WO2017157304A1 - Puce de source d'ions microfluidique et procédé de préparation associé - Google Patents

Puce de source d'ions microfluidique et procédé de préparation associé Download PDF

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Publication number
WO2017157304A1
WO2017157304A1 PCT/CN2017/076804 CN2017076804W WO2017157304A1 WO 2017157304 A1 WO2017157304 A1 WO 2017157304A1 CN 2017076804 W CN2017076804 W CN 2017076804W WO 2017157304 A1 WO2017157304 A1 WO 2017157304A1
Authority
WO
WIPO (PCT)
Prior art keywords
continuous phase
layer
flow channel
discrete
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/076804
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English (en)
Chinese (zh)
Inventor
钱翔
于赐龙
王晓浩
余泉
倪凯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Graduate School Tsinghua University
Original Assignee
Shenzhen Graduate School Tsinghua University
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Filing date
Publication date
Application filed by Shenzhen Graduate School Tsinghua University filed Critical Shenzhen Graduate School Tsinghua University
Publication of WO2017157304A1 publication Critical patent/WO2017157304A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Definitions

  • the continuous phase flow channel 208 is parallel to the discrete phase flow channel 206 at the front end of the discrete phase flow channel 206, and the length between the front end of the discrete phase flow channel 206 and the nozzle outlet 211 is in the range of 0-0.5 mm, preferably 0.05-0.2. Between mm, the spray port 204 formed by the discrete phase flow path 206 and the continuous phase flow path 208 is directly released from the mold formed by the photoresist, rather than being cut and trimmed.
  • the discrete phase flow channel 206 and the continuous phase flow channel 208 may be in a staggered multi-channel mode to enable automatic injection of multiple channels within a microfluidic ion source chip.
  • a method for preparing a microfluidic ion source chip has the following basic process: preparing a mask 101, and the following steps are as follows: Step 1 ⁇ Photoresist 102 - Step 2 Exposure - Step 3 Developing into a mold - step 4 mixing PDMS into the mold - step 5 curing stripping, dicing - step 6 bonding.
  • a first photoresist layer 300 is formed on the substrate silicon wafer 100 by a silicone.

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  • Health & Medical Sciences (AREA)
  • Clinical Laboratory Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Micromachines (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne une puce de source d'ions microfluidique (500) et le procédé de préparation associé. La puce de source d'ions microfluidique comprend une couche de phase discrète, une première couche de phase continue et un orifice de pulvérisation. La couche de phase discrète comprend un bac de stockage de phase discrète (205) et un canal d'écoulement de phase discrète (206). La première couche de phase continue comprend un premier bac de stockage de phase continue (207) et un premier canal d'écoulement de phase continue (208). Le premier canal d'écoulement de phase continue (208) commence à partir du premier bac de stockage de phase continue (207) et est divisé en deux premières ramifications de canal d'écoulement de phase continue (2081, 2082) dans une position définie. Les deux premières ramifications de canal d'écoulement de phase continue (2081, 2082) convergent au niveau d'un orifice de pulvérisation (204). Le canal d'écoulement de phase discrète (206) est en communication avec le bac de stockage de phase discrète (205) et l'orifice de pulvérisation (204), et le canal d'écoulement de phase discrète (206) est situé entre les deux premières ramifications de canal d'écoulement de phase continue (2081, 2082).
PCT/CN2017/076804 2016-03-16 2017-03-15 Puce de source d'ions microfluidique et procédé de préparation associé Ceased WO2017157304A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201610149298.1 2016-03-16
CN201610149298.1A CN105797791B (zh) 2016-03-16 2016-03-16 一种微流体离子源芯片及其制备方法

Publications (1)

Publication Number Publication Date
WO2017157304A1 true WO2017157304A1 (fr) 2017-09-21

Family

ID=56467582

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/076804 Ceased WO2017157304A1 (fr) 2016-03-16 2017-03-15 Puce de source d'ions microfluidique et procédé de préparation associé

Country Status (2)

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CN (1) CN105797791B (fr)
WO (1) WO2017157304A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110960997A (zh) * 2019-12-24 2020-04-07 南通大学 用于快速产生稳定体积的油包水微乳液的装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105797791B (zh) * 2016-03-16 2017-11-03 清华大学深圳研究生院 一种微流体离子源芯片及其制备方法
CN106970137B (zh) * 2017-03-13 2019-11-26 清华大学深圳研究生院 一种电离装置及电离方法
CN109603932B (zh) * 2018-12-12 2020-11-03 深圳大学 一种双聚焦微流体芯片

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1493487A1 (fr) * 2001-06-28 2005-01-05 Agilent Technologies, Inc. Système microfluidique avec régulation du courant ESI résiduel
CN101531466A (zh) * 2009-03-30 2009-09-16 浙江大学 玻璃材料高深宽比微结构二次约束流动刻蚀方法
CN101533005A (zh) * 2009-04-14 2009-09-16 北京大学 微流分配装置、其制备方法及用途
CN104056674A (zh) * 2014-06-09 2014-09-24 清华大学深圳研究生院 一种电喷雾微流体芯片、制作方法及掩膜版设备
CN104851774A (zh) * 2015-05-22 2015-08-19 华中师范大学 一种基于微流控三维聚焦技术的氮气吹扫型高分辨质谱电喷雾电离源及质谱检测方法
CN105498871A (zh) * 2015-12-16 2016-04-20 清华大学深圳研究生院 一种三维聚焦微流体芯片及其制作方法
CN105797791A (zh) * 2016-03-16 2016-07-27 清华大学深圳研究生院 一种微流体离子源芯片及其制备方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104695052B (zh) * 2013-12-04 2017-06-13 中国科学院大连化学物理研究所 一种制备具球形空腔聚合物纤维的方法及专用微流控芯片

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1493487A1 (fr) * 2001-06-28 2005-01-05 Agilent Technologies, Inc. Système microfluidique avec régulation du courant ESI résiduel
CN101531466A (zh) * 2009-03-30 2009-09-16 浙江大学 玻璃材料高深宽比微结构二次约束流动刻蚀方法
CN101533005A (zh) * 2009-04-14 2009-09-16 北京大学 微流分配装置、其制备方法及用途
CN104056674A (zh) * 2014-06-09 2014-09-24 清华大学深圳研究生院 一种电喷雾微流体芯片、制作方法及掩膜版设备
CN104851774A (zh) * 2015-05-22 2015-08-19 华中师范大学 一种基于微流控三维聚焦技术的氮气吹扫型高分辨质谱电喷雾电离源及质谱检测方法
CN105498871A (zh) * 2015-12-16 2016-04-20 清华大学深圳研究生院 一种三维聚焦微流体芯片及其制作方法
CN105797791A (zh) * 2016-03-16 2016-07-27 清华大学深圳研究生院 一种微流体离子源芯片及其制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110960997A (zh) * 2019-12-24 2020-04-07 南通大学 用于快速产生稳定体积的油包水微乳液的装置

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Publication number Publication date
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CN105797791A (zh) 2016-07-27

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