WO2020007407A3 - Silberelektrolyt zur abscheidung von dispersions-silberschichten und kontaktoberflächen mit dispersions-silberschichten - Google Patents
Silberelektrolyt zur abscheidung von dispersions-silberschichten und kontaktoberflächen mit dispersions-silberschichten Download PDFInfo
- Publication number
- WO2020007407A3 WO2020007407A3 PCT/DE2019/100596 DE2019100596W WO2020007407A3 WO 2020007407 A3 WO2020007407 A3 WO 2020007407A3 DE 2019100596 W DE2019100596 W DE 2019100596W WO 2020007407 A3 WO2020007407 A3 WO 2020007407A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- silver
- dispersion
- contact surfaces
- depositing
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/16—Apparatus for electrolytic coating of small objects in bulk
- C25D17/22—Apparatus for electrolytic coating of small objects in bulk having open containers
- C25D17/26—Oscillating baskets
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Primary Cells (AREA)
- Secondary Cells (AREA)
Abstract
Die Erfindung betrifft einen Silberelektrolyt zur Abscheidung von Silberschichten auf Substraten, welcher Kaliumsilbercyanid, Kaliumcyanid mit einem Gehalt von mindestens 10 g/L, wenigstens einen Kornverfeinerer mit einem Gehalt von 0,2 bis 10 g/L, wenigstens ein Dispergiermittel mit einem Gehalt von 1 bis 10 g/L und wenigstens einen Feststoffbestandteil mit einem Gehalt von 1 bis 150 g/L umfasst, wobei die Partikel des Feststoffbestandteils eine mittlere Partikelgröße (d50), von 10nm - 100μm aufweisen. Außerdem werden Kontaktoberflächen und Verfahren zur Abscheidung solcher Kontaktoberflächen gezeigt.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP19745553.8A EP3797183A2 (de) | 2018-07-05 | 2019-06-26 | Silberelektrolyt zur abscheidung von dispersions-silberschichten und kontaktoberflächen mit dispersions-silberschichten |
| KR1020217001960A KR102787239B1 (ko) | 2018-07-05 | 2019-06-26 | 분산 은 층의 증착 및 분산 은 층과의 접촉 표면을 위한 은 전해질 |
| CN201980044369.3A CN112368422B (zh) | 2018-07-05 | 2019-06-26 | 用于沉积分散体银层和具有分散体银层的接触表面的银电解质 |
| US17/251,253 US12110606B2 (en) | 2018-07-05 | 2019-06-26 | Silver electrolyte for depositing dispersion silver layers and contact surfaces with dispersion silver layers |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102018005352.1A DE102018005352A1 (de) | 2018-07-05 | 2018-07-05 | Silberelektrolyt zur Abscheidung von Dispersions-Silberschichten und Kontaktoberflächen mit Dispersions-Silberschichten |
| DE102018005352.1 | 2018-07-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2020007407A2 WO2020007407A2 (de) | 2020-01-09 |
| WO2020007407A3 true WO2020007407A3 (de) | 2020-02-27 |
Family
ID=67470367
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/DE2019/100596 Ceased WO2020007407A2 (de) | 2018-07-05 | 2019-06-26 | Silberelektrolyt zur abscheidung von dispersions-silberschichten und kontaktoberflächen mit dispersions-silberschichten |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US12110606B2 (de) |
| EP (1) | EP3797183A2 (de) |
| KR (1) | KR102787239B1 (de) |
| CN (1) | CN112368422B (de) |
| DE (1) | DE102018005352A1 (de) |
| WO (1) | WO2020007407A2 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4060093B1 (de) | 2021-03-17 | 2025-05-21 | Rosenberger Hochfrequenztechnik GmbH & Co. KG | Tribologisch verbesserte oberflächen für elektrische kontakte |
| US11578418B2 (en) * | 2021-03-29 | 2023-02-14 | Rohm And Haas Electronic Materials Llc (Rhem) | Silver electroplating compositions and methods for electroplating silver with low coefficients of friction |
| DE102021118820A1 (de) | 2021-07-21 | 2023-01-26 | Umicore Galvanotechnik Gmbh | Silber-Elektrolyt |
| DE102021207945A1 (de) | 2021-07-23 | 2023-01-26 | Volkswagen Aktiengesellschaft | Verfahren und Vorrichtung zum Detektieren eines kinetosekritischen Zustands eines Fahrzeuginsassen in einem Fahrzeug |
| DE102021130188A1 (de) * | 2021-11-18 | 2023-05-25 | Te Connectivity Germany Gmbh | Verfahren zur oberflächenbehandlung eines elektrischen kontaktlements und kontaktelement |
| CN114197017B (zh) * | 2021-12-08 | 2023-10-20 | 国网江西省电力有限公司电力科学研究院 | 一种复合镀层及其制备方法和应用 |
| DE102023103001A1 (de) * | 2023-02-08 | 2024-08-08 | Te Connectivity Solutions Gmbh | Selbstschmierende Beschichtung, Verfahren zu deren Herstellung und elektrischer Kontakt |
| CN120659911A (zh) * | 2023-03-13 | 2025-09-16 | 同和金属技术有限公司 | 复合材料、复合材料的制造方法、端子及端子的制造方法 |
| GB2628426A (en) * | 2023-03-24 | 2024-09-25 | Preeminent Smart Solutions Ltd | A composition, an audio device, a connector and method of making a connector |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1521025A1 (de) * | 1966-01-05 | 1969-09-04 | Max Schloetter Fabrik F Galvan | Galvanisches Glanzsilberbad |
| DE2543082A1 (de) * | 1975-09-26 | 1977-03-31 | Siemens Ag | Cyanidischer silberelektrolyt zur galvanischen abscheidung von silber-graphit-dispersionsueberzuegen |
| DE3328067A1 (de) * | 1983-08-03 | 1985-02-21 | Siemens AG, 1000 Berlin und 8000 München | Bad und verfahren zum galvanischen abscheiden von edelmetall- und edelmetallhaltigen dispersionsueberzuegen |
| WO1991014808A1 (de) * | 1990-03-28 | 1991-10-03 | Siemens Aktiengesellschaft | Verfahren zum aufbringen von silber-graphit-dispersionsüberzügen |
| CN105297095A (zh) * | 2015-12-14 | 2016-02-03 | 南昌航空大学 | 一种纯银层/银石墨复合层的功能性镀层及制备方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN85100022A (zh) * | 1985-03-28 | 1986-01-10 | 天津大学 | 电沉积耐磨减摩银基复合镀层 |
| CH677934A5 (de) * | 1988-08-25 | 1991-07-15 | Fluehmann Ag Werner | |
| JP2797951B2 (ja) * | 1994-02-22 | 1998-09-17 | 住友金属工業株式会社 | 銀−パラジウム合金めっき方法およびめっき浴 |
| DE10346206A1 (de) | 2003-10-06 | 2005-04-28 | Bosch Gmbh Robert | Kontaktoberflächen für elektrische Kontakte |
| WO2005038985A2 (en) * | 2003-10-16 | 2005-04-28 | Abb Research Ltd. | COATINGS OF Mn+1AXn MATERIAL FOR ELECTRICAL CONTACT ELEMENTS |
| JP2006065107A (ja) * | 2004-08-27 | 2006-03-09 | Fuji Xerox Co Ltd | 静電荷現像用マゼンタトナー、静電荷現像用現像剤、トナーの製造方法及び画像形成方法 |
| JP2007254876A (ja) * | 2006-03-27 | 2007-10-04 | Dowa Holdings Co Ltd | 複合めっき材およびその製造方法 |
| JP5019591B2 (ja) * | 2007-03-29 | 2012-09-05 | 古河電気工業株式会社 | 潤滑性粒子を有するめっき材料、その製造方法およびそれを用いた電気・電子部品 |
| PL2242873T3 (pl) | 2007-12-11 | 2019-02-28 | Macdermid Enthone Inc. | Elektroosadzanie opartych na metalu kompozytowych powłok zawierających nanocząstki |
| DE102008030988B4 (de) * | 2008-06-27 | 2010-04-01 | Siemens Aktiengesellschaft | Bauteil mit einer Schicht, in die CNT (Carbon Nanotubes) eingebaut sind und Verfahren zu dessen Herstellung |
| JP5150016B2 (ja) * | 2009-05-12 | 2013-02-20 | 石原薬品株式会社 | スズ又はスズ合金メッキ浴、及び当該メッキ浴を用いたバレルメッキ方法 |
| JP5943602B2 (ja) * | 2010-12-28 | 2016-07-05 | 三井化学株式会社 | 電気化学セル用アクリル系水分散体および水性ペースト、それからなる電極・電池の製造方法 |
| WO2013074038A1 (en) * | 2011-11-17 | 2013-05-23 | Andre Benny | Electrical contact with embedded solid lubricant particles |
| JP5077479B1 (ja) | 2011-12-15 | 2012-11-21 | オムロン株式会社 | コンタクトおよびこれを用いた電子部品 |
| EP2634293B1 (de) * | 2012-03-02 | 2018-07-18 | Rohm and Haas Electronic Materials, L.L.C. | Verbundstoffe aus russschwarz und metall |
| WO2014144180A1 (en) | 2013-03-15 | 2014-09-18 | Enthone Inc. | Electrodeposition of silver with fluoropolymer nanoparticles |
| DE102014110651B3 (de) * | 2014-07-29 | 2015-07-09 | Harting Kgaa | Galvanisches Bad zur Abscheidung einer Silberschicht mit Nanopartikeln und Kontaktelement für einen Steckverbinder |
| US9702045B2 (en) * | 2015-07-06 | 2017-07-11 | Carbodeon Ltd Oy | Metallic coating and a method for producing the same |
| CN106367785A (zh) * | 2016-09-21 | 2017-02-01 | 南昌航空大学 | 一种无氰银石墨烯复合镀层及制备方法 |
| CN106637785B (zh) | 2016-12-12 | 2019-07-02 | 杨可克 | 一种外挂式拉链整烫定型机及外挂式拉链整烫一体机 |
-
2018
- 2018-07-05 DE DE102018005352.1A patent/DE102018005352A1/de active Pending
-
2019
- 2019-06-26 KR KR1020217001960A patent/KR102787239B1/ko active Active
- 2019-06-26 WO PCT/DE2019/100596 patent/WO2020007407A2/de not_active Ceased
- 2019-06-26 US US17/251,253 patent/US12110606B2/en active Active
- 2019-06-26 CN CN201980044369.3A patent/CN112368422B/zh active Active
- 2019-06-26 EP EP19745553.8A patent/EP3797183A2/de active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1521025A1 (de) * | 1966-01-05 | 1969-09-04 | Max Schloetter Fabrik F Galvan | Galvanisches Glanzsilberbad |
| DE2543082A1 (de) * | 1975-09-26 | 1977-03-31 | Siemens Ag | Cyanidischer silberelektrolyt zur galvanischen abscheidung von silber-graphit-dispersionsueberzuegen |
| DE3328067A1 (de) * | 1983-08-03 | 1985-02-21 | Siemens AG, 1000 Berlin und 8000 München | Bad und verfahren zum galvanischen abscheiden von edelmetall- und edelmetallhaltigen dispersionsueberzuegen |
| WO1991014808A1 (de) * | 1990-03-28 | 1991-10-03 | Siemens Aktiengesellschaft | Verfahren zum aufbringen von silber-graphit-dispersionsüberzügen |
| CN105297095A (zh) * | 2015-12-14 | 2016-02-03 | 南昌航空大学 | 一种纯银层/银石墨复合层的功能性镀层及制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US12110606B2 (en) | 2024-10-08 |
| EP3797183A2 (de) | 2021-03-31 |
| WO2020007407A2 (de) | 2020-01-09 |
| US20210254230A1 (en) | 2021-08-19 |
| KR102787239B1 (ko) | 2025-03-27 |
| DE102018005352A1 (de) | 2020-01-09 |
| KR20210025599A (ko) | 2021-03-09 |
| CN112368422B (zh) | 2024-11-19 |
| CN112368422A (zh) | 2021-02-12 |
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