WO2006132111A1 - Mecanisme etage - Google Patents

Mecanisme etage Download PDF

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Publication number
WO2006132111A1
WO2006132111A1 PCT/JP2006/310777 JP2006310777W WO2006132111A1 WO 2006132111 A1 WO2006132111 A1 WO 2006132111A1 JP 2006310777 W JP2006310777 W JP 2006310777W WO 2006132111 A1 WO2006132111 A1 WO 2006132111A1
Authority
WO
WIPO (PCT)
Prior art keywords
linear guide
stage
linear
slider
rail
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2006/310777
Other languages
English (en)
Japanese (ja)
Inventor
Yasuo Konishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP2007520065A priority Critical patent/JP4614105B2/ja
Priority to CN2006800056161A priority patent/CN101128908B/zh
Publication of WO2006132111A1 publication Critical patent/WO2006132111A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001—Maintaining constant desired temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H01J2237/20228—Mechanical X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20271—Temperature responsive devices

Definitions

  • the present invention relates to a stage mechanism, and more particularly to a stage mechanism provided in a vacuum apparatus, particularly a vacuum apparatus provided with a heating mechanism.
  • a vacuum apparatus that includes a stage mechanism in a vacuum chamber and performs processing and inspection on an object placed on the stage mechanism in a vacuum state.
  • vacuum devices there are liquid crystal manufacturing devices and inspection devices, for example, measuring, analyzing and inspecting an object by irradiating the object with a charged particle beam such as an electron beam or an ion beam, Processing is applied to the object.
  • a TFT substrate is detected by irradiating an electron beam onto the TFT substrate and detecting secondary electrons emitted from the TFT substrate cover.
  • TFT substrate inspection equipment is known.
  • FIG. 8 is a diagram for explaining a configuration example of a vacuum apparatus including a heating device.
  • Fig. 8 (a) is a diagram for explaining a configuration example of a vacuum apparatus including a heating device.
  • the vacuum device 101 has a substrate in the vacuum chamber 102.
  • a stage mechanism 104 for placing an object such as 105 and a heating device 103 for heating the substrate 105 are provided.
  • the stage mechanism 104 includes a ⁇ stage 104a that adjusts the tilt ( ⁇ ), and an X—Y stage 104b that moves in the X and Y directions. By combining these movements, the position of the substrate 105 is adjusted. I do.
  • the ⁇ stage 104a includes a heating device 103, and heats the substrate 105 placed on the stage table.
  • FIG. 8 (b) is a diagram for explaining the transfer of heat to the stage mechanism by the heating device provided in the vacuum device.
  • the heat generated by the heating device 103 heats the substrate 105 placed on the table of the ⁇ stage 104a by heat conduction, and also heats the X—Y stage 104b by heat radiation. It gets hot.
  • heat conduction can be reduced by sandwiching a heat insulating material, but since the radiant heat is transmitted even in vacuum, the X—Y stage 104b is connected to the ⁇ stage 104a. Being heated by heat radiation from.
  • stage mechanism when the stage mechanism reaches a high temperature, the structure constituting the stage mechanism thermally expands, and it becomes difficult to smoothly drive the stage.
  • stage mechanism provided in the vacuum chamber has also increased in size with the increase in size of the substrate. This increase in the size of the stage mechanism is thought to be more marked by the effects of thermal expansion due to the high temperature of the stage mechanism.
  • FIG. 9 is a schematic diagram for explaining the influence of the stage mechanism due to high temperature.
  • Fig. 9 (a) shows the state before heating
  • Fig. 9 (b) shows the state after heating.
  • a mechanism for driving the X table with respect to the Y table is shown.
  • the stage mechanism 100 includes a pair of first linear guides 111 and a second linear guide 112, and the X table 100a slides in the X direction with respect to the Y table 100b by the pair of linear guides 111 and 112. It is supported and driven by the drive mechanism 113.
  • the first linear guide 111 includes a rail portion 11 la fixed to the Y table 100b along the X direction, and a slider portion 11 lb fixed to the X table 100a along the X direction.
  • the part 11 lb is configured to be slidable relative to the rail part 11 la.
  • the second linear guide 112 includes a rail part 112a fixed to the Y table 100b along the X direction, and a slider part 112b fixed to the X table 100a along the X direction.
  • the slider portion 112b is configured to be slidable with respect to the rail portion 112a.
  • Figure 9 (b) shows the effect of thermal expansion on the stage mechanism.
  • the X table 100a is slidable by the first and second linear guides 111 and 112 in the X direction, and is not affected by thermal expansion in the X direction.
  • This distortion affects the smooth drive of the linear guide and may cause the table itself to be distorted by stress.
  • the present invention aims to solve the above-mentioned problems and reduce the influence of thermal expansion of the stage mechanism due to high temperature, and more specifically, smooth drive by thermal expansion of the linear guide of the stage mechanism.
  • the purpose is to prevent obstruction.
  • the stage mechanism of the present invention includes at least one table, a pair of table linear guides that guide the table in a linear direction, and a compensation linear guide that compensates for displacement caused by thermal expansion of the table. .
  • the compensation linear guide fixes one table linear guide to a support portion that supports a pair of table linear guides, and moves the other table linear guide in a direction perpendicular to the linear direction. Make it free.
  • the table is displaced in various directions by thermal expansion.
  • this displacement is disassembled into a linear direction guided by the linear guide for the table and a direction perpendicular to the linear direction
  • the displacement in the linear direction guided by the linear guide for the table is the same movement direction as the linear guide for the table. Does not interfere with the driving of the linear guide.
  • the displacement in the direction perpendicular to the linear direction is perpendicular to the direction in which the table linear guide is driven and hinders the drive.
  • one of the table linear guides is fixed to the support portion, while the other table linear guide has a linear direction with respect to the support portion.
  • This stage mechanism can be applied to an XY stage having a configuration in which two tables are stacked in the vertical direction, such as an X table and a Y table.
  • the compensation linear guide may be provided on either the X table or the Y table in addition to the configuration provided on either the X table or the Y table.
  • the compensating linear guide compensates for the displacement of the table by fixing one table linear guide and making the other table linear guide movable in a direction orthogonal to the linear direction.
  • the compensating linear guide may include a slider portion that moves in accordance with the displacement of the table in a direction perpendicular to the rail portion in the linear direction.
  • one upper table linear guide is fixed to the lower table, and the other upper table linear guide is orthogonal to the linear direction. Free to move in the direction.
  • one lower table linear guide is provided for the support portion supporting the pair of lower table linear guides for guiding the lower table.
  • the guide is fixed, and the other lower table linear guide is movable in a direction perpendicular to the linear direction.
  • the present invention it is possible to reduce the influence of thermal expansion of the stage mechanism due to high temperature. Further, it is possible to prevent hindering smooth driving due to thermal expansion of the linear guide of the stage mechanism.
  • FIG. 1 is a diagram for explaining a configuration example of a stage mechanism of the present invention.
  • FIG. 2 is a schematic perspective view for explaining a first embodiment of the compensating linear guide of the present invention.
  • ⁇ 3 A schematic perspective view for explaining the first embodiment of the compensation linear guide of the present invention.
  • ⁇ 4 A view of the bottom surface force for explaining the first embodiment of the compensation linear guide of the present invention. It is.
  • FIG. 5 is a view of the bottom force for explaining the first embodiment of the compensating linear guide of the present invention.
  • ⁇ 6 A schematic perspective view for explaining a second embodiment of the compensating linear guide of the present invention.
  • ⁇ 7 A schematic perspective view for explaining a third embodiment of the compensating linear guide of the present invention.
  • ⁇ 8 It is a figure for demonstrating one structural example of a vacuum device provided with a heating apparatus.
  • FIG. 10 is a diagram for explaining two embodiments of the compensating linear guide of the present invention. Explanation of symbols
  • FIG. 1 is a view for explaining a configuration example of the stage mechanism of the present invention, and shows an example provided in a vacuum chamber.
  • a stage mechanism 1 is installed in a vacuum chamber 2 on which an object such as a substrate 9 is placed.
  • the stage mechanism 1 is an X—Y stage mechanism that can move in the X—Y direction, a ⁇ stage mechanism that adjusts the tilt, or a ⁇ and X—Y stage mechanism that combines the ⁇ stage and the X—Y stage. be able to.
  • a configuration combining a ⁇ stage mechanism and an XY stage mechanism will be described.
  • the stage mechanism 1 includes a ⁇ stage 3 that adjusts the tilt ( ⁇ ), and an X—Y stage 4 that moves in the X and Y directions, and performs movement in the ⁇ direction and movement in the X and Y directions.
  • the position of the substrate 9 is adjusted by combining them.
  • Each stage has a configuration in which the ⁇ stage 3, X stage 4, and Y stage 5 are stacked in this order from above.
  • the substrate 9 is placed on the ⁇ stage 3, the tilt is adjusted by the ⁇ stage, the X direction is aligned by the X stage 4, and the Y direction is aligned by the Y stage 5.
  • the 0 stage 3 includes a heating device 6.
  • the heating device 6 is provided in the 0 stage 3 to heat the substrate 9 placed on the 0 stage 3.
  • the heating device 6 can be a heater such as an IR lamp.
  • the heating device 6 is configured to be provided in the ⁇ stage 3 here.
  • the setting position of the heating device 6 is limited to that in the ⁇ stage 3.
  • the heating device 6 may be separated from the stage mechanism 1.
  • a light source provided above the ⁇ stage 3 may be used as a heating device.
  • a heating device is configured by a light source, the substrate 9 placed on the 0 stage 3 is heated from above by radiant heat generated from a light source (not shown).
  • the heat generated by the heating device 6 heats the substrate 9 placed on the table of the ⁇ stage 3 to a predetermined temperature by heat conduction.
  • the heating temperature of the heating device 6 is the temperature of the substrate 9 to be heated, It can be set in consideration of the temperature drop during heat conduction.
  • a spacer 8 having a heat insulating material force such as a ceramic material is sandwiched and installed. Also, ⁇ stay The reflector 7 is installed so that the radiant heat from the three does not reach the tee 4.
  • the X stage 4 includes an X table 4a, a pair of linear guides for guiding the X table 4a in the X direction (the IX linear guide 11 and the second X linear guide 12), and an X drive motor for driving the X table 4a. 4b, ball screw 4c, X axis 4d.
  • the Y stage 5 includes a Y table 5a, a pair of linear guides (first Y linear guide 21 and second Y linear guide 22) for guiding the Y table 5a in the Y direction, and a Y drive motor 5b for driving the Y table 5a. , Ball screw 5c, Y axis 5d. Therefore, the X stage 4 is movable in the X direction using the Y table 5a as a supporting portion, and the Y stage 5 is movable in the Y direction using the base portion of the vacuum chamber 2 or the like as a supporting portion.
  • the stage mechanism 1 of the present invention includes a guide direction of the linear guide (the IX linear guide 11 or the second X linear guide 12) on one of a pair of linear guides that guide the X table 4a in the X direction.
  • a third linear guide 13 is provided for guiding the linear guide (the IX linear guide 11 or the second X linear guide 12) in the orthogonal direction.
  • either one of the pair of linear guides for guiding the Y table 5a in the Y direction is arranged in a direction perpendicular to the guide direction of the reduction guide (first Y linear guide 21 or second Y linear guide 22).
  • a third linear guide 23 for guiding the linear guide (the first Y linear guide 21 or the second Y linear guide 22) is provided.
  • Whether or not the third linear guide 23 is installed can be determined according to the degree of the influence of thermal expansion on the Y table 5a by the heating device 6. In the example shown in FIG. 1, both the X stage 4 and the Y stage 5 have a third linear guide.
  • the second X linear guide 12 includes a second rail 12a and a second slider 12b.
  • the second rail 12a is attached to the upper surface of the Y table 5a along the X direction
  • the second slider 12b is attached to the lower surface of the X table 4a along the X direction.
  • the second slider 1 2b is slidable in the X direction on the second rail 12a and fixed in the Y direction!
  • the IX linear guide 11 includes a first rail 11a and a first slider l ib.
  • the first rail 11a is attached to the upper surface of the Y table 5a along the X direction
  • the first slider l ib is attached to the lower surface of the X table 4a along the X direction by the third linear guide 13.
  • First 1Slider l ib can be slid freely in the X direction on the first rail 11a by this third linear guide 13, and moved to the extent that it can absorb the displacement of stage 4 due to thermal expansion in the Y direction. It is possible.
  • the Y stage has the same configuration as the force stage that differs in the X and Y directions.
  • the second Y linear guide 22 includes a second rail and a second slider.
  • the second rail is mounted on the base (not shown) along the Y direction, and the second slider is mounted on the lower surface of the Y table 5a along the Y direction.
  • the second slider is slidable in the Y direction on the second rail and fixed in the X direction!
  • the first Y linear guide 21 includes a first rail and a first slider.
  • the first rail is mounted along the Y direction on the base (not shown), and the first slider is mounted along the Y direction by the third linear guide 23 on the lower surface of the Y table 5a.
  • the first slider can be slid in the Y direction on the first lane by the third linear guide 23, and can move to the X direction to absorb the displacement of the Y stage 5 due to thermal expansion. It is said.
  • the IX linear guide 11 and the second X linear guide 12 described above constitute a table linear guide that guides the X table 4a in the X direction with respect to the Y table 5a.
  • the guide 22 constitutes a linear guide for the table that guides the Y table 5a in the Y direction with respect to the base portion.
  • the third X linear guide 13 constitutes a compensating linear guide that absorbs the displacement in the Y direction of the X table 4a, and the third Y linear guide 23 is for compensation that absorbs the displacement in the X direction of the Y table 5a. It constitutes a linear guide.
  • the compensation linear guide of the present invention can realize the mechanism for absorbing the displacement in the direction orthogonal to the sliding direction of the attached linear guide in various forms.
  • the first embodiment of the compensation linear guide will be described with reference to FIGS. 2 to 5
  • the second embodiment of the compensation linear guide will be described with reference to FIG. 6, and the compensation linear guide will be described with reference to FIG. A third form of guide will be described.
  • the IX linear guide 11 fixes the first rail 11a to the upper surface of the heel table 5a, and holds the first slider 1 lb slidably in the X direction with respect to the first rail 1 la. Make it.
  • FIGS. 2A and 2B show before and after the X table 4a is moved in the X direction.
  • the X table 4a is moved in the X direction (arrow A in Fig. 2 (a)) by rotating the X axis 4d by the X drive motor 4b and driving the ball screw 4c attached to the X axis 4d. be able to.
  • the ball screw 4c is fixed to the X table 4a, and when the ball screw 4c moves relative to the X axis 4d, the X table 4a is moved.
  • Fig. 2 (b) shows the X table 4a moved in the X direction (arrow B in Fig. 2 (b)).
  • the third X linear guide 13 uses the first slider l ib as a rail part, the X table 4a side as a slider part, and the X table 4a is slidable in the Y direction relative to the first slider 1 lb for compensation. Configure the linear guide.
  • the X table 4a is provided with a groove 13a formed along the X direction in a portion facing the first slider l ib, and the width of the groove 13a in the Y direction is set to the first width.
  • a gap 13b is formed between the slider 1 lb and the first slider l ib. This gap 13b prevents the contact between the side surface of the groove 13a of the X table 4a and the side surface of the first slider l ib when the X table 4a is displaced in the Y direction. Compensates for smooth movement in the X direction along the first rail 11a.
  • FIG. 3 shows a state in which the X table 4a is thermally expanded.
  • FIG. 3 (a) shows a state before thermal expansion
  • FIG. 3 (b) shows a state after thermal expansion.
  • the second slider 12b of the second X linear guide 12 is fixed to the X table 4a and the displacement is absorbed by the third X linear guide 13 provided on the first IX re- guide guide 11. Therefore, the smooth movement of the second X linear guide 12 is compensated.
  • FIG. 4 is a view of the X table 4a as viewed from the back side (Y table 5a side).
  • FIG. 4 (a) shows a state before the X table 4a is displaced, and
  • FIG. ) Shows the state after X table 4a is displaced.
  • the IX linear guide 11 has a configuration in which a pair of first sliders l ib is provided for the first rail 11a, and a pair of grooves is formed in the X table 4a for each first slider l ib. 13a is formed to constitute the third X linear guide 13.
  • the second X linear guide 12 is provided with a pair of second sliders 12b with respect to the second rail 12a, and the second slider 12b is fixed to the lower surface of the X stage 4a.
  • FIG. 5 (a) shows the lower surface of the X table 4a as in FIG. 4, and FIG. 5 (b) shows the lower surface of the Y table 5a.
  • the first Y linear guide 21 and the second Y linear guide 22 provided on the lower surface of the Y table 5a are the point that the moving direction is the Y direction, the slider part is attached to the Y table 5a, and the rail part is the base part such as a vacuum chamber. The only difference is that it is supported, and the rest of the configuration is almost the same as the above-mentioned IX linear guides 11 and 12.
  • the first Y linear guide 21 has a configuration in which a pair of first sliders 21b is provided for the first rail 21a, and the Y table 5a is provided for each first slider 21b.
  • a pair of grooves 23a is formed to constitute a third Y linear guide 23.
  • the second Y linear guide 22 is provided with a pair of second sliders 22b with respect to the second rail 22a, and the second slider 22b is fixed to the lower surface of the Y table 5a.
  • the IX linear guide 11 fixes the first rail 11a to the upper surface of the Y table 5a, and the first slider 1 lb is slidable in the X direction with respect to the first rail 1la. Hold.
  • the third X linear guide 14 is provided with a groove 14a in the Y direction on the first slider l ib to form a rail portion, and a slider 14b that allows the groove 14a to slide is attached to the X table 4a side, and the X table 4a
  • the compensation linear guide is configured so that is slidable in the Y direction with respect to the first slider l ib.
  • the slider 14b attached to the X table 4a moves in the groove 14a provided in the first slider l ib in the Y direction.
  • the displacement of the X table 4a is prevented from being transmitted by 1 lb of the first slider, and this compensates for the smooth movement of the first slider l ib in the X direction along the first rail 11a. To do.
  • the first IX linear guide 11 fixes the first rail 11a to the upper surface of the Y table 5a, and holds the first slider 1 lb slidably in the X direction with respect to the first rail 1la. .
  • the third X linear guide 15 is provided with a convex portion 15a in the Y direction on the first slider lib to form a rail portion, and a groove slider 15b for making the convex portion 15a slidable is formed on the X table 4a side. Then, a compensation linear guide is configured such that the X table 4a is slidable in the Y direction with respect to the first slider l ib.
  • the groove 15b formed in the X table 4a guides the convex portion 15a provided on the first slider l ib in the Y direction. By doing so, the displacement of the X table 4a is prevented from being transmitted to the first slider l ib so that the first slider 1 lb moves smoothly in the X direction along the first rail 1 la. To compensate.
  • the first rail 1 of the IX linear guide 11 la and the second slider 12b of the 2′X linear guide 12 is fixed to the lower surface of the X table 4a, and the first slider lib of the IX linear guide 11 is orthogonal to the X direction with respect to the Y table 5a.
  • the second rail 12a of the second X linear guide 12 is fixed to the upper surface of the Y table 5a.
  • the compensation linear guide 13 can absorb the displacement when the X table 4a is displaced in the direction orthogonal to the X direction.
  • the first slider 1 lib of the IX linear guide 11 and the second slider 12b of the second X linear guide 12 The first rail 11a of the IX linear guide 11 and the second rail 12a of the second X linear guide 12 are fixed to the upper surface of the Y table 5a.
  • the first slider lib of the IX linear guide 11 is movable in a direction (arrow direction) perpendicular to the X direction with respect to the first rail 11a.
  • the compensating linear guide 13 can absorb the displacement when the X table 4a is displaced in the direction orthogonal to the X direction.
  • the present invention can be applied to a device that involves heating in a vacuum device such as a measuring device, an inspection device, or a processing device using a charged particle beam.

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)

Abstract

L’invention concerne un mécanisme étagé permettant d’assurer le mouvement uniforme de guides linéaires en dépit d’une dilatation thermique. Le mécanisme étagé comprend au moins une table (4, 5), une paire de guides linéaires (11, 12, 21, 22) guidant ladite au moins une table dans une direction linéaire, et des guides linéaires de compensation (13, 14, 15, 23) compensant le déplacement de ladite au moins une table dû à sa dilatation thermique. Des guides linéaires (12, 22) de la paire sont fixés à une partie de support et à ladite au moins une table, et les autres guides linéaires (11, 21) de la paire sont conçus de façon à permettre le mouvement de ladite au moins une table dans une direction orthogonale à la direction linéaire des guides linéaires de compensation (13, 14, 15, 23). En variante, les autres guides linéaires (11, 21) de la paire sont conçus de façon à pouvoir se déplacer par rapport à la partie de support dans une direction orthogonale à la direction linéaire des guides linéaires de compensation (13, 14, 15, 23).
PCT/JP2006/310777 2005-06-09 2006-05-30 Mecanisme etage Ceased WO2006132111A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007520065A JP4614105B2 (ja) 2005-06-09 2006-05-30 ステージ機構
CN2006800056161A CN101128908B (zh) 2005-06-09 2006-05-30 平台机构

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005169973 2005-06-09
JP2005-169973 2005-06-09

Publications (1)

Publication Number Publication Date
WO2006132111A1 true WO2006132111A1 (fr) 2006-12-14

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PCT/JP2006/310777 Ceased WO2006132111A1 (fr) 2005-06-09 2006-05-30 Mecanisme etage

Country Status (5)

Country Link
JP (1) JP4614105B2 (fr)
KR (1) KR100904647B1 (fr)
CN (1) CN101128908B (fr)
TW (1) TWI316377B (fr)
WO (1) WO2006132111A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008010633A (ja) * 2006-06-29 2008-01-17 Tokyo Seimitsu Co Ltd プローバ
WO2010041663A1 (fr) * 2008-10-08 2010-04-15 株式会社 日立ハイテクノロジーズ Dispositif d’entraînement de plate-forme
KR100957190B1 (ko) * 2007-08-29 2010-05-11 (주)피에조테크놀리지 압전 리니어 모터를 이용한 스테이지 장치
WO2020053979A1 (fr) * 2018-09-12 2020-03-19 株式会社日立ハイテクノロジーズ Dispositif d'inspection d'électrons à miroir

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KR100957190B1 (ko) * 2007-08-29 2010-05-11 (주)피에조테크놀리지 압전 리니어 모터를 이용한 스테이지 장치
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JP5166545B2 (ja) * 2008-10-08 2013-03-21 株式会社日立ハイテクノロジーズ ステージ駆動装置
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CN101128908A (zh) 2008-02-20
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TWI316377B (en) 2009-10-21
TW200706055A (en) 2007-02-01
KR100904647B1 (ko) 2009-06-25

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