WO2011020740A2 - Corps en métal, en métal dur, en cermet ou en céramique, munis d'un revêtement et procédé pour munir des corps de ce type d'un revêtement - Google Patents

Corps en métal, en métal dur, en cermet ou en céramique, munis d'un revêtement et procédé pour munir des corps de ce type d'un revêtement Download PDF

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Publication number
WO2011020740A2
WO2011020740A2 PCT/EP2010/061607 EP2010061607W WO2011020740A2 WO 2011020740 A2 WO2011020740 A2 WO 2011020740A2 EP 2010061607 W EP2010061607 W EP 2010061607W WO 2011020740 A2 WO2011020740 A2 WO 2011020740A2
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Prior art keywords
metal
hard material
based hard
bodies
layer
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German (de)
English (en)
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WO2011020740A3 (fr
Inventor
Mandy HÖHN
Ingolf Endler
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Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
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Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
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Publication of WO2011020740A3 publication Critical patent/WO2011020740A3/fr
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications

Definitions

  • TECHNICAL FIELD This invention relates to coated bodies of metal, cemented carbide, cermet or ceramic coated with a single or multi-layer coating system
  • the hard material layer according to the invention which is produced on the bodies, is distinguished by its smooth, homogeneous surface, its high hardness and its good resistance to oxidation and is known in particular as
  • Wear protection layer can be used on Si3N and WC / Co indexable inserts and steel components.
  • Aluminum oxide AI2O3 belongs to the industrially established layer materials. Properties such as high oxidation resistance, relatively high hardness, low thermal conductivity and high chemical resistance make it a successful wear protection coating.
  • CVD chemical vapor deposition
  • PVD Physical Vapor Deposition
  • thermodynamically stable a-Al 2 O 3 phase or the modification ⁇ -Al 2 O 3 are selectively prepared, as described for example in US Patents 5,137,774 and
  • PVD plasma-based CVD
  • PVD plasma-based CVD
  • WO 00/17416 describes a CVD composite material layer of aluminum oxide with zirconium oxide and / or hafnium oxide.
  • a mixture of different metal oxides is also explained in DE 195 18 927 A1. This is the CVD deposition of two-phase metal oxide layers, which include aluminum oxide and zirconia. A mixed crystal layer of aluminum oxide and chromium oxide with a chromium content of more than 5 at.% Prepared by a PVD process is described in patent EP 0 513 662 B1. Metal carbide layers of the metals chromium, zirconium,
  • WO 2005/085499 A1 includes a PVD coating, in particular for a cutting tool, in which a cover layer is formed, inter alia, of ZrC or CrC.
  • Investigations by Park et al. for the preparation of Zirkoncarbid Anlagenen with a thermal CVD process showed that form stoichiometric ZrC layers at deposition temperatures of 1350 to 1400 ° C (JH Park, CH Jung, DJ Kim, JY Park, Surface and Coating Technologies 203 (2008) 324-328). With increasing deposition temperature, the crystal size increased it to about 5 ⁇ .
  • Wear protection layers with a metal carbide multilayer structure are described in WO 98/44163.
  • these multilayers consist of carbides of the metals zirconium, chromium, niobium and vanadium, whose individual layers have a thickness of 3 to 100 nm. These layers, called “superlattice”, are characterized by high hardness.
  • Carbide layers of vanadium are used as described in DE 10 2007 046 410 A1 as surface coating in foundry tools. Generated The vanadium carbide layers described by means of thermal diffusion, a CVD or PVD method.
  • the invention has for its object to develop for metal, hard metal, cermet or ceramic body a single or multilayer coating system containing at least one Al-based hard material layer, characterized by high oxidation resistance, higher hardness and better wear resistance in comparison to distinguish conventional Al-based hard coatings.
  • n 1, 2, 3, 6, 7 or 8.
  • these may have a different content of metal carbides.
  • the Al-based hard material layer may also have a gradient with respect to the carbide content.
  • the Al-based hard material layer may advantageously contain Cr 3 C 2 , Cr 7 C 3 , Cr 2 3 C 6, ZrC, VC, V 2 C, NbC and / or Nb 2 C.
  • Layer system in addition to one or more of the Al-based hard material layers additionally contain one or more further layers.
  • Layers can be selected from the group of materials a (alpha) -Al 2 O 3 , Y (gamma) -Al 2 O 3 , K (kappa) -Al 2 O 3 , TiN, TiCN, TiC, TiAIN and TiAICN.
  • the Al-based hard material layer has a layer thickness between 0.1 ⁇ and 30 ⁇ on.
  • Alumina phases and metal carbides are and can contain even more metal oxides, shows in a surprising manner that over pure Al 2 O 3 or Metallcarbid füren property improvements are achievable, such as an increase in hardness while maintaining a high oxidation resistance.
  • chromium is used as the second metal in addition to aluminum, then a layer of the mixed oxide aluminum chromium oxide and / or Al 2 O 3 and chromium carbides can be produced. If, in addition to aluminum, a metal of the group niobium, zirconium or vanadium is used as the second metal, then a composite layer is formed
  • the metal carbides which may contain other metal oxides.
  • Such a composite layer which combines the excellent oxidation resistance of the aluminum oxide with the higher hardness of metal carbides has not been described.
  • the invention includes a method in which the Al-based hard material layer
  • Al a M1 b Cl c passed a sublimed aluminum trichloride over a second metal chloride at a temperature of 150 ° C to 600 ° C.
  • a chloride of Cr, Zr, V and / or Nb can be used as the second metal chloride.
  • the CVD process is advantageously carried out at temperatures between 900 ° C and 1050 ° C and at pressures between 4 kPa and 15 kPa.
  • the carbon-containing compounds used are expediently CO 2 , CO and / or hydrocarbons, as oxygen-containing compounds CO 2 , CO, H 2 O and / or N 2 O and as inert gases argon or helium.
  • An important prerequisite in the production of the composite layers according to the invention is the use of a novel precursor, which is generated in situ in an evaporator system. For this purpose, sublimed aluminum trichloride is passed over a chloride of the metals chromium, zirconium, vanadium or niobium. This reaction produces a volatile ternary aluminum metal chloride.
  • Precursors take place in an evaporator system consisting of an aluminum chloride evaporator and a second evaporator filled with a chloride of the metals chromium, zirconium, vanadium or niobium.
  • the layers produced in this way are characterized by a composite structure whose main components are aluminum oxide phases and metal carbides and which may contain other metal oxides. These layers are characterized by excellent oxidation resistance.
  • the layer according to the invention furthermore has a smooth, homogeneous surface and a high hardness of up to 28 GPa. In the case of multilayer structures consisting of single layers with
  • Fig. 1 the X-ray diffractogram of the composite layer consisting of
  • Fig. 2 Cross sections of the composite layers consisting of a-Al 2 xCr x O3, ⁇ - ⁇ 2 ⁇ 3 and chromium carbides
  • Fig. 3 Vegard's straight line for the Al2 -x CrxO3 mixed crystal
  • FIG. 4 the ruby luminescence of a ruby reference specimen and the composite layer consisting of ⁇ -Al 2 - x Cr x O 3, X - ⁇ 2 ⁇ 3 and the chromium carbides Cr 7 C 3 , Cr 2 3C 6 according to exemplary embodiment 1
  • FIG. 5 the X-ray diffractogram of FIG Composite layer composed of
  • Fig. 6 The ruby luminescence of a ruby reference sample and the composite layer consisting of a-Al 2- xCr x O3, ⁇ - ⁇ 2 ⁇ 3 and chromium carbide Cr 7 C3 according to FIG.
  • Fig. 7 the X-ray diffractogram of the composite layer consisting of
  • FIG. 8 a cross section of the composite layer consisting of a-Al 2 - x Cr x O 3, ⁇ - ⁇ 2 ⁇ 3 and the chromium carbide Cr 7 C 3 according to exemplary embodiment 3,
  • Fig. 9 The ruby luminescence of a ruby reference sample and the composite layer consisting of a-Al 2-x Cr x O 3, ⁇ - ⁇ 2 ⁇ 3 and chromium carbide Cr 7 C3 according to FIG.
  • Fig. 10 the X-ray diffractogram of the composite layer consisting of
  • Fig. 1 1 a cross section of the composite layers consisting of a-Al 2-x Cr x O 3 and the chromium carbide Cr 7 C3 according to Embodiment 6. example 1
  • the coating process takes place in a hot wall CVD reactor with an internal diameter of 75 mm.
  • a precursor consisting of a mixture of AICI 3 and ternary aluminum chromium chloride Al 2 CrCl 8 is used. This
  • Precursor mixture is generated in situ by sublimed aluminum trichloride over chromium (II) chloride is passed at a temperature of 300 ° C and thereby formed in an incomplete reaction volatile ternary chloride.
  • the preparation of the Precursorgemisches is realized by means of a combination of two evaporators consisting of an aluminum chloride evaporator and an evaporator filled with chromium chloride.
  • a gas mixture is used, the 94.8 vol .-% H 2 , 2.5 vol .-% CO 2 and 2.0 vol .-% Ar and 0.7 vol .-% of Precursorgemisches AICI 3 and ternary aluminum chromium chloride AI 2 CrCl8 contains.
  • the deposition temperature is 920 ° C and the process pressure 6 kPa.
  • a coating time of 240 minutes a 3.5 ⁇ m-thick composite layer consisting of Al 2 - x Cr x O 3 and
  • the diffractogram shows a phase mixture consisting of a-Al 2- xCr x O3 and ⁇ - ⁇ 2 03 and the
  • Chromium carbides Cr 7 C3 and Cr 23 C6 The cross section of the sample (see Fig. 2a) shows the composite structure of the layer. There are chromium carbide grains embedded in one
  • Aluminum content of 32.3 at.% Determined within the layer.
  • the presence of the Al2 -x CrxO3 mixed crystal is determined by the determination of the lattice constant and further by the method of measuring the
  • the layer according to the invention is characterized by a composite structure with a smooth, homogeneous surface and high hardness. Microhardness measurements with a Vickers indenter gave a hardness of 26.2 ⁇ 0.6 GPa.
  • the coating process takes place in a hot wall CVD reactor with an internal diameter of 75 mm. Using a gas mixture, the
  • the composition of the layer was determined by means of X-ray thin-layer analysis in grazing incidence (see X-ray diffractogram Fig. 5).
  • the diffractogram shows a phase mixture consisting of a-Al 2- xCr x O3 and ⁇ - ⁇ 2 ⁇ 3 and the chromium carbide Cr 7 C3. From the transverse section of the sample (see Fig. 2b), the composite structure of the layer can be seen. In contrast to
  • Example 1 is a significantly lower number of chromium carbide grains embedded in an alumina matrix.
  • the Al 2 -x CrxO 3 mixed crystal was detected as in Example 1 by determining the lattice constant of the a-Al 2 O 3 and the measurement of ruby luminescence.
  • Figure 3 shows this relationship graphically. In the case of the layer described here, it is an Ali. 98 8Cro.oi2O3.
  • Figure 4 shows the spectra of Example 2 compared to a ruby reference sample.
  • Si3N ceramic inserts On Si3N ceramic inserts is first applied a 1 ⁇ thick TiN bonding layer and then the layer according to the invention by means of a CVD process.
  • the coating process is carried out analogously to Example 1 and 2 in a hot wall CVD reactor with an inner diameter of 75 mm.
  • a gas mixture containing 92.3 vol .-% H 2 , 2.5 vol .-% CO 2 , 2.5 vol .-% CO, 2.0 vol .-% Ar and analogous to Examples 1 and 2 Contains 0.7 vol .-% of a Precursorgemisches of AICI3 and ternary aluminum chromium chloride Al 2 CrCl8, at a temperature of 920 ° C and a pressure of 6 kPa, a composite layer consisting of Al 2-x Cr x O3 and chromium carbides with a deposition rate of 0.4 ⁇ / h receive.
  • This layer was also examined by X-ray thin-film analysis in grazing incidence and the X-ray diffraction pattern is shown in Figure 6. It shows a phase mixture consisting of a-Al 2- xCr x O3 and ⁇ - ⁇ 2 ⁇ 3 as well as chromium carbide Cr 7 C3.
  • the cross-section of the sample (see Fig. 7) reveals the composite structure of the layer.
  • the layer has a very high proportion of chromium carbides.
  • the chromium content determined by WDX examination is 29.8 at.% And the aluminum content is 22.7 at.%.
  • Example 1 For the detection of the Al2 -x CrxO3-Mischkhstalls the method of ruby luminescence was used as in Example 1 and 2.
  • Figure 8 shows the spectra of Example 3 compared to a ruby reference sample. The intensity of the ruby doublet is lower in this sample than in Examples 1 and 2, indicating a lower proportion of chromium in the Al 2 -x CrxO 3 mixed crystal.
  • a 1 ⁇ m thick TiN bonding layer and then the layer according to the invention are applied by means of a CVD process.
  • a precursor consisting of a mixture of AICI3 and ternary aluminum zirconium chloride AIZrCl 7 is used .
  • This precursor mixture is generated in situ by passing sublimed aluminum trichloride over zirconium (IV) chloride at a temperature of 280 ° C, forming volatile ternary chloride in an incomplete reaction.
  • the preparation of the precursor mixture is realized by means of a combination of two evaporators consisting of an aluminum chloride evaporator and an evaporator filled with zirconium chloride.
  • the coating process is analogous to Example 1 in a hot wall CVD reactor with an inner diameter of 75 mm.
  • a WC / Co hard metal substrate with a pre-coating consisting of 1 ⁇ TiN and 2 ⁇ TiCN layer of the invention is applied by means of a CVD process.
  • a precursor consisting of a mixture of AICI3 and ternary aluminum niobium chloride AINbCIs is used. This precursor mixture is generated in situ by passing sublimed aluminum trichloride over niobium (V) chloride at a temperature of 250 ° C, forming volatile ternary chloride in an incomplete reaction.
  • V niobium
  • the coating process is analogous to Example 1 in a hot wall CVD reactor with an inner diameter of 75 mm. One is used
  • Aluminum niobium chloride AINbCIs contains at a temperature of 980 ° C and a pressure of 6 kPa. After a coating time of 240 minutes, a 3.5 ⁇ m thick composite layer consisting of aluminum oxide Al 2 O 3, niobium oxide NbO 2 and the
  • Niobarbiden NbC and Nb 2 C obtained.
  • the coating process takes place in a hot wall CVD reactor with an internal diameter of 75 mm.
  • a gas mixture 91, 3 vol.% H 2 , 6 vol.% CO 2 , 2.0 vol.% Ar and, analogously to Example 1, 0.7 vol.% Of a precursor mixture of AlCl 3 and ternary aluminum chromium chloride Al 2 CrCl 8 ,
  • a composite layer consisting of Al 2- xCr x O3 and chromium carbides with a
  • the diffractogram shows a phase mixture consisting of a-Al 2-x Cr x O 3 and the chromium carbide Cr 7 C3.
  • the cross-section of the sample shows the composite structure of the
  • the presence of the Al 2- xCr x O3 mixed crystal is determined by the determination of the
  • Lattice constant detected The lattice constant of the Al 2-x Cr x O 3 mixed crystal follows Vegard's rule, which describes a linear dependence between the lattice constant of a mixed crystal and the composition. Figure 3 shows this relationship graphically. In the case of the layer described here is a
  • the layer according to the invention is characterized by a composite structure with a smooth, homogeneous surface and high hardness. Microhardness measurements with a Vickers indenter gave a hardness of 26.8 ⁇ 0.5 GPa.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne des corps en métal, en métal dur, en cermet ou en céramique, qui sont revêtus d'un système en couches à une ou à plusieurs couches, qui contient au moins une couche de substance dure à base d'Al, ainsi qu'un procédé pour munir ce type de corps d'un revêtement. L'invention vise à produire des corps de ce type munis de couches de substance dure à base d'Al, lesdites couches se caractérisant en ce qu'elles présentent une résistance élevée à l'oxydation, une dureté renforcée et une meilleure résistance à l'usure comparativement aux couches de substance dure à base d'Al classiques. Selon l'invention, lesdits corps sont revêtus d'une ou de plusieurs n couches de substance dure à base d'Al, qui se composent au moins d'oxyde d'aluminium et/ou d'AI2-xCrxO3, x = 0,0001 à 1 et d'un ou de plusieurs carbures métalliques des éléments Cr, Zr, V, Nb et peuvent contenir d'autres oxydes métalliques des éléments Zr, V, Nb. Les corps sont munis d'un revêtement par procédé CVD thermique, à des températures comprises entre 800 et 1050°C, le mélange gazeux utilisé comprenant des composés contenant du carbone, des composés contenant de l'oxygène ainsi que de l'hydrogène et/ou des gaz inertes, ledit mélange contenant comme précurseur métallique, un ou plusieurs chlorures métalliques d'aluminium ternaires AlaM1bClc, un des métaux M1 = Cr, Zr, V et Nb et, a = 1, 2 ou 3, b = 1 et c = 6, 7, 8, 10 ou 12 et auquel peut être mélangé un halogénure d'aluminium. Pour produire le chlorure métallique d'aluminium ternaire AlaM1bClc, un trichlorure d'aluminium sublimé est passé sur un second chlorure métallique à une température comprise entre 150 et 600°C. La couche de substance dure à base d'Al selon l'invention s'utilise notamment comme couche anti-usure sur des matrices de découpage réversibles en Si3N4et en WC/Co et des éléments en acier.
PCT/EP2010/061607 2009-08-17 2010-08-10 Corps en métal, en métal dur, en cermet ou en céramique, munis d'un revêtement et procédé pour munir des corps de ce type d'un revêtement Ceased WO2011020740A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009028579.2 2009-08-17
DE200910028579 DE102009028579B4 (de) 2009-08-17 2009-08-17 Beschichtete Körper aus Metall, Hartmetall, Cermet oder Keramik sowie Verfahren zur Beschichtung derartiger Körper

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WO2011020740A2 true WO2011020740A2 (fr) 2011-02-24
WO2011020740A3 WO2011020740A3 (fr) 2011-05-05

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011053372A1 (de) * 2011-09-07 2013-03-07 Walter Ag Werkzeug mit chromhaltiger Funktionsschicht

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014104886A1 (de) 2014-04-07 2015-10-08 Mas Gmbh Schneidplatte, Zerspanungswerkzeug und Verfahren zur Herstellung einer Schneidplatte

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