WO2012052257A3 - Optoelektronischer halbleiterchip und verfahren zu dessen herstellung - Google Patents
Optoelektronischer halbleiterchip und verfahren zu dessen herstellung Download PDFInfo
- Publication number
- WO2012052257A3 WO2012052257A3 PCT/EP2011/066687 EP2011066687W WO2012052257A3 WO 2012052257 A3 WO2012052257 A3 WO 2012052257A3 EP 2011066687 W EP2011066687 W EP 2011066687W WO 2012052257 A3 WO2012052257 A3 WO 2012052257A3
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- WIPO (PCT)
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- layer
- semiconductor chip
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/815—Bodies having stress relaxation structures, e.g. buffer layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/822—Materials of the light-emitting regions
- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/831—Electrodes characterised by their shape
- H10H20/8312—Electrodes characterised by their shape extending at least partially through the bodies
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
- H10H20/8511—Wavelength conversion means characterised by their material, e.g. binder
- H10H20/8512—Wavelength conversion materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
- H10H20/8516—Wavelength conversion means having a non-uniform spatial arrangement or non-uniform concentration, e.g. patterned wavelength conversion layer or wavelength conversion layer with a concentration gradient
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/531—Shapes of wire connectors
- H10W72/536—Shapes of wire connectors the connected ends being ball-shaped
Landscapes
- Led Devices (AREA)
- Led Device Packages (AREA)
Abstract
Es ist ein optoelektronischer Halbleiterchip (10) mit einem Halbleiterschichtenstapel (1) aus einem nitridischen Verbindungshalbleitermaterial auf einem Trägersubstrat (2) angegeben, wobei das Trägersubstrat (2) eine Oberfläche (2a) aufweist, die Silizium enthält. Der Halbleiterschichtenstapel (1) weist eine Ausnehmung (3) auf, die sich von einer Rückseite (1e) des Halbleiterschichtenstapels (1) durch eine aktive Schicht (1a) zu einer Schicht (1b) eines ersten Leitfähigkeitstyps erstreckt. Die Schicht (1b) des ersten Leitfähigkeitstyps ist mittels einer ersten elektrischen Anschlussschicht (4), welche die Rückseite (1e) zumindest stellenweise bedeckt, durch die Ausnehmung (3) hindurch elektrisch angeschlossen. Eine Schicht (1c) eines zweiten Leitfähigkeitstyps ist mittels einer zweiten elektrischen Anschlussschicht (5), die an der Rückseite (1e) angeordnet ist, elektrisch angeschlossen. Weiter ist ein Verfahren zur Herstellung eines derartigen Halbleiterchips (10) angegeben.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/825,842 US8823034B2 (en) | 2010-09-28 | 2011-09-26 | Optoelectric semiconductor chip |
| US14/447,679 US9136431B2 (en) | 2010-09-28 | 2014-07-31 | Optoelectronic semiconductor chip |
| US14/818,630 US9293652B2 (en) | 2010-09-28 | 2015-08-05 | Optoelectronic semiconductor chip having reduced strain between different constituent materials of the chip |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102010046792.8 | 2010-09-28 | ||
| DE102010046792A DE102010046792A1 (de) | 2010-09-28 | 2010-09-28 | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US13/825,842 A-371-Of-International US8823034B2 (en) | 2010-09-28 | 2011-09-26 | Optoelectric semiconductor chip |
| US14/447,679 Division US9136431B2 (en) | 2010-09-28 | 2014-07-31 | Optoelectronic semiconductor chip |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2012052257A2 WO2012052257A2 (de) | 2012-04-26 |
| WO2012052257A3 true WO2012052257A3 (de) | 2012-11-15 |
Family
ID=44674814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2011/066687 Ceased WO2012052257A2 (de) | 2010-09-28 | 2011-09-26 | Optoelektronischer halbleiterchip und verfahren zu dessen herstellung |
Country Status (4)
| Country | Link |
|---|---|
| US (3) | US8823034B2 (de) |
| DE (1) | DE102010046792A1 (de) |
| TW (1) | TWI452731B (de) |
| WO (1) | WO2012052257A2 (de) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010046792A1 (de) * | 2010-09-28 | 2012-03-29 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
| DE102011015821B4 (de) * | 2011-04-01 | 2023-04-20 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterchip |
| DE102012101211A1 (de) | 2012-02-15 | 2013-08-22 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines strahlungsemittierenden Halbleiterbauelements |
| KR101974353B1 (ko) * | 2013-01-11 | 2019-05-02 | 삼성전자주식회사 | 발광소자 및 발광소자 패키지 |
| DE102013200509A1 (de) * | 2013-01-15 | 2014-07-17 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
| KR20140100115A (ko) * | 2013-02-05 | 2014-08-14 | 삼성전자주식회사 | 반도체 발광 소자 |
| DE102016113274B4 (de) | 2016-07-19 | 2023-03-09 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterchip |
| JP2019537255A (ja) * | 2016-11-22 | 2019-12-19 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングOsram Opto Semiconductors GmbH | 少なくとも1つのオプトエレクトロニクス半導体部品の製造方法およびオプトエレクトロニクス半導体部品 |
| DE102017113549A1 (de) * | 2017-06-20 | 2018-12-20 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement und Verfahren zur Herstellung eines optoelektronischen Bauelements |
| DE102018122684A1 (de) * | 2018-09-17 | 2020-03-19 | Osram Opto Semiconductors Gmbh | Optoelektronischer halbleiterchip und verfahren zur herstellung eines optoelektronischen halbleiterchips |
| DE102019100624A1 (de) | 2019-01-11 | 2020-07-16 | Osram Opto Semiconductors Gmbh | Optoelektronisches halbleiterbauelement mit erster und zweiter dielektrischer schicht und verfahren zur herstellung des optoelektronischen halbleiterbauelements |
| US11637219B2 (en) | 2019-04-12 | 2023-04-25 | Google Llc | Monolithic integration of different light emitting structures on a same substrate |
| US20220140192A1 (en) * | 2020-11-04 | 2022-05-05 | Excellence Opto. Inc. | Light-emitting diode chip structure |
| US20220344905A1 (en) * | 2021-04-21 | 2022-10-27 | Osram Opto Semiconductors Gmbh | Semiconductor laser device and projection device |
| KR20220170236A (ko) | 2021-06-22 | 2022-12-29 | 삼성전자주식회사 | 나노 막대 발광 소자, 복수의 나노 막대 발광 소자를 포함하는 기판 구조물, 및 기판 구조물의 제조 방법 |
| EP4476800B1 (de) * | 2022-02-08 | 2025-12-24 | ams-OSRAM International GmbH | Laserdiodenbauelement |
| DE102022129759A1 (de) * | 2022-11-10 | 2024-05-16 | Ams-Osram International Gmbh | Verfahren zur herstellung eines optoelektronischen halbleiterbauelements und optoelektronisches halbleiterbauelement |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003003421A2 (en) * | 2001-06-29 | 2003-01-09 | Xanoptix, Inc. | Optical chip packaging via through hole |
| EP1577958A1 (de) * | 2004-03-19 | 2005-09-21 | LumiLeds Lighting U.S., LLC | Licht emittierendes Bauelement mit photonischem Kristall |
| US20080149956A1 (en) * | 2006-12-22 | 2008-06-26 | Philips Lumileds Lighting Company, Llc | Multi-Grain Luminescent Ceramics for Light Emitting Devices |
| US20090101923A1 (en) * | 2007-10-19 | 2009-04-23 | Samsung Electro-Mechanics Co., Ltd. | Semiconductor light emitting device, method of manufacturing the same, and semiconductor light emitting device package using the same |
| DE102008011848A1 (de) * | 2008-02-29 | 2009-09-03 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines solchen |
| DE102008022942A1 (de) * | 2008-05-09 | 2009-11-12 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip |
| DE102009030243A1 (de) * | 2008-10-22 | 2010-05-12 | Samsung Electro-Mechanics Co., Ltd., Suwon | Halbleiter-Lichtemittervorrichtung |
| WO2010056083A2 (ko) * | 2008-11-14 | 2010-05-20 | 삼성엘이디 주식회사 | 반도체 발광소자 |
Family Cites Families (11)
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| GB702560A (en) | 1950-10-31 | 1954-01-20 | Armstrong Cork Co | Improvements in or relating to rolling sheet material into articles |
| GB701069A (en) | 1951-12-04 | 1953-12-16 | Bernard Alexander Christie | Improvements in or relating to seats |
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| JP2006512748A (ja) | 2001-12-21 | 2006-04-13 | アイクストロン、アーゲー | Iii−v半導体皮膜を非iii−v基板に沈積する方法 |
| DE102007022947B4 (de) * | 2007-04-26 | 2022-05-05 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines solchen |
| DE102008032318A1 (de) | 2008-03-31 | 2009-10-01 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines solchen |
| DE102008056175A1 (de) * | 2008-11-06 | 2010-05-12 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines Strahlung emittierenden Dünnschichtbauelements und Strahlung emittierendes Dünnschichtbauelement |
| DE102009006177A1 (de) * | 2008-11-28 | 2010-06-02 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip |
| DE102009047881B4 (de) | 2009-09-30 | 2022-03-03 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung einer epitaktisch hergestellten Schichtstruktur |
| DE102010035489A1 (de) | 2010-08-26 | 2012-03-01 | Osram Opto Semiconductors Gmbh | Halbleiterbauelement und Verfahren zur Herstellung eines Halbleiterbauelement |
| DE102010046792A1 (de) * | 2010-09-28 | 2012-03-29 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zu dessen Herstellung |
-
2010
- 2010-09-28 DE DE102010046792A patent/DE102010046792A1/de not_active Withdrawn
-
2011
- 2011-09-26 WO PCT/EP2011/066687 patent/WO2012052257A2/de not_active Ceased
- 2011-09-26 US US13/825,842 patent/US8823034B2/en active Active
- 2011-09-28 TW TW100134916A patent/TWI452731B/zh not_active IP Right Cessation
-
2014
- 2014-07-31 US US14/447,679 patent/US9136431B2/en active Active
-
2015
- 2015-08-05 US US14/818,630 patent/US9293652B2/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003003421A2 (en) * | 2001-06-29 | 2003-01-09 | Xanoptix, Inc. | Optical chip packaging via through hole |
| EP1577958A1 (de) * | 2004-03-19 | 2005-09-21 | LumiLeds Lighting U.S., LLC | Licht emittierendes Bauelement mit photonischem Kristall |
| US20080149956A1 (en) * | 2006-12-22 | 2008-06-26 | Philips Lumileds Lighting Company, Llc | Multi-Grain Luminescent Ceramics for Light Emitting Devices |
| US20090101923A1 (en) * | 2007-10-19 | 2009-04-23 | Samsung Electro-Mechanics Co., Ltd. | Semiconductor light emitting device, method of manufacturing the same, and semiconductor light emitting device package using the same |
| DE102008011848A1 (de) * | 2008-02-29 | 2009-09-03 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper und Verfahren zur Herstellung eines solchen |
| DE102008022942A1 (de) * | 2008-05-09 | 2009-11-12 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Halbleiterchip |
| DE102009030243A1 (de) * | 2008-10-22 | 2010-05-12 | Samsung Electro-Mechanics Co., Ltd., Suwon | Halbleiter-Lichtemittervorrichtung |
| WO2010056083A2 (ko) * | 2008-11-14 | 2010-05-20 | 삼성엘이디 주식회사 | 반도체 발광소자 |
| EP2357679A2 (de) * | 2008-11-14 | 2011-08-17 | Samsung LED Co., Ltd. | Vertikale/horziontale leuchtdiode für halbleiter |
Non-Patent Citations (1)
| Title |
|---|
| LIN HON-WAY ET AL: "InGaN/GaN nanorod array white light-emitting diode", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 97, no. 7, 16 August 2010 (2010-08-16), pages 73101 - 73101, XP012138836, ISSN: 0003-6951, DOI: 10.1063/1.3478515 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US9136431B2 (en) | 2015-09-15 |
| US8823034B2 (en) | 2014-09-02 |
| US9293652B2 (en) | 2016-03-22 |
| TW201222874A (en) | 2012-06-01 |
| US20130221369A1 (en) | 2013-08-29 |
| WO2012052257A2 (de) | 2012-04-26 |
| US20150340561A1 (en) | 2015-11-26 |
| DE102010046792A1 (de) | 2012-03-29 |
| TWI452731B (zh) | 2014-09-11 |
| US20140339591A1 (en) | 2014-11-20 |
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