WO2011031092A3 - Composition de solution de nettoyage pour substrat pour la préparation d'écran plat - Google Patents

Composition de solution de nettoyage pour substrat pour la préparation d'écran plat Download PDF

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Publication number
WO2011031092A3
WO2011031092A3 PCT/KR2010/006181 KR2010006181W WO2011031092A3 WO 2011031092 A3 WO2011031092 A3 WO 2011031092A3 KR 2010006181 W KR2010006181 W KR 2010006181W WO 2011031092 A3 WO2011031092 A3 WO 2011031092A3
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning solution
solution composition
flat panel
panel display
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2010/006181
Other languages
English (en)
Korean (ko)
Other versions
WO2011031092A2 (fr
Inventor
윤효중
방순홍
김성식
김병묵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020100088419A external-priority patent/KR20110028239A/ko
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Priority to CN201080040842.XA priority Critical patent/CN102575201B/zh
Publication of WO2011031092A2 publication Critical patent/WO2011031092A2/fr
Publication of WO2011031092A3 publication Critical patent/WO2011031092A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Detergent Compositions (AREA)

Abstract

La présente invention concerne une composition de solution aqueuse de nettoyage comprenant un ou plusieurs types de composés choisis parmi un dérivé d'acide borique, un acide phosphorique organique et leurs sels, utilisée pour nettoyer la surface d'un substrat pendant un procédé de fabrication d'un écran plat. La composition de solution aqueuse de nettoyage de la présente invention est dotée d'une excellente capacité d'élimination de la contamination due aux matières ou particules organiques produite sur un substrat pendant un procédé de fabrication d'un écran plat, et est dotée d'une excellente capacité de prévention de la corrosion d'une interconnexion métallique formée sur un substrat. En outre, la composition de solution aqueuse de nettoyage de la présente invention contient une grande quantité d'eau désionisée et peut donc être facilement manipulée et est avantageuse sur le plan environnemental.
PCT/KR2010/006181 2009-09-11 2010-09-10 Composition de solution de nettoyage pour substrat pour la préparation d'écran plat Ceased WO2011031092A2 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201080040842.XA CN102575201B (zh) 2009-09-11 2010-09-10 用于制造平面显示器的基板的清洗液组合物

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20090086045 2009-09-11
KR10-2009-0086045 2009-09-11
KR10-2010-0088419 2010-09-09
KR1020100088419A KR20110028239A (ko) 2009-09-11 2010-09-09 평판표시장치 제조용 기판의 세정액 조성물

Publications (2)

Publication Number Publication Date
WO2011031092A2 WO2011031092A2 (fr) 2011-03-17
WO2011031092A3 true WO2011031092A3 (fr) 2011-08-04

Family

ID=43732969

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/006181 Ceased WO2011031092A2 (fr) 2009-09-11 2010-09-10 Composition de solution de nettoyage pour substrat pour la préparation d'écran plat

Country Status (1)

Country Link
WO (1) WO2011031092A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6899220B2 (ja) * 2017-01-11 2021-07-07 株式会社ダイセル レジスト除去用組成物
KR102675757B1 (ko) * 2017-02-24 2024-06-18 동우 화인켐 주식회사 레지스트 박리액 조성물
CN107346095B (zh) * 2017-09-14 2020-12-22 江阴江化微电子材料股份有限公司 一种半导体制程正性光刻胶去胶液及应用
US20220326620A1 (en) * 2019-08-30 2022-10-13 Dow Global Technologies Llc Photoresist stripping composition
KR102763422B1 (ko) * 2023-03-27 2025-02-05 주식회사 디엔에스 박리력이 우수한 포토레지스트 스트리퍼

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004042811A1 (fr) * 2002-11-08 2004-05-21 Wako Pure Chemical Industries, Ltd. Composition de nettoyage et procede pour nettoyer avec cette composition
KR20060087950A (ko) * 2005-01-31 2006-08-03 테크노세미켐 주식회사 에칭 잔류물 세정용 조성물 및 이를 이용한 세정방법
KR20080111268A (ko) * 2007-06-18 2008-12-23 동우 화인켐 주식회사 세정액 조성물 및 이를 이용한 세정방법
WO2009078123A1 (fr) * 2007-12-17 2009-06-25 Sanyo Chemical Industries, Ltd. Agent de nettoyage et procédé de nettoyage pour matériau électronique

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004042811A1 (fr) * 2002-11-08 2004-05-21 Wako Pure Chemical Industries, Ltd. Composition de nettoyage et procede pour nettoyer avec cette composition
KR20060087950A (ko) * 2005-01-31 2006-08-03 테크노세미켐 주식회사 에칭 잔류물 세정용 조성물 및 이를 이용한 세정방법
KR20080111268A (ko) * 2007-06-18 2008-12-23 동우 화인켐 주식회사 세정액 조성물 및 이를 이용한 세정방법
WO2009078123A1 (fr) * 2007-12-17 2009-06-25 Sanyo Chemical Industries, Ltd. Agent de nettoyage et procédé de nettoyage pour matériau électronique

Also Published As

Publication number Publication date
WO2011031092A2 (fr) 2011-03-17

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