WO2018095249A1 - 一种掩模版版盒 - Google Patents

一种掩模版版盒 Download PDF

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Publication number
WO2018095249A1
WO2018095249A1 PCT/CN2017/111018 CN2017111018W WO2018095249A1 WO 2018095249 A1 WO2018095249 A1 WO 2018095249A1 CN 2017111018 W CN2017111018 W CN 2017111018W WO 2018095249 A1 WO2018095249 A1 WO 2018095249A1
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WO
WIPO (PCT)
Prior art keywords
reticle
middle frame
bottom plate
plate
top cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/111018
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English (en)
French (fr)
Inventor
王刚
张荣军
黄栋梁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Micro Electronics Equipment Co Ltd
Original Assignee
Shanghai Micro Electronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to JP2019527219A priority Critical patent/JP6899437B2/ja
Priority to EP17874058.5A priority patent/EP3547025A4/en
Priority to US16/464,158 priority patent/US10908497B2/en
Priority to KR1020197017198A priority patent/KR102297060B1/ko
Publication of WO2018095249A1 publication Critical patent/WO2018095249A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1906—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers specially adapted for containing masks, reticles or pellicles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1911—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by materials, roughness, coatings or the like
    • H10P72/1912—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by materials, roughness, coatings or the like characterised by shock absorbing elements, e.g. retainers or cushions

Definitions

  • the present invention relates to the field of semiconductor manufacturing, and in particular to a reticle plate.
  • a plate is usually used to store and protect the reticle.
  • the commonly used 6-inch reticle type has three types: NIKON (Nikon), CANON, and SMIF (standard mechanical interface).
  • the pick-and-place of the reticle is realized by a mask transfer robotic fork.
  • the robotic version of the fork is fixed by vacuum adsorption, and there is no reticle protection structure on the robotic fork, so in the actual use, vacuum adsorption is adopted.
  • the fixed reticle has a problem that the reliability is not high and the material safety cannot be guaranteed.
  • there is also the possibility of a collision plate which seriously jeopardizes the safety of the material.
  • the invention provides a reticle plate to solve the problem that the material safety existing in the prior art cannot be guaranteed.
  • the technical solution of the present invention is: a reticle plate, comprising a bottom plate, a middle frame disposed above the bottom plate, and a top cover disposed above the middle frame, the bottom plate and the middle frame And a top cover enclosing a receiving cavity having an opening, the mask plate box further comprising a door panel on one side of the opening, wherein the bottom plate is provided with a plurality of reticle supports, each of the reticle a lateral gap is formed between the seat and the middle frame, and a longitudinal section of the middle frame includes an H-shaped structure, a crosspiece of the H-shaped structure and the bottom plate, and an inner side of the H-shaped structure A longitudinal gap is formed between the lower surface of a vertical side and the bottom plate.
  • a longitudinal gap is formed between the crosspiece of the H-shaped structure and the top cover.
  • the method further includes a bottom plate mounting post disposed on the bottom plate corresponding to the second vertical side of the H-shaped structure.
  • the distance between the lower surface of the first vertical side of the H-shaped structure and the lower surface of the reticle in the magazine should be less than the thickness of the reticle but not less than the vertical movement of the upper surface of the yoke when the plate is taken space.
  • a barcode scanning area is further disposed on the door panel.
  • the middle frame includes a left side, a right side surface and two opposite ends respectively connected to the rear side surfaces of the left and right side surfaces, and the left and right side surfaces are respectively provided with a top cover locking member.
  • the plurality of reticle supports include two first pedestals on one side of the opening and two second pedestals on a side away from the opening.
  • the distance between the two first seats and the left and right sides of the middle frame is the same.
  • the distance between the two second seats and the rear side of the middle frame is the same.
  • the position of the second support is set such that the distance between the reticle positioning surface of the second support and the rear side of the middle frame is greater than the reticle of the reticle plate when the reticle is accessed The distance between the positioning surface and the rear side of the middle frame.
  • the position of the second holder is set such that the minimum distance between the side of the second holder and the side of the mask plate fork when the reticle is taken is greater than 2 mm.
  • a distance between a lower surface of the first vertical side of the H-shaped structure and a lower surface of the reticle in the plate is greater than 3 mm and smaller than a thickness of the reticle.
  • top cover is movably connected to the top of the rear side of the middle frame.
  • top cover is movably connected to the door panel.
  • the upper surface of the top cover is provided with an identification area.
  • the reticle plate provided by the present invention comprises a bottom plate, a middle frame disposed above the bottom plate, and a top cover above the middle frame, the bottom plate, the middle frame and the top cover enclose a receiving cavity having an opening, the opening is provided with a door panel, and the bottom plate is provided with a plurality of reticle supports, the cover a gap is formed between the stencil holder and the middle frame, the longitudinal section of the middle frame is an H-shaped structure, the crosspiece of the H-shaped structure and the lower surface of the first vertical side located at the inner side and the bottom plate There is a gap between them.
  • a receiving cavity having an opening is defined by the bottom plate, the middle frame and the top cover for storing the reticle and the plate pick-and-place reticle, and a plurality of reticle supports are supported on the bottom plate to support the reticle, and the reticle holder is supported
  • a gap is provided between the middle frame and the middle frame, so that the plate can be adapted to both the vacuum adsorption type fork and the physical clamping type fork, and the longitudinal section of the middle frame is set to the H-shaped structure, and the cross-section of the H-shaped structure
  • a gap is provided between the lower surface of the first vertical side and the bottom plate, so that the label can be adapted to both the mask-protected version of the fork and the self-shielded version of the fork-removed version, thereby greatly improving compatibility.
  • FIG. 1 is a schematic structural view of a reticle plate of the present invention
  • Figure 2 is an exploded view of the reticle plate of the present invention
  • Figure 3 is a layout view of the first seat and the second seat of the present invention.
  • Figure 4 is a schematic structural view of a frame in the present invention.
  • Figure 5 is a cross-sectional view of the frame of the present invention.
  • the figure shows: 1, the bottom plate; 11, the bottom plate mounting column; 2, the middle frame; 21, the crosspiece; 22, the first vertical side; 23, the second vertical side; 24, the left side; 25, the right side 26, rear side; 27, top cover locking member; 3, top cover; 4, door panel; 41, bar code scanning area; 51, first support; 52, second support; 6, identification area; Mask plate; 8, spring assembly; 81, lateral edge; 82, vertical edge.
  • the present invention provides a reticle plate, comprising a bottom plate 1 disposed at the bottom a middle frame 2 above the board 1 and a top cover 3 disposed above the middle frame 2, the bottom plate 1, the middle frame 2 and the top cover 3 enclosing a receiving cavity having an opening on one side for storing the reticle 7,
  • the size of the reticle 7 may be 5 inches or 6 inches, and the size of the accommodating cavity is adapted to the size of the reticle 7.
  • One side of the opening is provided with a door panel 4 on which a plurality of reticle holders are provided a lateral gap is formed between the reticle support and the middle frame 2, so that the label box can be simultaneously adapted to the vacuum adsorption type fork and the physical clamping type fork plate; the longitudinal section of the middle frame 2
  • the H-shaped structure is included, as shown in Fig. 5, in which the H-shaped structure on the side of the middle frame 2 is shown.
  • a longitudinal gap is formed between the crosspiece 21 of the H-shaped structure and the lower surface of the first vertical side 22 on the inner side and the bottom plate 1 for protecting the fork in the plate fork of the self-protecting reticle protection device
  • the department provides an activity space that can be adapted to both the version of the maskless protection device and the version of the self-shielded protection device.
  • a gap is provided between the crosspiece 21 of the H-shaped structure and the top cover 3 for ensuring the movable space of the spring assembly 8 (see FIG. 2), and the spring assembly 8 is disposed between the top cover 3 and the bottom plate 1.
  • two spring assemblies 8 are provided on the left and right sides of the top cover 3, respectively.
  • the spring assembly 8 is an inverted L-shaped structure, the lateral edge 81 is disposed on the left side or the right side of the top cover 3, and the vertical side 82 is movably connected to the lateral side 81, and the lower end of the vertical side 82 (in the use state, that is, the top cover When the cover 3 is placed on the middle frame 2, it corresponds to the gap between the crosspiece 21 of the H-shaped structure and the top cover 3, and the entire plate is closed by the cover 3 and pressed by the spring.
  • the bottom plate 1 is provided with a plurality of bottom plate mounting posts 11, and the position of the bottom plate mounting posts 11 corresponds to the second vertical side 23 of the H-shaped structure located outside.
  • the position of the bottom plate mounting post 11 is moved from the middle to the edge to provide sufficient space for the extension of the plate fork to extend.
  • the distance between the lower surface of the first vertical side 22 on the inner side of the H-shaped structure and the upper surface of the reticle 7 (ie, the reticle in the plate) when the reticle is taken is used as a gap between the reticle 7 and the plate Positioning benchmark.
  • the crosspiece is The distance between the lower surface of the 21 and the bottom plate 1 is d2, preferably 17 mm, to ensure the movable space required for the plate fork having the reticle protection device to move from the high position of the pick-and-place plate to the low position, and the support height of the reticle 7 is The distance from the lower surface of the reticle 7 to the bottom plate 1 is d8, preferably 10 mm, at least to ensure that the distance d8 is not less than the sum of the thickness of the plate fork and the vertical movable space required for the lower surface of the plate when laying the plate, the first vertical side
  • the distance between the lower surface of 22 and the upper surface of the reticle 7 is d3, preferably 11 mm.
  • the lower surface and the mask of the first vertical side 22 are calculated by measuring the distance d3.
  • the distance from the lower surface of the stencil 7, the distance d4 should be smaller than the thickness of the reticle 7, but not less than the vertical movable space of the upper surface of the yoke when the plate is taken, preferably d4 > 3 mm.
  • the door panel 4 is further provided with a barcode scanning area 41 for material monitoring and management.
  • the middle frame 2 includes oppositely disposed left and right side faces 24, 25 and rear sides 26 respectively connecting the left and right side faces 24, 25, the left and right side faces 24, 25
  • a top cover locking member 27 is respectively provided on the upper cover for locking the top cover 3.
  • the plurality of reticle holders include two first holders 51 on one side of the opening and two second holders 52 on the side away from the opening.
  • the distance between the two first seats 51 and the left and right sides 24, 25 of the middle frame 2 is the same, that is, the distance between the first support 51 and the left side 24 on the left side.
  • the distance between the first seat 51 and the right side surface 25 on the right side is the same, and both are a5.
  • the distance between the two second seats 52 and the rear side 26 of the middle frame 2 is the same.
  • the distance between the reticle positioning surface of the second support 52 and the rear side surface 26 of the middle frame is greater than the reticle positioning surface of the reticle plate when the reticle 7 is accessed and the middle frame 2
  • the lateral distance of the second support 52 from the left and right sides of the middle frame 2 is equal. In FIG.
  • the distance between the side of the mask plate fork and the side of the second holder 52 is a4>2 mm, and in the present embodiment, a4 is 14.5 mm.
  • the upper surface of the top cover 3 is provided with an identification area 6, that is, a logo area, which reduces the risk of the operator mixing the magazine.
  • the top cover 3 is movably connected to the top of the rear side 26 of the middle frame 2, for example, pivotally connected, so that the top cover 3 can be rotated relative to the middle frame 2, thereby achieving the opening of the top cover 3 and shut down.
  • the top cover 3 and the door panel 4 are also movably connected, so that the door panel 4 can also be rotated relative to the top cover 3 to open or close the door panel 4, thereby facilitating the pick-and-place of the reticle 7.
  • the reticle plate provided by the present invention comprises a bottom plate 1, a middle frame 2 disposed above the bottom plate 1, and a top cover 3 disposed above the middle frame 2, the bottom plate 1, the middle frame 2 and the top cover 3 encloses a receiving cavity having an opening, the opening is provided with a door panel 4, and the bottom plate 1 is provided with a plurality of reticle holders, between the reticle holder and the middle frame 2 A gap is provided, and the longitudinal section of the middle frame 2 is an H-shaped structure, and a gap is formed between the crosspiece 21 of the H-shaped structure and the lower surface of the first vertical side 22 located inside and the bottom plate 1.
  • a receiving cavity having an opening is formed by the bottom plate 1, the middle frame 2 and the top cover 3 for storing the reticle 7 and the plate pick-and-place reticle 7 , and a plurality of reticle holders are arranged on the bottom plate 1 to support the reticle 7 And a gap is provided between the reticle support and the middle frame 2, so that the sleeve can be adapted to both the vacuum adsorption type fork and the physical clamping type fork, and the longitudinal section of the middle frame 2 is set to the H type.
  • the structure, and the crosspiece 21 of the H-shaped structure and the lower surface of the first vertical side 22 are provided with a gap between the bottom plate 1 so that the plate can be simultaneously adapted to the mask-protected plate fork and the self-shielded plate-protected plate fork
  • the version is greatly improved.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Library & Information Science (AREA)
  • Public Health (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

一种掩模版版盒，包括底板(1)、设于底板(1)上方的中框(2)和设于中框(2)上方的顶盖(3)，底板(1)、中框(2)和顶盖(3)围成具有一开口的容纳腔，开口处设有门板(4)，底板(1)上设有若干掩模版支座，掩模版支座与所述中框(2)之间设有空隙，中框(2)的纵截面为H型结构，H型结构的横档(21)以及位于内侧的第一竖边(22)的下表面与底板(1)之间设有空隙。通过在掩模版支座与中框(2)之间设置空隙，使版盒可同时适应于真空吸附式版叉和物理夹持式版叉取版，同时将中框(2)的纵截面设置为H型结构，且H型结构的横档(21)以及第一竖边(22)的下表面与底板(1)之间设置空隙，使版盒可同时适应于无掩模版保护的版叉和自带掩模版保护的版叉取版，大大提高了兼容性。

Description

一种掩模版版盒 技术领域
本发明涉及半导体制造领域，具体涉及一种掩模版版盒。
背景技术
在半导体领域通常使用版盒来存储与保护掩模版，目前常用的6寸掩模版版盒类型有NIKON(尼康)版盒、CANON(佳能)版盒和SMIF(标准机械接口)版盒三种。在实际生产过程中，掩模版的取放通过掩膜传输机械手版叉实现。受版盒结构的限制，特别是NIKON版盒，取放机械手版叉均采用真空吸附方式固定掩模版，而且取放机械手版叉上没有掩模版保护结构，因此在实际使用过程中，采用真空吸附方式固定掩模版存在可靠性不高，物料安全无法保障的问题。除此之外，在取放机械手版叉带版运动过程中，也存在撞版的可能性，严重危及物料安全。
发明内容
本发明提供了一种掩模版版盒，以解决现有技术中存在的物料安全无法保障的问题。
为了解决上述技术问题，本发明的技术方案是：一种掩模版版盒，包括底板、设于所述底板上方的中框和设于所述中框上方的顶盖，所述底板、中框和顶盖围成具有一开口的容纳腔，所述掩模版版盒在所述开口的一侧还设有门板，其中，所述底板上设有若干掩模版支座，各所述掩模版支座与所述中框之间设有横向空隙，所述中框的纵截面包括H型结构，所述H型结构的横档与所述底板之间以及所述H型结构的位于内侧的第一竖边的下表面与所述底板之间设有纵向空隙。
进一步的，所述H型结构的横档与顶盖之间设有纵向空隙。
进一步的，还包括设于所述底板上的、与所述H型结构位于外侧的第二竖边对应的底板安装柱。
进一步的，所述H型结构的第一竖边的下表面与版盒内掩模版下表面的距离应小于所述掩模版的厚度但不小于版叉取版时版叉上表面的垂向活动空间。
进一步的，所述门板上还设有条码扫描区。
进一步的，所述中框包括相对设置的左、右侧面和两端分别连接所述左、右侧面的后侧面，所述左、右侧面上分别设有顶盖锁紧件。
进一步的，所述若干掩模版支座包括两个靠近所述开口一侧的第一支座和两个远离所述开口一侧的第二支座。
进一步的，两个所述第一支座与所述中框的左、右侧面之间的距离相同。
进一步的，两个所述第二支座与所述中框的后侧面之间的距离相同。
进一步的，所述第二支座的位置设置为使得所述第二支座的掩模版定位面与所述中框的后侧面之间的距离大于取放掩模版时掩模版版叉的掩模版定位面与所述中框的后侧面之间的距离。
进一步的，所述第二支座的位置设置为使得所述第二支座的侧面与取放掩模版时掩模版版叉的侧面之间的最小距离大于2mm。
进一步的，所述H型结构的第一竖边的下表面与版盒内掩模版下表面的距离大于3mm，且小于所述掩模版的厚度。
进一步的，所述顶盖与所述中框的后侧面的顶部活动连接。
进一步的，所述顶盖与所述门板之间活动连接。
进一步的，所述顶盖的上表面设有标识区域。
本发明提供的掩模版版盒，包括底板、设于所述底板上方的中框和设于 所述中框上方的顶盖，所述底板、中框和顶盖围成具有一开口的容纳腔，所述开口处设有门板，所述底板上设有若干掩模版支座，所述掩模版支座与所述中框之间设有空隙，所述中框的纵截面为H型结构，所述H型结构的横档以及位于内侧的第一竖边的下表面与所述底板之间设有空隙。通过底板、中框和顶盖围成具有一开口的容纳腔用于存储掩模版和版叉取放掩模版，在底板上设置若干掩模版支座对掩模版进行支撑，并在掩模版支座与中框之间设置空隙，使版盒可同时适应于真空吸附式版叉和物理夹持式版叉取版，同时将中框的纵截面设置为H型结构，且H型结构的横档以及第一竖边的下表面与底板之间设置空隙，使版盒可同时适应于无掩模版保护的版叉和自带掩模版保护的版叉取版，大大提高了兼容性。
附图说明
图1是本发明掩模版版盒的结构示意图；
图2是本发明掩模版版盒的爆炸图；
图3是本发明第一支座和第二支座的布置图；
图4是本发明中框的结构示意图；
图5是本发明中框的剖视尺寸图。
图中所示：1、底板；11、底板安装柱；2、中框；21、横档；22、第一竖边；23、第二竖边；24、左侧面；25、右侧面；26、后侧面；27、顶盖锁紧件；3、顶盖；4、门板；41、条码扫描区；51、第一支座；52、第二支座；6、标识区域；7、掩模版；8、弹簧组件；81、横边；82、竖边。
具体实施方式
下面结合附图对本发明作详细描述：
如图1-5所示，本发明提供了一种掩模版版盒，包括底板1、设于所述底 板1上方的中框2和设于所述中框2上方的顶盖3，所述底板1、中框2和顶盖3围成具有一侧开口的容纳腔，用于存储掩模版7，掩模版7的尺寸可以是5寸或6寸，容纳腔的大小与掩模版7的尺寸相适配，所述开口的一侧设有门板4，所述底板1上设有若干掩模版支座，所述掩模版支座与所述中框2之间设有横向空隙，使版盒可同时适应于真空吸附式版叉和物理夹持式版叉取版；所述中框2的纵截面包括H型结构，如图5所示，其中示出了中框2一侧的H型结构。所述H型结构的横档21以及位于内侧的第一竖边22的下表面与所述底板1之间设有纵向空隙，用于为自带掩模版保护装置的版叉中的版叉保护部提供活动空间，可同时适应于无掩模版保护装置的版叉和自带掩模版保护装置的版叉进行取版。
优选的，所述H型结构的横档21与顶盖3之间设有空隙，用于保证弹簧组件8(见图2)的活动空间，弹簧组件8设于顶盖3与底板1之间，于本实施例中，提供了两个弹簧组件8分别设于顶盖3的左、右两侧。所述弹簧组件8为倒L型结构，横边81设于顶盖3的左侧或右侧，竖边82活动连接于横边81，竖边82的下端(于使用状态下，即顶盖3盖于中框2上时)与所述H型结构的横档21与顶盖3之间的空隙对应，在弹簧作用下使整个版盒被顶盖3封闭并被压紧。
优选的，如图4、图5所示，所述底板1上设有若干底板安装柱11，所述底板安装柱11的位置与所述H型结构位于外侧的第二竖边23对应，相比现有技术，将底板安装柱11的位置由中间移动至边缘，给版叉的伸入伸出提供足够的空间。
优选的，所述H型结构内侧的第一竖边22的下表面与取放掩模版时掩模版7(即位于版盒内的掩模版)上表面的距离作为掩模版7与版盒之间的定位基准。
如图5所示，本实施例中横档21与顶盖3之间的距离为d1＝12mm，横档 21的下表面与底板1之间的距离为d2，优选为17mm，以保证具有掩模版保护装置的版叉从取放版高位运动到低位所需的活动空间，掩模版7的支撑高度，即掩模版7下表面到底板1的距离为d8，优选为10mm，至少保证该距离d8不小于版叉的厚度和放版时版叉下表面所需的垂向活动空间的和，第一竖边22的下表面与掩模版7上表面的距离为d3，优选为11mm，作为掩模版7与版盒之间的定位基准，通过测量距离d3，以计算得到第一竖边22的下表面与掩模版7下表面的距离，距离d4应小于所述掩模版7的厚度但不小于版叉取版时版叉上表面的垂向活动空间，优选为d4>3mm。
优选的，所述门板4上还设有条码扫描区41，便于物料监控和管理。
优选的，所述中框2包括相对设置的左、右侧面24、25和两端分别连接所述左、右侧面24、25的后侧面26，所述左、右侧面24、25上分别设有顶盖锁紧件27，用于对顶盖3进行锁紧。
如图3所示，所述若干掩模版支座包括两个靠近所述开口一侧的第一支座51和两个远离所述开口一侧的第二支座52。优选的，两个所述第一支座51与所述中框2左、右侧面24、25之间的距离相同，即左侧的第一支座51与左侧面24之间的距离与右侧的第一支座51与右侧面25之间的距离相同，都为a5。优选的，两个所述第二支座52与所述中框2的后侧面26之间的距离相同。
优选的，所述第二支座52的掩模版定位面与所述中框的后侧面26之间的距离大于取放掩模版7时掩模版版叉的掩模版定位面与所述中框2的后侧面26之间的距离。图3中第二支座52的定位面与所述中框的后侧面26之间的距离为a1＝12mm，版叉取放版伸入最远位置时掩模版7的定位面距中框2的后侧面26之间的距离为a3＝11mm，本实施例中a3-a1＝1mm。第二支座52距离中框2左、右侧面的侧向距离相等，图3中只标示出左侧的第二支座52距离中框2左侧面24的距离a2，要求该距离a2能使掩模版版叉伸入伸出版 盒进行取放版时，掩模版版叉侧面距离第二支座52侧面的距离为a4＞2mm，本实施例中a4＝14.5mm。
优选的，所述顶盖3上表面设有标识区域6，即logo区域，降低了操作人员将版盒混用的风险。
请重点参照图2，所述顶盖3与所述中框2后侧面26的顶部活动连接，例如枢转连接，使得顶盖3可相对于中框2转动，从而实现顶盖3的打开和关闭。所述顶盖3与所述门板4之间也活动连接，使得门板4也可相对于顶盖3转动，以实现门板4的打开或关闭，从而便于掩模版7的取放。
综上所述，本发明提供的掩模版版盒，包括底板1、设于所述底板1上方的中框2和设于所述中框2上方的顶盖3，所述底板1、中框2和顶盖3围成具有一开口的容纳腔，所述开口处设有门板4，所述底板1上设有若干掩模版支座，所述掩模版支座与所述中框2之间设有空隙，所述中框2的纵截面为H型结构，所述H型结构的横档21以及位于内侧的第一竖边22的下表面与所述底板1之间设有空隙。通过底板1、中框2和顶盖3围成具有开口的容纳腔，用于存储掩模版7和版叉取放掩模版7，在底板1上设置若干掩模版支座对掩模版7进行支撑，并在掩模版支座与中框2之间设置空隙，使版盒可同时适应于真空吸附式版叉和物理夹持式版叉取版，同时将中框2的纵截面设置为H型结构，且H型结构的横档21以及第一竖边22的下表面与底板1之间设置空隙，使版盒可同时适应于无掩模版保护的版叉和自带掩模版保护的版叉取版，大大提高了兼容性。
虽然说明书中对本发明的实施方式进行了说明，但这些实施方式只是作为提示，不应限定本发明的保护范围。在不脱离本发明宗旨的范围内进行各种省略、置换和变更均应包含在本发明的保护范围内。

Claims (15)

  1. 一种掩模版版盒，其特征在于，包括底板、设于所述底板上方的中框和设于所述中框上方的顶盖，所述底板、中框和顶盖围成具有一开口的容纳腔，所述掩模版版盒在所述开口的一侧还设有门板，其中，所述底板上设有若干掩模版支座，各所述掩模版支座与所述中框之间设有横向空隙，所述中框的纵截面包括H型结构，所述H型结构的横档与所述底板之间以及所述H型结构的位于内侧的第一竖边的下表面与所述底板之间设有纵向空隙。
  2. 根据权利要求1所述的掩模版版盒，其特征在于，所述H型结构的横档与顶盖之间设有纵向空隙。
  3. 根据权利要求1所述的掩模版版盒，其特征在于，还包括设于所述底板上的、与所述H型结构位于外侧的第二竖边对应的底板安装柱。
  4. 根据权利要求1所述的掩模版版盒，其特征在于，所述H型结构的第一竖边的下表面与版盒内掩模版下表面的距离应小于所述掩模版的厚度但不小于版叉取版时版叉上表面的垂向活动空间。
  5. 根据权利要求1所述的掩模版版盒，其特征在于，所述门板上还设有条码扫描区。
  6. 根据权利要求1所述的掩模版版盒，其特征在于，所述中框包括相对设置的左、右侧面和两端分别连接所述左、右侧面的后侧面，所述左、右侧面上分别设有顶盖锁紧件。
  7. 根据权利要求6所述的掩模版版盒，其特征在于，所述若干掩模版支座包括两个靠近所述开口一侧的第一支座和两个远离所述开口一侧的第二支座。
  8. 根据权利要求7所述的掩模版版盒，其特征在于，两个所述第一支座与所述中框的左、右侧面之间的距离相同。
  9. 根据权利要求7所述的掩模版版盒，其特征在于，两个所述第二支座与所述中框的后侧面之间的距离相同。
  10. 根据权利要求7所述的掩模版版盒，其特征在于，所述第二支座的位置设置为使得所述第二支座的掩模版定位面与所述中框的后侧面之间的距离大于取放掩模版时掩模版版叉的掩模版定位面与所述中框的后侧面之间的距离。
  11. 根据权利要求7所述的掩模版版盒，其特征在于，所述第二支座的位置设置为使得所述第二支座的侧面与取放掩模版时掩模版版叉的侧面之间的最小距离大于2mm。
  12. 根据权利要求4所述的掩模版版盒，其特征在于，所述H型结构的第一竖边的下表面与版盒内掩模版下表面的距离大于3mm，且小于所述掩模版的厚度。
  13. 根据权利要求6所述的掩模版版盒，其特征在于，所述顶盖与所述中框的后侧面的顶部活动连接。
  14. 根据权利要求1所述的掩模版版盒，其特征在于，所述顶盖与所述门板之间活动连接。
  15. 根据权利要求1所述的掩模版版盒，其特征在于，所述顶盖的上表面设有标识区域。
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CN108107672A (zh) 2018-06-01
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