Physik Ag F2-laser with line selection
US6459720B2 (en) 1998-06-04 2002-10-01 Lambda Physik Ag Excimer laser
US6345065B1 (en) 1998-06-04 2002-02-05 Lambda Physik Ag F2-laser with line selection
US6285701B1 (en) 1998-08-06 2001-09-04 Lambda Physik Ag Laser resonator for improving narrow band emission of an excimer laser
US6404796B1 (en) 1998-08-06 2002-06-11 Lambda Physik Ag Laser resonator for improving narrow band emission of an excimer laser
US6212214B1 (en) 1998-10-05 2001-04-03 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6330267B1 (en) 1998-10-05 2001-12-11 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6526085B2 (en) 1998-10-05 2003-02-25 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6614828B1 (en) 1999-02-03 2003-09-02 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US6393037B1 (en) 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US20060056478A1 (en) * 1999-02-10 2006-03-16 Hans-Stephen Albrecht Laser gas replenishment method
US6154470A (en) * 1999-02-10 2000-11-28 Lamba Physik Gmbh Molecular fluorine (F2) laser with narrow spectral linewidth
US7266137B2 (en) 1999-02-10 2007-09-04 Lambda Physik Ag Laser gas replenishment method
US6426966B1 (en) 1999-02-10 2002-07-30 Lambda Physik Ag Molecular fluorine (F2) laser with narrow spectral linewidth
US6717973B2 (en) 1999-02-10 2004-04-06 Lambda Physik Ag Wavelength and bandwidth monitor for excimer or molecular fluorine laser
US6393040B1 (en) 1999-02-24 2002-05-21 Lambda Physik Ag Molecular fluorine (F2) excimer laser with reduced coherence length
US6498803B2 (en) 1999-03-12 2002-12-24 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with adjustable bandwidth
US6563853B2 (en) 1999-03-12 2003-05-13 Lambda Physik Ag Gas performance control system for gas discharge lasers
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
US6298080B1 (en) 1999-03-12 2001-10-02 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with adjustable bandwidth
US6487228B2 (en) 1999-03-12 2002-11-26 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with adjustable bandwidth
US6549555B2 (en) 1999-03-12 2003-04-15 Lambda Physik Ag Gas performance control system for gas discharge lasers
US6243406B1 (en) 1999-03-12 2001-06-05 Peter Heist Gas performance control system for gas discharge lasers
US6700915B2 (en) 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
US6490307B1 (en) 1999-03-17 2002-12-03 Lambda Physik Ag Method and procedure to automatically stabilize excimer laser output parameters
US6714577B1 (en) 1999-03-17 2004-03-30 Lambda Physik Ag Energy stabilized gas discharge laser
US6493370B2 (en) 1999-03-17 2002-12-10 Lambda Physik Ag Laser gas replenishment method
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US6389052B2 (en) 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6522681B1 (en) 1999-04-26 2003-02-18 Lambda Physik Ag Laser for the generation of narrow band radiation
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6560254B2 (en) 1999-06-23 2003-05-06 Lambda Physik Ag Line-narrowing module for high power laser
US6424666B1 (en) 1999-06-23 2002-07-23 Lambda Physik Ag Line-narrowing module for high power laser
US6476987B1 (en) 1999-08-04 2002-11-05 Lambda Physik Ag Excimer laser with line narrowing
US6567451B2 (en) 1999-11-18 2003-05-20 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6421365B1 (en) 1999-11-18 2002-07-16 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6553050B1 (en) 1999-11-18 2003-04-22 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6516012B2 (en) 1999-11-18 2003-02-04 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6603788B1 (en) 1999-11-23 2003-08-05 Lambda Physik Ag Resonator for single line selection
US7075963B2 (en) 2000-01-27 2006-07-11 Lambda Physik Ag Tunable laser with stabilized grating
US7203562B2 (en) 2000-02-16 2007-04-10 Cymer, Inc. Process monitoring system for lithography lasers
US20040186609A1 (en) * 2000-02-16 2004-09-23 Patel Parthiv S. Process monitoring system for lithography lasers
US6941259B2 (en) 2000-03-01 2005-09-06 Lamda Physik Ag Laser software control system
US20010032066A1 (en) * 2000-03-01 2001-10-18 Gunter Nowinski Laser software control system
US20010049618A1 (en) * 2000-03-23 2001-12-06 Rainer Patzel Method for allocating predictable costs for consumable items
US6697695B1 (en) * 2000-04-25 2004-02-24 Komatsu Ltd. Laser device management system
US6654403B2 (en) * 2000-06-09 2003-11-25 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
WO2001097345A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Gas discharge laser long life electrodes
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
WO2001097344A1 (en) * 2000-06-09 2001-12-20 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
US6603789B1 (en) 2000-07-05 2003-08-05 Lambda Physik Ag Narrow band excimer or molecular fluorine laser with improved beam parameters
US6721345B2 (en) 2000-07-14 2004-04-13 Lambda Physik Ag Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers
US6801561B2 (en) 2000-09-25 2004-10-05 Lambda Physik Ag Laser system and method for spectral narrowing through wavefront correction
US8526481B2 (en) 2001-01-23 2013-09-03 Cymer, Inc. Extendable electrode for gas discharge laser
US8446928B2 (en) 2001-01-23 2013-05-21 Cymer, Inc. Extendable electrode for gas discharge laser
US20110058580A1 (en) * 2001-01-23 2011-03-10 Sandstrom Richard L Extendable electrode for gas discharge laser
US20080179548A1 (en) * 2003-04-08 2008-07-31 Cymer, Inc. Laser produced plasma EUV light source
US8035092B2 (en) 2003-04-08 2011-10-11 Cymer, Inc. Laser produced plasma EUV light source
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US20100127186A1 (en) * 2003-04-08 2010-05-27 Cymer, Inc. Laser produced plasma EUV light source
US20050162633A1 (en) * 2004-01-28 2005-07-28 Canon Kabushiki Kaisha Exposure apparatus
US7212276B2 (en) * 2004-01-28 2007-05-01 Canon Kabushiki Kaisha Exposure apparatus
US20070196104A1 (en) * 2005-01-03 2007-08-23 Finisar Corporation Optical transceiver with clock for providing maintenance and lifetime information
US8233793B2 (en) * 2005-01-03 2012-07-31 Finisar Corporation Optical transceiver with clock for providing maintenance and lifetime information
US7920788B2 (en) * 2005-01-03 2011-04-05 Finisar Corporation Optical transceiver with clock for providing maintenance and lifetime information
US20110182571A1 (en) * 2005-01-03 2011-07-28 Finisar Corporation Optical transceiver with clock for providing maintenance and lifetime information
US20090057567A1 (en) * 2007-08-31 2009-03-05 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US20100140514A1 (en) * 2007-08-31 2010-06-10 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US8198615B2 (en) 2007-08-31 2012-06-12 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US20090154642A1 (en) * 2007-12-14 2009-06-18 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US20100032590A1 (en) * 2008-08-06 2010-02-11 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US8629417B2 (en) 2010-02-22 2014-01-14 Gigaphoton Inc. Extreme ultraviolet light generation apparatus
US9647415B2 (en) 2012-07-26 2017-05-09 Gigaphoton Inc. Laser apparatus and method of controlling laser apparatus
US10177520B2 (en) * 2013-12-25 2019-01-08 Gigaphoton Inc. Excimer laser apparatus and excimer laser system
WO2022039898A1 (en) * 2020-08-18 2022-02-24 Cymer, Llc Predictive calibration scheduling apparatus and method
US12540850B2 (en) 2020-08-18 2026-02-03 Cymer, Llc Predictive calibration scheduling apparatus and method
WO2023178055A3 (en) * 2022-03-13 2023-11-16 Far Uv Technologies, Inc. Excimer illuminator with replaceable lamp
CN120722675A (zh) * 2025-08-20 2025-09-30 新毅东(北京)科技有限公司 准分子激光器剩余使用寿命的预测方法、装置及电子设备

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DE69707323T2 (de) 2002-05-02
EP0789431A3 (de) 1998-05-20
EP0789431B1 (de) 2001-10-17
DE69707323D1 (de) 2001-11-22
KR100246725B1 (ko) 2000-03-15
KR970063846A (ko) 1997-09-12
CA2196130A1 (en) 1997-08-13
EP0789431A2 (de) 1997-08-13
JP3226473B2 (ja) 2001-11-05
JPH09223833A (ja) 1997-08-26

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