WO2003012549A3 - Lithograph mit bewegtem zylinderlinsensystem - Google Patents

Lithograph mit bewegtem zylinderlinsensystem Download PDF

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Publication number
WO2003012549A3
WO2003012549A3 PCT/EP2002/008372 EP0208372W WO03012549A3 WO 2003012549 A3 WO2003012549 A3 WO 2003012549A3 EP 0208372 W EP0208372 W EP 0208372W WO 03012549 A3 WO03012549 A3 WO 03012549A3
Authority
WO
WIPO (PCT)
Prior art keywords
movement
lithograph
lens
write beam
lens system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2002/008372
Other languages
English (en)
French (fr)
Other versions
WO2003012549A2 (de
Inventor
Steffen Noehte
Christoph Dietrich
Robert Thomann
Stefan Stadler
Joern Leiber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Scribos GmbH
Original Assignee
Tesa Scribos GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tesa Scribos GmbH filed Critical Tesa Scribos GmbH
Priority to DE10293414T priority Critical patent/DE10293414B4/de
Priority to US10/485,009 priority patent/US20040257629A1/en
Priority to GB0403047A priority patent/GB2395799B/en
Publication of WO2003012549A2 publication Critical patent/WO2003012549A2/de
Publication of WO2003012549A3 publication Critical patent/WO2003012549A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0478—Serial printer, i.e. point oriented processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)

Abstract

Die Erfindung betrifft einen Lithographen zum Herstellen digitaler Hologramme in einem Speichermedium (13) mit einer Quelle zur Erzeugung eines Schreibstrahls (2), mit einer bewegten Linse (4) zum Fokussieren des Schreibstrahls (2), mit Mitteln zum Bewegen der bewegten Linse (4) entlang einer Bewegungsrichtung (6) und mit einem Mittel zum Verfahren des Schreibstrahls (2) relativ zu dem Speichermedium (13) senkrecht zu der Bewegungsrichtung (6). Das technische Problem, einen Lithographen bereitzustellen, bei dem Störungen der Bewegung einer Linse senkrecht zu deren Bewegungsrichtung keinen Einfluss auf die Qualität des Hologramms haben, wird dadurch gelöst, dass die bewegte Linse 4 nur im wesentlichen in einer ersten Richtung Brechkraft aufweist, die parallel zu der Bewegungsrichtung (6) ist, dass eine stationäre Linse (9) vorgesehen ist und dass die stationäre Linse (9) nur im wesentlichen in einer zweiten Richtung (5) Brechkraft aufweist, wobei die zweite Richtung (5) senkrecht zu der ersten Richtung und zu dem Schreibstrahl (2) steht.
PCT/EP2002/008372 2001-07-27 2002-07-26 Lithograph mit bewegtem zylinderlinsensystem Ceased WO2003012549A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE10293414T DE10293414B4 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem Zylinderlinsensystem
US10/485,009 US20040257629A1 (en) 2001-07-27 2002-07-26 Lithograph comprising a moving cylindrical lens system
GB0403047A GB2395799B (en) 2001-07-27 2002-07-26 Lithograph having a moving cylindrical lens system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10136569 2001-07-27
DE10136569.1 2001-07-27

Publications (2)

Publication Number Publication Date
WO2003012549A2 WO2003012549A2 (de) 2003-02-13
WO2003012549A3 true WO2003012549A3 (de) 2003-10-09

Family

ID=7693264

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008372 Ceased WO2003012549A2 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem zylinderlinsensystem

Country Status (4)

Country Link
US (1) US20040257629A1 (de)
DE (1) DE10293414B4 (de)
GB (1) GB2395799B (de)
WO (1) WO2003012549A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9069244B2 (en) 2010-08-23 2015-06-30 Rolith, Inc. Mask for near-field lithography and fabrication the same

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WO2002084404A1 (de) * 2001-04-12 2002-10-24 Tesa Scribos Gmbh Lithograph mit eindimensionaler triggermaske und verfahren zum herstellen digitaler hologramme in einem speichermedium
EP1826632B1 (de) 2006-02-22 2015-12-30 tesa scribos GmbH Verfahren zum Berechnen von computergenerierten Hologrammen auf einer unebenen Fläche
ATE532104T1 (de) * 2006-04-04 2011-11-15 Tesa Scribos Gmbh Vorrichtung und verfahren zur steuerung einer vorrichtung zur mikrostrukturierung eines speichermediums
DE102006032538A1 (de) 2006-04-04 2007-10-11 Tesa Scribos Gmbh Speichermedium mit einem Sicherheitsmerkmal sowie Verfahren zur Herstellung eines Speichermediums mit einem Sicherheitsmerkmal
DE102006037216B4 (de) * 2006-04-04 2017-07-13 Tesa Scribos Gmbh Verfahren zur Herstellung einer Punkteverteilung in einem Speichermedium sowie ein Speichermedium
DE102006025335A1 (de) * 2006-05-31 2007-12-06 Tesa Scribos Gmbh Etikett mit einem Sicherheitsmerkmal und Behälter mit einem Etikett
DE102006032234A1 (de) 2006-07-12 2008-01-17 Tesa Scribos Gmbh Verfahren zum Aufbringen eines Sicherheitsmerkmals auf ein Sicherheitsdokument sowie Sicherheitsdokument mit einem Sicherheitsmerkmal
DE102007004857A1 (de) 2007-01-31 2008-08-07 Tesa Scribos Gmbh Datenträger und Etikett sowie deren Herstellung
DE102007006120A1 (de) 2007-02-02 2008-08-07 Tesa Scribos Gmbh Speichermedium mit einer optisch veränderbaren Speicherschicht
DE102007006119A1 (de) 2007-02-02 2008-08-14 Tesa Scribos Gmbh Datenspeicher
WO2008153674A1 (en) 2007-06-09 2008-12-18 Boris Kobrin Method and apparatus for anisotropic etching
US8518633B2 (en) * 2008-01-22 2013-08-27 Rolith Inc. Large area nanopatterning method and apparatus
US8192920B2 (en) * 2008-04-26 2012-06-05 Rolith Inc. Lithography method
TWI427431B (zh) 2008-09-22 2014-02-21 Ａｓｍｌ荷蘭公司 微影裝置、可程式化圖案化器件及微影方法
US20110210480A1 (en) * 2008-11-18 2011-09-01 Rolith, Inc Nanostructures with anti-counterefeiting features and methods of fabricating the same
DE102009040112B4 (de) 2009-09-04 2021-03-04 Tesa Scribos Gmbh Etikettenbahn mit einer Mehrzahl von Etiketten
TWI448830B (zh) 2010-02-09 2014-08-11 Ａｓｍｌ荷蘭公司 微影裝置及元件製造方法
KR101419330B1 (ko) 2010-02-23 2014-07-15 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
US9041911B2 (en) 2010-02-25 2015-05-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5738981B2 (ja) 2010-04-12 2015-06-24 エーエスエムエル ネザーランズ ビー．ブイ． 基板ハンドリング装置、リソグラフィ装置、ツール、及びデバイス製造方法
KR101501967B1 (ko) 2010-12-08 2015-03-12 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
JP5793236B2 (ja) 2011-03-29 2015-10-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィにおける放射ビームスポットの位置の測定
US9645502B2 (en) 2011-04-08 2017-05-09 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
NL2008500A (en) 2011-04-21 2012-10-23 Asml Netherlands Bv Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method.
WO2013023876A1 (en) 2011-08-18 2013-02-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
WO2013079316A2 (en) 2011-11-29 2013-06-06 Asml Netherlands B.V. Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
NL2009761A (en) 2011-11-29 2013-05-30 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and computer program.
JP5840303B2 (ja) 2011-12-05 2016-01-06 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
JP5881851B2 (ja) 2011-12-06 2016-03-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、セットポイントデータを提供する装置、デバイス製造方法、セットポイントデータの計算方法、およびコンピュータプログラム
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9354502B2 (en) 2012-01-12 2016-05-31 Asml Netherlands B.V. Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
KR101633761B1 (ko) 2012-01-17 2016-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
NL2010176A (en) 2012-02-23 2013-08-26 Asml Netherlands Bv Device, lithographic apparatus, method for guiding radiation and device manufacturing method.
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
KR102517037B1 (ko) * 2020-11-03 2023-04-04 경북대학교 산학협력단 실린드리컬 렌즈를 이동하여 호겔 위치를 조정하는 홀로그램 프린터

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WO1991001517A1 (en) * 1989-07-18 1991-02-07 Massachusetts Institute Of Technology Improving holographic lithography
WO2002079881A2 (de) * 2001-03-30 2002-10-10 Tesa Scribos Gmbh Lithographischer apparat mit bewegter linse zum herstellen digitaler hologramme
WO2002084404A1 (de) * 2001-04-12 2002-10-24 Tesa Scribos Gmbh Lithograph mit eindimensionaler triggermaske und verfahren zum herstellen digitaler hologramme in einem speichermedium

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Publication number Priority date Publication date Assignee Title
WO1991001517A1 (en) * 1989-07-18 1991-02-07 Massachusetts Institute Of Technology Improving holographic lithography
WO2002079881A2 (de) * 2001-03-30 2002-10-10 Tesa Scribos Gmbh Lithographischer apparat mit bewegter linse zum herstellen digitaler hologramme
WO2002084404A1 (de) * 2001-04-12 2002-10-24 Tesa Scribos Gmbh Lithograph mit eindimensionaler triggermaske und verfahren zum herstellen digitaler hologramme in einem speichermedium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9069244B2 (en) 2010-08-23 2015-06-30 Rolith, Inc. Mask for near-field lithography and fabrication the same

Also Published As

Publication number Publication date
WO2003012549A2 (de) 2003-02-13
US20040257629A1 (en) 2004-12-23
GB2395799B (en) 2005-06-15
GB2395799A (en) 2004-06-02
DE10293414B4 (de) 2007-03-01
DE10293414D2 (de) 2004-08-19
GB0403047D0 (en) 2004-03-17

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