WO2019107695A1 - Écran réfléchissant et son procédé de fabrication - Google Patents

Écran réfléchissant et son procédé de fabrication Download PDF

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Publication number
WO2019107695A1
WO2019107695A1 PCT/KR2018/008144 KR2018008144W WO2019107695A1 WO 2019107695 A1 WO2019107695 A1 WO 2019107695A1 KR 2018008144 W KR2018008144 W KR 2018008144W WO 2019107695 A1 WO2019107695 A1 WO 2019107695A1
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WO
WIPO (PCT)
Prior art keywords
metal layer
layer
projection
forming
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2018/008144
Other languages
English (en)
Korean (ko)
Inventor
정종국
장창영
이재호
이상문
변나은
백우성
박철호
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
May Co Ltd
Selcos Co ltd
Original Assignee
May Co Ltd
Selcos Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by May Co Ltd, Selcos Co ltd filed Critical May Co Ltd
Priority to CN201880076764.5A priority Critical patent/CN111406231B/zh
Publication of WO2019107695A1 publication Critical patent/WO2019107695A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0284—Diffusing elements; Afocal elements characterized by the use used in reflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/54—Accessories
    • G03B21/56—Projection screens
    • G03B21/60—Projection screens characterised by the nature of the surface

Definitions

  • the present invention relates to a reflective screen and a method of manufacturing the same, and more particularly, to a reflective screen and a method of manufacturing the same, in which a light absorbing layer for restricting external light or artificial light, And to a method of manufacturing the same.
  • the image inputted from the projector is reflected to the user side through the reflection type screen and the user can recognize the image with the naked eye.
  • the luminance at the lower portion of the screen is relatively high while the luminance at the upper portion of the screen may be relatively low due to artificial light such as outside light or illumination.
  • Such a reflective screen prevents the luminance of the screen from being reduced by external light or artificial light and forms stepped protrusions on the surface from which the image is projected so that the image can be clearly displayed even in the bright room. And a light reflection film is formed on the lower surface of each projection.
  • An object of the present invention is to provide a method of manufacturing a reflective screen capable of simultaneously forming a light reflection film and a light absorption film in a single device.
  • the present invention provides a method of manufacturing a reflective screen for forming a light reflecting film and a light absorbing film on one surface of a substrate in a vacuum atmosphere chamber, comprising: preparing a substrate having a plurality of projections formed in parallel on one surface thereof; ; Forming a metal seed on the first surface of each of the projections so as to have a non-uniform concavo-convex structure; Forming a metal layer on the first and second surfaces of each projection; Ionizing the metal layer formed on the second surface of each projection; And forming an antioxidant layer on the metal layer on the first surface and the ionized metal layer on the second surface of each projection simultaneously.
  • the metal seed may be formed by an ion bombardment process, and the first target may be made of SUS or Ti.
  • the metal layer may be formed by a sputtering process, and the second target may be pure Al.
  • the sputtering may be performed while the first surface of the second target and the protrusion are maintained at a distance of 100 mm to 200 mm.
  • the sputtering incident angle may be inclined by 30 ° to 60 ° with respect to the vertical line so as to emit ions towards the first surface of the projection.
  • the metal layer formed on the second surface of each of the protrusions may be formed of an AlN x layer by reacting with nitrogen ions.
  • the step of forming the anti-oxidation layer may be performed by sputtering, and the third target may be made of SiO 2 .
  • the present invention provides a semiconductor device comprising a substrate; A plurality of protrusions protruding in parallel to one surface of the substrate and having a triangular cross section; A light reflection film comprising a first metal layer deposited on a first surface of each projection and an anti-oxidation layer deposited on an upper surface of the first metal layer; And a light absorbing layer composed of a second metal layer deposited on a second surface of each of the projections and an anti-oxidation layer deposited on an upper surface of the second metal layer.
  • the reflective screen of the present invention can do.
  • the first metal layer may be made of pure Al
  • the second metal layer may be made of AlN x
  • the oxidation preventing layer may be made of SiO 2 .
  • the first metal layer may have a thickness of 25 nm to 35 nm.
  • the light reflection film and the light absorption film can be simultaneously formed on the substrate in the same chamber of the single device, which is advantageous in that the working time can be significantly shortened as compared with the prior art.
  • the present invention includes a plurality of AlN x on the second surface of the protrusion formed on one surface of a substrate by stacking a layer and the SiO 2 layer to form the light absorbing film, AlN x, or Al 2 O 3
  • the reflectance can be reduced as compared with the light absorbing film formed only with the reflector, and the screen projected on the reflective screen can be displayed more clearly.
  • FIG. 1 is a schematic view showing a reflective screen according to an embodiment of the present invention.
  • FIG. 2 is a schematic view showing a vacuum deposition apparatus for forming a light reflection film and a light absorption film on a reflection type screen according to an embodiment of the present invention.
  • FIG 3 is a view showing a sputtering incidence angle for forming a pure Al layer on a substrate.
  • 4 is a view showing the distance between the substrate and the target.
  • FIG. 5 is a view showing a light reflection film and a light absorption film formed in multiple layers on a projection pattern of a substrate.
  • FIG. 6 is a flowchart illustrating a manufacturing process of a reflective screen according to an embodiment of the present invention.
  • a reflective screen 10 according to an embodiment of the present invention has a projection pattern in which a plurality of projections 13 are continuously formed in a substantially horizontal direction on one surface of a substrate 11.
  • Each of the protrusions 13 forming the protrusion pattern has a substantially triangular cross section and the light reflection film 30 is formed on the first surface 15 of each protrusion 13 and the second surface 17 of each protrusion 13, And a light absorbing film 50 are coated and formed, respectively.
  • the reflective screen 10 provided for projecting with a projector (not shown) is arranged such that the first surface 15 faces downward and the second surface 17 faces upward .
  • the light reflecting film 30 formed on the first surface 15 reflects the beam emitted from the projector to the user side and the light absorbing film 50 formed on the second surface 17 reflects the natural light (Light emitted from a lighting apparatus such as a fluorescent lamp).
  • the light reflection film 30 and the light absorption film 50 have a structure in which a metal layer and an oxidation prevention layer are sequentially laminated.
  • the irregularly formed concave-convex structure formed on the first surface 15 at the time of manufacturing the light reflecting film 30 is diffusedly diffused, a wide viewing angle can be secured.
  • the step of forming the concavo-convex structure will be described later.
  • the screen projected on the reflective screen 10 can be displayed clearly as a whole.
  • a predetermined partition may be formed between each target and the ion beam launcher in the second chamber 120 so that the ion bombardment treatment, the sputtering treatment, and the ion beam treatment can be smoothly performed at the same time.
  • a vacuum deposition apparatus 100 for forming a light reflection film 30 and a light absorption film 50 on a reflective screen 10 according to an embodiment of the present invention will be described do.
  • FIG. 2 is a schematic view showing a vacuum deposition apparatus for forming a light reflection film and a light absorption film on a reflective screen according to an embodiment of the present invention
  • FIG. 3 is a view showing a sputtering incident angle for forming a pure Al layer on a substrate
  • FIG. 4 is a view showing a distance between a substrate and a target
  • FIG. 5 is a view showing a light reflection film and a light absorption film formed in multiple layers on a projection pattern of a substrate.
  • a plurality of protrusions 13 formed on the substrate 11 are exaggeratedly enlarged.
  • a vacuum deposition apparatus 100 for forming a light reflection film 30 and a light absorption film 50 on a reflection type screen 10 according to an embodiment of the present invention will be described.
  • the vacuum deposition apparatus 100 may include first to third vacuum chambers 110, 120 and 130.
  • the first to third vacuum chambers 110, 120 and 130 are sequentially arranged and isolated from each other by the first and second partition walls 111 and 131.
  • the first and second barrier ribs 111 and 131 may have holes (not shown) of a predetermined shape through which the substrate 11 can pass, respectively.
  • An un-winding roller 113 around which the substrate 11 is wound is disposed in the first vacuum chamber 110 before the light reflection film 30 and the light absorption film 50 are formed.
  • the second vacuum chamber 120 is provided with a first target 141 for ion bombardment and second and third targets 143 and 147 for forming the light reflecting film 30 and the light absorbing film 50, And the ion beam launcher 145, respectively.
  • the first target 141 may be made of SUS (Steel Use Stainless) or Ti material. Metal ions are discharged by a predetermined gun (not shown) and the first surface 15 of each projection 13 is exposed. A metal seed may be formed on the substrate.
  • the second target 143 may be pure Al and is used to form the metal layer 31 on the first side 15 by sputtering.
  • the pure Al constituting the metal layer 31 may be formed to a thickness of about 25 nm to 35 nm.
  • the sputtering incidence angle of each projection 13 with respect to the first face 15 is set at about 30 to 60 degrees at a position where the first face 15 of each projection 13 is vertical,
  • the second target 143 can be set.
  • the incidence angle of the sputtering (? 1 ???? 2 ) is set to less than 30 degrees or exceeds 60 degrees, the region where the light reflection film 30 is formed extends do. In this case, the light reflection film 30 is not formed in a desired shape or a desired thickness, and as a result, the overall shape of each projection 13 is changed, so that the reflectance can be reduced.
  • the incident angle of the sputtering is set in the range of about 30 to 60, coating is possible in the tilt region as in the example shown in Fig. 1, and an effective luminance improvement can be expected.
  • the second target 143 is disposed adjacent to the support roller 125 at a predetermined interval.
  • the second target 143 may be arranged so as to have an interval of about 100 mm to 200 mm in a state parallel to the first surface 15 of the projection, as shown in Fig. These intervals are designed so that the thickness of the pure Al layer 31 coated on the first and second surfaces 15 and 17 of the projection having a triangular section can be easily controlled.
  • the pure Al layer 31 is formed on the first surface 15 of the protrusion
  • another pure Al layer 55 is formed to a predetermined thickness on the second surface 17 of the protrusion.
  • the other pure Al layer 55 formed on the second surface 17 of the projection is moved by the support roller 125 rotating in one direction to a position adjacent to the ion beam projector 145 and then irradiated by the ion beam projector 145 And reacts with the supplied nitrogen ions (N 2 - ) to form the AlN x layer 51.
  • the third target 147 is formed on the AlN x layer 51 coated on the second surface 17 of the protrusion and the pure Al layer 31 coated on the first surface 15 of the protrusion, 2 oxidation preventing layers 33 and 53 are formed.
  • the third target 147 may be made of SiO 2 material.
  • the pure Al layer 31 and the first antioxidant layer 33 are laminated on the first surface 15 of the projection to form the light reflection film 30 and the second surface
  • the light absorption film (or the anti-reflection film) 50 is formed by stacking the AlN x layer 51 and the second antioxidant layer 53 on the first anti-reflection film 17.
  • the refractive index n1 of the substrate 11 is about 1.5
  • the refractive index n2 of the pure Al layer 31 is about 1.37
  • the refractive index n3 of the AlN x layer 51 is about 1.8
  • the refractive index n4 of the second anti-oxidation layer 33, 53 may be about 1.46.
  • the second vacuum chamber 120 is provided with a substrate 11 such that the substrate 11 can move sequentially adjacent to the first target 141, the second target 143, the ion beam irradiator 145 and the third target 147, First and second guide rollers 121 and 122 disposed in front of the support roller 125 (in the direction adjacent to the first vacuum chamber 110) (In the direction adjacent to the third vacuum chamber 130) of the first guide roller 123 and the second guide roller 123, respectively.
  • the first and second guide rollers 121 and 122 are disposed between the first partition wall 111 and the support roller 125 to guide the substrate 11 from the first vacuum chamber 110 to the support roller 125.
  • the third and fourth guide rollers 123 and 124 are disposed between the support roller 125 and the second partition wall 131 and are provided on the first and second surfaces 15 and 17 of the plurality of projections 13, And the substrate 11 on which the light absorbing film 50 is formed is guided from the supporting roller 125 to a re-winding roller 133 disposed in the third vacuum chamber 130.
  • a rewinding roller 133 is disposed in the third vacuum chamber 130 and a power is supplied to the third vacuum chamber 130 by a driving motor (not shown) so as to wind the substrate 11 on which the light reflecting film 30 and the light absorbing film 50 are formed. It can be received and rotated in one direction.
  • FIG. 6 is a flowchart illustrating a manufacturing process of a reflective screen according to an embodiment of the present invention.
  • the leading end of the substrate is taken out from the unwinding roller 113 and connected to the rollers of the second chamber 120 and the rewinding roller 133 of the third chamber 130 (S1).
  • the rewinding roller 133 is rotated in one direction, the substrate 11 wound on the unwinding roller 113 is wound around the rewinding roller 133 of the third chamber 130 through the second chamber 120 .
  • the rewinding roller 133 is rotated by a predetermined angle in one direction to move the first surface 15 of the protrusion formed so as to reach the position adjacent to the second target 143.
  • the pure Al layer 31 is formed on the first surface 15 of the projection through sputtering.
  • another pure Al layer 55 formed on the second surface 17 of the protrusion may be formed to be thinner than the pure Al layer 31 formed on the first surface 15 of the protrusion (S3).
  • the reason why the thicknesses of the pure Al layers 31 and 53 are formed differently in this manner is that the first surface 15 of the projection that rotates in one direction by the support roller 125 can be directed to the second target 143 This is because the position of the second target is set. That is, the second target 143 is disposed on the left side of the support roller 125 as shown in FIG. 2 and at the same time is inclined so that the incident angle of sputtering is about 30 ° to 60 ° as shown in FIG. 3, (15) can be directed to the second target (143). The second surface 17 of the projection is prevented from being directed toward the second target 143 while being rotated by the support roller 125 in one direction.
  • the rewinding roller 133 is rotated in a predetermined direction in one direction to form the second surface 17 of the projection,
  • the pure Al layer 55 formed on the ion beam irradiator 145 is moved to a position facing the ion beam projector 145.
  • the ion beam launcher 145 is then driven to emit nitrogen ions (N 2 - ) to the pure Al layer 55 on the second side 17 of the projection.
  • the pure Al layer 55 reacts with nitrogen ions (N 2 - ) to form an AlN x layer 51 (S 4).
  • the rewinding roller 133 is rotated by a predetermined angle in one direction so that the second surface 17 of the projection and the first surface 15 of the next projection simultaneously move toward the third target 147.
  • SiO 2 layers oxidation preventing layers
  • the first surface 15 of the protrusion is provided with a pure Al layer 31 and a layer of SiO 2 A light absorbing film (or an anti-reflection film) made of the AlN x layer 51 and the SiO 2 layer 53 laminated thereon is formed on the second surface 17 of the projection, (50) is formed.
  • the light absorption film 50 formed on the second surface of the projection is AlN or Al 2 O 3 It is possible to reduce the reflectance by as much as 6% as compared with the case where the reflector is formed only by the reflector.
  • the present invention can simultaneously form a light reflecting film and a light absorbing film on a substrate in the same chamber of a single device, which is advantageous in that the working time can be shortened compared with the prior art.
  • the present invention relates to a reflective screen having a light absorbing layer for restricting external light or artificial light illuminating a screen, and a light reflecting layer for reflecting an image incident from the projection, and a method of manufacturing the same.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Overhead Projectors And Projection Screens (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La présente invention concerne un procédé de fabrication d'écran réfléchissant consistant à former un film réfléchissant la lumière et un film absorbant la lumière sur une surface d'un substrat à l'intérieur d'une chambre ayant une atmosphère sous vide ; à préparer un substrat ayant une pluralité de saillies formées en parallèle sur une surface de celui-ci ; à former une graine métallique sur une première surface de chaque saillie de sorte à obtenir une structure irrégulière non uniforme ; à former des couches métalliques sur la première surface et une seconde surface de chaque saillie ; à ioniser des couches métalliques formées sur la seconde surface de chaque saillie ; et à former simultanément une couche antioxydante sur la couche métallique de la première surface et sur la couche métallique ionisée de la seconde surface, de chaque saillie.
PCT/KR2018/008144 2017-12-01 2018-07-19 Écran réfléchissant et son procédé de fabrication Ceased WO2019107695A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201880076764.5A CN111406231B (zh) 2017-12-01 2018-07-19 一种反射型屏幕及其制备方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2017-0163880 2017-12-01
KR1020170163880A KR102086843B1 (ko) 2017-12-01 2017-12-01 반사형 스크린 및 그 제조방법

Publications (1)

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WO2019107695A1 true WO2019107695A1 (fr) 2019-06-06

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PCT/KR2018/008144 Ceased WO2019107695A1 (fr) 2017-12-01 2018-07-19 Écran réfléchissant et son procédé de fabrication

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KR (1) KR102086843B1 (fr)
CN (2) CN207924177U (fr)
WO (1) WO2019107695A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102086843B1 (ko) * 2017-12-01 2020-03-09 주식회사 셀코스 반사형 스크린 및 그 제조방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000131768A (ja) * 1992-10-21 2000-05-12 Dainippon Printing Co Ltd 透過型スクリ―ン
JP2006259644A (ja) * 2005-03-18 2006-09-28 Seiko Epson Corp 反射型スクリーン
JP2007094047A (ja) * 2005-09-29 2007-04-12 Sony Corp 反射型スクリーン
KR20120122749A (ko) * 2011-04-29 2012-11-07 엘지전자 주식회사 영상 표시 시스템의 디스플레이 스크린 및 그 제조 방법
KR20140019608A (ko) * 2012-08-06 2014-02-17 삼성전자주식회사 프론트 프로젝션 장치용 스크린 및 그 제조 방법
JP2015069163A (ja) * 2013-09-30 2015-04-13 大日本印刷株式会社 反射スクリーンおよび反射スクリーンを備えた映像表示システム

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JPH11339683A (ja) * 1998-05-29 1999-12-10 Matsushita Electron Corp 陰極線管およびその製造方法
CN1693989A (zh) * 2004-05-07 2005-11-09 株式会社有泽制作所 反射式屏幕
JP2011221272A (ja) * 2010-04-09 2011-11-04 Seiko Epson Corp 反射型スクリーン、投影システム、フロントプロジェクションテレビ、および、反射型スクリーンの製造方法
KR102086843B1 (ko) * 2017-12-01 2020-03-09 주식회사 셀코스 반사형 스크린 및 그 제조방법

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000131768A (ja) * 1992-10-21 2000-05-12 Dainippon Printing Co Ltd 透過型スクリ―ン
JP2006259644A (ja) * 2005-03-18 2006-09-28 Seiko Epson Corp 反射型スクリーン
JP2007094047A (ja) * 2005-09-29 2007-04-12 Sony Corp 反射型スクリーン
KR20120122749A (ko) * 2011-04-29 2012-11-07 엘지전자 주식회사 영상 표시 시스템의 디스플레이 스크린 및 그 제조 방법
KR20140019608A (ko) * 2012-08-06 2014-02-17 삼성전자주식회사 프론트 프로젝션 장치용 스크린 및 그 제조 방법
JP2015069163A (ja) * 2013-09-30 2015-04-13 大日本印刷株式会社 反射スクリーンおよび反射スクリーンを備えた映像表示システム

Also Published As

Publication number Publication date
CN207924177U (zh) 2018-09-28
CN111406231A (zh) 2020-07-10
KR20190064738A (ko) 2019-06-11
CN111406231B (zh) 2021-10-22
KR102086843B1 (ko) 2020-03-09

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