WO2006053751A3 - Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage - Google Patents

Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage Download PDF

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Publication number
WO2006053751A3
WO2006053751A3 PCT/EP2005/012327 EP2005012327W WO2006053751A3 WO 2006053751 A3 WO2006053751 A3 WO 2006053751A3 EP 2005012327 W EP2005012327 W EP 2005012327W WO 2006053751 A3 WO2006053751 A3 WO 2006053751A3
Authority
WO
WIPO (PCT)
Prior art keywords
projection
lens system
exposure installation
microlithographic
projection lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2005/012327
Other languages
English (en)
French (fr)
Other versions
WO2006053751A2 (de
Inventor
Helmut Beierl
Sascha Bleidistel
Wolfgang Singer
Toralf Gruner
Alexander Epple
Norbert Wabra
Susanne Beder
Jochen Weber
Heiko Feldmann
Baerbel Schwaer
Olaf Rogalsky
Arif Kazi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to US11/719,074 priority Critical patent/US7782440B2/en
Priority to JP2007541792A priority patent/JP4980922B2/ja
Publication of WO2006053751A2 publication Critical patent/WO2006053751A2/de
Publication of WO2006053751A3 publication Critical patent/WO2006053751A3/de
Anticipated expiration legal-status Critical
Priority to US12/825,001 priority patent/US8319944B2/en
Priority to US13/660,347 priority patent/US9164396B2/en
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Eine mikrolithographische Projektionsbelichtungsanlage weist ein Projektionsobjektiv (20) auf, das ein Objekt (24) auf eine Bildebene (28) abbildet und eine Linse (L3) mit einer gekrümmten Fläche (S) hat. In dem Projektions­objektiv (20) befindet sich ein flüssiges oder festes Me­dium (34), das unmittelbar an die gekrümmte Fläche (S) über einen Bereich hinweg angrenzt, der für die Abbildung des Objekts (24) nutzbar ist. Die Projektionsbelichtungs­anlage weist außerdem einen verstellbaren Manipulator (M) zur Verringerung einer Bildfeldwölbung auf, die durch ei­ne Erwärmung des Mediums (34) während des Projektionsbe­triebs verursacht wird.
PCT/EP2005/012327 2004-11-18 2005-11-17 Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage Ceased WO2006053751A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US11/719,074 US7782440B2 (en) 2004-11-18 2005-11-17 Projection lens system of a microlithographic projection exposure installation
JP2007541792A JP4980922B2 (ja) 2004-11-18 2005-11-17 マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法
US12/825,001 US8319944B2 (en) 2004-11-18 2010-06-28 Projection lens system of a microlithographic projection exposure installation
US13/660,347 US9164396B2 (en) 2004-11-18 2012-10-25 Projection lens system of a microlithographic projection exposure installation

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US62912604P 2004-11-18 2004-11-18
US60/629,126 2004-11-18

Related Child Applications (3)

Application Number Title Priority Date Filing Date
US11/719,074 A-371-Of-International US7782440B2 (en) 2004-11-18 2005-11-17 Projection lens system of a microlithographic projection exposure installation
US71907407A Continuation 2004-11-18 2007-05-10
US12/825,001 Continuation US8319944B2 (en) 2004-11-18 2010-06-28 Projection lens system of a microlithographic projection exposure installation

Publications (2)

Publication Number Publication Date
WO2006053751A2 WO2006053751A2 (de) 2006-05-26
WO2006053751A3 true WO2006053751A3 (de) 2006-10-12

Family

ID=35520774

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/012327 Ceased WO2006053751A2 (de) 2004-11-18 2005-11-17 Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Country Status (3)

Country Link
US (3) US7782440B2 (de)
JP (1) JP4980922B2 (de)
WO (1) WO2006053751A2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8873022B2 (en) * 2009-02-12 2014-10-28 Carl Zeiss Smt Gmbh Projection exposure method, system and objective
US9330912B2 (en) 2006-11-22 2016-05-03 Asml Netherlands B.V. Lithographic apparatus, fluid combining unit and device manufacturing method

Families Citing this family (47)

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JP4980922B2 (ja) 2004-11-18 2012-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法
JP5055566B2 (ja) * 2005-05-12 2012-10-24 株式会社ニコン 投影光学系、露光装置、および露光方法
DE102005024163A1 (de) * 2005-05-23 2006-11-30 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
JP5069232B2 (ja) 2005-07-25 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の投影対物レンズ
US20070070323A1 (en) * 2005-09-21 2007-03-29 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
WO2007034838A1 (ja) * 2005-09-21 2007-03-29 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
WO2007052659A1 (ja) * 2005-11-01 2007-05-10 Nikon Corporation 露光装置、露光方法、及びデバイス製造方法
DE102005056899B4 (de) * 2005-11-28 2007-10-18 Schleifring Und Apparatebau Gmbh Polarisationserhaltende optische Drehkupplung
US20070146904A1 (en) * 2005-12-22 2007-06-28 Webb James E Submersive doublet for high numerical aperture optical system
US8045134B2 (en) * 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US7969549B2 (en) * 2006-06-30 2011-06-28 Asml Netherlands B.V. Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method
WO2008003442A1 (en) 2006-07-03 2008-01-10 Carl Zeiss Smt Ag Method for revising/repairing a lithographic projection objective
DE102006045075A1 (de) * 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
US7525640B2 (en) 2006-11-07 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2097789B1 (de) 2006-12-01 2012-08-01 Carl Zeiss SMT GmbH Optisches system mit austauschbarer manipulierbarer korrekturanordnung zur verminderung von bildfehlern
KR100830586B1 (ko) * 2006-12-12 2008-05-21 삼성전자주식회사 기판을 노광하는 장치 및 방법
DE102007013923B4 (de) * 2006-12-22 2012-02-02 Schleifring Und Apparatebau Gmbh Mehrkanaliger optischer Drehübertrager mit hoher Rückflußdämpfung
DE102007012224A1 (de) * 2007-03-12 2008-09-25 Schleifring Und Apparatebau Gmbh Mehrkanalige reflexionsarme optische Drehkupplung
DE102008000968A1 (de) * 2007-04-05 2008-10-09 Carl Zeiss Smt Ag Optisches Korrekturelement und Verfahren zur Korrektur von temperaturinduzierten Abbildungsfehlern in optischen Systemen, Projektionsobjektiv und Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102008001497A1 (de) 2007-05-07 2008-11-13 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage
DE102007029503A1 (de) * 2007-06-25 2009-01-02 Schleifring Und Apparatebau Gmbh Optischer Drehübertrager mit kurzer Baulänge
JP5224218B2 (ja) * 2007-07-23 2013-07-03 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学システム
JP5579063B2 (ja) * 2007-08-24 2014-08-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 制御可能な光学素子、熱アクチュエータによる光学素子の操作方法および半導体リソグラフィのための投影露光装置
DE102008023238A1 (de) * 2008-05-10 2009-12-10 Schott Ag Vorrichtung und Verfahren zur Erhöhung der Lichtdurchlässigkeit an optischen Elementen für Licht mit Wellenlängen nahe der Absorptionskante
JP5305128B2 (ja) * 2008-05-14 2013-10-02 株式会社リコー 液滴光学装置
EP2131242A1 (de) * 2008-06-02 2009-12-09 ASML Netherlands B.V. Substrattisch, lithografischer Apparat und Vorrichtungsherstellungsverfahren
JP5277731B2 (ja) * 2008-06-02 2013-08-28 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
DE102009026632A1 (de) * 2008-06-06 2009-12-10 Schleifring Und Apparatebau Gmbh Linsenanordnung mit Lagejustierung
JP5360530B2 (ja) * 2008-07-01 2013-12-04 株式会社リコー 液膜光学装置
TW201015230A (en) * 2008-10-03 2010-04-16 Univ Nat Chiao Tung Immersion inclined lithography apparatus and tank thereof
NL2006458A (en) * 2010-05-05 2011-11-08 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US8634145B2 (en) * 2010-07-29 2014-01-21 Johnson & Johnson Vision Care, Inc. Liquid meniscus lens with concave torus-segment meniscus wall
US8767308B2 (en) * 2010-08-23 2014-07-01 Johnson & Johnson Vision Care, Inc Negative add liquid meniscus lens
US8693104B2 (en) * 2010-08-24 2014-04-08 Johnson & Johnson Vision Care, Inc. Lens with compound linear-convex meniscus wall
DE102011080437A1 (de) 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Abbildendes optisches System für die Mikrolithographie
NL2007498A (en) * 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
NL2008704A (en) 2011-06-20 2012-12-28 Asml Netherlands Bv Wavefront modification apparatus, lithographic apparatus and method.
NL2009844A (en) * 2011-12-22 2013-06-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102012211256A1 (de) * 2012-06-29 2014-01-02 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Projektionslithographie
DE102013100680B4 (de) * 2013-01-23 2015-02-05 Carl Zeiss Ag Wellenfrontmanipulator und Optisches System mit einem Wellenfrontmanipulator
DE102013101711A1 (de) * 2013-02-21 2014-08-21 Carl Zeiss Microscopy Gmbh Objektiv und optisches Beobachtungsgerät
JP6147924B2 (ja) * 2013-09-14 2017-06-14 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影装置を作動させる方法
DE102018221670A1 (de) * 2018-12-13 2020-06-18 Karlsruher Institut für Technologie Vorrichtung und Verfahren zur optischen Charakterisierung oder Bearbeitung eines Objekts
JP7213761B2 (ja) * 2019-06-18 2023-01-27 キヤノン株式会社 露光装置、および物品製造方法
DE102019209764A1 (de) * 2019-07-03 2021-01-07 Robert Bosch Gmbh Verfahren zur Herstellung eines Kameragehäuses
CN112666696A (zh) * 2021-01-18 2021-04-16 郑州轻工业大学 焦点扫描方法、焦点扫描装置和共焦显微镜
US12601861B2 (en) * 2022-12-27 2026-04-14 Pixieray Oy Index matching based on gas to liquid phase change

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9330912B2 (en) 2006-11-22 2016-05-03 Asml Netherlands B.V. Lithographic apparatus, fluid combining unit and device manufacturing method
US8873022B2 (en) * 2009-02-12 2014-10-28 Carl Zeiss Smt Gmbh Projection exposure method, system and objective

Also Published As

Publication number Publication date
JP2008521224A (ja) 2008-06-19
US20080106711A1 (en) 2008-05-08
US20130070224A1 (en) 2013-03-21
WO2006053751A2 (de) 2006-05-26
JP4980922B2 (ja) 2012-07-18
US20100265478A1 (en) 2010-10-21
US7782440B2 (en) 2010-08-24
US8319944B2 (en) 2012-11-27
US9164396B2 (en) 2015-10-20

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