WO2004010225A3 - Machine d'exposition de panneaux de circuit imprime - Google Patents

Machine d'exposition de panneaux de circuit imprime Download PDF

Info

Publication number
WO2004010225A3
WO2004010225A3 PCT/FR2003/002255 FR0302255W WO2004010225A3 WO 2004010225 A3 WO2004010225 A3 WO 2004010225A3 FR 0302255 W FR0302255 W FR 0302255W WO 2004010225 A3 WO2004010225 A3 WO 2004010225A3
Authority
WO
WIPO (PCT)
Prior art keywords
support
frame
printed circuit
circuit board
machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/FR2003/002255
Other languages
English (en)
Other versions
WO2004010225A2 (fr
Inventor
Gilles Vibet
Boucher Arnaud Le
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Automa Tech SA
Original Assignee
Automa Tech SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Automa Tech SA filed Critical Automa Tech SA
Priority to AU2003269029A priority Critical patent/AU2003269029A1/en
Publication of WO2004010225A2 publication Critical patent/WO2004010225A2/fr
Publication of WO2004010225A3 publication Critical patent/WO2004010225A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L’invention concerne une machine d’exposition pour panneaux de circuit imprimé comprenant un support horizontal (24) pour ledit panneau, un support de cliché (10) mobile verticalement par rapport audit support, ledit support comprenant un cadre (16) sensiblement rectangulaire et une plaque transparente (18) apte à recevoir un cliché, un châssis mobile verticalement sur lequel est fixée la périphérie externe dudit cadre (16), des moyens d’étanchéité (38) pour réaliser une étanchéité entre ledit support de panneau et ledit cadre du support de cliché, des moyens pour créer une dépression entre ledit cadre et ledit support, et des moyens formant cale d’épaisseur (50) réglable, présentant une face supérieure (50a) et une face inférieure en contact avec ledit cadre et ledit support de panneau et s’étendant selon au moins deux côtés opposés dudit cadre et disposés entre lesdits moyens d’étanchéité et le bord interne dudit cadre.
PCT/FR2003/002255 2002-07-17 2003-07-17 Machine d'exposition de panneaux de circuit imprime Ceased WO2004010225A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003269029A AU2003269029A1 (en) 2002-07-17 2003-07-17 Machine for exposing printed circuit boards

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0209031A FR2842618B1 (fr) 2002-07-17 2002-07-17 Machine d'exposition de panneaux de circuit imprime
FR02/09031 2002-07-17

Publications (2)

Publication Number Publication Date
WO2004010225A2 WO2004010225A2 (fr) 2004-01-29
WO2004010225A3 true WO2004010225A3 (fr) 2004-04-29

Family

ID=29797490

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2003/002255 Ceased WO2004010225A2 (fr) 2002-07-17 2003-07-17 Machine d'exposition de panneaux de circuit imprime

Country Status (3)

Country Link
AU (1) AU2003269029A1 (fr)
FR (1) FR2842618B1 (fr)
WO (1) WO2004010225A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2917850B1 (fr) * 2007-10-12 2009-10-16 Automa Tech Sa Machine d'exposition pour panneaux de circuit imprime

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4773841A (en) * 1986-10-14 1988-09-27 Asahi Kasei Kogyo Kabushiki Kaisha Plate thickness adjusting apparatus in photosensitive resin plate making machine
FR2748886A1 (fr) * 1996-05-15 1997-11-21 Automa Tech Sa Dispositif de support de cliche pour installation d'exposition a la lumiere d'une piece plane
DE19859049A1 (de) * 1998-12-21 2000-07-20 Karl Suss Dresden Gmbh Belichtunganordnung für fotolackbeschichtete Leiterplatten
JP2001305744A (ja) * 2000-04-20 2001-11-02 Dainippon Screen Mfg Co Ltd 密着露光装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4773841A (en) * 1986-10-14 1988-09-27 Asahi Kasei Kogyo Kabushiki Kaisha Plate thickness adjusting apparatus in photosensitive resin plate making machine
FR2748886A1 (fr) * 1996-05-15 1997-11-21 Automa Tech Sa Dispositif de support de cliche pour installation d'exposition a la lumiere d'une piece plane
DE19859049A1 (de) * 1998-12-21 2000-07-20 Karl Suss Dresden Gmbh Belichtunganordnung für fotolackbeschichtete Leiterplatten
JP2001305744A (ja) * 2000-04-20 2001-11-02 Dainippon Screen Mfg Co Ltd 密着露光装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2002, no. 03 3 April 2002 (2002-04-03) *

Also Published As

Publication number Publication date
FR2842618B1 (fr) 2005-01-21
FR2842618A1 (fr) 2004-01-23
AU2003269029A1 (en) 2004-02-09
WO2004010225A2 (fr) 2004-01-29

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