WO2012173459A3 - 고굴절 조성물 - Google Patents

고굴절 조성물 Download PDF

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Publication number
WO2012173459A3
WO2012173459A3 PCT/KR2012/004819 KR2012004819W WO2012173459A3 WO 2012173459 A3 WO2012173459 A3 WO 2012173459A3 KR 2012004819 W KR2012004819 W KR 2012004819W WO 2012173459 A3 WO2012173459 A3 WO 2012173459A3
Authority
WO
WIPO (PCT)
Prior art keywords
composition
resistance
present application
high refraction
durability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2012/004819
Other languages
English (en)
French (fr)
Other versions
WO2012173459A2 (ko
Inventor
고민진
정재호
강대호
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Priority to EP12800978.4A priority Critical patent/EP2722365B1/en
Priority to JP2014515768A priority patent/JP5824577B2/ja
Priority to CN201280029922.4A priority patent/CN103608407B/zh
Publication of WO2012173459A2 publication Critical patent/WO2012173459A2/ko
Publication of WO2012173459A3 publication Critical patent/WO2012173459A3/ko
Priority to US14/109,232 priority patent/US9285507B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0091—Complexes with metal-heteroatom-bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/56—Organo-metallic compounds, i.e. organic compounds containing a metal-to-carbon bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/85—Packages
    • H10H20/852—Encapsulations
    • H10H20/854—Encapsulations characterised by their material, e.g. epoxy or silicone resins

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
  • Led Device Packages (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

본 출원은 고굴절 조성물에 관한 것이다. 본 출원의 조성물은, 투명성, 내습성, 내열성, 내수성, 내후성, 내광성 및 내구성이 우수하고, 높은 굴절률이 발현되는 고굴절막을 형성할 수 있다. 상기 조성물은, 공정 과정이나 공정 후에 기체 발생(outgassing)이 적고, 용액 도포법에 적용될 수 있어서, 다양한 전자 광학 장치에 효과적으로 적용될 수 있다.
PCT/KR2012/004819 2011-06-17 2012-06-18 고굴절 조성물 Ceased WO2012173459A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP12800978.4A EP2722365B1 (en) 2011-06-17 2012-06-18 Composition having high refraction
JP2014515768A JP5824577B2 (ja) 2011-06-17 2012-06-18 高屈折組成物
CN201280029922.4A CN103608407B (zh) 2011-06-17 2012-06-18 高折射组合物
US14/109,232 US9285507B2 (en) 2011-06-17 2013-12-17 High-refractive composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20110059097 2011-06-17
KR10-2011-0059097 2011-06-17

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US14/109,232 Continuation US9285507B2 (en) 2011-06-17 2013-12-17 High-refractive composition

Publications (2)

Publication Number Publication Date
WO2012173459A2 WO2012173459A2 (ko) 2012-12-20
WO2012173459A3 true WO2012173459A3 (ko) 2013-03-28

Family

ID=47357644

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/004819 Ceased WO2012173459A2 (ko) 2011-06-17 2012-06-18 고굴절 조성물

Country Status (6)

Country Link
US (1) US9285507B2 (ko)
EP (1) EP2722365B1 (ko)
JP (1) JP5824577B2 (ko)
KR (1) KR101537144B1 (ko)
CN (1) CN103608407B (ko)
WO (1) WO2012173459A2 (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5667282B1 (ja) * 2013-12-27 2015-02-12 古河電気工業株式会社 有機電界発光素子用充填材料及び有機電界発光素子の封止方法
KR102307458B1 (ko) * 2014-10-20 2021-09-30 삼성전자주식회사 색분리 소자 및 그 제조 방법 및 이를 포함하는 이미지 센서
KR101908163B1 (ko) 2014-12-03 2018-10-16 삼성에스디아이 주식회사 윈도우 필름용 조성물, 이로부터 형성된 플렉시블 윈도우 필름 및 이를 포함하는 플렉시블 디스플레이 장치
KR101835866B1 (ko) 2014-12-17 2018-03-08 삼성에스디아이 주식회사 윈도우 필름용 조성물, 이로부터 형성된 플렉시블 윈도우 필름 및 이를 포함하는 플렉시블 디스플레이 장치
KR101835867B1 (ko) 2014-12-23 2018-03-08 삼성에스디아이 주식회사 윈도우 필름용 조성물, 이로부터 형성된 플렉시블 윈도우 필름 및 이를 포함하는 플렉시블 디스플레이 장치

Citations (4)

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JP2006299251A (ja) * 2005-03-22 2006-11-02 Jsr Corp 高屈折材料形成用組成物およびその硬化体、ならびに高屈折材料形成用組成物の製造方法
KR20080068246A (ko) * 2007-01-18 2008-07-23 주식회사 엘지화학 저온 경화형 고굴절막 형성용 조성물, 이로부터 제조되는고굴절막, 및 이를 포함하는 기재
JP2010085579A (ja) * 2008-09-30 2010-04-15 Toray Ind Inc 反射防止光学物品およびシロキサン系樹脂組成物の製造方法
JP2010144135A (ja) * 2008-12-22 2010-07-01 Nitto Denko Corp シリコーン樹脂組成物

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JPH09255782A (ja) * 1996-03-25 1997-09-30 Nippon Steel Corp 光硬化型無機・有機ハイブリッド材料とそれより成る三次元光導波路
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006299251A (ja) * 2005-03-22 2006-11-02 Jsr Corp 高屈折材料形成用組成物およびその硬化体、ならびに高屈折材料形成用組成物の製造方法
KR20080068246A (ko) * 2007-01-18 2008-07-23 주식회사 엘지화학 저온 경화형 고굴절막 형성용 조성물, 이로부터 제조되는고굴절막, 및 이를 포함하는 기재
JP2010085579A (ja) * 2008-09-30 2010-04-15 Toray Ind Inc 反射防止光学物品およびシロキサン系樹脂組成物の製造方法
JP2010144135A (ja) * 2008-12-22 2010-07-01 Nitto Denko Corp シリコーン樹脂組成物

Also Published As

Publication number Publication date
JP2014517122A (ja) 2014-07-17
JP5824577B2 (ja) 2015-11-25
EP2722365A4 (en) 2015-01-07
CN103608407A (zh) 2014-02-26
EP2722365B1 (en) 2020-05-13
US9285507B2 (en) 2016-03-15
US20140179869A1 (en) 2014-06-26
WO2012173459A2 (ko) 2012-12-20
CN103608407B (zh) 2016-05-04
EP2722365A2 (en) 2014-04-23
KR20120139616A (ko) 2012-12-27
KR101537144B1 (ko) 2015-07-16

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