WO2005106067A2 - Revetement a film mince pour jantes de roues - Google Patents

Revetement a film mince pour jantes de roues Download PDF

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Publication number
WO2005106067A2
WO2005106067A2 PCT/US2005/013985 US2005013985W WO2005106067A2 WO 2005106067 A2 WO2005106067 A2 WO 2005106067A2 US 2005013985 W US2005013985 W US 2005013985W WO 2005106067 A2 WO2005106067 A2 WO 2005106067A2
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WO
WIPO (PCT)
Prior art keywords
thin
wheel rim
coating
group
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2005/013985
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English (en)
Other versions
WO2005106067A3 (fr
Inventor
Micha Kapourchali
Nima Khalilian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MOLECULAR FX
Original Assignee
MOLECULAR FX
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MOLECULAR FX filed Critical MOLECULAR FX
Publication of WO2005106067A2 publication Critical patent/WO2005106067A2/fr
Anticipated expiration legal-status Critical
Publication of WO2005106067A3 publication Critical patent/WO2005106067A3/fr
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/006—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterized by the colour of the layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49481—Wheel making
    • Y10T29/49492—Land wheel
    • Y10T29/49524—Rim making

Definitions

  • the present invention is generally drawn to a method of depositing a thin-film color coating on wheel rims and motorcycle parts using ion bombardment, as well as the wheel rims and motorcycle parts products formed by the method. More particularly, a preferred embodiment of the invention is drawn to depositing a non-uniform thin-film color or dichroic coating to chrome wheel rims by sputtering with a silicon or titanium target, and the wheel rims formed by the method. Wheel rims and motorcycle parts are aesthetically an important part of the vehicle. With respect to wheel rims, billions of dollars are spent world- wide each year in the production of new rims to add style and luxury to the automotive industry.
  • Patent 5056630 FUJII relates to a wheel rim for a two-wheeled vehicle and has a spray coated layer formed from a metal alloy or ceramic covering at least a part of a rim surface with a brake shoe brought into contact which coating provides improved friction characteristics.
  • U.S. Patent 6159011 MOORMANN is a process for producing a bonded titanium- ceramic composite system, which involves ion implanting. The ion implantation forms a surface layer with excellent adhesion to the ceramic surface.
  • U.S. Patent 6254458 JULIEN is a process for producing a surface layer material having nitinol (nickel-titanium alloy) chemical and galvanic corrosion and resistant to chipping, erosion and abrasion.
  • Patent 6399152 GOODRICH relates to vapor deposition of nickel-chromium and chromium metallic layer that permits a decorative chrome coating to be applied to a metal object.
  • the present invention relates to coating a thin-film pattern to wheel rims and motorcycle parts.
  • the coating intentionally non-uniform and is applied by physical vapor deposition (PVD).
  • the coating is preferably dichroic and adds a colored, iridescent pattern to the wheel rim, while maintaining other characteristics, such as brilliance, shine, durability, and general appearance.
  • the coating may be varied from rim to rim, and may have different patterns and colors among different rims, and even among different areas on the same rim.
  • the thin- film coating may be added by various techniques known in the art.
  • the general outcome of the appearance of the rims may be varied by modifying these techniques.
  • the coating typically added to chrome plating; however, they may be added to other surfaces as desired.
  • the present invention provides for a wheel rim or motorcycle parts that has coated thereon a thin-film deposition.
  • the application of the thin-film deposition may be done by a variety of techniques, including but not limited to sputtering, cathodic arc, magnetron sputtering, thermal evaporation, and other physical vapor deposition methods.
  • the coating adds a colored pattern to the rim, while maintaining other desired characteristics, such as brilliance, shine, iridescence, durability and general appearance.
  • Variations in the chemical composition of the coating may be used to alter the coloring and other characteristics of the deposition.
  • Other techniques such as varying the pressure and temperature used in the process, may also produce desired variations in the thin-film deposition.
  • the coating may be varied from rim to rim, and may have different patterns and color among different rims, and even among different areas on the same rim based upon intentional non-uniformity of the thin-film coating.
  • an iridescent "rainbow" effect is produced on the rim, while maintaining the underlying brilliance and shine of the original plating.
  • the rainbow effect may favor certain colors over others, producing a limited or skewed spectrum.
  • the coatings are typically added to chrome plating; however, they may be added to other substrates as desired.
  • the thin-film deposition may add increased durability to the rim. This durability makes the rim easier to maintain, and provides a resistance to the elements.
  • the coating may be a variety of different types suitable for thin-film deposition.
  • a substantially pure silicon or pure titanium target, both doped and undoped is used.
  • Other materials that may be used in conjunction with silicon and titanium include, but are not limited to, aluminum, boron, carbon, chromium, cobalt, copper, gold, iridium, iron, lead, magnesium, manganese, molybdenum, nickel, niobium, platinum, silver, tantalum, tin, tungsten, vanadium, zinc, zirconium and oxides thereof.
  • Sputter coating is a PVD process where atoms of a solid target are ejected by the bombardment of energetic ions onto the target.
  • the source of the bombarding ions is commonly a gas discharge, where collisions between electrons and neutral gas atoms results in the generation of electron and gas ion pairs, the ions having a positive charge.
  • a negatively charged electrode (cathode) placed in the gas discharge attracts the positive ions causing the ion bombardment responsible for sputtering.
  • the target is consumed by the sputtering process and requires periodic replacement.
  • a cathode assembly supports the target, provides water cooling, sets up a magnetic field in the region of the gas discharge and shields non-target portions of the cathode from unwanted ion bombardment.
  • Most sputtering systems operate with the target at a negative potential, with a grounded metal chamber acting as an anode.
  • the gas discharge is usually made from argon gas at pressures in the range of 1 to 20 millitorr. (Atmospheric pressure is 760 Torr.) Argon is the gas of choice because of its chemical inertness, relatively large atomic mass, and relatively low cost.
  • Electrical gas discharges can be achieved with any gas, but if a chemically reactive gas is chosen, it will react with atoms sputtered from the target to yield a coating, which is the reaction product of the two constituents. When this is intentionally done, the process is termed reactive sputtering.
  • An example of reactive sputtering is the sputtering of a titanium target in a nitrogen-argon gas mixture to yield a coating of titanium nitride. Residual atmospheric gas contaminants present in the gas discharge will also react with the coating material resulting in its contamination. Since this is to be avoided, many sputtering systems are evacuated in the region of the discharge to pressure levels of 1 x 10-7 Torr or less prior to introduction of the ion providing gas.
  • the sputtering is a vacuum used to deposit very thin films is accomplished by putting a high voltage across a low-pressure gas, such as argon, to create a plasma, which is an electrically neutral, highly ionized gas composed of ions, electrons, and neutral particles.
  • Plasma is a phase of matter distinct from solids, liquids, and normal gases. Since the plasma emits a colorful halo of light, it is also sometimes called a "glow discharge" process.
  • energized plasma composed of the desired coating material ions strike the target and cause atoms from that target to be ejected with enough energy to travel to, and bond with, the substrate.
  • the sputtering uses an inert gas, though the inert gas may also be combined with a reactive gas such as oxygen, nitrogen, or cetalyne, or a combination of such gases to achieve desired results.
  • the gas is used to generate an ionizing plasma that is responsible for sputtering the target material away and then depositing the material on the rim.
  • the sputtering is controlled by a voltage, and this may be altered to produce differences in the deposition of the silicon. Also, varying the pressure will also produce similar differences.
  • the energy supply used may be a DC voltage source that can range from 308-1008 volts or 30-283 watts.
  • the target is activated by an electrical charge and the system begins sputtering the silicon or titanium onto the substrate (rim).
  • the coating material is being transformed into a gaseous or vapor state, then the vapor is transferred through the rarefied pressure region also known as the vacuum that exist between the silicon source and the substrate, The vapor then condenses onto the substrate surface and forms a thin layer.
  • the inside temperature is negligible depending on heat generated by the deposition itself This sputtering can go on anywhere from 5 to 40 minutes, depending on the color iridescence desired.
  • a typical deposition is from 300 to 3000 Angstroms on the rim surface.
  • the sputtering is accomplished with the target at a 90° angle with the deposition. This increases the control over the thickness of the deposition.
  • An example of sputtering equipment would comprise a vacuum system, a power supply, equipment to introduce the sputtering gas, and a sputtering gun.
  • the vacuum system itself comprises a pumping system, a chamber, and metrology to measure the vacuum levels and sputtering gas levels.
  • the pumping system is usually a combination of a roughing/backing pump and a high vacuum pump.
  • the roughing/backing pump can evacuate the chamber to about l/3000th of an atmosphere.
  • other types of thin-film deposition include, but are not limited to, evaporation and chemical vapor deposition (CVD). While ion deposition processes are concerned with uniformity of the film and conductivity for precise manufacturing processes, the process of the present invention is directed to control of color and iridescence on the wheel outer surface. This provides control over the aesthetic effects rather than conductivity or uniformity. Additionally, the deposition of the thin-film for aesthetic enhancement also provides additional protection to the wheels, such as corrosion protection. Though the present invention may be used on a variety of rim surfaces, a particular embodiment is to have the thin-film deposition on a chrome plating.
  • chrome plating One method of applying a chrome plating is to first buff the rim alloy, then apply a zincate. Onto this is applied a heavy copper plating, which is then buffed and cleaned. Next is applied a bright nickel plating, and then a hexavalent chrome plating. This is then rinsed and dried. Chrome or other bright substrates useful with the present invention are sometimes applied to plastic articles. When the substrate or a portion thereof is applied over plastic, the sputtering or other thin-film coating process should be carried out without heating of the substrate so as to avoid damage to the plastic.
  • the thin-film coating can consist essentially of doped silicon, undoped silicon, doped titanium, or undoped titanium, wlierem doping substances are selected from the group consisting of aluminum, boron, carbon, chromium, cobalt, copper, gold, iridium, iron, lead, magnesium, manganese, molybdenum, nickel, niobium, platinum, silver, tantalum, tin, tungsten, vanadium, zinc, zirconium, and oxides thereof.
  • this method will include drawing a vacuum on the treatment chamber and introducing gases selected from the group consisting of inert gases, reactive gases, and combinations thereof.
  • Another embodiment of the invention is a method of forming a non-uniform thin- film dichroic coating on a wheel rim, comprising: cleaning a surface of the wheel rim by a treatment selected from the group consisting of acetone treatment, rouge (ferric oxide) treatment, ultrasonic treatment, and combinations thereof; positioning the wheel rim in a vacuum treatment chamber; drawing a vacuum in the vacuum treatment chamber to a pressure range between 1 x 10-6 to 1 x 10-1 Torr; and sputtering a thin-film coating using a target selected from the group consisting of silicon and titanium to the surface of the wheel to obtain a film thickness between 300-3000 Angstroms.
  • Variations of this embodiment include those wherein the sputtering is selected from the group consisting of bias sputtering and cathodic magnetron sputtering; those further comprising introducing argon gas at pressures in the range of 1 to 20 millitorr, those further comprising introducing reactive gases selected from the group consisting of oxygen, nitrogen, or cetalyne, and combinations thereof; those, further comprising the thin-film coating being selected from the group consisting essentially of doped silicon, undoped silicon, doped titanium, and undoped titanium, and wherein doping substances are selected from the group consisting of aluminum, boron, carbon, chromium, cobalt, copper, gold, iridium, iron, lead, magnesium, manganese, molybdenum, nickel, niobium, platinum, silver, tantalum, tin, tungsten, vanadium, zinc, zirconium, and oxides thereof; those further comprising controlling coating properties by varying the temperature of the surface of the wheel rim;
  • a thin-film coated wheel rim produced in accordance with this method is also part of the present invention. While specific embodiments of the invention have been described in detail, it will be appreciated by those skilled in the art that various modifications and alternatives to those details could be developed in light of the overall teachings of the disclosure. Accordingly, the particular arrangements disclosed are meant to be illustrative only and not limiting as to the scope of the inventions which, is to be given the full breadth of the claims appended and any and all equivalents thereof.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention concerne un procédé de revêtement d'un motif dichroïque, à film mince, non uniforme sur une jante de roue ou sur une pièce de motocycle. Le film mince ajoute un motif coloré ou irisé à la jante de roue ou à la pièce de motocycle, tout en conservant les autres caractéristiques, telles que brillance, luisance, durabilité et aspect général. Le revêtement est intentionnellement non uniforme. On peut le modifier et lui conférer différents motifs et couleur sur différents articles, voire sur différentes zones du même article. Le revêtement à film mince peut être ajouté par différentes techniques connues. On peut cependant l'appliquer de préférence par pulvérisation d'une cible de silicium ou de titane pour obtenir le film mince sur une jante de roue chromée.
PCT/US2005/013985 2004-04-23 2005-04-25 Revetement a film mince pour jantes de roues Ceased WO2005106067A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56469004P 2004-04-23 2004-04-23
US60/564,690 2004-04-23

Publications (2)

Publication Number Publication Date
WO2005106067A2 true WO2005106067A2 (fr) 2005-11-10
WO2005106067A3 WO2005106067A3 (fr) 2006-11-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/013985 Ceased WO2005106067A2 (fr) 2004-04-23 2005-04-25 Revetement a film mince pour jantes de roues

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US (1) US7279078B2 (fr)
WO (1) WO2005106067A2 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070289869A1 (en) * 2006-06-15 2007-12-20 Zhifei Ye Large Area Sputtering Target
US20080284238A1 (en) * 2007-05-14 2008-11-20 Shimano, Inc. Colored bicycle wheel rim
US20100276047A1 (en) * 2009-04-30 2010-11-04 Gm Global Technology Operations, Inc. Wear resistant coating for interface of wheel rim and tire
US20120015209A1 (en) 2010-07-19 2012-01-19 Ford Global Technologies, Llc Wheels Having Oxide Coating And Method of Making The Same
CN108359940A (zh) * 2018-03-22 2018-08-03 中国计量大学 一种彩色金属制品及制备方法
CN115125595B (zh) * 2022-06-23 2023-11-24 中南大学 一种钛锰合金涂层的制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2508712B2 (ja) * 1986-05-27 1996-06-19 ブリヂストンサイクル株式会社 自転車用リム
US5211991A (en) * 1992-07-23 1993-05-18 Hughes Aircraft Company Method of plasma spraying magnetic-cermet dielectric coatings
US5332601A (en) * 1992-12-10 1994-07-26 The United States As Represented By The United States Department Of Energy Method of fabricating silicon carbide coatings on graphite surfaces
DE19626440C1 (de) 1996-06-20 1998-01-08 Andreas Dr Moormann Verfahren zur Herstellung eines Titan-Keramik-Haftverbundes für Zahnersatz und ein daraus hergestellter Titan-Keramik-Haftverbund
US6254458B1 (en) 1998-10-28 2001-07-03 Nitinol Technologies, Inc. Post processing for nitinol coated articles
US6399152B1 (en) * 2000-07-27 2002-06-04 Goodrich Technology Corporation Vacuum metalization process for chroming substrates
US20040034999A1 (en) * 2002-08-26 2004-02-26 Wheels Technology, Inc. Method of repairing a damaged or deformed wheel

Also Published As

Publication number Publication date
WO2005106067A3 (fr) 2006-11-23
US20050258028A1 (en) 2005-11-24
US7279078B2 (en) 2007-10-09

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