WO2003104530A1 - Electrode de generation d'eau ionique et son procede de fabrication - Google Patents

Electrode de generation d'eau ionique et son procede de fabrication Download PDF

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Publication number
WO2003104530A1
WO2003104530A1 PCT/KR2002/001108 KR0201108W WO03104530A1 WO 2003104530 A1 WO2003104530 A1 WO 2003104530A1 KR 0201108 W KR0201108 W KR 0201108W WO 03104530 A1 WO03104530 A1 WO 03104530A1
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WO
WIPO (PCT)
Prior art keywords
base metal
ionic water
metal oxide
metal
water electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2002/001108
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English (en)
Inventor
Yong-Suk Tak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
E-SU TECH Co Ltd
Original Assignee
E-SU TECH Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by E-SU TECH Co Ltd filed Critical E-SU TECH Co Ltd
Priority to AU2002306060A priority Critical patent/AU2002306060A1/en
Publication of WO2003104530A1 publication Critical patent/WO2003104530A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1229—Composition of the substrate
    • C23C18/1241—Metallic substrates
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
    • C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material
    • C02F2001/46138—Electrodes comprising a substrate and a coating

Definitions

  • the present invention relates to an ionic water electrode for generating ionic water and a method for manufacturing the same, and more particularly, to an ionic water electrode and a method for manufacturing the same by which the concentration of available chlorine can be increased.
  • Ionic water refers to acid water and alkaline water, both of which are obtained by passing water between two electrodes and are electrolyzed, and is harmless to men, does not leave a residue, and returns to a natural water state.
  • An electrode hereinafter referred to as a Pt/Ti or Ir0 2 /Ti electrode
  • Pt/Ti or Ir0 2 /Ti electrode which is formed by depositing metal, such as Pt, or metal oxide, such as Ir0 2 , on a Ti base metal, is generally used to generate such ionic water.
  • an electrolyte such as KCI or NaCl, may be added to the water to generate ionic water, which may result in the generation of chlorine gas.
  • the ionic water including chlorine gas has a remarkable sterilizing power, it is used for medical use or as a sterilizer in a process of manufacturing food.
  • the ionic water is used to remove odor of livestock and disinfect and sterilize the livestock.
  • the ionic water is used to prevent disease in the crops or to clean meat, fish, and vegetables.
  • an object of the present invention to provide an ionic water electrode and a method for manufacturing the ionic water electrode by which a larger amount of chlorine gas can be generated in a process of creating ionic water. It is another object of the present invention to provide an ionic water electrode and a method for manufacturing the ionic water electrode by which ionic water can be created for a long period of time without isolating the metal oxide from Ti base metal.
  • an . ionic water electrode where a metal oxide layer having a composition of (Ir0 2 +Sn0 2 ) is formed on a Ti base metal.
  • the metal oxide layer comprises Pt.
  • the method includes: (S4) pre-treating the surface of a Ti base metal; (S5) coating the pre-treated surface of the Ti base metal with a source solution having a composition of (lr0 2 +SnO 2 )Pt; (S8) heating the Ti base metal that is coated with the source solution to form a (lr0 2 +Sn0 2 )Pt metal oxide on the surface of the Ti base metal; (S10) repeating steps (S5) and (S8) at least two times or more until the (lr0 2 +Sn0 2 )Pt metal oxide is formed to a proper thickness; (S11 ) heating the Ti base metal that underwent step (S10) to increase the stability of the (lr0 2 +Sn0 2 )Pt metal oxide formed on the surface of the Ti base metal.
  • step (S4) includes: (S1 ) dipping the Ti base metal into a hydrofluoric acid solution for a predetermined period of time; (S2) dipping the Ti base metal that underwent step (S1 ) into a sulfuric acid solution for a predetermined period of time; (S3) dipping the
  • the source solution having a composition of (lr0 2 +Sn0 2 )Pt is manufactured by dissolving H 2 lrCI 6 XH 2 0, SnCI , and
  • step (S8) includes: (S6) heating the Ti base metal that is coated with the source solution at a temperature of 90 ° C - 130 ° C for 5 - 15 minutes; and (S7) heating the Ti base metal that underwent step (S6) at a temperature of 300 ° C - 700°C for 3 - 7 minutes.
  • step (S1 1 ) the Ti base metal that underwent step (S10) is heated at a temperature of 300 °C - 700°C for 40 - 80 minutes.
  • FIG. 1 is a perspective view of an ionic water electrode according to the present invention
  • FIG. 2 is a flowchart of a process of manufacturing the ionic water electrode shown in FIG. 1 ;
  • FIG. 3 is a view of a process of manufacturing a source solution which coats a Ti base metal when manufacturing the ionic water electrode shown in FIG. 1.
  • FIG. 1 is a perspective view of an ionic water electrode according to the present invention.
  • the ionic water electrode is formed by coating a Ti base metal 1 with a metal oxide layer having a composition of (Ir0 2 +Sn0 2 ).
  • the metal oxide layer further includes Pt to be made into a metal oxide layer 2 having a composition of (lr0 2 +Sn0 2 )Pt.
  • FIG. 2 is a flowchart of a process of manufacturing the ionic water electrode shown in FIG. 1.
  • FIG. 3 is a view of a process of manufacturing a source solution which coats the Ti base metal 1 when manufacturing the ionic water electrode shown in FIG. 1.
  • the Ti base metal is pre-treated.
  • the pre-treated Ti base metal is coated with a source solution having the composition of (Ir0 2 +Sn0 2 )Pt.
  • the Ti base metal is . heated to form a (lr0 2 +SnO 2 )Pt metal oxide on the surface of the Ti base metal.
  • step S9 steps S5 and S8 are repeated at least two times or more until the (lr0 2 +Sn0 2 )Pt metal oxide has a proper thickness.
  • step S10 the Ti base metal is heated to increase the stability of the (lr0 2 +SnO 2 )Pt metal oxide formed thereon.
  • the method of manufacturing the ionic water electrode is achieved by sequentially performing the above-described steps.
  • step S4 is required to remove Ti0 2 from the surface of the Ti base metal.
  • Step S4 is composed of first through third pre-treatment processes step S1 through step S3.
  • step S1 the Ti base metal 1 is dipped into a hydrofluoric acid (HF) solution for a predetermined period of time.
  • step S2 the Ti base metal 1 is dipped into a sulfuric acid (H 2 SO ) solution for a predetermined period of time.
  • step S3 the Ti base metal is dipped into an oxalic acid ((COOH) 2 2H 2 0) solution at a predetermined temperature for a predetermined period of time.
  • HF hydrofluoric acid
  • step S2 the Ti base metal 1 is dipped into a sulfuric acid (H 2 SO ) solution for a predetermined period of time.
  • step S3 the Ti base metal is dipped into an oxalic acid ((COOH) 2 2H 2 0) solution at a predetermined temperature for a predetermined period of time.
  • COOH oxalic acid
  • the HF solution used in step S1 has the concentration of 1 % - 5%, and the time required for performing step S1 is 1 to 5 minutes. In this embodiment, a HF solution having the concentration of 3% was used and the time required for performing step S1 was 3 minutes.
  • the H 2 S0 solution used in step S2 has the concentration of 40% - 80% and the time required for performing step S2 is 10 to 30 minutes, in this embodiment, the concentration of the H 2 S0 4 solution was 60% and the time required for performing step S2 was 20 minutes.
  • the ((COOH) 2 2H 2 0) solution used in step S3 has the concentration of 5 - 15%, the time required for performing step S3 is 3 to 10 minutes, and the temperature of ((COOH) 2 2H 2 0) solution is within a range of 50 - 100 ° C.
  • the concentration of the ((COOH) 2 2H 2 0) solution was 10%, the time required for performing step S3 was 5 minutes, and the temperature of the ((COOH) 2 2H 2 0) solution was 80 °C.
  • step S5 the Ti base metal, which underwent step S4, is coated with a source solution to form a metal oxide on the surface of the Ti base metal.
  • the source solution used in step S5 has a composition of
  • the Ti base metal may be dipped into a (lr0 2 +Sn0 2 )Pt solution or may be sprayed with the
  • the (lr0 2 +Sn0 2 )Pt solution is made by dissolving H 2 lrCI 6X H 2 0, SnCI , and H 2 PtCl 6 6H 2 0 in a hydrochloric acid
  • HCI HCl
  • concentration of the HCI solution is 15%
  • H 2 lrCI 6 XH 2 0 is 63.6 mM
  • SnCl 4 is 87.8 mM
  • H 2 PtCI 6 6H 2 0 is 63 mM.
  • step S8 the (lr0 2 +SnO 2 )Pt solution, which coats the Ti base metal, is initially adhered to the surface of the Ti base metal, and step S8 includes steps S6 and S7.
  • step S6 the Ti base metal is heated at a temperature of 90 °C - 130 °C for 5 - 15 minutes
  • step S7 the Ti base metal, which underwent step S6, is heated at a temperature of 300 ° C - 700 °C for 3 - 7 minutes.
  • step S6 the (lr0 2 +Sn0 2 )Pt solution, which coats the Ti base metal, is dried, and in step S7, the (lr0 2 +Sn0 2 )Pt solution is formed to a metal oxide layer in a gel-film form on the surface of the Ti base metal.
  • the temperature in step S6 is 110 °C and the time required for performing step S6 is about 10 minutes.
  • the temperature in step S7 is 500 °C and the time required for performing step S7 is about 5 minutes.
  • step S10 steps S5 is repeated after initially performing step S8, and then steps S5 and S8 are alternatively repeated at least two times or more.
  • step S10 it is determined whether the thickness of the metal oxide formed in step S8 is proper, and then if it is determined that the thickness of the metal oxide is improper, steps S5 and S8 are performed again. If it is that the thickness of the metal oxide is proper, step 11 is performed.
  • Step S10 is required to form a (lr0 2 +Sn0 2 )Pt metal oxide layer to a sufficient thickness on the Ti base metal by performing steps S5 and S8 one time.
  • steps S5 and S8 are repeated ten times so as to form a (lr0 2 +Sn0 2 )Pt metal oxide layer having a sufficient durability on the Ti base metal. If steps S5 and S8 are repeated less than ten times, a (lr0 2 +Sn0 2 )Pt metal oxide layer having a sufficient uniformity and durability cannot be obtained. If steps S5 and S8 are repeated more than ten times, a (lr0 2 +Sn0 2 )Pt metal oxide layer having a thickness greater than required is formed, thereby decreasing the productivity.
  • step S11 the (lr0 2 +Sn0 2 )Pt metal oxide layer, which is formed on the Ti base metal in step S10, is completely heated at a temperature of 300 °C - 700 °C for 40 - 80 minutes to be stabilized.
  • the temperature in step S11 was 500 °C
  • the time required for performing step S11 was 60 minutes.
  • the concentration of available chlorine being created is much higher than conventional electrodes Pt/Ti and Ir0 2 /Ti.
  • a larger amount of chlorine gas can be created in a process of creating ionic water. Also, the ionic water can be created for a long period of time without isolating a metal oxide from a Ti base metal.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)

Abstract

L'invention concerne une électrode de génération d'eau ionique formée par l'application d'une couche d'oxyde de métal de structure (IrO2+SnO2) sur un métal à base de Ti. Ici, la couche d'oxyde de métal comprend du Pt. Le procédé de fabrication d'une électrode de génération d'eau ionique consiste à : (S4) pré-traiter la surface d'un métal à base de Ti ; (S5) enduire la surface pré-traitée du métal à base de Ti d'une solution source de structure (IrO2+SnO2)Pt ; (S8) chauffer le métal à base de Ti enduit d'une solution source pour former un oxyde de métal (IrO2+SnO2)Pt sur la surface de celui-ci ; (S10) répéter les étapes (S5) et (S8) au moins deux fois jusqu'à ce que l'épaisseur de l'oxyde de métal (IrO2+SnO2)Pt formé soit appropriée ; (S11) chauffer le métal à base de Ti ayant subi l'étape (S10) pour augmenter la stabilité de l'oxyde de métal (IrO2)Pt formé sur la surface du métal à base de Ti.
PCT/KR2002/001108 2002-06-11 2002-06-12 Electrode de generation d'eau ionique et son procede de fabrication Ceased WO2003104530A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002306060A AU2002306060A1 (en) 2002-06-11 2002-06-12 Ionic water electrode and method for manufacturing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR2002/32514 2002-06-11
KR1020020032514A KR20030095012A (ko) 2002-06-11 2002-06-11 전해조 전극 및 그를 제조하기 위한 제조방법

Publications (1)

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WO2003104530A1 true WO2003104530A1 (fr) 2003-12-18

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PCT/KR2002/001108 Ceased WO2003104530A1 (fr) 2002-06-11 2002-06-12 Electrode de generation d'eau ionique et son procede de fabrication

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KR (1) KR20030095012A (fr)
AU (1) AU2002306060A1 (fr)
WO (1) WO2003104530A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109824123A (zh) * 2019-03-29 2019-05-31 福州大学 一种SnO2-NiO氧化物涂层电极及其制备方法和应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4471006A (en) * 1982-08-26 1984-09-11 Permelec Electrode Ltd. Process for production of electrolytic electrode having high durability
JPS60184691A (ja) * 1984-03-02 1985-09-20 Permelec Electrode Ltd 耐久性を有する電極及びその製造方法
JPS62284095A (ja) * 1986-06-02 1987-12-09 Permelec Electrode Ltd 耐久性を有する電解用電極及びその製造方法
JPH05255881A (ja) * 1992-03-11 1993-10-05 Tdk Corp 酸素発生用電極およびその製造方法

Family Cites Families (5)

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Publication number Priority date Publication date Assignee Title
GB2207272B (en) * 1987-07-18 1991-08-14 Stc Plc Addressing liquid crystal cells
EP0305331A3 (fr) * 1987-08-25 1991-05-08 Ciba-Geigy Ag Flexibilisateurs pour résines époxydes
KR930009605B1 (ko) * 1990-11-16 1993-10-07 김남채 축압기를 이용한 자력승강 주차장치
JP3212327B2 (ja) * 1991-08-30 2001-09-25 ペルメレック電極株式会社 電解用電極
KR100434430B1 (ko) * 2001-02-28 2004-06-07 한국전자통신연구원 산화금속을 이용한 미소 기준전극 및 그 제조 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4471006A (en) * 1982-08-26 1984-09-11 Permelec Electrode Ltd. Process for production of electrolytic electrode having high durability
JPS60184691A (ja) * 1984-03-02 1985-09-20 Permelec Electrode Ltd 耐久性を有する電極及びその製造方法
JPS62284095A (ja) * 1986-06-02 1987-12-09 Permelec Electrode Ltd 耐久性を有する電解用電極及びその製造方法
JPH05255881A (ja) * 1992-03-11 1993-10-05 Tdk Corp 酸素発生用電極およびその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109824123A (zh) * 2019-03-29 2019-05-31 福州大学 一种SnO2-NiO氧化物涂层电极及其制备方法和应用

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Publication number Publication date
KR20030095012A (ko) 2003-12-18
AU2002306060A1 (en) 2003-12-22

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