WO2003065428A1 - Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium - Google Patents

Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium Download PDF

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Publication number
WO2003065428A1
WO2003065428A1 PCT/JP2003/000833 JP0300833W WO03065428A1 WO 2003065428 A1 WO2003065428 A1 WO 2003065428A1 JP 0300833 W JP0300833 W JP 0300833W WO 03065428 A1 WO03065428 A1 WO 03065428A1
Authority
WO
WIPO (PCT)
Prior art keywords
communication server
image formation
information
adjustment device
adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2003/000833
Other languages
English (en)
French (fr)
Other versions
WO2003065428B1 (en
Inventor
Yasuo Shimizu
Shigeru Hirukawa
Kousuke Suzuki
Tomoyuki Matsuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to EP03734875A priority Critical patent/EP1478010A4/en
Priority to JP2003564921A priority patent/JP4415674B2/ja
Priority to KR1020047011623A priority patent/KR100927560B1/ko
Publication of WO2003065428A1 publication Critical patent/WO2003065428A1/ja
Publication of WO2003065428B1 publication Critical patent/WO2003065428B1/ja
Priority to US10/901,209 priority patent/US7230682B2/en
Anticipated expiration legal-status Critical
Priority to US11/736,134 priority patent/US7391497B2/en
Priority to US11/736,177 priority patent/US7405803B2/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/18—Fire preventing or extinguishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
PCT/JP2003/000833 2002-01-29 2003-01-29 Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium Ceased WO2003065428A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP03734875A EP1478010A4 (en) 2002-01-29 2003-01-29 PICTURE CONTROL STATE SETUP SYSTEM, EXPOSURE METHOD, EXPOSURE DEVICE, PROGRAM AND INFORMATION RECORDING MEDIUM
JP2003564921A JP4415674B2 (ja) 2002-01-29 2003-01-29 像形成状態調整システム、露光方法及び露光装置、並びにプログラム及び情報記録媒体
KR1020047011623A KR100927560B1 (ko) 2002-01-29 2003-01-29 이미지 형성 상태 조정 시스템, 노광 방법 및 노광 장치, 그리고 프로그램 및 정보 기록 매체
US10/901,209 US7230682B2 (en) 2002-01-29 2004-07-29 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
US11/736,134 US7391497B2 (en) 2002-01-29 2007-04-17 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
US11/736,177 US7405803B2 (en) 2002-01-29 2007-04-17 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002-020712 2002-01-29
JP2002020712 2002-01-29
JP2002158954 2002-05-31
JP2002-158954 2002-05-31

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/901,209 Continuation US7230682B2 (en) 2002-01-29 2004-07-29 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium

Publications (2)

Publication Number Publication Date
WO2003065428A1 true WO2003065428A1 (en) 2003-08-07
WO2003065428B1 WO2003065428B1 (en) 2004-05-13

Family

ID=27667443

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2003/000833 Ceased WO2003065428A1 (en) 2002-01-29 2003-01-29 Image formation state adjustment system, exposure method, exposure apparatus, program, and information recording medium

Country Status (7)

Country Link
US (3) US7230682B2 (ja)
EP (1) EP1478010A4 (ja)
JP (1) JP4415674B2 (ja)
KR (1) KR100927560B1 (ja)
CN (1) CN100345252C (ja)
TW (1) TWI223132B (ja)
WO (1) WO2003065428A1 (ja)

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WO2007066692A1 (ja) 2005-12-06 2007-06-14 Nikon Corporation 露光方法、露光装置、及びデバイス製造方法
WO2007077925A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation パターン形成方法及びパターン形成装置、並びにデバイス製造方法
JP2007194551A (ja) * 2006-01-23 2007-08-02 Nikon Corp 算出方法、調整方法及び露光方法、並びに像形成状態調整システム及び露光装置
WO2007094407A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007094470A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
WO2007097380A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置及びパターン形成方法、移動体駆動システム及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
WO2007097466A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation 測定装置及び方法、処理装置及び方法、パターン形成装置及び方法、露光装置及び方法、並びにデバイス製造方法
WO2007097379A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置、マーク検出装置、露光装置、パターン形成方法、露光方法及びデバイス製造方法
WO2007119501A1 (ja) 2006-03-23 2007-10-25 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
WO2008026739A1 (fr) 2006-08-31 2008-03-06 Nikon Corporation Procédé d'entraînement de corps mobile et système d'entraînement de corps mobile, procédé et appareil de mise en forme de motif, procédé et appareil d'exposition et procédé de fabrication de dispositif
WO2008026742A1 (en) 2006-08-31 2008-03-06 Nikon Corporation Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
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WO2008029758A1 (fr) 2006-09-01 2008-03-13 Nikon Corporation Procédé de commande de corps mobile, système et commande de corps mobile, procédé et appareil de formation de motif, procédé et appareil d'exposition et procédé de fabrication de ce dispositif
WO2008029757A1 (fr) 2006-09-01 2008-03-13 Nikon Corporation Procédé de commande d'objet mobile, système de commande d'objet mobile, procédé et appareil de formation de motif, procédé et appareil d'exposition, procédé de fabrication de dispositif et procédé d'étalonnage
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