WO1994021839A1 - Appareil et systeme de placage ionique a l'arc - Google Patents
Appareil et systeme de placage ionique a l'arc Download PDFInfo
- Publication number
- WO1994021839A1 WO1994021839A1 PCT/JP1994/000410 JP9400410W WO9421839A1 WO 1994021839 A1 WO1994021839 A1 WO 1994021839A1 JP 9400410 W JP9400410 W JP 9400410W WO 9421839 A1 WO9421839 A1 WO 9421839A1
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- WO
- WIPO (PCT)
- Prior art keywords
- evaporation source
- work
- arc ion
- shaped
- arc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0468—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H10P72/0471—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
- H10P72/0468—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H10P72/0476—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one plating chamber
Definitions
- the present invention relates to an arc ion plating device (hereinafter, referred to as an AIP device) which is a coating device utilizing vacuum arc discharge, and an arc ion plating system (hereinafter, an AIP system) provided with the AIP device.
- an AIP device an arc ion plating device
- an AIP system an arc ion plating system
- a vacuum arc discharge is generated between an anode (an anode) provided in a vacuum chamber and a cathode (a power source), which is an evaporation source (evening target), and the solid state is formed in a solid state.
- the cathode material is evaporated from the arc spot generated on the surface of a certain cathode, and this vapor is deposited on a work placed in a vacuum chamber to coat the coating.
- an AIP device g for realizing this arc ion brazing method an apparatus disclosed in Japanese Patent Publication No. 58-30333 and a Japanese Patent Publication No. 52-146690 by a sniper and a subreflector, respectively. After that, various improvements have been made.
- an AIP device for realizing high productivity, for example, an AIP device in which a work on which a coating film is coated is mounted on a worktable that can be put in and out of a vacuum chamber is known.
- FIG. Figure (a ) Is a top view, and ( ⁇ ) is a side sectional view.
- An anode 2 and a flat plate-shaped evaporation source (cathode) 3 are fixed in a vacuum chamber 1, and a work 5 placed on a work table 4 is further arranged.
- An arc power source 3a is connected between the anode 2 and the evaporation source 3, and when arc discharge is generated between the anode 2 and the evaporation source 3 in a vacuum, the target material on the surface of the evaporation source 3 evaporates instantly. At the same time, it jumps into vacuum as metal ions 6.
- the metal ions 6 are accelerated and adhere to the surface of the work 5 together with the reaction gas particles 8, and a dense hard film (TiN, TiC, TiCN, ZrN, Cr-1N, etc.).
- the work table 4 incorporates a gear device that meshes with the drive gear 9, whereby the work 5 rotates and the work table 4 itself rotates in the a direction to revolve the work 5.
- a shield plate 12 is provided inside the vacuum chamber 1 with an opening in the radial direction of the metal ion 6.
- the vacuum chamber 1 has a door 10 and a rail 11.
- the worktable 4 on which the work 5 is placed can be pulled out in the direction c along the rail 11.
- the workpieces 5 are not handled one by one, but are grouped in a state in which the workpieces 5 are mounted on the work table 4 in advance. Since the work 5 can be loaded and unloaded, the time required for setting the work 5 can be greatly reduced, which is extremely advantageous in obtaining high productivity.
- an AIP apparatus capable of uniformly evaporating a coating material at a high speed from a substantially plate-shaped evaporation source as described above is disclosed in, for example, Japanese Patent Application Laid-Open No. 4-224671.
- This AIP device supplies arc power to the evaporation source independently from a plurality of arc power supplies, enabling uniform evaporation of the evaporation source and high-power operation, resulting in high output.
- an AIP device that can be applied to applications requiring high productivity such as piston ring, there is a type in which an evaporation source is formed in a mouth shape.
- the work is arranged at a position surrounding the evaporation source, so if the evaporation source is fixed in a vacuum chamber, it is mounted on a work table.
- the work and the evaporation source interfered and collided when unloading the work. Therefore, the same work loading and unloading as in Fig. 23 could not be performed.
- the AIP device disclosed in the above-mentioned Japanese Patent Application Laid-Open No. 4-224671 is a device corresponding only to a flat-plate evaporation source, and is applicable to an AIP device having a rod-shaped evaporation source. Is not mentioned.
- the work is usually loaded and unloaded manually, and the evaporation source, which is often performed simultaneously with the loading and unloading of the work * The replacement and cleaning of the anode shield plate, etc.
- manual intervention was indispensable. Although loading and unloading of workpieces is performed in a relatively short time, it takes a lot of time to replace and clean the evaporation source and anode 'shield plate, and these tasks cannot be performed at night.
- the present invention has been made in view of the above situation, and has an AIP apparatus and an AIP system that employ a mouth-shaped evaporation source, which can realize extremely high productivity by efficiently working a workpiece.
- the purpose is to provide.
- the present invention has the following configurations (1) to (19).
- An AIP apparatus is an arc ion breaker having a rod-side evaporating source for generating an arc, and a work provided so as to surround the orifice-shaped evaporating source and having a surface coated with a film.
- the work is movable in the axial direction of the mouth-shaped evaporation source relative to the ⁇ -shaped evaporation source.
- the AIP device of the present invention comprises a vacuum chamber, a rod-like evaporation source provided in the vacuum chamber, and a coating provided on the surface so as to surround the rod-like evaporation source.
- the vacuum chamber comprises a lower lid on which the workpiece is mounted, and a main body to which an upper lid of the rod-shaped evaporation source is fixed.
- the lower lid is vertically movable relative to the main body.
- the lower lid can be moved up and down with respect to the main body.
- the work is mounted on the lower lid.
- the work table is mounted on a work table, and the work table is horizontally movable with respect to the lower cover by a rack provided on the work table and a pinion provided on the lower cover.
- the work is mounted on a work table mounted on the lower lid, and a shield plate is mounted on the work table together with the work. I have.
- the work table further includes an anode.
- the AIP apparatus of the present invention is a vacuum chamber, a rod-shaped evaporation source provided in the vacuum chamber, and a coating provided on a surface of the vacuum evaporation chamber so as to surround the rod-shaped evaporation source.
- An arc ion brazing device having a workpiece to be worked, wherein the vacuum chamber is configured to hold the work to which one end of the mouth-shaped evaporation source is fixed, and to hold the work and to be relative to the work body.
- a lid that is movable in the axial direction of the lid-shaped evaporation source, and the other end of the lid-shaped evaporation source is connected to the lid via electrical connection means that is separable from the lid.
- the arc power is supplied from both ends of the mouth evaporation source.
- the electric connection means is configured such that a surface member supported by the lid via an elastic means can contact the other end of the pad-shaped evaporation source. Have been.
- the rod-shaped evaporation source is a hollow cylinder having a center hole, and a sunset material is held by a shaft passed through the center hole. I have.
- an outer passage is provided between the target material and the shaft, a center passage is provided at the center of the shaft, and the center passage and the shaft are provided.
- a lateral hole communicating with the outer passage is provided, and a cooling medium flows through the lateral hole, the outer passage, and the center passage. The n-shaped evaporation source is cooled.
- the shaft has a nut for holding the target material, and the nut holds the target material via an elastic body.
- An AIP apparatus includes a vacuum chamber, a rod evaporating source provided in the vacuum chamber, an anode for generating an arc between the rod-shaped evaporating source, and an anode.
- An arc ion brazing apparatus having a workpiece disposed so as to surround the rod-shaped evaporation source and having a film coated on the surface thereof, wherein the anode is provided at both ends of the headless evaporation source. It is a ring-shaped anode.
- the AIP device of the present invention comprises: a vacuum chamber; a ⁇ -shaped evaporation source provided in the vacuum chamber; and an anode for generating an arc between the rod-shaped evaporation source and the anode.
- an arc ion brazing apparatus having a workpiece disposed so as to surround the rod-shaped evaporation source and having a film coated on the surface, the anode is centered on an axis of the rod-shaped evaporation source.
- a rod-shaped anode provided on the circumference and at a position between the ⁇ -shaped evaporation source and the work, and arc power is supplied from both ends of the anode.
- the anode is used as a heater for preheating the work before a film is coated on the work surface.
- the AIP system of the present invention is provided with a traveling carriage that can be moved along one or more arc ion plating devices for inserting and removing a work table on which a workpiece is mounted.
- a mounting portion for mounting a table is provided, and the mounting portion is configured to move the arc when the traveling bogie travels.
- the work table is moved to a position facing the ion breaking device, and the work table is automatically moved in and out between the mounting portion and the arc ion breaking device.
- the traveling carriage is provided so as to be able to travel on a rail provided along the arc ion plating apparatus, and a turntable capable of mounting a plurality of the worktables is provided.
- the work table is provided along the rail, and the work table can be automatically exchanged between the dinner table and the traveling trolley.
- a work table on which a work is mounted is inserted in and out of the arc ion plating apparatus before and after each of the plurality of arc ion plating apparatuses.
- a rotary table for changing the direction is provided, a bi-directional conveyor for connecting the plurality of row tables and transporting the work table is provided, and the rotary table located at one end has a processed front.
- a first stocker capable of storing a plurality of the work tables on which the workpieces are mounted is connected via an unloading conveyor, and a plurality of unloaded workpieces are mounted on the row table at the other end.
- the second stocker capable of storing the work table is in contact with a gun via a carry-in conveyor. Carried into the vacuum tea Nba * out to Runisaishite, work can be moved in the axial direction relatively ⁇ head shaped evaporation source with respect Kuchi' de shaped evaporation source. Therefore, even if a mouth-shaped evaporation source is used in the AIP device, the work can be loaded and unloaded without interference * collision between the work and the rod-shaped evaporation source. That is, by adopting a pad-shaped evaporation source as the evaporation source, and by handling a plurality of workpieces collectively, an AIP apparatus having high productivity can be realized.
- the work is carried into and out of the vacuum chamber.
- the workpiece can be moved up and down relatively to the rod-shaped evaporation source, so that the workpiece can be handled without interference or collision with the rod-shaped evaporation source.
- the rod-shaped evaporation source is fixed to the main body of the vacuum chamber, even when a work table or the like on which a work is mounted is provided, a mechanism for mounting the rod-shaped evaporation source, such as a port, is provided. There is no need to centrally provide cooling equipment for the evaporation source. Therefore, an AIP device having high productivity can be realized without complicating the device configuration.
- the lower lid further moves up and down with respect to the main body of the vacuum chamber.
- the configuration of the auxiliary equipment of the AIP device such as the exhaust nozzle, may be complicated, but this is not a concern if the lower lid is raised and lowered. Therefore, an AIP device having high productivity can be realized with a simple device configuration.
- the workpiece moves horizontally after completely falling to the outside of the main body of the vacuum chamber.
- Interference with the doping evaporation source * Work can be loaded and unloaded without collision *. Therefore, it is possible to efficiently handle the work in the AIP device employing the rod-shaped evaporation source, thereby realizing the AIP device having high productivity.
- the work is further mounted on a work table, and the work table is horizontally moved by using a rack and a pinion.
- the workpiece can be reliably moved. That is, in an AIP device having high productivity, more accurate operation of the device is performed.
- the shield plate is mounted on a work table together with the work and handled. Even if the shield plate needs to be replaced and cleaned, this can be done externally without stopping the AIP device. Therefore, the operation of the AIP device can be continued regardless of the replacement of the shield plate and the cleaning work, and the AIP device having high productivity can be realized.
- the anode according to the present invention described in the above (6) is further mounted on a single table, the anode can be replaced. Similarly, it can be performed externally without stopping the AIP device. Therefore, the operation of the AIP device can be continued irrespective of the replacement of the anode * cleaning work, and an AIP device having high productivity can be realized.
- one end of the rod-shaped evaporation source is fixed to the main body of the vacuum chamber, and the other end is connected to the lid by using a detachable electrical connection means.
- the lid is movable, arc power can be supplied from both ends, and large arc power can be supplied to the rod-shaped evaporation source. Therefore, by supplying a large arc power to the AIP device employing the rod-shaped evaporation source, an AIP device having high productivity can be realized.
- the rod is electrically connected to the bottom evaporation source. Even if there is an inclination in the gun contact part with the means, the connection can be made reliably. Therefore, it is possible to reliably supply a large arc power to the rod-shaped evaporation source, and to realize an AIP apparatus having high productivity without fail.
- the ⁇ -shaped evaporation source is constituted by holding the target material by the shaft, one side is provided.
- the rod-shaped evaporation source can be configured with the free end as the free end. / 21839
- the operation time of the AIP device can be improved by shortening the time required for replacing the rod material of the rod bark evaporation source, thereby realizing an AIP device having high productivity.
- the cooling medium can be passed through a part of the mouth-shaped evaporation source, the head-shaped evaporation source Even if the temperature rises due to the input of arc power to the furnace, it can be efficiently cooled. Therefore, the power supplied to the ⁇ -shaped evaporation source can be increased to increase the evaporation rate, thereby realizing an AIP apparatus having high productivity.
- the nut holding the target material holds the target material via an elastic body.
- the difference in thermal expansion between the target material and the shaft caused by the supply of the arc power to the doping-shaped evaporation source and its cooling can be absorbed by the elastic body, so that the heat between the target material and the shaft can be absorbed. It is possible to realize an AIP device having high productivity without causing a possibility that the target material may be damaged due to a difference in expansion.
- the anode is provided on the anode so as not to generate a potential difference in the axial direction of the rod-shaped evaporation source, the anode is uniformly discharged in the axial direction of the rod-shaped evaporation source. Can be generated. Therefore, it is possible to realize an AIP device that realizes higher quality by performing coating evenly.
- the present invention according to (14) further includes: Since the rod-shaped anode is used as a heater for preheating the work, there is no need to provide a separate heater, and the film adhering to the rod-shaped anode surface and the water vapor in the air adversely affect the quality of the work film. There is nothing. Therefore, the quality of the work film can be further improved.
- the work table on which the work is mounted can be automatically loaded and unloaded from the AIP device. There is no need to pause AIP equipment at night. Therefore, it is possible to realize an AIP device having a high operation rate and high productivity capable of unmanned operation at night.
- FIG. 1 is a main part diagram of the AIP device of the present invention.
- Figure 2 is a work table transfer diagram.
- Figure 3 is a top view of the AIP system using a traveling vehicle.
- Figure 4 is a diagram showing an example of relative movement between the workpiece and the rod-shaped evaporation source.
- Figure 5 is a cross-sectional view of the mouth evaporation source.
- Figure 6 is a cross-sectional view of another ⁇ -pod evaporation source.
- FIG. 7 is a cross-sectional view of another head-down evaporation source.
- FIG. 8 is a cross-sectional view of another headless evaporation source.
- Fig. 9 is a diagram showing the electric gun contacting means for rod-type evaporation sources.
- FIG. 9 is a diagram showing the electric gun contacting means for rod-type evaporation sources.
- FIG. 10 is a view showing another means for electrically connecting the D-shaped evaporation source.
- FIG. 11 is a diagram showing an anode for a rod-shaped evaporation source.
- FIG. 12 is a diagram showing another anode for the evaporation source in the form of a mouth.
- Figure 13 shows another meteorological pole for a rod-shaped evaporation source.
- FIG. 14 is a diagram showing another anode for the rod-shaped evaporation source.
- Fig. 15 is a circuit diagram of the connection between the ⁇ -pod evaporation source and the power supply of the anode.
- Figure 16 is a connection circuit diagram for anode preheating.
- FIG. 17 is another connection circuit diagram for anode preheating.
- Fig. 18 shows work tape / 21839
- FIG. 12 is a drive system diagram of a table and a mouth-even table.
- FIG. 19 is a top view of another AIP system using a traveling vehicle.
- Figure 20 is a top view of the AIP system using a rotary table.
- Figure 21 is a side view of the AIP system related to the AIP device with a gate valve.
- FIG. 22 is a conceptual diagram showing the application of a shield plate to an in-line AIP device.
- FIG. 23 is a principal view of a conventional AIP device.
- FIG. 1 is a main part diagram of an AIP device of the present invention.
- the main body 1a of the vacuum chamber 1 is fixed on the second floor portion 16 of the gantry 15 and has an exhaust nozzle 1c protruding from a side surface and an open bottom surface.
- the lower lid 17, which is a lid for opening and closing the opening of the main body 1 a of the vacuum chamber 1, is elastically supported on the lifter 18 via a spring 18 a. By moving up and down, it is possible to move up and down between the falling position of the two-dot chain line and the rising position of the solid line.
- the vacuum chamber 1 is sealed by a special seal 19.When the lower cover 17 is supported via an elastic body such as a spring 18a, a complete sealed state is obtained. It becomes easier.
- a rod-shaped evaporation source 14 projects downward from the center of the upper lid 1 ⁇ of the vacuum chamber 1 and has an upper minus terminal 14 connected to the cathode of an arc power supply (not shown) at the upper end.
- the lower lid 17 on which a is fixed is provided with a roller rail 20 as a horizontal moving means of the work 5 consisting of a row of driven rollers, and a lower roller connected to a cathode of an AC power supply.
- An input terminal 21 and a drive gear 22 are provided.
- the work table 23 on which the work 5 is placed is placed on the lower cover 17 via the roller rail 20. The work table 23 can roll on the roller rail 20 and be transported to the near side in the thickness direction of the paper. And the work 5 rotates by the drive gear 2 2 21839 "
- the lower minus terminal 21 is connected to the lower end of the rod-shaped source 14 by a gun from the entire surface of the mouth-shaped evaporation source 14. ⁇ The discharge is performed.
- the work table 23 has a shield plate 24 mounted thereon and is transported together with the work 5. Further, an anode (not shown) for the rod-shaped evaporation source 14 may be mounted on the work table 23.
- a heater 25 is used for preheating the work 5.
- the work table 23 is pulled out onto the traveling carriage 30 as indicated by an arrow d by driving the ⁇ -larails 20 and 31. It is also possible to raise and lower the main body 1a of the vacuum chamber 1 without raising and lowering the lower cover 17 (this will be described in detail later), but connect a flexible hose to the exhaust nozzle 1c. It is more preferable to raise and lower the lower cover 17 because the configuration of the device becomes complicated, for example, because it becomes necessary.
- the work 5 moves in the axial direction of the mouth evaporation source 14 relative to the rod surface evaporation source 14 (in the embodiment of FIGS. 1 and 2,
- the relative movement in the direction can be performed by raising and lowering the lower lid 17 on which the work table 23 is placed.)
- This movement causes the work 5 and the rod-shaped evaporation source 14 to move away from each other to a position where they do not collide with each other when the work table 23 carrying the work 5 is transported in the horizontal direction.
- the rod evaporation source 14 is fixed not to the work table 23 but to the main body 1 a of the vacuum chamber 1. As a result, it is possible to avoid the problem that it is difficult to provide a cooling device for the mouth-shaped evaporation source, which is generated when the mouth-shaped evaporation source 14 is fixed to the work table 23 that moves up and down.
- the device can be configured by using
- the shield plate 24 and the anode are mounted on the work table 23 and transported together with the workpiece 5, the shield plate 24 and the anode must be replaced. Since it can be performed outside of the AIP device, there is no need to stop the AIP device, and this can also achieve high productivity.
- This configuration can be applied to a conventional AIP device using a flat evaporation source.
- the steam capture rate is higher than that of the flat force source 3 as shown in FIG. 23, and the yield is increased. Can be expected about 80%.
- the yield of the flat force source 3 shown in Fig. 23 is usually 50% or less.
- the force source 3 in the form of a flat plate in Fig. 23 weighs a maximum of several kilograms, whereas tens of kilograms. It is expected that the cost of manufacturing the target material in the ⁇ -shaped evaporation source 14 can be reduced to 1 to 4 or less. This reduction in manufacturing costs and improvement in yield can significantly reduce the effective unit price per gram of target.
- the form of the relative movement of the work 5 with respect to the rod-shaped evaporation source 14 is not limited to the forms shown in FIGS. 1 and 2, and various changes may be made. / 21839
- the main body 1 a of the vacuum chamber 1 and the rod-shaped evaporation source 14 may be moved up and down with respect to the work 5 and the lower lid 17.
- the upper lid 17A which hangs the workpiece 5 rises and lowers with respect to the main body 1a of the vacuum chamber 1 and the .pi.
- the vacuum chamber 1 has an openable / closable door (two-dot chain line) through which the work 5 is put in and taken out. It moves up and down with respect to the vacuum chamber 1 together with 17 C.
- a horizontal evaporation source 14 protrudes horizontally from the main body 1a of the vacuum chamber 1 which is oriented horizontally, and a side lid 17B together with the workpiece 5 is provided. It moves horizontally.
- Figures 1 and 4 (a), (b), (c) and (d) indicate the ⁇ -shaped vapor source 14 or the lid (lower lid 17, upper lid 17 ⁇ , side lid 1). 7) In the relative movement of)), an opening is provided in the vacuum chamber 1 on the free side of the mouth and the evaporation source 14, and the lid of the opening and the main body 1 a of the vacuum chamber 1 a On the other hand, a lid that moves relatively to the main body 1a of the vacuum chamber 1 is not provided, and the evaporation evaporation source 1 in the vacuum chamber 1 is provided.
- FIGS. 5 to 8 are cross-sectional views of the rod bottom evaporation source applied to FIG.
- the target material 71 of the rod-shaped evaporation source 14 is a hollow cylinder. Has become.
- a lower arc confinement ring 72 having the same outer diameter is attached to the lower end of the target material 1.
- a target holding portion 73 is provided at the upper end of the target material 71, and an upper arc confinement ring 74 having the same outer diameter as the evaporation source is attached to the outer peripheral side thereof.
- the upper and lower arc confinement rings 72 and 74 are fixed to the target holding part 73 and the shaft 77 with an insulating structure to insulate them from the sunset. The detailed structure is omitted.
- the target material 71, the lower arc confinement ring 72, and the target holding part 73 are provided with central holes 71a and 73a, and the central holes 71a and 73a are Foot 77 is passed.
- the flange 75 and the nut 79 of the shaft 77 are used to fasten the target material 71 together via the evening holding portion 73.
- This co-fastened configuration eliminates the need to apply a threaded hole in the evening material 71 to stop the flange 75 that stops the free end of the target, and also makes the evening material 71 1 a consumable product. It will be easy to remove and install when replacing.
- FIG. 6 shows an example of a configuration for efficiently cooling the rod-shaped evaporation source 14 illustrated in FIG. 5 when the temperature rises due to electric power supplied from an arc power supply.
- the inner diameter of the central holes 7 la, 72 a, and 3 a is larger than the outer diameter of the shaft 77, and an outer passage 80 is formed on the outer periphery 77 a side of the shaft 77.
- a central passage 81 is formed, one end of which is opened by an injection connection port 83 so as to be in contact with the pipe and the other end is closed.
- a side hole 82 communicating with the outer passage 80 is opened on the closed end side of the central passage 81, and is provided outside the main body 1a of the vacuum vessel 1 and has a sunset holding portion 7 of the outer passage 80.
- a discharge connection port 84 is opened in a part reaching 3. The cooling medium from the injection muzzle 83 flows from the top through the central passage 81, passes through the lateral hole 82, flows from the bottom through the outer passage 80, and reaches the discharge muzzle 84. . Cooling medium does not cause stagnation.
- Figure 7 shows a configuration example of a ⁇ -pod evaporation source 14 that can absorb thermal stress caused by a temperature difference.
- the shaft 77 for sending the cooling medium to the tip is at a low temperature, but the target material 1 is at a higher temperature.
- the target material 71 tried to extend significantly in the axial direction, and the shaft 77 only slightly extended in the axial direction.Therefore, a large compressive stress might act on the target material 71, causing a risk of breakage. . Therefore, for example, a compression spring 788 is interposed as an elastic body between the nut for fastening 79 and the evening holding portion 73, so that a difference in thermal expansion between the target material 71 and the shaft 77 is obtained. Is absorbed by the compression springs 7 8. Since only the compressive stress determined by the preload of the compression spring 78 is applied to the target material 71, there is no possibility of breakage. Note that a rubber plate or the like can be used instead of the compression springs 78.
- FIG. 8 shows another configuration example of thermal stress absorption.
- the shaft 77 is divided in the axial direction, and a bellows 85 is interposed therebetween as an elastic body.
- the bellows 85 is like a plate spring alternately contacted with a gun, generates a predetermined compression force, and serves as a passage for the cooling medium.
- a spring, a rubber plate, or the like may be used as the elastic body.
- the upper end of the mouth-shaped evaporation source 14 is fixed to the main body 1a of the vacuum chamber 1 with a nut 86 via an insulating member 96.
- the lower end of 14 is a free end that is cut off by opening and closing the lower lid 17.
- the electrical gun contact means is composed of a surface member 87 which comes into surface contact with the flange 75 of the shaft 77, an insulating member 97 and a lower lid 17 via elastic means (flexible flange 88 in FIG. 9). It is configured to stand upright.
- the surface member 87 corresponds to the lower negative terminal 21 in FIG.
- the flexible plunger 88 is capable of withstanding the internal pressure of the atmospheric pressure and is expandable and contractable and has a certain degree of elasticity, and the inside of the plunge communicates with the outside air through a hole 89 formed in the lower lid 17. are doing.
- atmospheric pressure acts on the inside of the flexible flange 88, and the surface member 87 is pressed against the flange 75.
- Appropriate surface pressure is secured at the surface contact part by the pressing by the atmospheric pressure and the elasticity of the flexible flange 88 itself.
- a compression panel 90a may be provided at the lower end of the surface member 87 via an insulating member 98 to press the surface member 87 against the flange 75.
- FIGS. 11 to 14 show a general example of the above-described positive electrode arrangement by exemplifying a device for supplying an arc current to only one end of the arc-shaped evaporation source 14.
- the example in FIG. 15 is a specific example in which this is applied to an AIP device that supplies an arc current from both ends of the rod-shaped evaporation source 14.
- ring-shaped anodes 101 and 102 are provided at vertically symmetric positions deviated from the target material 71.
- the ring-shaped anodes 101 and 102 are connected in parallel to a power source 104 by wirings 105 and 106, respectively.
- the rod-shaped evaporation source 14 has a wire 107 connected at one end to a power supply 104.
- the ring-shaped anodes 101 and 102 arranged at vertically symmetrical positions contribute to uniform discharge in the axial direction of the rod-shaped evaporation source 14 and the ring-shaped anode 10 1, 1 and 2 do not cast a shadow on the work 5, and the work can be coated evenly.
- the broken line 108 in the figure it is more preferable that the cathode side is also supplied with current from both ends.
- the ring-shaped anodes 101 and 1D2 in FIG. 11 were merely ring-shaped blades, but as shown in FIG. 12, a dish-shaped ring-shaped anode 101A having a conical surface was formed. , 102 A, the arc on the surface of the target material 71 of the rod-shaped evaporation source 14 becomes easier to run to the center of the rod-shaped evaporation source 14, and the target material 71 Discharge biased near the edge is suppressed, resulting in a more uniform discharge in the axial direction of the evaporation source 14.
- the anode in Fig. 13 is positioned such that the circumference concentric with the head-down evaporation source 1 between the head-shaped evaporation source 14 and the work 5 is equally divided into four equal parts in the example shown in the figure).
- a rod-shaped anode 103 is disposed on the fin. Each of the rod-shaped anodes 103 is connected to the power supply 104 in parallel with wirings 105 and 106.
- the mouth-shaped evaporation source 14 has a wire 10.7 and one end connected to a power supply 104.
- the rod-shaped anodes 1 and 3 are used, the rod-shaped anodes 103 are arranged evenly in the circumferential and axial directions of the rod-shaped evaporation source 14, so that the bias of discharge is reduced.
- the ⁇ ⁇ -shaped anode 103 is located between the head-side evaporating source 14 and the work 5, it casts a shadow on the work 5. Since it is configured to rotate while revolving around, there is no unevenness in the coating of the work 5. Even in the case of this example, it is more preferable to supply power from both ends even on the cathode side by the wiring 108.
- the anode in FIG. 14 is a combination of the ring-shaped anodes 101 and 102 in FIG. 1 and the rod-shaped anode 103 in FIG.
- the axial uniformity of the discharge is further improved. Since the anode has a structure in which the ring and the rod are integrally formed, the wirings 105 and 106 may be only those connected to the ring. 21
- FIG. 15 is an example in which the anode illustrated in FIGS. 11 to 14 is applied to the mouth-shaped evaporation source 14 of the present invention.
- Both ends of rod-shaped evaporation source # 4 are connected to power sources 104 and 104 with wires 107A and 107B, respectively, to supply arc current.
- the potential difference in the axial direction of the rod-shaped evaporation source 14 is reduced. Since the effects described in FIGS. 1 to 14 are added, the uniformity of the discharge in the axial direction is further improved. Further, according to FIG.
- the anode may be constituted by the ring-shaped anodes 101 and 102 as shown in FIG. 15, or by the mouth-shaped anodes 103 exemplified above, and these may be freely used. May be combined. Note that, when the lid-shaped anode 103 is applied to the AIP device of the present invention, the rod-shaped anode 103 is formed similarly to the lid-shaped evaporation source 14 described above. It is preferable to use an electric connection means with one end as a free end.
- the open anode 103 located between the rod-shaped evaporation source 14 and the work 5 is used, a large amount of film adheres to the surface of the rod-shaped anode 103 as well.
- the rod-shaped anode 103 has a low temperature due to water cooling, the film separates or separates, and when the vacuum chamber 1 is opened, water vapor and the like in the atmosphere adsorbed on the film are released during the coating. In some cases, the quality of the film of the work 5 may be adversely affected. Therefore, before the coating is started with the wiring as shown in Fig. 16 and Fig. 17, the mouth-shaped anode 103 is used as a heater for preheating the workpiece 5 to release water vapor etc. adhering to the surface, Further, it is preferable that the coating is kept at a high temperature during coating so that the film is not easily separated or released.
- the power sources 104 and 108 for discharging are connected to the rod-shaped anode 1 / 21839
- FIG. 3A shows a heating state
- FIG. 3B shows a discharging state
- switches 113, 111, 115 for switching and a bypass circuit 116 are provided in addition to the circuits required for discharge.
- Reference numerals 104, 108, 113, 114, 115, and 116 constitute preheating means. If the switches 113, 114, 115 are at the a-contact, as shown in Fig. 13 (a), the power sources 104, 108 are connected in parallel, and the rod-shaped anode 10 The gun is heated in parallel with 3, and the mouth-shaped anode 103 is heated as heat and the work 5 is preheated.
- FIG. 17 shows that an AC power supply 110 for using the anode as a heater is provided separately from the DC power supplies 104 and 108 for vacuum arc discharge.
- Switches 11 1 and 11 2 are provided between the AC power supply circuit and the DC power supply circuit so that the gun contact with the rod-shaped anode 103 can be switched.
- the switches 1 1 1 and 1 1 2 are a-contacts
- the rod-shaped anode 103 is connected to the DC power supplies 104 and 108, and normal coating is performed. Prior to this coating, if the switches 1 1 1 and 1 1 2 b were brought into contact, the rod-shaped anode 103 was contacted with an AC power supply 110 and the rod-shaped anode 1 was turned on.
- Work 5 is preheated with 0 3 as the night.
- a conventional flat evaporation source by disposing an electrode in the front of the evaporation source, the bias of the discharge can be reduced. Also in this case, as described in FIG. 16 and FIG. 17, the mouth electrode may be used as a heater for preheating. / 21839
- the work table 23 moves horizontally on the lower cover ⁇ 7.
- the roller rail 20 is provided in the embodiment of FIGS. 1 and 2, but more preferably, the vacuum seal 1 can be reliably carried out because the inside of the vacuum chamber 1 is vacuum. It is necessary to make the configuration and the configuration that can reliably drive the drive 23. Furthermore, after the work table 23 is carried into the predetermined position of the lower cover 1, the position shift that does not move in the horizontal direction regardless of the vertical movement of the lower cover 17 can be prevented. Necessary from a viewpoint.
- FIG. 18 shows an example of means for rotating the work 5 on the work table 23 together with the means for horizontally moving the work table 23, which will be described later.
- Free rollers 120 are arranged in a row on the lower cover 17, and the work table 23 rolls thereon.
- a rack 123 is attached to a side surface of the work table 23, and a pinion 125 that fits the rack 123 is fitted into a shaft 124 mounted on a lower lid 17.
- the axes 124 are for horizontally moving the work table 23.
- the shaft 124 is connected to a driving motor 132 via a pair of pulleys 130 and a clutch 131.
- the shaft 124 is provided with a disc brake 1S3, and an encoder switch 134 for detecting the rotational position of the disc. Then, the driving ⁇ circle around (1) ⁇ is controlled by a driver [35], and the rotation information of the encoder switch [13] is input to the driver [13].
- the work table 23 is carried into the vacuum chamber by the pinion 1 25.
- the workpiece 5 on the work table 23 is conveyed to a position where the bias voltage transmission unit 150 for applying the bias voltage to the workpiece 5 is brought into close contact with a predetermined force.
- the pinion 1 25 is engaged with the rack 1 23 as shown. / 21839
- the work table 23 is rotatably supported by a rotary table 122, and a rotary shaft 122 is protruded below the work table 23.
- a gear 1 26 is fitted into the rotating shaft 1 2 2
- a gear 1 28 fitted with the gear 1 2 6 is fitted into the shaft 1 2 7 protruding from the lower lid 17.
- the shaft 127 is for rotating the rotary table 121, and is connected to the drive motor 142 via the gear train 140 and the pulley 141.
- a ball joint 144 is provided at the lower end of the shaft 127, and an air cylinder 144 is connected after rotation and edge cutting.
- the air cylinder 144 has upper and lower limit switches 144 and 146, and can reciprocate up and down.
- the air cylinder 144 shortens, and the gear 128 retracts to a position below the gear 126.
- the lock table 2 3. is fixed in place, the air cylinder 144 expands, but there is no guarantee that the gears 128 and 128 will be in the engaged position. Therefore, when the drive motor 142 is slightly moved by the driver 14 and the shortening and extension of the gear cylinder 144 are repeated several times, the gear 128 and the gear 128 94/21839
- the horizontal moving means of the work table 23 and the rotating means of the workpiece 5 are constituted as described above, only two shafts 124 and 127 are protruded from the lower lid 17. Since only this portion needs to be vacuum-sealed, the vacuum sealing can be performed reliably.
- the rack 1 23 and the pinion 125 are used, the work table 23 can be driven reliably, and the shaft 124 into which the pinion 125 is fitted is fixed. Work table 23 can be fixed.
- the horizontal moving means of the work table 23 and the rotating means of the work 5 described above can also be applied to an AIP apparatus having a conventional flat plate evaporation source.
- the traveling vehicle 30 has roller rails 31 and S2, and is provided with a first mounting portion A and a second mounting portion B of the worktable 23. It is mounted on the rail 33 so that it can reciprocate a distance P ′ equal to the distance P between the first and second mounting portions A and B.
- the traveling trolley 30 is at the solid line position, and the first mounting part A stands by in an empty state.
- the worktable 23 on which the processed workpiece 5 is mounted is carried out in the direction 1, the traveling carriage 30 is moved to the position indicated by the two-dot chain line in the direction ', and the second mounting part B is evacuated. Faces chamber 1.
- the unprocessed work table 23 mounted on the second mounting part B is carried in the direction 3, and the work table 23 is placed in the vacuum channel 1 in the order of Fig. 2 (b) ⁇ 2 () ⁇ Fig. 1. 23 are carried in.
- the work table 23 is automatically replaced and the first mounting part A has been processed.
- the work table 23 on which the mark 5 is mounted gets on, and the second mounting part B becomes empty. The worker only needs to exchange the work 5 and the shield plate 24 on the work table 23 of the first loading section A during the cycle time. What 94/21839
- the work table 23 may be provided with the n-type anode 103 described above, and in such a case, the rod-type anode 103 may be easily replaced.
- Fig. 19 is an AIP system diagram when one traveling vehicle 30 is used for a large number of ⁇ ⁇ devices (four in the example shown).
- Four AIP devices 35 A, 35 B, 35 C and 35 D are arranged along the rail 33, and a turntable 36 is installed at the end of the rail 33.
- 37 is a distribution board / control board
- 38 is a bias power supply unit
- 39 is an arc power supply unit
- 40 is a rack wiring.
- work tools four work tables 23 equipped with vermilion-treated work 5 and a clean shield plate 2 are placed on the evening table 36.
- the second mounting part B of the traveling vehicle 30 receives the unprocessed worktable 23 from the turntable 36 and automatically replaces it in the same manner as in Fig. 3, and performs processing. Return the completed worktable 23 to the turntable 36.
- the overnight table 36 becomes a rest with the processed table 23 on board. Therefore, the worker may collectively exchange the work 5 and the shield plate 24 and the ⁇ -pod-shaped anode 103 as needed toward the evening table 36.
- the traveling carriage 30 is provided with two worktable mounting parts, but has only one mounting part, and the processed worktable is first stored. After receiving and transporting to the turntable 36, an unprocessed worktable may be received from the turntable 36 and transported to the AIP device.
- FIG. 20 shows an AIP system using a rotary table 4D instead of the traveling vehicle 30.
- *, *, 35 X, ⁇ - evening table 40, ...,, 40 are installed, and each rotary table 40, ..., 40, Two-way conveyors 4 1, ⁇ ⁇ ⁇ ⁇ , connected by 1.
- an unloading conveyor 42 is connected with a gun, and at the end of the unloading conveyor 42, a large number of processed worktables 23 are stored via a cross table 44.
- Tocker 4 5 is connected.
- a carry-in conveyor 43 is connected to the opposite side of the bidirectional conveyor 41 of the mouthpiece table 40 in front of the AIP device 35 X, and a cross table 46 is connected to an end of the carry-in conveyor 43.
- a second stocker 47 in which a large number of unprocessed worktables are stored, is connected via the.
- the processed work table 23 passes through the ⁇ - tary table 40 of the AIP device 35 A, and is stored in the first stocker 45 via the cross table 44.
- the unprocessed work table 23 pulled out from the second stocker 47 through the cross table 46 enters the evening table 40 as shown in the direction 3, and the turntable 40 turns in the direction 4 as the turntable 40 turns.
- the work table 23 on which the workpieces 5 before and after the processing are mounted can be automatically transferred.
- the AIP system can be operated even at night, which can achieve high productivity.
- the automatic exchange system shown in Figs. 3, 19 and 20 is not limited to the AIP device employing the rod-shaped evaporation source 14 shown in Fig. 1, but has a flat plate-shaped evaporation source as shown in Fig. 23. It is also applicable to AIP devices.
- Figure 21 shows this example.
- Figure (a) is a top view and Figure (b) is a side view.
- a flat-plate evaporation source 51 is provided on both sides of the vacuum chamber 50, and a gate valve 53 for moving a valve plate 52 up and down is mounted in front of the vacuum chamber 50.
- the work table 23 on which the work 28 is mounted is pulled out onto the traveling carriage 30 (or the rotary table 40) by the raised state of the valve plate 52 serving as an opening / closing door.
- Mounting a shield plate on the worktable is not limited to the batch-type AIP device described above, but can also be applied to an inline-type AIP device S as shown in FIG.
- This in-line type AIP apparatus comprises a vacuum chamber 60, a preheating chamber 61, a coating chamber 62, and a cooling chamber 63, which are gate valves 64a, 64b, 64c, 64.
- the work tables 66 are connected to each other through the rails 65 through d and 64 e sequentially into the respective chambers 60 to 63.
- a work table 66 with a clean shield plate 67 is loaded into the vacuum chamber 60, and a work table 66 is mounted on the work table 66. From Table 3, a work table 66 equipped with the shield plate 67 is removed. Therefore, the shield plate 67 can be replaced for each line (running) outside without stopping the AIP device, and the coating using the clean shield plate 67 can always be performed. Further, if the anode is also mounted on the work table 66 and transported together with the work 5 and the shield plate 67, the anode can be replaced * cleaned easily and efficiently.
- the AIP device of the present invention and the AIP system equipped with the device can easily carry in and carry out the work to and from the device, so that it has high productivity and can be applied to various surface treatments. Effective for processing workpieces.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE69432165T DE69432165T2 (de) | 1993-03-15 | 1994-03-15 | Vorrichtung und system zum lichtbogenionenplattieren |
| US08/325,438 US5730847A (en) | 1993-03-15 | 1994-03-15 | Arc ion plating device and arc ion plating system |
| EP94909317A EP0643151B9 (en) | 1993-03-15 | 1994-03-15 | Apparatus and system for arc ion plating |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8140693 | 1993-03-15 | ||
| JP5/81406 | 1993-03-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1994021839A1 true WO1994021839A1 (fr) | 1994-09-29 |
Family
ID=13745455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1994/000410 Ceased WO1994021839A1 (fr) | 1993-03-15 | 1994-03-15 | Appareil et systeme de placage ionique a l'arc |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5730847A (ja) |
| EP (1) | EP0643151B9 (ja) |
| DE (1) | DE69432165T2 (ja) |
| WO (1) | WO1994021839A1 (ja) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5972185A (en) * | 1997-08-30 | 1999-10-26 | United Technologies Corporation | Cathodic arc vapor deposition apparatus (annular cathode) |
| US5932078A (en) * | 1997-08-30 | 1999-08-03 | United Technologies Corporation | Cathodic arc vapor deposition apparatus |
| US5997705A (en) * | 1999-04-14 | 1999-12-07 | Vapor Technologies, Inc. | Rectangular filtered arc plasma source |
| US7250196B1 (en) | 1999-10-26 | 2007-07-31 | Basic Resources, Inc. | System and method for plasma plating |
| US6350317B1 (en) * | 1999-12-30 | 2002-02-26 | Lam Research Corporation | Linear drive system for use in a plasma processing system |
| US6503379B1 (en) * | 2000-05-22 | 2003-01-07 | Basic Research, Inc. | Mobile plating system and method |
| US6521104B1 (en) * | 2000-05-22 | 2003-02-18 | Basic Resources, Inc. | Configurable vacuum system and method |
| US20030180450A1 (en) * | 2002-03-22 | 2003-09-25 | Kidd Jerry D. | System and method for preventing breaker failure |
| WO2004000494A1 (ja) * | 2002-06-25 | 2003-12-31 | Mitsubishi Materials Corporation | 被覆切削工具部材 |
| US7150792B2 (en) * | 2002-10-15 | 2006-12-19 | Kobe Steel, Ltd. | Film deposition system and film deposition method using the same |
| JP4199062B2 (ja) * | 2003-07-07 | 2008-12-17 | 株式会社神戸製鋼所 | 真空蒸着装置 |
| US20050126497A1 (en) * | 2003-09-30 | 2005-06-16 | Kidd Jerry D. | Platform assembly and method |
| JP5014603B2 (ja) * | 2005-07-29 | 2012-08-29 | 株式会社アルバック | 真空処理装置 |
| US20070240982A1 (en) * | 2005-10-17 | 2007-10-18 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Arc ion plating apparatus |
| US7498587B2 (en) * | 2006-05-01 | 2009-03-03 | Vapor Technologies, Inc. | Bi-directional filtered arc plasma source |
| TWI386509B (zh) * | 2007-05-25 | 2013-02-21 | Hon Hai Prec Ind Co Ltd | 翻面治具及翻面方法 |
| US20100218721A1 (en) * | 2007-09-05 | 2010-09-02 | Atomic Energy Council - Institute Of Nuclear Energy Research | Hollow-cathode discharge apparatus for plasma-based processing |
| TWI400344B (zh) * | 2008-09-02 | 2013-07-01 | Metal Ind Res & Dev Ct | Vacuum barrel and vacuum deposition machine for vacuum plating machine |
| US8673122B2 (en) * | 2009-04-07 | 2014-03-18 | Magna Mirrors Of America, Inc. | Hot tile sputtering system |
| DE102010032591A1 (de) * | 2010-07-23 | 2012-01-26 | Leybold Optics Gmbh | Vorrichtung und Verfahren zur Vakuumbeschichtung |
| US20140110253A1 (en) * | 2011-07-06 | 2014-04-24 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Vacuum coating apparatus |
| JP5916581B2 (ja) * | 2012-10-12 | 2016-05-11 | 株式会社神戸製鋼所 | Pvd処理方法及びpvd処理装置 |
| JP5941016B2 (ja) * | 2013-05-27 | 2016-06-29 | 株式会社神戸製鋼所 | 成膜装置およびそれを用いた成膜方法 |
| US20190276932A1 (en) * | 2018-03-08 | 2019-09-12 | Shimadzu Corporation | Film forming apparatus and film forming method |
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Also Published As
| Publication number | Publication date |
|---|---|
| EP0643151A4 (en) | 1997-01-15 |
| US5730847A (en) | 1998-03-24 |
| EP0643151B9 (en) | 2003-11-26 |
| DE69432165T2 (de) | 2003-12-11 |
| EP0643151A1 (en) | 1995-03-15 |
| DE69432165D1 (de) | 2003-04-03 |
| EP0643151B1 (en) | 2003-02-26 |
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