WO2014208362A1 - Dispositif d'applicateur et procédé de détection de hauteur - Google Patents

Dispositif d'applicateur et procédé de détection de hauteur Download PDF

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Publication number
WO2014208362A1
WO2014208362A1 PCT/JP2014/065711 JP2014065711W WO2014208362A1 WO 2014208362 A1 WO2014208362 A1 WO 2014208362A1 JP 2014065711 W JP2014065711 W JP 2014065711W WO 2014208362 A1 WO2014208362 A1 WO 2014208362A1
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WIPO (PCT)
Prior art keywords
height
substrate
image
value
pixel
Prior art date
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Ceased
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PCT/JP2014/065711
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English (en)
Japanese (ja)
Inventor
博明 大庭
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NTN Corp
Original Assignee
NTN Corp
NTN Toyo Bearing Co Ltd
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Priority to CN201480030007.6A priority Critical patent/CN105247318B/zh
Publication of WO2014208362A1 publication Critical patent/WO2014208362A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J25/00—Actions or mechanisms not otherwise provided for
    • B41J25/304—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface
    • B41J25/308—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface with print gap adjustment mechanisms
    • B41J25/3086—Bodily-movable mechanisms for print heads or carriages movable towards or from paper surface with print gap adjustment mechanisms with print gap adjustment means between the print head and its carriage
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/0209—Low-coherence interferometers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/005—Repairing damaged coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Definitions

  • the present invention relates to a coating apparatus and a height detection method, and in particular, a coating apparatus that applies a liquid material to the surface of a substrate, and a height detection method that detects the height of a coating portion made of the liquid material applied to the surface of the substrate.
  • a coating apparatus that applies a liquid material to the surface of a substrate
  • a height detection method that detects the height of a coating portion made of the liquid material applied to the surface of the substrate.
  • the liquid crystal color filter substrate includes a transparent substrate, a lattice pattern called a black matrix 51 formed on the surface thereof, and a plurality of sets of R (red) pixels 52, G ( Green) pixel 53 and B (blue) pixel 54.
  • the white defect 55 in which the color of the pixel or the black matrix 51 is lost, or the adjacent pixel and the color as shown in FIG. Are mixed, or a black defect 56 in which the black matrix 51 protrudes from the pixel, or a foreign object defect 57 in which a foreign object adheres to the pixel as shown in FIG.
  • an ink having the same color as that of the pixel in which the white defect 55 exists is attached to the tip of the application needle by the ink application mechanism, and the ink attached to the tip of the application needle is applied to the white defect 55
  • There is a method to correct by applying Further, as a method of correcting the black defect 56 and the foreign object defect 57, after the defective portion is laser-cut to form a rectangular white defect 55, the ink applied to the tip of the application needle is removed by the ink application mechanism.
  • Patent Document 1 Japanese Patent Laid-Open No. 2009-122259
  • a liquid crystal display is obtained by bonding a TFT substrate on which an electronic circuit is formed and a liquid crystal color filter substrate that expresses the color of a pixel, and sealing liquid crystal between two substrates.
  • a TFT substrate on which an electronic circuit is formed and a liquid crystal color filter substrate that expresses the color of a pixel, and sealing liquid crystal between two substrates.
  • protrusions higher than a predetermined height are present on the surface of at least one of the two substrates, the liquid crystal cannot be normally sealed between the two substrates. For this reason, before bonding the two substrates, it is necessary to determine whether the bonding is possible by inspecting the presence or absence of protrusions on the surface of the substrate.
  • the ink application portion made of the applied ink becomes a protrusion on the surface of the liquid crystal color filter substrate. Therefore, it is necessary to detect the height of the ink application part after correcting the white defect 55.
  • the method of Patent Document 2 cannot quantitatively detect the height of the ink application portion even if a planar defect such as the color and density of the ink application portion or the size and shape can be detected. It was.
  • a main object of the present invention is to provide a coating apparatus capable of quantitatively detecting the height of the coating part and a height detection method.
  • the coating apparatus is a coating apparatus that applies a liquid material to the surface of a substrate, and includes an observation optical system that observes the surface of the substrate via an objective lens, and an image of the surface of the substrate via the observation optical system.
  • a head unit including an image pickup apparatus for picking up images, a coating mechanism for applying a liquid material to the surface of the substrate, and the head unit and the substrate are relatively moved to position the head unit at a desired position above the surface of the substrate.
  • the positioning device, the positioning device, and the imaging device are controlled to position the objective lens above the application portion made of a liquid material applied to the surface of the substrate, and then the application portion and the objective lens are moved relative to each other in the vertical direction.
  • a height detection unit is provided that captures an image, obtains a focal position for each of a plurality of pixels constituting the captured image, and obtains a height of the application unit based on the obtained focal position.
  • the height detection method includes an observation optical system for observing the surface of the substrate through the objective lens, an imaging device for capturing an image of the surface of the substrate through the observation optical system, and a surface of the substrate.
  • a coating apparatus comprising: a head unit including a coating mechanism that coats a liquid material; and a positioning device that relatively moves the head unit and the substrate to position the head unit at a desired position above the surface of the substrate.
  • a height detection method for detecting the height of an application part made of a liquid material applied to the surface of the apparatus wherein the positioning device and the imaging device are controlled to position the objective lens above the application part, and An image is picked up while relatively moving the objective lens in the vertical direction, a focal position is obtained for each of a plurality of pixels constituting the picked-up image, and the height of the coating part is obtained based on the obtained focal position.
  • an image is captured while the coating unit and the objective lens are relatively moved in the vertical direction, and a focal position is obtained and obtained for each of a plurality of pixels constituting the captured image.
  • the height of the application part is obtained based on the focal position. Therefore, the height of the application part can be detected quantitatively.
  • FIG. 1 It is a perspective view which shows the whole structure of the defect correction apparatus by Embodiment 1 of this invention. It is a perspective view which shows the structure of the ink application
  • FIG. 11 is a diagram for explaining a problem of the third embodiment.
  • FIG. 10 is another diagram for explaining the problem of the third embodiment. It is a figure for demonstrating the principle of the height detection method by Embodiment 4 of this invention. It is another figure for demonstrating the principle of the height detection method by Embodiment 4.
  • FIG. 11 is a diagram for explaining a problem of the third embodiment.
  • FIG. 10 is another diagram for explaining the problem of the third embodiment.
  • FIG. 10 is a figure for demonstrating the principle of the height detection method by Embodiment 4 of this invention.
  • FIG. 18 is a diagram showing a zero point of a phase ⁇ nearest to the peak position shown in FIG. 17. It is a figure which shows the deviation
  • the defect correcting apparatus 1 includes an observation optical system 2, a CCD camera 3, a cutting laser device 4, an ink application mechanism 5, and an ink curing light source 6.
  • a correction head portion a Z stage 8 that moves the correction head portion in a direction perpendicular to the liquid crystal color filter substrate 7 to be corrected (Z-axis direction), and a Z stage 8 that is mounted and moved in the X-axis direction.
  • the observation optical system 2 includes a light source for illumination, and observes the surface state of the substrate 7 and the state of the correction ink applied by the ink application mechanism 5. An image observed by the observation optical system 2 is converted into an electrical signal by the CCD camera 3 and displayed on the monitor 12.
  • the cutting laser device 4 removes unnecessary portions on the substrate 7 by irradiating them with laser light via the observation optical system 2.
  • the ink application mechanism 5 corrects the white defect generated on the substrate 7 by applying correction ink.
  • the ink curing light source 6 includes, for example, a CO 2 laser, and cures the correction ink applied by the ink application mechanism 5 by irradiating it with laser light.
  • This apparatus configuration is an example.
  • the Z stage 8 on which the observation optical system 2 or the like is mounted is mounted on the X stage, the X stage is mounted on the Y stage, and the Z stage 8 can be moved in the XY directions.
  • a configuration called a gantry system may be used, and any configuration may be used as long as the Z stage 8 on which the observation optical system 2 and the like are mounted can be moved relative to the correction target substrate 7 in the XY directions.
  • FIG. 2 is a perspective view showing the main parts of the observation optical system 2 and the ink application mechanism 5.
  • the defect correcting apparatus 1 includes a movable plate 15, a plurality of (for example, five) objective lenses 16 having different magnifications, and a plurality of (for example, five) application units 17 for applying different color inks.
  • the movable plate 15 is provided between the lower end of the observation barrel 2a of the observation optical system 2 and the substrate 7 so as to be movable in the X-axis direction and the Y-axis direction. Further, the movable plate 15 is formed with five through holes 15a corresponding to the five objective lenses 16, respectively.
  • the five through holes 15a are arranged at predetermined intervals in the Y-axis direction.
  • Each objective lens 16 is fixed to the lower surface of the movable plate 15 so that its optical axis coincides with the center line of the corresponding through hole 15a.
  • the optical axis of the observation barrel 2a and the optical axis of each objective lens 16 are arranged in the Z-axis direction perpendicular to the X-axis direction and the Y-axis direction.
  • the five coating units 17 are fixed to the lower surface of the movable plate 15 at a predetermined interval in the Y-axis direction. Each of the five coating units 17 is disposed adjacent to the five objective lenses 16. By moving the movable plate 15, it is possible to arrange the desired coating unit 17 above the white defect to be corrected.
  • 3 (a) to 3 (c) are views showing the main part from the direction A in FIG. 2, and showing the ink application operation.
  • the application unit 17 includes an application needle 18 and an ink tank 19.
  • the application needle 18 of the desired application unit 17 is positioned above the white defect to be corrected.
  • the tip of the application needle 18 is immersed in the correction ink in the ink tank 19.
  • the application needle 18 is lowered and the tip of the application needle 18 protrudes from the hole at the bottom of the ink tank 19. At this time, correction ink is attached to the tip of the application needle 18.
  • the application needle 18 and the ink tank 19 are lowered to bring the tip of the application needle 18 into contact with the white defect, and the correction ink is applied to the white defect. Thereafter, the state returns to the state of FIG.
  • the ink application mechanism using a plurality of application needles is not described in detail since various other techniques are known. For example, it is shown in Patent Document 1 (Japanese Patent Laid-Open No. 2009-122259).
  • the defect correction apparatus 1 can correct a defect using ink of a desired color among a plurality of inks by using, for example, a mechanism as shown in FIG. 2 as the ink application mechanism 5.
  • the defect can be corrected using an application needle having a desired application diameter among the application needles.
  • FIG. 4 is a view showing the surface of the liquid crystal color filter substrate 7.
  • the liquid crystal color filter substrate 7 includes a plurality of picture elements PC formed on the surface of a glass substrate.
  • the beginning DS of the picture element PC and the end DE of the picture element PC exist at the intersection positions of the black matrix portions BM formed vertically and horizontally.
  • the start DS of the picture element PC is referred to as a color filter position.
  • the control computer 11 specifies the position of this color filter.
  • a set of pixels having a value of 1 in the picture element PC is a color filter portion (shown by a color filter portion CF in the figure), and a set of pixels having a value of 0 (hatched portion in the figure) is This is a black matrix portion (indicated by a black matrix portion BM in the figure) of the picture element PC.
  • Each picture element PC has one of RGB (Red, Green, Blue) different from each other, and is repeatedly formed at a constant cycle.
  • FIGS. 5A and 5B are diagrams showing operations when the control computer 11 detects a defect in the horizontal direction of the input image.
  • the control computer 11 detects a defective portion based on the brightness of the pixels of the color filter. More specifically, the control computer 11 sets the brightness f (x, y) at the position (x, y) in the input image, where P is the interval between picture elements arranged periodically, that is, at equal intervals.
  • a comparative inspection is performed as shown by the following formula (1).
  • the control computer 11 compares the luminance f (x, y) with the luminance f (x ⁇ P, y) before one cycle and the luminance f (x + P, y) after one cycle.
  • s-p (x, y) is a comparison result between f (x, y) and f (x-P, y)
  • s + p (x, y) is f (x, y) and f.
  • the comparison result with (x + P, y) is shown.
  • the control computer 11 compares sH (x, y) with the slice level Td when the signs of sp (x, y) and s + p (x, y) match. Further, when the signs of sp (x, y) and s + p (x, y) do not match, the control computer 11 determines whether the position (x ⁇ P, y) or the position (x + P, y). The position (x, y) is excluded from the inspection target because it is highly likely to be erroneously detected as a pixel defect in FIG. With such a configuration, an error in defect detection due to noise in the input image can be prevented.
  • sH (x, y) is equal to or greater than Td
  • the control computer 11 determines that the pixel at the position (x, y) is a defect and stores the result in dH (x, y).
  • dH (x, y) a pixel having a value of 1 indicates a defect
  • a pixel having a value of 0 indicates normal.
  • control computer 11 calculates the centroid position of the portion having a value of 1 (ie, white defect), and the X stage 9 and the Y stage so that the coordinates of the calculated centroid position coincide with the center of the screen of the monitor 12. 10 is controlled. Further, the control computer 11 determines the color of the ink to be applied to the white defect. Further, the control computer 11 calculates the ink application position in the white defect.
  • a defect detection step is disclosed in, for example, Japanese Patent Application Laid-Open No. 2007-233299.
  • control computer 11 selects the application unit 17 for applying the ink of the determined color, contacts the tip of the application needle 18 of the application unit 17 with the calculated ink application position, and determines the determined color. Apply correction ink to white defects.
  • the correction ink applied to the white defect is cured by irradiating the light of the ink curing light source 6, and the correction of the white defect is completed.
  • the control computer 11 controls the defect correcting device 1 to obtain the height of the ink application portion made of the correction ink applied to the white defect and cured.
  • the height detection method of the first embodiment is suitable for detecting the height of the ink application part that is higher than the focal depth of the objective lens 16.
  • the Z stage 8 is moved relative to the ink application part, and the contrast is maximized for each pixel of the image.
  • the stage position is obtained and the position is used as the height information of the pixel.
  • the search procedure is shown.
  • the Z stage 8 is moved to the search start position. If the current position is Zp and the search range is ⁇ , for example, it moves to Zp ⁇ / 2.
  • the minus direction of the Z stage 8 is the direction approaching the substrate 7, and the search is performed in the plus direction from the initial position, that is, the direction away from the substrate 7. Therefore, a range of ⁇ is searched in the positive direction from the initial position Zp ⁇ / 2.
  • the search direction is not necessarily a direction away from the substrate 7, and may be a direction approaching.
  • the control computer 11 starts sampling the image after the Z stage 8 starts to move and reaches a constant speed state. Sampling is performed at regular intervals. Preferably, sampling can be performed more accurately by performing the period of the vertical synchronizing signal of the CCD camera 3.
  • the Z stage 8 moves at a predetermined speed v ( ⁇ m / second).
  • the velocity v satisfies the condition of D ⁇ (1 / F) ⁇ v, where D ( ⁇ m) is the depth of focus of the objective lens 16 to be used, and F (Hz) is the frequency of the vertical synchronization signal of the CCD camera 3. It is desirable. This is because the depth of focus is the length of the region that appears to be in focus, so that the image cannot be changed unless it moves at least D ( ⁇ m) during the sampling period.
  • the image is sampled while moving the Z stage 8 within the search range, and the contrast value C of the image is calculated for each pixel of the acquired image.
  • the contrast value C is the luminance fi (x + a) of the pixel (x + a, y + b) separated by (a, b) vertically and horizontally with respect to the luminance fi (x, y) of the target pixel (x, y).
  • Y + b) and dx xy , dy xy the following formula (2) is calculated.
  • (H, W) indicates the number of pixels in the horizontal and vertical directions of the image.
  • fi (x, y) indicates the luminance of the pixel of the i-th sampled image
  • FIG. 7A is a diagram showing the relationship between the Z stage position and the contrast value C
  • FIG. 7B is a diagram showing the relationship between the Z stage position and its speed.
  • the contrast value C has a mountain shape as shown in FIG. 7A, and the peak of the mountain is the focal position.
  • the Prewitt operator and Sobel operator generally used in image processing are applied to an image and the average luminance value of the image after application is plotted, the same tendency as in FIG. In other words, any image feature that exhibits a tendency similar to that of Equation (2) may be used. Since the image is sampled at least every D ( ⁇ m), the true focal position is likely to exist between samples. For this reason, interpolation is performed using data in the vicinity of the position where the contrast value C is maximum, and an accurate focal position is obtained by approximation.
  • the data in the vicinity of the focal position can be approximated by a quadratic function or a Gaussian function because it shows a symmetrical mountain-shaped tendency centered on the focal position.
  • Function approximation is performed by the Newton method or the like using the Z stage coordinates near the focal position and the contrast value, and the peak position is interpolated from the obtained function to obtain the height of the corresponding pixel.
  • the center of gravity position may be obtained using the contrast value around the peak, and the obtained center of gravity position may be set as the height of the corresponding pixel.
  • the ink application part is extracted based on the images before and after application, and the heights of the extracted ink application part and the reference part are compared.
  • Patent Document 2 Japanese Patent Laid-Open No. 2009-237086
  • the brightness of the image before and after application is compared, and the ink application part is extracted based on the comparison result.
  • the extraction result of the ink application part be b (x, y).
  • b (x, y) is a function that returns 1 if the pixel at the position (x, y) is an ink application portion, and returns 0 otherwise.
  • the reference portion is a normal portion of the substrate 7 where the correction ink is not applied, and is extracted from an image before or after application.
  • the center coordinates ( ⁇ x, ⁇ y) of the reference portion with respect to the application start point and the vertical and horizontal sizes (w, h) are determined in advance.
  • an image in which the height information obtained in the height detection step is stored is h (x, y)
  • the coordinates of the application start point are (xs, ys)
  • the height of the reference portion is (xs + ⁇ x
  • the reference portion is not limited to the above method, and for example, a characteristic portion of the substrate 7 may be detected by pattern matching or the like, or may be set in an area offset from a detection position obtained by pattern matching. .
  • the average height of the reference portion obtained as described above is set as h0.
  • H0 is subtracted from the height image h (x, y), and the subtraction result is set as h '(x, y).
  • the total value, the maximum value, the minimum value, the variance value, and the average value of h ′ (x, y) of the pixel indicating the value 1 of the ink application part b (x, y) extracted earlier are calculated.
  • the vertical and horizontal dimensions of one pixel are (mx, my). The unit is nm.
  • the total value corresponds to the volume of the ink application part, and is effective for checking whether a predetermined ink application amount can be secured or whether the upper limit is exceeded.
  • the total value is calculated using the following formula.
  • the maximum value is the maximum value of h ′ (x, y) of a pixel having a b (x, y) value of 1, and is effective for checking whether the height of the ink application part exceeds the upper limit. It is.
  • the minimum value is the minimum value of h ′ (x, y) of a pixel having a b (x, y) value of 1, and is effective for checking whether or not a certain thickness can be secured.
  • the dispersion value is effective when evaluating the uniformity of the height of the ink application part.
  • the variance value is calculated according to the following equation (4).
  • the average value is effective for checking whether or not a certain height is secured over the entire ink application part.
  • the average value is calculated according to the following equation (5).
  • the control computer 11 determines whether or not the ink application unit is normal based on at least one of the calculated total value, maximum value, minimum value, variance value, and average value.
  • the defect correction apparatus 1 has a function of registering inspection items in advance in the order of application, and the inspection items and the allowable range can be changed depending on the type of application needle, the substrate 7, and the correction ink. Yes.
  • FIG. 8 is a diagram showing inspection conditions when ink is applied by the ink application mechanism 5 shown in FIG.
  • the ink application mechanism 5 has five application needles, and inspection conditions can be registered for each application needle.
  • the registered content is referred to when application is performed with the corresponding application needle. AND is passed when all the specified conditions are met, and OR is passed when any one of the conditions is met.
  • the numeric field is specified as a (lower limit, upper limit) pair.
  • the condition is satisfied when the value of the corresponding inspection item is not less than the lower limit value and less than the upper limit value.
  • the lower limit value is “ ⁇ ”
  • the condition is satisfied when the value is less than or equal to the upper limit value.
  • the upper limit is “ ⁇ ”
  • the condition is satisfied when the value is equal to or greater than the lower limit. It is not judged when both are blank.
  • an image is captured while the ink application unit and the objective lens 16 are relatively moved in the vertical direction, a focal position is obtained for each of a plurality of pixels constituting the captured image, and the obtained focal position is obtained. Based on this, the height of the ink application part is obtained. Therefore, the height of the ink application part can be easily and accurately detected quantitatively. As a result, accurate inspections such as changes in the viscosity of the corrected ink and detection of an abnormal state of the ink application mechanism 5 can be performed, which can contribute to an improvement in manufacturing process yield.
  • the present invention is not limited to this. It goes without saying that the present invention can be applied to the detection of the height of an application part made of a liquid material applied to a substrate.
  • the present invention can be applied to the detection of the height of a paste application portion made of a conductive paste applied to a disconnection defect portion of a wiring on the surface of a substrate such as a TFT substrate or a printed circuit board.
  • FIG. 9 is a diagram showing a main part of the defect correcting apparatus according to the second embodiment of the present invention, and is a diagram contrasted with FIG. Referring to FIG. 9, this defect correcting device is different from defect correcting device 1 of the first embodiment in that coating unit 17 is replaced with electrostatic ink jet device 20.
  • the electrostatic inkjet device 20 is fixed to the lower surface of the movable plate 15.
  • FIG. 10 is a diagram showing a main part of the electrostatic ink jet apparatus 20.
  • the electrostatic inkjet device 20 includes an inkjet nozzle 21, a pulse voltage generator 22, and a controller 23.
  • the nozzle 21 is a glass tube that is stretched to have a very small tip diameter.
  • Conductive correction ink 24 is injected into the nozzle 21, and a pulse voltage VP output from the pulse voltage generator 22 can be applied to the correction ink 24.
  • the substrate 7 is fixed horizontally on the Y stage 10. A desired target position on the surface of the substrate 7 can be positioned below the nozzle 21 by driving the stages 8 to 10.
  • the tip 21a of the nozzle 21 and the surface of the substrate 7 face each other with a minute drawing distance d.
  • a conical tailor cone 24a is formed from the tip 21a of the nozzle 21 toward the substrate 7, and the surface of the substrate 7 is formed from the top of the tailor cone 24a.
  • a jet flow (liquid column) 24b that reaches 1 is generated, and a part of the correction ink 24 moves onto the surface of the substrate 7 to form droplets 24c.
  • a height detection method different from the height detection method described in the first embodiment is employed.
  • a two-beam interference objective lens is used instead of the objective lens 16, and the interference fringe intensity is maximized at the focal position, and the Z stage 8 is moved relative to the substrate 7. Then, an interference fringe image is picked up, a Z stage position where the interference intensity is maximized is obtained for each pixel, and the position is set as the height of the pixel.
  • This height detection method is suitable for detecting a minute height of several ⁇ m or less.
  • the two-beam interference objective lens separates the white light emitted from the light source into two light beams and irradiates one on the surface of the object and the other on the reference surface to interfere the reflected light from both surfaces. is there.
  • a Mirau interference objective lens is used, but a Michelson type interference linique type interference objective lens may be used.
  • a white light source is used as the light source. This is because the brightness of the interference fringes is maximized only at the focal position of the lens unlike a single wavelength light source such as a laser, and is therefore suitable for measuring the height.
  • FIG. 11 shows a layout of the optical elements of the observation optical system 2 when the Mirau-type interference objective lens 30 is used.
  • the Mirau interference objective lens 30 includes a lens 31, a reference mirror 32, and a beam splitter 33.
  • a filter 36 is inserted by the filter switching device 35 into the exit portion of the falling light source 34. When light passes through the filter 36, white light having a center wavelength ⁇ (nm) is obtained.
  • the light that has passed through the filter 36 is reflected by the half mirror 37 toward the lens 31.
  • the light incident on the lens 31 is divided by the beam splitter 33 into light that passes in the direction of the substrate 7 and two light that reflects in the direction of the reference mirror 32.
  • the light reflected by the surface of the substrate 7 and the reference mirror 32 is again merged by the beam splitter 33 and condensed by the lens 31. Thereafter, the light emitted from the lens 31 passes through the half mirror 37 and then enters the imaging surface 3 a of the CCD camera 3 through the imaging lens 38.
  • the Mirau-type interference objective lens 30 is moved in the optical axis direction by the Z stage 8 to cause an optical path length difference between the surface reflected light of the substrate 7 and the surface reflected light of the reference mirror 32.
  • the CCD camera 3 captures an interference fringe generated by the optical path length difference while moving the Mirau interference objective lens 30.
  • the intensity that is, the brightness of the interference fringes is maximized when the reflected light from the substrate 7 and the reflected light from the reference mirror 32 are equal in length. At this time, the surface of the substrate 7 is in focus.
  • the substrate 7 itself is moved up and down on the table, or a piezo table or the like is attached to the connecting portion between the Mirau interference objective lens 30 and the observation optical system 2 to set the upper and lower positions of the Mirau interference objective lens 30. You may adjust.
  • the search range is ⁇ , and the search is performed in the positive direction from the initial position Zp ⁇ / 2, that is, in the direction in which the Z stage 8 moves away from the substrate 7.
  • the search direction does not necessarily need to be a direction away from the substrate 7 and may be a direction approaching.
  • the sampling of the image is started after the Z stage 8 starts to move and reaches a constant speed state. Further, if sampling is performed at the period of the vertical synchronization signal of the CCD camera 3, an interference fringe image can be sampled more accurately.
  • the contrast value Mi of the interference fringe intensity is calculated using the following equation (6) using five images.
  • fi (x, y) indicates the value of the pixel at the position (x, y) of the image fi.
  • FIG. 12A is a diagram showing the relationship between the image number i and the pixel value fi (x, y), and FIG. 12B is a diagram showing the relationship between the pixel number i and the contrast value Mi.
  • c) is a diagram showing the relationship between the position of the Z stage 8 and the speed. 12 (a) to 12 (c), fi (x, y) and Mi show peaks in the vicinity of the image p. This peak point is the focal position of the pixel (x, y). Since Mi shows a symmetrical mountain-shaped tendency around the peak point, a curve representing Mi can be approximated by a quadratic function or a Gaussian function as in the first embodiment.
  • an image in which the maximum value of Mi is stored is Mmax (x, y)
  • an image in which the image number indicating the maximum value is stored is I (x, y).
  • all pixels of Mmax (x, y) are set to 0.
  • ⁇ 1 is set to all the pixels of I (x, y).
  • Mi (x, y) is compared with Mmax (x, y). If Mi (x, y) is larger, then Mi is set to Mmax (x, y).
  • an accurate peak point is obtained by function approximation using a total of (2n + 1) images of ⁇ n sheets around the image p near the peak point.
  • Let j be the number of (2n + 1) images. Since the interference fringe amplitude value Mj (x, y) of each image is obtained during the measurement, the second order is obtained by the Newton method or the like using (2n + 1) amplitude values Mj (x, y) and the image number j. Approximate with a function or Gaussian function, and interpolate peak position from the obtained function. Besides the function approximation, the center of gravity position may be obtained using the contrast value around the peak, and the obtained center of gravity position may be set as the peak position.
  • the fourth embodiment relates to a method for increasing the detection accuracy of the height detection method of the third embodiment. First, problems of the third embodiment will be described.
  • the intensity value g ⁇ of the interference fringe waveform can be expressed by the following equation (7).
  • s is the sampling position
  • h is the height of the ink application part
  • ⁇ and ⁇ are coefficients determined from the amplitude of white light. Since white light actually has a certain bandwidth, the center wavelength is ⁇ , and light having a wavelength of ⁇ 1 ⁇ ⁇ ⁇ ⁇ 2 is irradiated. The intensity of light having this bandwidth is expressed by the following equation (8).
  • G is one in which the wavelength lambda is varied between from .lambda.1 .lambda.2 adds g lambda, and averaged by dividing by the number of times N obtained by adding.
  • FIG. 13 is a diagram showing the relationship between the sampling position s and the interference fringe intensity G.
  • the interference fringe intensity G in FIG. 13 is calculated using Equation (8).
  • ⁇ indicates sampling points.
  • the sampling point controls the Z stage 8 that adjusts the relative position between the substrate 7 and the Mirau interference objective lens 30, and the relative distance between the substrate 7 and the objective lens 30 is ⁇ / 8 corresponding to ⁇ / 2 in phase increment.
  • (nm) is a plot of the luminance value G at the position (x, y) on the image when the image is taken while being changed. Note that the sampling of the image satisfies the Nyquist principle, and the original signal can be reproduced using the sampling points.
  • the contrast value Mi of the interference fringe waveform is obtained from the luminance value of the sampling point, and the peak position is taken as the height of the corresponding pixel.
  • the contrast value Mi is calculated by Equation (6) using a total of five images including two images before and after an image sample to be obtained when an image is taken while changing by ⁇ / 2 in phase increment.
  • phase ⁇ is expressed by the following equation (12) and can be calculated without being affected by ⁇ and ⁇ .
  • the horizontal axis in FIG. 15 indicates the sampling position s
  • the convex curve indicates Mi
  • the saw-tooth line segment indicates the phase ⁇ .
  • the phase ⁇ changes linearly downward from ⁇ to ⁇ , and becomes discontinuous where it changes from ⁇ to ⁇ . This discontinuous portion is indicated by a vertical line segment.
  • an image is taken while changing the relative distance between the substrate 7 and the Mirau interference objective lens 30 by ⁇ / 8 (nm) corresponding to ⁇ / 2 in phase increment.
  • the amount of movement is equal to the phase difference ⁇ and is ⁇ / 8.
  • ⁇ / 8 corresponds to ⁇ / 2 in phase increment.
  • FIG. 16 shows that the peak of the contrast value Mi is not affected by the phase difference ⁇ , but the zero point of the phase ⁇ is affected by the phase difference ⁇ .
  • the peak of the contrast value Mi may be displaced due to noise, it can indicate the height of the object without being affected by the phase difference ⁇ as described above.
  • the phase ⁇ can minimize the influence of noise, and can be detected with higher accuracy than the peak of the contrast value Mi. Therefore, in the present invention, the height of the ink application part is detected using both the peak of the contrast value Mi and the phase ⁇ .
  • the zero point of the phase ⁇ closest to the peak of the contrast value Mi is set as the height of the corresponding pixel as an initial value.
  • the peak of the contrast value Mi is called the primary height
  • the zero point of the phase ⁇ closest to the peak of the contrast value Mi is called the secondary height.
  • FIG. 17 is a diagram showing a peak position of a certain line on the image.
  • FIG. 17 shows data for one line in the horizontal direction when an inclined plane is measured.
  • the horizontal axis indicates the pixel position
  • the vertical axis indicates the image sampling number. It increases as the sampling number increases. When the sampling number changes by 1, the height changes by ⁇ / 8.
  • FIG. 18 shows the zero point of the phase ⁇ closest to the peak position shown in FIG. Phase jumps occur at D and E in FIG. Also, comparing FIG. 17 with FIG. 18, it can be seen that there is less variation at the zero point of the phase ⁇ .
  • the amount of deviation between the peak point of the contrast value Mi and the zero point of the phase ⁇ is obtained, and correction processing is performed so that the sign of the amount of deviation coincides for almost all pixels on the image. To correct. Although this process changes the pixel height, there is no problem in this inspection method because the relative height is used for height evaluation.
  • the amount of deviation between the peak point and the zero point of the phase ⁇ is ⁇
  • the threshold is T
  • the threshold correction amount is t
  • ⁇ (x, y) at the same place as in FIG. 17 is shown in FIG.
  • the horizontal axis in FIG. 19 indicates the pixel position
  • the vertical axis indicates ⁇ (x, y)
  • a change of value 1 corresponds to ⁇ / 8.
  • K ′ (x, y) after correction of all the pixels (x, y) is compared with at least one pixel adjacent to (x, y) to obtain a sum S of difference values.
  • the difference value is the absolute value of the difference from K ′ (x, y) of the adjacent pixel.
  • the obtained total value S is stored in association with the threshold value T.
  • the correction amount t is added to the threshold value T to obtain a new threshold value T.
  • K ′ (x, y) is obtained for all pixels (x, y) on the image, and the total value S is obtained.
  • FIG. 21 shows the final K ′ (x, y) in FIG. Further, ⁇ (x, y) at this time is shown in FIG.
  • the threshold value T is started from ⁇ 4, and the correction amount t is set to 0.1, and the correction is performed 80 times in total.
  • the threshold T varies up to 4.
  • FIG. 21 shows that the phase jump is corrected.
  • the criteria for determining the amount of ink applied varies depending on the pattern to be applied.
  • the submicron level is required. It is.
  • the height information to be used can be switched according to the ink to be applied.
  • the ink to be applied can be changed for each application needle when, for example, the ink application mechanism 5 shown in FIG. 2 is used. Therefore, a selection column of “height type” is provided in the “needle-inspection item correspondence table” shown in FIG. 22, and the height type used when applying with the corresponding needle is registered. For example, when applied with the application needle A, the tertiary height is used, and when applied with the application needle B, the primary height is used.
  • the scan range can be set for each application needle.
  • a tact time suitable for ink can be set, and the inspection time can be made more efficient.
  • the height of the ink application part can be detected with higher accuracy than in the third embodiment.
  • 1 defect correction device 2 observation optical system, 2a observation barrel, 3 CCD camera, 4 cutting laser device, 5 ink application mechanism, 6 ink curing light source, 7 liquid crystal color filter substrate, 8 Z stage, 9 X stage, 10 Y stage, 11 control computer, 12 monitor, 13 operation panel, 15 movable plate, 16 objective lens, 17 coating unit, 18 coating needle, 19 ink tank, 20 electrostatic inkjet device, 21 inkjet nozzle, 22 pulse voltage generation Device, 23 control device, 24 correction ink, 24a tailor cone, 24b jet flow, 24c droplet, 30 Mirau interference objective lens, 31 lens, 32 reference mirror, 33 beam splitter, 34 falling light source, 35 filter switching device, 36 Motor, 37 a half mirror, 38 an imaging lens, 51 a black matrix, 52 R pixel, 53 G pixel, 54 B pixel, 55 white defect, 56 black defect, 57 defective foreign matter.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Optical Filters (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

Un ordinateur (11) de commande du dispositif (1) de réparation de défaut (dispositif d'applicateur) selon la présente invention positionne un objectif (16) au-dessus d'une partie d'application d'encre comprenant de l'encre appliquée à la surface d'un substrat (7), puis capture une image tout en déplaçant un étage (8) Z, calcule, pour chacun d'une pluralité de pixels constituant l'image capturée, une position d'étage Z (emplacement focal du pixel) au niveau de laquelle une valeur de contraste C atteint un pic, et sur la base de la position d'étage Z calculée, calcule la hauteur de la partie d'application d'encre. Ainsi, la hauteur de la partie d'application d'encre peut être détectée de manière quantitative.
PCT/JP2014/065711 2013-06-25 2014-06-13 Dispositif d'applicateur et procédé de détection de hauteur Ceased WO2014208362A1 (fr)

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