WO2013010896A3 - Système laser comprenant un milieu doté d'un matériau hôte en verre de quartz - Google Patents

Système laser comprenant un milieu doté d'un matériau hôte en verre de quartz Download PDF

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Publication number
WO2013010896A3
WO2013010896A3 PCT/EP2012/063641 EP2012063641W WO2013010896A3 WO 2013010896 A3 WO2013010896 A3 WO 2013010896A3 EP 2012063641 W EP2012063641 W EP 2012063641W WO 2013010896 A3 WO2013010896 A3 WO 2013010896A3
Authority
WO
WIPO (PCT)
Prior art keywords
laser
quartz glass
host material
laser system
material composed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2012/063641
Other languages
German (de)
English (en)
Other versions
WO2013010896A2 (fr
Inventor
Christian Neumann
Mark STAMMINGER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Publication of WO2013010896A2 publication Critical patent/WO2013010896A2/fr
Publication of WO2013010896A3 publication Critical patent/WO2013010896A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0071—Compositions for glass with special properties for laserable glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1681—Solid materials using colour centres
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/094038—End pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0943—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1691—Solid materials characterised by additives / sensitisers / promoters as further dopants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/17—Solid materials amorphous, e.g. glass
    • H01S3/176—Solid materials amorphous, e.g. glass silica or silicate glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Glass Compositions (AREA)
  • Lasers (AREA)

Abstract

L'invention concerne un système laser connu comprenant un milieu doté d'un matériau hôte en verre de quartz, une source de lumière de pompage agissant sur le milieu laser et un résonateur optique. L'invention vise à fournir un système laser peu onéreux comprenant un matériau laser à base de verre de quartz pouvant être défini dans une large plage de longueurs d'onde, facilement déformable, adapté à émettre de nouvelles fréquences laser jusque dans le domaine des ultraviolets et ayant par ailleurs le potentiel d'être utilisé dans un système laser à impulsion courte. A cet effet, le matériau hôte est un verre de quartz produit de manière synthétique et présentant une concentration de déficits en oxygène d'au moins 1 x 1016 cm-3 et une concentration d'hydrogène inférieure à 5 x 1016 molécules/cm3.
PCT/EP2012/063641 2011-07-19 2012-07-12 Système laser comprenant un milieu doté d'un matériau hôte en verre de quartz Ceased WO2013010896A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011107917.7 2011-07-19
DE201110107917 DE102011107917A1 (de) 2011-07-19 2011-07-19 Lasersystem, umfassend ein Lasermedium mit einem Wirtsmaterial aus Quarzglas

Publications (2)

Publication Number Publication Date
WO2013010896A2 WO2013010896A2 (fr) 2013-01-24
WO2013010896A3 true WO2013010896A3 (fr) 2013-05-30

Family

ID=46639443

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2012/063641 Ceased WO2013010896A2 (fr) 2011-07-19 2012-07-12 Système laser comprenant un milieu doté d'un matériau hôte en verre de quartz

Country Status (2)

Country Link
DE (1) DE102011107917A1 (fr)
WO (1) WO2013010896A2 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4030204B1 (fr) 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Fibre optique microstructurée et préforme associée

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007110081A2 (fr) * 2006-03-28 2007-10-04 Nkt Research & Innovation A/S Matériau de verre de silice amplificateur haute puissance

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4604225A (en) * 1985-07-03 1986-08-05 The United States Of America As Represented By The Secretary Of The Department Of Energy Refractory oxide hosts for a high power, broadly tunable laser with high quantum efficiency and method of making same
GB2201033B (en) * 1987-02-12 1991-01-09 Stc Plc Lasers and amplifiers
US4963755A (en) * 1988-09-12 1990-10-16 The United States Of America As Represented By The Department Of Energy Method for enhancement of useful luminescence from vacancy defects in refractory oxides for tunable lasers
JP4403082B2 (ja) 2002-11-29 2010-01-20 信越石英株式会社 合成石英ガラスの製造方法及び合成石英ガラス体
DE102005042073B4 (de) 2005-08-31 2010-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Faserlaser

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007110081A2 (fr) * 2006-03-28 2007-10-04 Nkt Research & Innovation A/S Matériau de verre de silice amplificateur haute puissance

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HOSONO H ET AL: "Interaction of F2 excimer laser with SiO2 glasses: Towards the third generation of synthetic SiO2 glasses", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B:BEAM INTERACTIONS WITH MATERIALS AND ATOMS, ELSEVIER, AMSTERDAM, NL, vol. 166-167, 1 May 2000 (2000-05-01), pages 691 - 697, XP004204160, ISSN: 0168-583X, DOI: 10.1016/S0168-583X(99)00726-0 *
SKUJA L: "Optically active oxygen-deficiency-related centers in amorphous silicon dioxide", JOURNAL OF NON-CRYSTALLINE SOLIDS, NORTH-HOLLAND PHYSICS PUBLISHING. AMSTERDAM, NL, vol. 239, no. 1-3, 1 October 1998 (1998-10-01), pages 16 - 48, XP004161125, ISSN: 0022-3093, DOI: 10.1016/S0022-3093(98)00720-0 *
TRUKHIN A N ET AL: "Investigation of optical and radiation properties of oxygen deficient silica glasses", JOURNAL OF NON-CRYSTALLINE SOLIDS, NORTH-HOLLAND PHYSICS PUBLISHING. AMSTERDAM, NL, vol. 248, no. 1, 1 June 1999 (1999-06-01), pages 49 - 64, XP004172994, ISSN: 0022-3093, DOI: 10.1016/S0022-3093(99)00089-7 *
WU X L ET AL: "Defect-related infrared photoluminescence in Ge+-implanted SiO2 films", APPLIED PHYSICS LETTERS, AIP, AMERICAN INSTITUTE OF PHYSICS, MELVILLE, NY, US, vol. 74, no. 17, 26 April 1999 (1999-04-26), pages 2420 - 2422, XP012022474, ISSN: 0003-6951, DOI: 10.1063/1.123867 *

Also Published As

Publication number Publication date
DE102011107917A1 (de) 2013-01-24
WO2013010896A2 (fr) 2013-01-24

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