WO2008126921A1 - 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂 - Google Patents

架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂 Download PDF

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Publication number
WO2008126921A1
WO2008126921A1 PCT/JP2008/057186 JP2008057186W WO2008126921A1 WO 2008126921 A1 WO2008126921 A1 WO 2008126921A1 JP 2008057186 W JP2008057186 W JP 2008057186W WO 2008126921 A1 WO2008126921 A1 WO 2008126921A1
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WO
WIPO (PCT)
Prior art keywords
polyvinyl acetal
acetal resin
crosslinked polyvinyl
functional group
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/057186
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English (en)
French (fr)
Inventor
Yuki Hirose
Hiroaki Takehara
Motokuni Ichitani
Takayuki Maeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
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Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to KR1020097021538A priority Critical patent/KR101515650B1/ko
Priority to CN2008800116072A priority patent/CN101652408B/zh
Priority to US12/450,673 priority patent/US8420298B2/en
Priority to EP08740283.0A priority patent/EP2138531B1/en
Priority to JP2008520165A priority patent/JP5336846B2/ja
Publication of WO2008126921A1 publication Critical patent/WO2008126921A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382—Contact thermal transfer or sublimation processes
    • B41M5/392—Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • B41M5/395—Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
    • C08F216/38—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an acetal or ketal radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/28—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/40—Cover layers; Layers separated from substrate by imaging layer; Protective layers; Layers applied before imaging
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2329/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Derivatives of such polymer
    • C08J2329/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)

Abstract

架橋剤を使用せず簡便な方法で、機械的強度が高く、耐溶剤性に優れる架橋ポリビニルアセタール樹脂を製造できることから、シートアタック、強度不足、粘度の経時安定性等の問題を解決することが可能な架橋ポリビニルアセタール樹脂の製造方法及び該架橋ポリビニルアセタール樹脂の製造方法を用いてなる架橋ポリビニルアセタール樹脂を提供する。 少なくとも下記一般式(1)、(2)、(3)及び(4)で表される構造単位を有するポリビニルアセタール樹脂に波長が200~365nmの範囲内にある紫外線を照射する工程を有することを特徴とする架橋ポリビニルアセタール樹脂の製造方法。式(1)~(4)中、R1は水素原子又は炭素数1~20の炭化水素基を表し、R2は下記一般式(5)で表される官能基、下記一般式(6)で表される官能基、及び、下記一般式(7)で表される官能基からなる群より選択される少なくとも1種の官能基を合計2個以上有する基を表す。
PCT/JP2008/057186 2007-04-11 2008-04-11 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂 Ceased WO2008126921A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020097021538A KR101515650B1 (ko) 2007-04-11 2008-04-11 가교 폴리비닐아세탈 수지의 제조 방법 및 가교 폴리비닐아세탈 수지
CN2008800116072A CN101652408B (zh) 2007-04-11 2008-04-11 交联聚乙烯醇缩醛树脂的制造方法和交联聚乙烯醇缩醛树脂
US12/450,673 US8420298B2 (en) 2007-04-11 2008-04-11 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin
EP08740283.0A EP2138531B1 (en) 2007-04-11 2008-04-11 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin
JP2008520165A JP5336846B2 (ja) 2007-04-11 2008-04-11 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
JP2007-103775 2007-04-11
JP2007103775 2007-04-11
JP2007137216 2007-05-23
JP2007-137214 2007-05-23
JP2007-137216 2007-05-23
JP2007-137215 2007-05-23
JP2007137214 2007-05-23
JP2007137215 2007-05-23
JP2007258082 2007-10-01
JP2007258080 2007-10-01
JP2007-258083 2007-10-01
JP2007-258080 2007-10-01
JP2007-258082 2007-10-01
JP2007258083 2007-10-01

Publications (1)

Publication Number Publication Date
WO2008126921A1 true WO2008126921A1 (ja) 2008-10-23

Family

ID=39864016

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057186 Ceased WO2008126921A1 (ja) 2007-04-11 2008-04-11 架橋ポリビニルアセタール樹脂の製造方法及び架橋ポリビニルアセタール樹脂

Country Status (6)

Country Link
US (1) US8420298B2 (ja)
EP (1) EP2138531B1 (ja)
JP (1) JP5336846B2 (ja)
KR (1) KR101515650B1 (ja)
TW (1) TWI432490B (ja)
WO (1) WO2008126921A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010168444A (ja) * 2009-01-21 2010-08-05 Sekisui Chem Co Ltd ポリビニルアセタール樹脂多孔質体の製造方法
WO2015146747A1 (ja) * 2014-03-27 2015-10-01 積水化学工業株式会社 蓄電デバイス電極用バインダー
WO2017033980A1 (ja) * 2015-08-24 2017-03-02 セメダイン株式会社 樹脂成型体又はゴム成形体の表面処理方法
JP2019065251A (ja) * 2017-09-29 2019-04-25 積水化学工業株式会社 水性ポリビニルアセタール樹脂組成物
US10784513B2 (en) 2015-09-17 2020-09-22 Sekisui Chemical Co., Ltd. Binder for electrical storage device electrode

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101829788B1 (ko) 2010-08-19 2018-02-19 주식회사 쿠라레 폴리비닐 아세탈 수지, 그 슬러리 조성물, 세라믹 그린 시트 및 적층 세라믹 콘덴서
UA126561C2 (uk) 2016-06-17 2022-11-02 Чугаі Сейяку Кабусікі Кайся Застосування антитіла проти с5
US10438575B2 (en) 2017-11-20 2019-10-08 Chang Chun Petrochemical Co., Ltd. Multilayer film, interlayer film comprising the multilayer film and laminated glass and sound-insulating glass laminate comprising the interlayer film
US10212828B1 (en) * 2017-11-27 2019-02-19 International Business Machines Corporation Via stub elimination by disrupting plating
JPWO2021215455A1 (ja) * 2020-04-21 2021-10-28

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JPH0277403A (ja) * 1988-06-24 1990-03-16 Shin Etsu Chem Co Ltd 光硬化性および熱硬化性を有するポリビニルブチラール誘導体
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JP2006156493A (ja) 2004-11-25 2006-06-15 Tdk Corp 積層型電子部品の製造方法
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JPH0277403A (ja) * 1988-06-24 1990-03-16 Shin Etsu Chem Co Ltd 光硬化性および熱硬化性を有するポリビニルブチラール誘導体
JPH10292013A (ja) * 1997-02-19 1998-11-04 Dainippon Printing Co Ltd 樹脂、耐熱塗料及び該塗料を用いた熱転写シート
JPH11305030A (ja) * 1998-04-14 1999-11-05 Samsung Display Devices Co Ltd 赤色フィルタ―膜の形成方法
JP2000218952A (ja) * 1999-01-29 2000-08-08 Mitsui Chemicals Inc 印刷版および印刷版の製版方法
JP2006523754A (ja) 2003-03-21 2006-10-19 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー アセトアセチル化ポリビニルポリマーおよび該ポリマーから製造された硬化性コーティング組成物
JP2006522863A (ja) 2003-04-11 2006-10-05 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー アセトアセチル化ポリビニルポリマー
JP2006131445A (ja) * 2004-11-04 2006-05-25 Sekisui Chem Co Ltd 塗工用ペースト
JP2006156493A (ja) 2004-11-25 2006-06-15 Tdk Corp 積層型電子部品の製造方法

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See also references of EP2138531A4

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010168444A (ja) * 2009-01-21 2010-08-05 Sekisui Chem Co Ltd ポリビニルアセタール樹脂多孔質体の製造方法
WO2015146747A1 (ja) * 2014-03-27 2015-10-01 積水化学工業株式会社 蓄電デバイス電極用バインダー
JPWO2015146747A1 (ja) * 2014-03-27 2017-04-13 積水化学工業株式会社 蓄電デバイス電極用バインダー
US10008724B2 (en) 2014-03-27 2018-06-26 Sekisui Chemical Co., Ltd. Binder for power storage device electrode
WO2017033980A1 (ja) * 2015-08-24 2017-03-02 セメダイン株式会社 樹脂成型体又はゴム成形体の表面処理方法
JPWO2017033980A1 (ja) * 2015-08-24 2017-08-24 セメダイン株式会社 樹脂成型体又はゴム成形体の表面処理方法
US10784513B2 (en) 2015-09-17 2020-09-22 Sekisui Chemical Co., Ltd. Binder for electrical storage device electrode
JP2019065251A (ja) * 2017-09-29 2019-04-25 積水化学工業株式会社 水性ポリビニルアセタール樹脂組成物
JP7120789B2 (ja) 2017-09-29 2022-08-17 積水化学工業株式会社 水性ポリビニルアセタール樹脂組成物

Also Published As

Publication number Publication date
EP2138531A1 (en) 2009-12-30
KR101515650B1 (ko) 2015-04-27
EP2138531B1 (en) 2014-10-29
TW200906924A (en) 2009-02-16
US20100112480A1 (en) 2010-05-06
TWI432490B (zh) 2014-04-01
JPWO2008126921A1 (ja) 2010-07-22
EP2138531A4 (en) 2011-03-30
JP5336846B2 (ja) 2013-11-06
US8420298B2 (en) 2013-04-16
KR20100015608A (ko) 2010-02-12

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