WO1999042902A3 - Systemes optiques d'imagerie par reflexion a distorsion equilibree - Google Patents

Systemes optiques d'imagerie par reflexion a distorsion equilibree Download PDF

Info

Publication number
WO1999042902A3
WO1999042902A3 PCT/US1999/003767 US9903767W WO9942902A3 WO 1999042902 A3 WO1999042902 A3 WO 1999042902A3 US 9903767 W US9903767 W US 9903767W WO 9942902 A3 WO9942902 A3 WO 9942902A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical systems
distortion
convex
optical imaging
imaging systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1999/003767
Other languages
English (en)
Other versions
WO1999042902A2 (fr
Inventor
Henry N Chapman
Russell M Hudyma
David R Shafer
Donald W Sweeney
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California Berkeley
University of California, San Diego
Original Assignee
University of California Berkeley
University of California, San Diego
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/027,281 external-priority patent/US5973826A/en
Priority claimed from US09/094,420 external-priority patent/US6226346B1/en
Application filed by University of California Berkeley, University of California, San Diego filed Critical University of California Berkeley
Priority to AU41803/99A priority Critical patent/AU4180399A/en
Publication of WO1999042902A2 publication Critical patent/WO1999042902A2/fr
Publication of WO1999042902A3 publication Critical patent/WO1999042902A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)

Abstract

L'invention porte sur des systèmes optiques fonctionnant dans l'extrême UV comportant quatre éléments réfléchissant projetant une image masque sur un substrat. Les quatre éléments optiques comprennent dans l'ordre de l'objet vers l'image des miroirs convexe, concave, convexe et concave. Lesdits systèmes sont particulièrement adaptés à des procédés de lithographie par paliers et balayage. L'invention permet d'utiliser des fentes plus larges associées à une optique de balayage à champs annulaire, ce qui augmente la production des tranches et la densité d'implantation des dispositifs à semi-conducteurs. Ces systèmes se caractérisent par une réduction de la distorsion dynamique puisque la distorsion statique est équilibrée le long de la largeur de la fente.
PCT/US1999/003767 1998-02-20 1999-02-19 Systemes optiques d'imagerie par reflexion a distorsion equilibree Ceased WO1999042902A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU41803/99A AU4180399A (en) 1998-02-20 1999-02-19 Reflective optical imaging systems with balanced distortion

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US09/027,281 US5973826A (en) 1998-02-20 1998-02-20 Reflective optical imaging system with balanced distortion
US09/027,281 1998-02-20
US09/094,420 US6226346B1 (en) 1998-06-09 1998-06-09 Reflective optical imaging systems with balanced distortion
US09/094,420 1998-06-09

Publications (2)

Publication Number Publication Date
WO1999042902A2 WO1999042902A2 (fr) 1999-08-26
WO1999042902A3 true WO1999042902A3 (fr) 1999-10-14

Family

ID=26702270

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/003767 Ceased WO1999042902A2 (fr) 1998-02-20 1999-02-19 Systemes optiques d'imagerie par reflexion a distorsion equilibree

Country Status (2)

Country Link
AU (1) AU4180399A (fr)
WO (1) WO1999042902A2 (fr)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19923609A1 (de) * 1998-05-30 1999-12-02 Zeiss Carl Fa Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie
EP1930771A1 (fr) 2006-12-04 2008-06-11 Carl Zeiss SMT AG Objectif de projection possédant des éléments de miroir avec des revêtements réfléchissants
DE102009047179B8 (de) 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
CN113050362B (zh) * 2019-12-27 2024-04-26 中芯国际集成电路制造(上海)有限公司 光学邻近修正方法及掩膜版

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5257139A (en) * 1991-05-09 1993-10-26 Nikon Corporation Reflection reduction projection optical system
US5315629A (en) * 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5353322A (en) * 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US5315629A (en) * 1990-10-10 1994-05-24 At&T Bell Laboratories Ringfield lithography
US5257139A (en) * 1991-05-09 1993-10-26 Nikon Corporation Reflection reduction projection optical system
US5353322A (en) * 1992-05-05 1994-10-04 Tropel Corporation Lens system for X-ray projection lithography camera
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US9778444B1 (en) 2014-03-16 2017-10-03 Navitar Industries, Llc Optical assembly for a wide field of view point action camera with low astigmatism
US9784943B1 (en) 2014-03-16 2017-10-10 Navitar Industries, Llc Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US10107989B1 (en) 2014-03-16 2018-10-23 Navitar Industries, Llc Optical assembly for a wide field of view point action camera with low field curvature
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US10139599B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US10317652B1 (en) 2014-03-16 2019-06-11 Navitar Industries, Llc Optical assembly for a wide field of view point action camera with low astigmatism
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
US10545313B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US10739561B1 (en) 2014-03-16 2020-08-11 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US10746967B2 (en) 2014-03-16 2020-08-18 Navitar Industries, Llc Optical assembly for a wide field of view point action camera with low field curvature
US11754809B2 (en) 2014-03-16 2023-09-12 Navitar, Inc. Optical assembly for a wide field of view point action camera with low field curvature

Also Published As

Publication number Publication date
WO1999042902A2 (fr) 1999-08-26
AU4180399A (en) 1999-09-06

Similar Documents

Publication Publication Date Title
TW490597B (en) Multi-mirror-system for an illumination system, and the illumination system, EUV-projection exposure unit for microlithography, and process for producing microelectronic devices comprising and using the same
EP0903605A3 (fr) Système optique de projection à quatre miroirs pour l' uv extrème
US5142132A (en) Adaptive optic wafer stepper illumination system
US5216247A (en) Optical scanning method with circular arc scanning traces
EP0465882A2 (fr) Lentille relais catadioptrique pour une réduction optique avec haute résolution
US5241423A (en) High resolution reduction catadioptric relay lens
US6542179B1 (en) Light integrating system with reduced dynamic shading
US6197454B1 (en) Clean-enclosure window to protect photolithographic mask
EP0816892A3 (fr) Système de lentilles catadioptrique
US6600552B2 (en) Microlithography reduction objective and projection exposure apparatus
EP1024408A3 (fr) Condenseur pour l' UV extrême avec une optique ne produisant aucune image
EP1243971A3 (fr) Dispositif d'exposition
JP2000235144A (ja) マイクロリソグラフィー縮小用対物レンズおよび投影露光装置
JPH0478002B2 (fr)
US6989229B2 (en) Non-resolving mask tiling method for flare reduction
EP0844530A3 (fr) Réduction de bruit de motif dans dispositifs d'illumination pour systèmes lithographiques à balayage
TWI269119B (en) Lithographic apparatus and device manufacturing method
EP1024522A4 (fr) Procede d'exposition et aligneur
EP0871072A3 (fr) Système à détecteurs multiples pour l'alignement photolithographique
US6566018B2 (en) Dual-member pellicle assemblies and methods of use
US7012674B2 (en) Maskless optical writer
US6411367B1 (en) Modified optics for imaging of lens limited subresolution features
JP2000269132A (ja) マイクロリソグラフィ投影対物レンズならびに投影露光装置
NL8903108A (nl) Werkwijze voor de vervaardiging van een inrichting en maskergroep voor de werkwijze.
WO2002084376A1 (fr) Dispositif a balayage optique, lecteur d'image equipe de ce dispositif, imageur et dispositif de prise de vue

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG UZ VN YU ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW SD SZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

AK Designated states

Kind code of ref document: A3

Designated state(s): AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG UZ VN YU ZW

AL Designated countries for regional patents

Kind code of ref document: A3

Designated state(s): GH GM KE LS MW SD SZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
NENP Non-entry into the national phase

Ref country code: KR

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase