WO2024199902A1 - Moteur électromagnétique et procédé de détermination d'une constante de moteur dépendant d'une position pour un moteur électromagnétique - Google Patents

Moteur électromagnétique et procédé de détermination d'une constante de moteur dépendant d'une position pour un moteur électromagnétique Download PDF

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Publication number
WO2024199902A1
WO2024199902A1 PCT/EP2024/055645 EP2024055645W WO2024199902A1 WO 2024199902 A1 WO2024199902 A1 WO 2024199902A1 EP 2024055645 W EP2024055645 W EP 2024055645W WO 2024199902 A1 WO2024199902 A1 WO 2024199902A1
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WO
WIPO (PCT)
Prior art keywords
electromagnetic motor
motor
coil assembly
disturbance
electromagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2024/055645
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English (en)
Inventor
Maurice Leonardus Josephina VAN DE VEN
Geert-Jan Martin HELDENS
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Priority to CN202480021638.5A priority Critical patent/CN120917656A/zh
Priority to JP2025550898A priority patent/JP2026511387A/ja
Publication of WO2024199902A1 publication Critical patent/WO2024199902A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P23/00—Arrangements or methods for the control of AC motors characterised by a control method other than vector control
    • H02P23/14—Estimation or adaptation of motor parameters, e.g. rotor time constant, flux, speed, current or voltage
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P6/00—Arrangements for controlling synchronous motors or other dynamo-electric motors using electronic commutation dependent on the rotor position; Electronic commutators therefor
    • H02P6/006—Controlling linear motors

Definitions

  • the present invention relates to an electromagnetic motor, in particular an electromagnetic motor as can be applied in a lithographic apparatus, e.g. to displace or position a patterning device or a substrate.
  • a lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate.
  • a lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • a lithographic apparatus may, for example, project a pattern (also often referred to as “design layout” or “design”) of a patterning device (e.g., a mask) onto a layer of radiation- sensitive material (resist) provided on a substrate (e.g., a wafer).
  • a lithographic apparatus may use electromagnetic radiation.
  • the wavelength of this radiation determines the minimum size of features which are patterned on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm and 13.5 nm.
  • a lithographic apparatus which uses extreme ultraviolet (EUV) radiation, having a wavelength within a range of 4 nm to 20 nm, for example 6.7 nm or 13.5 nm, may be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm.
  • EUV extreme ultraviolet
  • an electromagnetic motor comprising: a magnet assembly configured to generate a magnetic field; a coil assembly comprising at least one coil; the coil assembly being configured to cooperate with the magnet assembly so as to cause a movement of the magnet assembly relative to the coil assembly in a direction of movement; a power supply configured to, during use, power the coil assembly; a control unit configured to: o control the power supply to supply the coil assembly with an electric current so as to cause a displacement of the magnet assembly relative to the coil assembly along a predetermined trajectory of interest in the direction of movement, at a substantially constant velocity; o apply a disturbance having a predetermined frequency to the electromagnetic motor, during the displacement of the magnet assembly relative to the coil assembly; o determine a position of the magnet assembly relative to the coil assembly and an electromagnetic motor force, along the predetermined trajectory of interest; o determine a position dependent motor constant of the electromagnetic motor along the predetermined trajectory of interest, based on the determined position and the electromagnetic motor force.
  • a stage apparatus for use in a lithographic apparatus, the stage comprising an electromagnetic motor according to the invention.
  • the stage apparatus may e.g. be configured to hold a patterning device or a substrate.
  • a lithographic apparatus comprising the stage apparatus according to the invention.
  • a method of determining a position dependent motor constant of an electromagnetic motor comprising a magnet assembly and a coil assembly that are configured to displace relative to each other in a direction of movement, the method comprising: causing a displacement of the magnet assembly relative to the coil assembly along a predetermined trajectory of interest in the direction of movement, at a substantially constant velocity; applying a disturbance having a predetermined frequency to the electromagnetic motor, during the displacement of the magnet assembly relative to the coil assembly; determining a position error of the magnet assembly relative to the coil assembly and an electromagnetic motor force, along the predetermined trajectory of interest; determining a position dependent motor constant of the electromagnetic motor along the predetermined trajectory of interest, based on the determined position error and the electromagnetic motor force.
  • Figure 1 depicts a schematic overview of a lithographic apparatus
  • Figure 2 depicts a detailed view of a part of the lithographic apparatus of Figure 1;
  • Figure 3 schematically depicts a position control system
  • Figure 4 depicts a first electromagnetic motor according to the invention
  • Figure 5 depicts a second electromagnetic motor according to the invention
  • Figure 6 schematically illustrates the variation of the motor constant along a trajectory Y1 - Y2;
  • Figure 7 schematically depicts a position control system as can be applied in the present invention
  • Figure 8 schematically depicts a flowchart of the method according to the invention.
  • Figure 9 schematically depicts a position control system as can be applied in the present invention, including possible locations to insert a disturbance
  • Figure 10 schematically illustrates various ways to determine an amplitude of an alternating signal.
  • the terms “radiation” and “beam” are used to encompass all types of electromagnetic radiation, including ultraviolet radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range of about 5-100 nm).
  • the term “reticle”, “mask” or “patterning device” as employed in this text may be broadly interpreted as referring to a generic patterning device that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate.
  • the term “light valve” can also be used in this context. Besides the classic mask (transmissive or reflective, binary, phase-shifting, hybrid, etc.), examples of other such patterning devices include a programmable mirror array and a programmable LCD array.
  • FIG. 1 schematically depicts a lithographic apparatus LA.
  • the lithographic apparatus LA includes an illumination system (also referred to as illuminator) IL configured to condition a radiation beam B (e.g., UV radiation, DUV radiation or EUV radiation), a mask support (e.g., a mask table) MT constructed to support a patterning device (e.g., a mask) MA and connected to a first positioner PM configured to accurately position the patterning device MA in accordance with certain parameters, a substrate support (e.g., a wafer table) WT constructed to hold a substrate (e.g., a resist coated wafer) W and connected to a second positioner PW configured to accurately position the substrate support in accordance with certain parameters, and a projection system (e.g., a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g., comprising one or more dies) of the substrate W.
  • the illumination system IL receives a radiation beam from a radiation source SO, e.g. via a beam delivery system BD.
  • the illumination system IL may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, and/or other types of optical components, or any combination thereof, for directing, shaping, and/or controlling radiation.
  • the illuminator IL may be used to condition the radiation beam B to have a desired spatial and angular intensity distribution in its cross section at a plane of the patterning device MA.
  • projection system PS used herein should be broadly interpreted as encompassing various types of projection system, including refractive, reflective, catadioptric, anamorphic, magnetic, electromagnetic and/or electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, and/or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may be considered as synonymous with the more general term “projection system” PS.
  • the lithographic apparatus LA may be of a type wherein at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so as to fill a space between the projection system PS and the substrate W - which is also referred to as immersion lithography. More information on immersion techniques is given in US6952253, which is incorporated herein by reference.
  • the lithographic apparatus LA may also be of a type having two or more substrate supports WT (also named “dual stage”).
  • the substrate supports WT may be used in parallel, and/or steps in preparation of a subsequent exposure of the substrate W may be carried out on the substrate W located on one of the substrate support WT while another substrate W on the other substrate support WT is being used for exposing a pattern on the other substrate W.
  • the lithographic apparatus LA may comprise a measurement stage.
  • the measurement stage is arranged to hold a sensor and/or a cleaning device.
  • the sensor may be arranged to measure a property of the projection system PS or a property of the radiation beam B.
  • the measurement stage may hold multiple sensors.
  • the cleaning device may be arranged to clean part of the lithographic apparatus, for example a part of the projection system PS or a part of a system that provides the immersion liquid.
  • the measurement stage may move beneath the projection system PS when the substrate support WT is away from the projection system PS.
  • the radiation beam B is incident on the patterning device, e.g. mask, MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA. Having traversed the patterning device MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W. With the aid of the second positioner PW and a position measurement system IF, the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at a focused and aligned position.
  • the patterning device e.g. mask, MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA.
  • the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W.
  • the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at
  • first positioner PM and possibly another position sensor may be used to accurately position the patterning device MA with respect to the path of the radiation beam B.
  • Patterning device MA and substrate W may be aligned using mask alignment marks Ml, M2 and substrate alignment marks Pl, P2.
  • substrate alignment marks Pl, P2 as illustrated occupy dedicated target portions, they may be located in spaces between target portions.
  • Substrate alignment marks Pl, P2 are known as scribe-lane alignment marks when these are located between the target portions C.
  • a Cartesian coordinate system is used.
  • the Cartesian coordinate system has three axis, i.e., an x-axis, a y-axis and a z-axis. Each of the three axis is orthogonal to the other two axis.
  • a rotation around the x-axis is referred to as an Rx-rotation.
  • a rotation around the y- axis is referred to as an Ry-rotation.
  • a rotation around about the z-axis is referred to as an Rz-rotation.
  • the x-axis and the y-axis define a horizontal plane, whereas the z-axis is in a vertical direction.
  • Cartesian coordinate system is not limiting the invention and is used for clarification only. Instead, another coordinate system, such as a cylindrical coordinate system, may be used to clarify the invention.
  • the orientation of the Cartesian coordinate system may be different, for example, such that the z-axis has a component along the horizontal plane.
  • FIG. 2 shows a more detailed view of a part of the lithographic apparatus LA of Figure 1.
  • the lithographic apparatus LA may be provided with a base frame BF, a balance mass BM, a metrology frame MF and a vibration isolation system IS.
  • the metrology frame MF supports the projection system PS. Additionally, the metrology frame MF may support a part of the position measurement system PMS of Figure 1.
  • the metrology frame MF is supported by the base frame BF via the vibration isolation system IS.
  • the vibration isolation system IS is arranged to prevent or reduce vibrations from propagating from the base frame BF to the metrology frame MF.
  • the second positioner PW is arranged to accelerate the substrate support WT by providing a driving force between the substrate support WT and the balance mass BM.
  • the driving force accelerates the substrate support WT in a desired direction. Due to the conservation of momentum, the driving force is also applied to the balance mass BM with equal magnitude, but at a direction opposite to the desired direction.
  • the mass of the balance mass BM is significantly larger than the masses of the moving part of the second positioner PW and the substrate support WT.
  • the second positioner PW is supported by the balance mass BM.
  • the second positioner PW comprises a planar motor to levitate the substrate support WT above the balance mass BM.
  • the second positioner PW is supported by the base frame BF.
  • the second positioner PW comprises a linear motor and wherein the second positioner PW comprises a bearing, like a gas bearing, to levitate the substrate support WT above the base frame BF.
  • the position measurement system PMS may comprise any type of sensor that is suitable to determine a position of the substrate support WT.
  • the position measurement system PMS may comprise any type of sensor that is suitable to determine a position of the mask support MT.
  • the sensor may be an optical sensor such as an interferometer or an encoder.
  • the position measurement system PMS may comprise a combined system of an interferometer and an encoder.
  • the sensor may be another type of sensor, such as a magnetic sensor, a capacitive sensor or an inductive sensor.
  • the position measurement system PMS may determine the position relative to a reference, for example the metrology frame MF or the projection system PS.
  • the position measurement system PMS may determine the position of the substrate table WT and/or the mask support MT by measuring the position or by measuring a time derivative of the position, such as velocity or acceleration.
  • the position measurement system PMS may comprise an encoder system.
  • An encoder system is known from for example, United States patent application US2007/0058173A1, filed on September 7, 2006, hereby incorporated by reference.
  • the encoder system comprises an encoder head, a grating and a sensor.
  • the encoder system may receive a primary radiation beam and a secondary radiation beam. Both the primary radiation beam as well as the secondary radiation beam originate from the same radiation beam, i.e., the original radiation beam. At least one of the primary radiation beam and the secondary radiation beam is created by diffracting the original radiation beam with the grating.
  • the encoder system optically combines the primary radiation beam and the secondary radiation beam into a combined radiation beam.
  • a sensor in the encoder head determines a phase or phase difference of the combined radiation beam.
  • the sensor generates a signal based on the phase or phase difference.
  • the signal is representative of a position of the encoder head relative to the grating.
  • One of the encoder head and the grating may be arranged on the substrate structure WT.
  • the other of the encoder head and the grating may be arranged on the metrology frame MF or the base frame BF.
  • a plurality of encoder heads are arranged on the metrology frame MF, whereas a grating is arranged on a top surface of the substrate support WT.
  • a grating is arranged on a bottom surface of the substrate support WT, and an encoder head is arranged below the substrate support WT.
  • the position measurement system PMS may comprise an interferometer system.
  • An interferometer system is known from, for example, United States patent US6,020,964, filed on July 13, 1998, hereby incorporated by reference.
  • the interferometer system may comprise a beam splitter, a mirror, a reference mirror and a sensor.
  • a beam of radiation is split by the beam splitter into a reference beam and a measurement beam.
  • the measurement beam propagates to the mirror and is reflected by the mirror back to the beam splitter.
  • the reference beam propagates to the reference mirror and is reflected by the reference mirror back to the beam splitter.
  • the measurement beam and the reference beam are combined into a combined radiation beam.
  • the combined radiation beam is incident on the sensor.
  • the sensor determines a phase or a frequency of the combined radiation beam.
  • the sensor generates a signal based on the phase or the frequency.
  • the signal is representative of a displacement of the mirror.
  • the mirror is connected to the substrate support WT.
  • the reference mirror may be connected to the metrology frame MF.
  • the measurement beam and the reference beam are combined into a combined radiation beam by an additional optical component instead of the beam splitter.
  • the first positioner PM may comprise a long-stroke module and a short-stroke module.
  • the short-stroke module is arranged to move the mask support MT relative to the long-stroke module with a high accuracy over a small range of movement.
  • the long-stroke module is arranged to move the shortstroke module relative to the projection system PS with a relatively low accuracy over a large range of movement.
  • the first positioner PM is able to move the mask support MT relative to the projection system PS with a high accuracy over a large range of movement.
  • the second positioner PW may comprise a long- stroke module and a short-stroke module.
  • the short-stroke module is arranged to move the substrate support WT relative to the long-stroke module with a high accuracy over a small range of movement.
  • the long-stroke module is arranged to move the short-stroke module relative to the projection system PS with a relatively low accuracy over a large range of movement.
  • the second positioner PW is able to move the substrate support WT relative to the projection system PS with a high accuracy over a large range of movement.
  • the first positioner PM and the second positioner PW each are provided with an electromagnetic motor to move respectively the mask support MT and the substrate support WT.
  • the electromagnetic motor may be a linear motor to provide a driving force along a single axis, for example the y-axis.
  • the motor may be a planar motor to provide a driving force along multiple axis.
  • the planar motor may be arranged to move the substrate support WT in 6 degrees of freedom.
  • the electromagnetic motor may be an electromagnetic actuator comprising at least one coil and at least one magnet.
  • the actuator is arranged to move the at least one coil relative to the at least one magnet by applying an electrical current to the at least one coil.
  • the actuator may be a moving-magnet type actuator, which has the at least one magnet coupled to the substrate support WT respectively to the mask support MT.
  • the actuator may be a moving-coil type actuator which has the at least one coil coupled to the substrate support WT respectively to the mask support MT.
  • the electromagnetic actuator may be a voice-coil actuator, a reluctance actuator, a Lorentz -actuator or a piezo-actuator, or any other suitable actuator.
  • the lithographic apparatus LA comprises a position control system PCS as schematically depicted in Figure 3.
  • the position control system PCS comprises a setpoint generator SP, a feedforward controller FF and a feedback controller FB.
  • the position control system PCS provides a drive signal to the plant / motor combination P-EM / P.
  • the plant / motor combination comprises an electromagnetic motor EM, which may be the motor of the first positioner PM or the second positioner PW.
  • the motor EM of the plant / motor combination P-EM drives the plant P, which may comprise the substrate support WT or the mask support MT.
  • the plant P may also be referred to as the load that is driven by the motor.
  • An output of the plant / motor combination P-EM is a position quantity such as position or velocity or acceleration of the plant.
  • the position quantity is measured with the position measurement system PMS.
  • the position measurement system PMS generates a signal, which is a position signal representative of the position quantity of the plant P.
  • the setpoint generator SP generates a signal, which is a reference signal representative of a desired position quantity of the plant P.
  • the reference signal represents a desired trajectory of the substrate support WT.
  • a difference between the reference signal and the position signal forms an input for the feedback controller FB.
  • the feedback controller FB Based on the input, the feedback controller FB provides at least part of the drive signal for the electromagnetic motor EM of the plant / motor combination P-EM.
  • the reference signal may form an input for the feedforward controller FF.
  • the feedforward controller FF Based on the input, the feedforward controller FF provides at least part of the drive signal for the motor EM of the plant / motor combination.
  • the feedforward FF may make use of information about dynamical characteristics of the plant P, such as mass, stiffness, resonance modes and eigenfrequencies.
  • the present invention aims to improve the performance of the electromagnetic motors or actuators that are applied in a lithographic apparatus, e.g. the motors as applied in the above mentioned long-stroke or short-stroke modules.
  • FIG. 4 schematically shows a first example of an electromagnetic motor 400 according to the present invention.
  • the electromagnetic motor 400 comprises a magnet assembly 410 and a coil assembly 420.
  • the magnet assembly 410 as shown comprises two magnetic yokes 410.1 which are provided with permanent magnets 410.2.
  • the coil assembly 420 as shown comprises a single coil which can carry an electric current in a direction perpendicular to the plane of the drawing. When supplied with such a current, a force will be generated between the magnet assembly 410 and the coil assembly 420, the force acting in the indicated X-direction. Said force can cause a movement of the coil assembly 410 relative to the magnet assembly 420 in said direction, which is therefore also referred to as the direction of movement of the electromagnetic actuator 400.
  • the coil assembly 420 may also have multiple coils.
  • the electromagnetic motor 400 further comprises a power supply 430 for powering the coil assembly.
  • the power supply 430 can e.g. be configured to supply a current, indicated by the dotted line 430.1, to the coil or coils of the coil assembly 410 of the electromagnetic motor 400.
  • the electromagnetic motor 400 further comprises a control unit 440 that is configured to control the power supply 430 of the electromagnetic motor 400.
  • the control unit is configured to control the electromagnetic motor in a particular manner, in order to determine a position dependent motor constant of the electromagnetic motor along a trajectory of interest in the direction of movement.
  • the trajectory of interest can e.g. correspond to a certain stroke of the electromagnetic motor as shown.
  • control unit of the electromagnetic motor according to the present invention can include a position control system as illustrated in Figure 3.
  • control unit 440 of the electromagnetic motor according to the present invention may be configured to receive one or more input signals such as position measurement signals or setpoint signals and may be configured to output one or more control signals to control the electromagnetic motor.
  • control unit 440 of the electromagnetic motor according to the present invention is configured to perform the following actions.
  • the control unit 440 of the electromagnetic motor 400 is configured to control the power supply 430, indicated by control signal 440.1, to supply the coil assembly 410 with an electric current so as to cause a displacement of the magnet assembly relative to the coil assembly along a predetermined trajectory of interest in the direction of movement, at a substantially constant velocity.
  • the control unit 440 may be configured to generate a required position set point to achieve the displacement.
  • the control unit 440 may include a setpoint generator similar to setpoint generator SP as described above.
  • the control unit 440 may receive a setpoint signal 440.2 from an external setpoint generator.
  • the control unit 440 is configured to apply a disturbance having a predetermined frequency to the electromagnetic motor 400, during the displacement of the magnet assembly relative to the coil assembly.
  • a disturbance having a predetermined frequency
  • control unit 440 is configured to determine a position of the magnet assembly relative to the coil assembly and an electromagnetic motor force, along the trajectory of interest.
  • control unit 440 may be connected to a position measurement system such as the system PMS shown in Figure 3, which can be configured to measure a position of the coil assembly 420 and/or the magnet assembly 410, so as to obtain a position measurement signal of the coil assembly and/or the magnet assembly.
  • the exemplary electromagnetic motor 400 shown in Figure 4 may also be referred to as an electromagnetic actuator or a linear actuator or Lorentz actuator.
  • Such an electromagnetic motor or actuator typically has a comparatively small stroke.
  • use can e.g. be made of electromagnetic motors having coil assemblies with an array of coils and magnet assemblies with an array of magnets.
  • Figure 5 schematically shows an electromagnetic motor 500 according to the present invention which is capable of a comparatively large displacement of the coil assembly relative to the magnet assembly.
  • Figure 5 (a) schematically shows a cross-section of the motor 500 showing a magnet assembly 510 comprising an array of magnets 510.1, e.g. permanent magnets, arranged on a magnetic yoke 510.2, e.g. a ferromagnetic yoke or the like.
  • the motor 500 further comprises a coil assembly 520, comprising an array of coils 520.2 arranged in the indicated Y-direction and mounted to a holder 520.1.
  • the array of magnets 510.1 is configured to generate, during use, a spatially alternating magnetic field along the indicated Y-direction, which can also be referred to as the direction of movement since, during use, a movement of the coil assembly 520 relative to the magnet assembly 510 in the direction of movement can be established, when a suitable set of electric currents is supplied to the array of coils 520.2 of the coil assembly 520.
  • the electromagnetic motor 500 further includes a power supply and a control unit for powering and controlling the coil assembly 520 of the electromagnetic motor 500. These components are not shown in Figure 5.
  • Figures 5 (b) and 5 (c) schematically show the electromagnetic motor 500 for two different positions of the coil assembly 520 relative to the magnet assembly 510 of the motor.
  • the coil assembly 520 is at a left most position, relative to the magnet assembly 510 along the direction of movement
  • the coil assembly 520 is at a right most position, relative to the magnet assembly 510 along the direction of movement.
  • the range or stroke Y1 - Y2 can be considered to be the useful operating range of the motor, or the trajectory of interest in the direction of movement.
  • Figure 6 schematically indicates a motor constant K as a function of the relative position (Y) between a coil assembly and a magnet assembly of a motor such as electromagnetic motor 500.
  • the motor constant K(y) may vary between a value Kmin and a value Kmax along the range Y1 - Y2 which may be a range similar to the range as indicated in Figure 5.
  • the motor constant variation as perceived may have different causes such as manufacturing tolerances of the magnet assembly, the applied magnets, the coils of the array of coils and the coil assembly.
  • the motor constant variation as perceived will typically also comprise periodic components which may e.g. be associated with a magnetic pitch of the array of magnets of the magnet assembly of the motor.
  • FIG. 7 schematically shows a more detailed position control scheme as can be applied to control an electromagnetic motor according to the invention, e.g. to control a stage apparatus in a lithographic apparatus.
  • the control scheme in particular the position control scheme PCS can e.g. be implemented in a control unit of an electromagnetic motor according to the invention.
  • the control scheme as shown in Figure 7 is similar to the control scheme of Figure 3, apart from the following.
  • the plant motor combination P-EM(y) has been further detailed, to illustrate that the electromagnetic motor as applied in the plant motor combination may have a position dependent motor constant, i.e. a motor constant depending on the y-position of the plant motor combination.
  • the plant motor combination can be considered to be a system or component which converts a force into an acceleration which then causes a displacement along the direction of movement.
  • the plant motor combination may be characterised by a nominal motor constant Km nom , which is a singular value. Due to the aforementioned effects, the actual motor constant will not be constant but will be a function of the position y in the direction of movement. This is indicated in the detailed plant / motor combination P-EM of Figure 7 as Km(y).
  • the output of block Km(y) in Figure 7 thus represents the actual force as generated by the motor, which is used to accelerate the load, which is represented by a mass m.
  • the output of the P-EM(y) block thus corresponds to the displacement y of the plant or load that is driven.
  • the output of the position control system PCS corresponds to, as mentioned above, a drive signal for the P-EM(y) combination.
  • the drive signal is the combination of the outputs of the feedforward controller FF and the feedback controller FB.
  • the drive signal, indicated by reference number 710 would be considered the desired driving force or desired motor force for driving the plant to the desired position indicated by the setpoint generator.
  • this drive signal would not result in the desired acceleration or displacement of the plant.
  • Km(y) would be known in advance, a correction could be applied to the drive signal, in such manner that the desired control of the plant is obtained.
  • said correction is indicated as K rcp (y), which is thus a position dependent correction or adjustment which can be applied to the generated drive signal 710.
  • an adjusted drive signal 720 can thus be obtained, which takes account of the position dependent motor constant Km(y).
  • a method is disclosed which enables to determine the position dependent motor constant K m (y), and thus the required correction or adjustment K rcp (y) to take the position dependency into account. This method of determining a position dependent motor constant, which can also be considered a type of calibration method of the electromagnetic motor, is schematically illustrated in the flowchart of Figure 8.
  • the method of determining a position dependent motor constant comprises a first step 810 of causing a displacement of the magnet assembly of the electromagnetic motor relative to the coil assembly of the electromagnetic motor along a predetermined trajectory of interest in the direction of movement, at a substantially constant velocity.
  • said first step can e.g. be implemented in practice by means of a control unit of the electromagnetic motor, the control unit being configured to control a power supply of the electromagnetic motor, as e.g. described above with reference to Figure 4.
  • the trajectory of interest can e.g. be a range of motion of the electromagnetic motor, e.g. the range Y1 - Y2 illustrated in Figures 5 and 6.
  • the method of determining a position dependent motor constant according to the present invention further comprises a second step 820 of applying a disturbance having a predetermined frequency, that exposes the plant’s mass behavior, to the electromagnetic motor, during the displacement of the magnet assembly relative to the coil assembly.
  • a disturbance having a predetermined frequency that exposes the plant’s mass behavior, to the electromagnetic motor, during the displacement of the magnet assembly relative to the coil assembly.
  • the frequency of the disturbance should be within the range where the plant or load shows mass behavior, i.e. 1/ms 2 , having a -2 slope in magnitude.
  • the method of determining a position dependent motor constant further comprises a third step 830 of determining a position of the magnet assembly relative to the coil assembly and an electromagnetic motor force, along the predetermined trajectory of interest.
  • the position of the magnet assembly relative to the coil assembly may e.g. be determined using a position measurement system such as the indicated PMS system.
  • the method of determining a position dependent motor constant according to the present invention further comprises a fourth step 840 determining a position dependent motor constant of the electromagnetic motor along the predetermined trajectory of interest, based on the determined position error and the electromagnetic motor force.
  • the electromagnetic motor force may, in an embodiment of the present invention, be equated to the drive signal 710 as generated by the position control system PCS.
  • the disturbance as mentioned in step 820 of the method of determining a position dependent motor constant according to the present invention can be implemented in the position control system or control unit as applied to control the electromagnetic motor which motor constant is to be determined.
  • Figure 9 schematically illustrates a position control scheme similar to the scheme of Figure 7, apart from the position dependent correction or adjustment K rcp (y), which is to be determined.
  • the disturbance of step 820 of the method according to the invention can be injected or superimposed to the drive signal as generated by the position control system PCS.
  • this is indicated by the arrow 910.
  • the drive signal i.e. the combination of the outputs of the feedforward controller FF and the feedback controller FB which represent a desired drive force or desired motor force is combined with a disturbance indicated by the arrow 910.
  • the disturbance can thus be considered a disturbance force or force component that is added to the drive signal outputted by the PCS.
  • Such a disturbance force is further on referred as disturbance force F_dist(y).
  • the disturbance of step 820 of the method according to the invention can be injected or superimposed to the setpoint that is used by the PCS.
  • the setpoint generator SP may be configured to generate a setpoint to perform the displacement along the predetermined trajectory of interest that is mentioned in step 810 of the method according to the invention.
  • a disturbance, indicated by the arrow 920 may thus be added to said setpoint.
  • the disturbance can thus be considered a positional disturbance that is added to the setpoint.
  • the disturbance of step 820 of the method according to the invention can be injected or superimposed to the position error determined by the PCS.
  • the position error is obtained by the difference between the setpoint of the setpoint generator SP and the y-position as determined by the position measurement system PMS. Said position error is inputted in the feedback controller FB.
  • a disturbance, indicated by the arrow 930, may be injected or superimposed to said position error.
  • the disturbance can thus be considered a positional disturbance that is added to the position error.
  • the position error is further on referred to as e(y).
  • the disturbance of step 820 of the method according to the invention may be implemented as an actual disturbance force that is applied to the electromagnetic motor that is calibrated. This can e.g. be done by applying a disturbance force to either the stator or the mover of the electromagnetic motor in case both are displaceable. In case the stator is mounted to a rigid construction, the disturbance force may be applied to the mover.
  • electromagnetic motors such as the motor shown in Figure 5 may be applied in a long-stroke module, as e.g. discussed above.
  • Such a long-stroke module may also comprise a short-stroke module e.g. comprising one or more actuators configured to position an object table.
  • one or more of said actuators of a short-stroke module may be used to cause a disturbance force on the electromagnetic motor of the long-stroke module.
  • the disturbance as applied is a substantially sinusoidal disturbance having a predetermined frequency.
  • the method of determining a position dependent motor constant according to the present invention in particular the step 840 of the method can be implemented as follows.
  • an electromagnetic motor used for driving a plant or object such as an object table will have a position dependent motor constant which can be described by K m (y).
  • Km(y) may be expressed as:
  • K rcp (y) can easily be derived.
  • the position dependent motor constant and thus also the compensation, can be determined by determining the transfer function P-EM(y) shown in Figures 7 and 9.
  • the electromagnet motor In order to determine the position dependent motor constant, along a predetermined trajectory of interest, the electromagnet motor is displaced along the trajectory at a substantially constant velocity. During said displacement, a disturbance having a predetermined frequency, e.g. a sinusoidally varying disturbance, is applied to the motor. During said displacement, various characteristics can be traced. In particular the position of the magnet assembly relative to the coil assembly and the electromagnetic motor force F_act(y) are to be traced, as a function of the displacement, i.e. along the trajectory of interest. Other variables that can be traced during the displacement along the trajectory of interest are the position error e and the applied disturbance, e.g.
  • the disturbance force F_dist(y) Due to the nature of the applied disturbance, the electromagnetic motor force and the error e, as well as the disturbance force are alternating signals or traces. In order to determine the transfer function P-EM(y), only the amplitudes of said traced variables are required.
  • the transfer function P-EM(y) can be determined as follows: the transfer function P-EM(y) be determined based on the process sensitivity PS(y) and the sensitivity S(y) of the process. In particular:
  • e(y) is the amplitude of the position error e along the predetermined trajectory
  • F_dist(y) is the amplitude of the disturbance force as applied during the displacement along the predetermined trajectory
  • F_act(y) is the amplitude of the actuator force as applied during the displacement along the predetermined trajectory.
  • the transfer function P-EM(y), and thus the position dependent motor constant as e.g. given by equation (1) can be derived from the position error e and from the actuator force F_act(y).
  • position error e can easily be obtained as the difference between the actual position y, as e.g. measured by the PMS system shown in Figures 7 and 9 and the setpoint obtained from the setpoint generator SP.
  • the position error, the disturbance force and the electromagnetic motor force are typically alternating signals.
  • the amplitude of such signals can e.g. be determined using a fitting algorithm or similar methods. Such methods are schematically explained with reference to Figure 10.
  • Figure 10 schematically shows a signal S, which can e.g. correspond to the actual position y as measured, the position error e, the disturbance force or the electromagnetic motor force along the trajectory of interest. Note that it is assumed that the displacement along the trajectory of interest is a displacement at a substantially constant speed, the indicated signal S also corresponds to the signal as obtained over time, i.e. during the constant speed displacement.
  • a first method to derive the amplitude of the signal S is to perform a fitting of the signal with a sinusoidal signal spanning one or more periods of the signal S. Note that the period of the signal S is known since it will correspond to the period of the disturbance force, which has a predetermined frequency.
  • window 1000 spans 3 periods of the signal S.
  • the signal S can be fitted to a sinusoidal signal M(y) spanning the same period as the window 1000.
  • the signal M(y) can be considered a sinusoidal signal with unknown amplitude and phase, optionally with an unknown offset and an unknown slope.
  • a general expression of M(y) would thus be:
  • the parameters Ai - A4 can be obtained, whereby Al can then be considered to correspond to the amplitude of the signal S over the window 1000. This process can then be repeated for an adjacent window until the amplitude of the signal S is obtained across the desired trajectory of interest. Note that by the first method as illustrated one would obtain one value for the amplitude of the signal S over the window 1000. In order to obtain a more dense or detailed dataset for the amplitude of the signal S, the window 1000 can be made more narrow, e.g. spanning only one period. Alternatively or in addition, the sequency of windows that is applied can be overlapping.
  • a second method to obtain the amplitude of the signal S would be to determine the maxima and minima of the signal S. For a portion of the signal S, these maxima and minima are indicated by resp. MAX and MIN in Figure 10.
  • a polynomial, or the like fitting through the maxima and the minima, resulting in polynomials Pmax and Pmin. Subtracting Pmin from Pmax would then result in the amplitude of the signal S.
  • a third method to obtain the amplitude of the signal S which can be considered a simplified version of the second method, is illustrated on the right of Figure 10.
  • a line L is constructed between two adjacent maxima of the signal.
  • the amplitude of the signal S at the minimum between the two adjacent maxima can then be construed as the distance D between said minimum and the line.
  • the transfer function P-EM(y) can be determined, as well as the correction K rcp (y).
  • the correction K rcp (y) is subsequently implemented in a position control system or control unit of an electromagnetic motor, a more accurate positioning or displacement of the load or plant that is driven by the motor can be obtained.
  • the electromagnetic motor according to the invention may advantageously be applied to drive a stage of a lithographic apparatus.
  • the electromagnetic motor according to the invention may also be applied to drive other components in a lithographic apparatus as well, such as e.g. a reticle masking device.
  • the electromagnetic motor according to the invention may also be applied outside the field of lithography.
  • specific reference may be made in this text to the use of a lithographic apparatus in the manufacture of ICs, it should be understood that the lithographic apparatus described herein may have other applications. Possible other applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquidcrystal displays (LCDs), thin-film magnetic heads, etc.
  • Embodiments of the invention may form part of a mask inspection apparatus, a metrology apparatus, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device). These apparatus may be generally referred to as lithographic tools. Such a lithographic tool may use vacuum conditions or ambient (non-vacuum) conditions.
  • embodiments of the invention may be implemented in hardware, firmware, software, or any combination thereof. Embodiments of the invention may also be implemented as instructions stored on a machine-readable medium, which may be read and executed by one or more processors.
  • a machine -readable medium may include any mechanism for storing or transmitting information in a form readable by a machine (e.g., a computing device).
  • a machine -readable medium may include read only memory (ROM); random access memory (RAM); magnetic storage media; optical storage media; flash memory devices; electrical, optical, acoustical or other forms of propagated signals (e.g. carrier waves, infrared signals, digital signals, etc.), and others.
  • firmware, software, routines, instructions may be described herein as performing certain actions. However, it should be appreciated that such descriptions are merely for convenience and that such actions in fact result from computing devices, processors, controllers, or other devices executing the firmware, software, routines, instructions, etc. and in doing that may cause actuators or other devices to interact with the physical world.
  • An electromagnetic motor comprising: a magnet assembly configured to generate a magnetic field; a coil assembly comprising at least one coil; the coil assembly being configured to cooperate with the magnet assembly so as to cause a movement of the magnet assembly relative to the coil assembly in a direction of movement; a power supply configured to, during use, power the coil assembly; a control unit configured to: o control the power supply to supply the coil assembly with an electric current so as to cause a displacement of the magnet assembly relative to the coil assembly along a predetermined trajectory of interest in the direction of movement, at a substantially constant velocity; o apply a disturbance having a predetermined frequency to the electromagnetic motor, during the displacement of the magnet assembly relative to the coil assembly; o determine a position of the magnet assembly relative to the coil assembly and an electromagnetic motor force, along the predetermined trajectory of interest; o determine a position dependent motor constant of the electromagnetic motor along the predetermined trajectory of interest, based on the determined position and the electromagnetic motor force.
  • the electromagnetic motor according to clause 1 wherein the magnet assembly comprises an array of magnets to generate, during use, a spatially alternating magnetic field in the direction of movement, and wherein the coil assembly comprises an array of coils arranged in the direction of movement.
  • the electromagnetic motor according to clause 1 or 2 wherein the disturbance is a substantially sinusoidal disturbance.
  • the control unit is configured to receive or generate a position setpoint for the electromagnetic motor to cause the displacement, and receive a position signal representing a position of the electromagnetic motor.
  • the electromagnetic motor according to clause 4 wherein the control unit is configured to determine a position error along the trajectory of interest based on the position signal and the position setpoint and to determine the position dependent motor constant of the electromagnetic motor along the predetermined trajectory of interest, based on the determined position error and the electromagnetic motor force.
  • the electromagnetic motor according to clause 4 or 5 wherein the control unit is configured to determine a desired motor force during the displacement, based on the position setpoint and the position signal. 7.
  • the disturbance is a disturbance force and wherein the control unit is configured to superimpose the disturbance force to the desired motor force.
  • a stage apparatus for use in a lithographic apparatus comprising an electromagnetic motor according to any of the preceding clauses.
  • stage apparatus configured to hold a patterning device or a substrate.
  • a lithographic apparatus comprising a stage apparatus according to clause 12 or 13.
  • a method of determining a position dependent motor constant of an electromagnetic motor comprising a magnet assembly and a coil assembly that are configured to displace relative to each other in a direction of movement, the method comprising: causing a displacement of the magnet assembly relative to the coil assembly along a predetermined trajectory of interest in the direction of movement, at a substantially constant velocity; applying a disturbance having a predetermined frequency to the electromagnetic motor, during the displacement of the magnet assembly relative to the coil assembly; determining a position error of the magnet assembly relative to the coil assembly and an electromagnetic motor force, along the predetermined trajectory of interest; determining a position dependent motor constant of the electromagnetic motor along the predetermined trajectory of interest, based on the determined position error and the electromagnetic motor force.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Linear Motors (AREA)

Abstract

L'invention concerne un procédé de détermination d'une constante de moteur dépendant d'une position d'un moteur électromagnétique, le moteur électromagnétique comprenant un ensemble aimant et un ensemble bobine qui sont configurés pour se déplacer l'un par rapport à l'autre dans une direction de mouvement, le procédé consistant à : - provoquer un déplacement de l'ensemble aimant par rapport à l'ensemble bobine le long d'une trajectoire d'intérêt prédéterminée dans la direction de mouvement, à une vitesse sensiblement constante ; - appliquer une perturbation ayant une fréquence prédéterminée au moteur électromagnétique, pendant le déplacement de l'ensemble aimant par rapport à l'ensemble bobine ; - déterminer une erreur de position de l'ensemble aimant par rapport à l'ensemble bobine et une force de moteur électromagnétique, le long de la trajectoire d'intérêt prédéterminée ; - déterminer une constante de moteur dépendant d'une position du moteur électromagnétique le long de la trajectoire d'intérêt prédéterminée, sur la base de l'erreur de position déterminée et de la force de moteur électromagnétique.
PCT/EP2024/055645 2023-03-31 2024-03-05 Moteur électromagnétique et procédé de détermination d'une constante de moteur dépendant d'une position pour un moteur électromagnétique Ceased WO2024199902A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202480021638.5A CN120917656A (zh) 2023-03-31 2024-03-05 电磁马达和确定电磁马达的位置相关马达常数的方法
JP2025550898A JP2026511387A (ja) 2023-03-31 2024-03-05 電磁モータ及び電磁モータの位置依存性モータ定数を決定する方法

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EP23166250.3 2023-03-31
EP23166250 2023-03-31

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070058173A1 (en) 2005-09-12 2007-03-15 Wolfgang Holzapfel Position-measuring device
JP2009159741A (ja) * 2007-12-27 2009-07-16 Yaskawa Electric Corp リニアモータの推力リップル測定装置およびその測定方法とモータ制御装置
US20190089283A1 (en) * 2017-09-15 2019-03-21 Siemens Aktiengesellschaft Identification of a Secondary Part During Use in a Linear-Motor-Based System
US20220200385A1 (en) * 2016-02-12 2022-06-23 Asml Netherlands B.V. Multiphase linear motor, multiphase planar motor, stage, lithographic apparatus and device manufacturing method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020964A (en) 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6952253B2 (en) 2002-11-12 2005-10-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070058173A1 (en) 2005-09-12 2007-03-15 Wolfgang Holzapfel Position-measuring device
JP2009159741A (ja) * 2007-12-27 2009-07-16 Yaskawa Electric Corp リニアモータの推力リップル測定装置およびその測定方法とモータ制御装置
US20220200385A1 (en) * 2016-02-12 2022-06-23 Asml Netherlands B.V. Multiphase linear motor, multiphase planar motor, stage, lithographic apparatus and device manufacturing method
US20190089283A1 (en) * 2017-09-15 2019-03-21 Siemens Aktiengesellschaft Identification of a Secondary Part During Use in a Linear-Motor-Based System

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