WO2003081712A3 - Gitterelement zum filtern von wellenlängen ≤ 100nm - Google Patents

Gitterelement zum filtern von wellenlängen ≤ 100nm Download PDF

Info

Publication number
WO2003081712A3
WO2003081712A3 PCT/EP2003/002419 EP0302419W WO03081712A3 WO 2003081712 A3 WO2003081712 A3 WO 2003081712A3 EP 0302419 W EP0302419 W EP 0302419W WO 03081712 A3 WO03081712 A3 WO 03081712A3
Authority
WO
WIPO (PCT)
Prior art keywords
grating
grating element
filtering wavelengths
individual
wavelengths
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2003/002419
Other languages
English (en)
French (fr)
Other versions
WO2003081712A2 (de
Inventor
Klaus Heidemann
Karlfried Osterried
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to EP03708203A priority Critical patent/EP1485759A2/de
Priority to AU2003212324A priority patent/AU2003212324A1/en
Priority to JP2003579308A priority patent/JP2005521107A/ja
Publication of WO2003081712A2 publication Critical patent/WO2003081712A2/de
Publication of WO2003081712A3 publication Critical patent/WO2003081712A3/de
Priority to US10/945,626 priority patent/US20050180013A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

Die Erfindung betrifft ein Gitterelement zum Filtern von Wellenlängen ≤ 100 nm mit einer Vielzahl von Einzelgitterelementen, wobei die Einzelgitterelemente Gitterli­nien, ergebend eine Gitterperiodizität, aufweisen. Die Erfindung ist dadurch gekennzeichnet, dass die Einzelgitterelemente in Rich­tung der Strahlen eines Strahlbüschels, das auf das Gitterelement auftrifft, hinter­einander auf einer gekrümmten Trägerfläche relativ zu der durch das Gitterele­ment aufgespannten Ebene angeordnet sind.
PCT/EP2003/002419 2002-03-21 2003-03-10 Gitterelement zum filtern von wellenlängen ≤ 100nm Ceased WO2003081712A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP03708203A EP1485759A2 (de) 2002-03-21 2003-03-10 Gitterelement zum filtern von wellenlängen = 100nm
AU2003212324A AU2003212324A1 (en) 2002-03-21 2003-03-10 Grating element for filtering wavelengths d 100nm
JP2003579308A JP2005521107A (ja) 2002-03-21 2003-03-10 １００ｎｍ以下の波長を濾光するための格子素子
US10/945,626 US20050180013A1 (en) 2002-03-21 2004-09-21 Grating element for filtering wavelengths < 100 nm

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10212691.7 2002-03-21
DE2002112691 DE10212691A1 (de) 2002-03-21 2002-03-21 Gitterelement zum Filtern von Wellenlängen 100 nm

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/945,626 Continuation US20050180013A1 (en) 2002-03-21 2004-09-21 Grating element for filtering wavelengths < 100 nm

Publications (2)

Publication Number Publication Date
WO2003081712A2 WO2003081712A2 (de) 2003-10-02
WO2003081712A3 true WO2003081712A3 (de) 2004-03-04

Family

ID=27798029

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/002419 Ceased WO2003081712A2 (de) 2002-03-21 2003-03-10 Gitterelement zum filtern von wellenlängen ≤ 100nm

Country Status (5)

Country Link
EP (1) EP1485759A2 (de)
JP (1) JP2005521107A (de)
AU (1) AU2003212324A1 (de)
DE (1) DE10212691A1 (de)
WO (1) WO2003081712A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7821900B2 (en) * 2008-05-15 2010-10-26 Northrop Grumman Systems Corporation Diffractive optical element and method of designing the same
NL2004816A (en) * 2009-07-07 2011-01-10 Asml Netherlands Bv Euv radiation generation apparatus.
DE102011003145A1 (de) 2010-02-09 2011-08-11 Carl Zeiss SMT GmbH, 73447 Optisches System mit Blendeneinrichtung
JP5637702B2 (ja) * 2010-03-09 2014-12-10 キヤノン株式会社 露光装置およびデバイス製造方法
DE102017206066A1 (de) * 2017-04-10 2018-10-11 Anvajo GmbH Spektrometer
DE102021210671A1 (de) 2021-09-24 2022-12-01 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für eine optische anordnung und optische anordnung mit einem entsprechenden intensitätsanpassungsfilter sowie verfahren zu dessen herstellung

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120717A (ja) * 1990-09-12 1992-04-21 Nec Corp Ｘ線露光装置
EP0884736A1 (de) * 1997-06-11 1998-12-16 Istituto Nazionale Di Fisica Nucleare Mehrstufiger pseudo-sphärischer Diffraktor, hergestellt mit konstanter Stufenbreite (mehrstufiger Monochromator)
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
US20020097385A1 (en) * 2000-10-10 2002-07-25 Asm Lithography B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04120717A (ja) * 1990-09-12 1992-04-21 Nec Corp Ｘ線露光装置
EP0884736A1 (de) * 1997-06-11 1998-12-16 Istituto Nazionale Di Fisica Nucleare Mehrstufiger pseudo-sphärischer Diffraktor, hergestellt mit konstanter Stufenbreite (mehrstufiger Monochromator)
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
US20020097385A1 (en) * 2000-10-10 2002-07-25 Asm Lithography B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 016, no. 379 (E - 1247) 13 August 1992 (1992-08-13) *

Also Published As

Publication number Publication date
WO2003081712A2 (de) 2003-10-02
EP1485759A2 (de) 2004-12-15
AU2003212324A1 (en) 2003-10-08
JP2005521107A (ja) 2005-07-14
DE10212691A1 (de) 2003-10-02
AU2003212324A8 (en) 2003-10-08

Similar Documents

Publication Publication Date Title
EP0965864A3 (de) Diffraktives optisches Element
ATE401988T1 (de) Nanokristlallstrukturen
EP1043110A3 (de) Verfahren zur Bearbeitung von keramischen Grünfolien und Vorrichtung zur Bearbeitung der keramischen Grünfolien
WO2003091042A3 (de) Sicherheitselement mit maetallbeschictungen
EP1109163A3 (de) Optische Vorrichtung
IL136849A0 (en) Optical dynamic devices particularly for beam steering
EP1753104A3 (de) Halbleiterlaser
WO2001012782A3 (de) Transgene pflanzenzellen und pflanzen mit veränderter aktivität des gbssi- und des be-proteins
WO2001020372A3 (en) Athermal and high throughput optical gratings
WO2004010228A3 (en) Maskless lithography using an array of diffractive focusing elements
WO2002071132A3 (en) Methods and apparatus for diffractive optical processing using an actuatable structure
BR9801181B1 (pt) gênero alimentìcio fortificado com cálcio, bem como processo para preparação do mesmo.
CA2249670A1 (en) Glass wave guide element and method of manufacturing the same
CA2319139A1 (en) Surface pattern
EP1300705A3 (de) Optischer Multiplexer/Demultiplexer und Abstimmverfahren
DE602005004864D1 (de) Verfahren zur zweidimensionalen Quantisierung für das Abtasten der Strahlrichtung einer Antennengruppe
EP1239310A3 (de) Halbleiterchip mit einem Wellenleitergitter, Methode zur Herstellung eines derartigen Halbleiterchips und Modul mit einem derartigen Halbleiterchip
WO2004047241A3 (en) Multiple-disks laser system
TR199501423A2 (tr) Onceden basilmis levhalarin hakikiligini veya kisisel olmasini saglayan, sahtekarliga/tahrifata karsi korumaya yönelik bir metod.
EP1139527A3 (de) Hochleistungsvielfachhalbleiterlaservorrichtung
WO2004029721A3 (de) Verfahren und vorrichtung zum herstellen von belichteten strukturen
BR0214206B1 (pt) processo para a produÇço de um fluxo de etileno diluÍdo e um fluxo de propileno diluÍdo.
FR2790837B1 (fr) Systeme optoelectronique comprenant plusieurs sections a fonctions respectives couplees par couplage evanescent et procede de realisation
EP1103316A3 (de) Verfahren zur Herstellung einer Wellrippe
CA2426443A1 (en) Phase mask for forming diffraction grating, and optical fiber and optical waveguide having diffraction grating duplicated using the phase mask

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SC SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2003708203

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2003579308

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 10945626

Country of ref document: US

WWP Wipo information: published in national office

Ref document number: 2003708203

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642